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    • 3. 发明申请
    • IMAGE PROCESSING DEVICE AND RECORDING MEDIUM STORING IMAGE PROCESSING PROGRAM
    • 图像处理设备和记录媒体存储图像处理程序
    • US20090141979A1
    • 2009-06-04
    • US12339925
    • 2008-12-19
    • Tomotaka ShinodaToshihiro MitakaSatoshi MoriNaoki WatanabeHideki Ito
    • Tomotaka ShinodaToshihiro MitakaSatoshi MoriNaoki WatanabeHideki Ito
    • G06K9/00
    • G06K9/00134
    • An inspection apparatus includes an imaging device and an image processing device. The imaging device photographs a specimen and outputs a color image of the specimen to the image processing device. The image processing device subjects the color image of the specimen to negative-positive reversal. After detecting a mode value of the hue the color image having been subjected to negative-positive reversal, the image processing device changes the hue of the color image in accordance with a difference between a boundary value of two predefined hues and the detected mode value. In accordance with the change of the hue, a plurality of target pixels different in the saturation is extracted and the saturation and the intensity of each pixel are changed, or the gradation of each pixel is converted so that the plurality of target pixels becomes most distant from one another in a color space.
    • 检查装置包括成像装置和图像处理装置。 成像装置拍摄样本并将样本的彩色图像输出到图像处理装置。 图像处理装置使样本的彩色图像呈负反转。 在检测到彩色图像经受负反转后的色调的模式值之后,图像处理装置根据两个预定色调的边界值与检测到的模式值之间的差异来改变彩色图像的色调。 根据色调的变化,提取饱和度不同的多个目标像素,并且改变每个像素的饱和度和强度,或者转换每个像素的灰度,使得多个目标像素变得最远 在一个色彩空间中彼此之间。
    • 4. 发明授权
    • Image processing device and recording medium storing image processing program
    • 图像处理装置和存储图像处理程序的记录介质
    • US08406514B2
    • 2013-03-26
    • US12339925
    • 2008-12-19
    • Tomotaka ShinodaToshihiro MitakaSatoshi MoriNaoki WatanabeHideki Ito
    • Tomotaka ShinodaToshihiro MitakaSatoshi MoriNaoki WatanabeHideki Ito
    • G06K9/00
    • G06K9/00134
    • An inspection apparatus includes an imaging device and an image processing device. The imaging device photographs a specimen and outputs a color image of the specimen to the image processing device. The image processing device subjects the color image of the specimen to negative-positive reversal. After detecting a mode value of the hue the color image having been subjected to negative-positive reversal, the image processing device changes the hue of the color image in accordance with a difference between a boundary value of two predefined hues and the detected mode value. In accordance with the change of the hue, a plurality of target pixels different in the saturation is extracted and the saturation and the intensity of each pixel are changed, or the gradation of each pixel is converted so that the plurality of target pixels becomes most distant from one another in a color space.
    • 检查装置包括成像装置和图像处理装置。 成像装置拍摄样本并将样本的彩色图像输出到图像处理装置。 图像处理装置使样本的彩色图像呈负反转。 在检测到彩色图像经受负反转后的色调的模式值之后,图像处理装置根据两个预定色调的边界值与检测到的模式值之间的差异来改变彩色图像的色调。 根据色调的变化,提取饱和度不同的多个目标像素,并且改变每个像素的饱和度和强度,或者转换每个像素的灰度,使得多个目标像素变得最远 在一个色彩空间中彼此之间。
    • 10. 发明申请
    • FILM-FORMING APPARATUS AND METHOD
    • 成膜装置和方法
    • US20120244684A1
    • 2012-09-27
    • US13404117
    • 2012-02-24
    • Kunihiko SuzukiHideki Ito
    • Kunihiko SuzukiHideki Ito
    • H01L21/205C23C16/46C23C16/00
    • H01L21/0262C23C16/45517C23C16/45591C23C16/46C30B25/02C30B25/08C30B25/10C30B29/36H01L21/0237H01L21/02532
    • A film-forming apparatus and method is provided that includes a reflector and insulator capable of suppressing the thermal degradation of components in close proximity to the heater in a film-forming apparatus. In a film-forming apparatus the reflector is used in combination with insulator. Specifically, in a film-forming apparatus a reflector is disposed below a heater with the insulator placed below the reflector. The insulator absorbs the radiant heat from the heater thus suppressing an excessive rise in temperature around the heater, it is therefore possible to prevent thermal degradation of components in close proximity of the heater. For example, when the temperature of a semiconductor substrate is 1650° C., the temperature of the quartz heater base maybe about 1000° C. This is lower than the softening point temperature of the quartz heater base, preventing deformation of the heater base.
    • 提供了一种成膜装置和方法,其包括反射器和绝缘体,其能够抑制成膜装置中加热器附近的部件的热劣化。 在成膜设备中,反射器与绝缘体组合使用。 具体地,在成膜装置中,反射器设置在加热器下方,绝缘体位于反射器下方。 绝缘子吸收来自加热器的辐射热,从而抑制加热器周围温度的过度上升,因此可以防止加热器附近的部件的热劣化。 例如,当半导体基板的温度为1650℃时,石英加热器基座的温度可以为约1000℃。这低于石英加热器基座的软化点温度,从而防止加热器基座的变形。