专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20060188812A1 Phenolic hydroxyl group-containing copolymer and radiation-sensitive resin composition 审中-公开
标题翻译：含酚羟基的共聚物和辐射敏感树脂组合物
公开(公告)号：US20060188812A1
公开(公告)日：2006-08-24
申请号：US11356003
申请日：2006-02-17
申请人： Tomoki Nagai , Hirotaka Mizuno , Kouichirou Yoshida , Yoshikazu Yamaguchi , Daisuke Shimizu , Nobuji Matsumura , Satoru Nishiyama , Toshiyuki Kai
发明人： Tomoki Nagai , Hirotaka Mizuno , Kouichirou Yoshida , Yoshikazu Yamaguchi , Daisuke Shimizu , Nobuji Matsumura , Satoru Nishiyama , Toshiyuki Kai
IPC分类号： G03C1/76
CPC分类号： G03F7/0392 , C08F8/12 , C08F212/08 , C08F212/14 , C08J5/18
摘要： A copolymer is provided which exhibits improved resolution, sensitivity, and exposure latitude and excels in pattern collapse margin. The copolymer contains a recurring unit which is hydrolyzed completely an acid-labile group with an acid after copolymerizing a monomer of the following formula(1) and a recurring unit which is hydrolyzed partially acid-labile group with an acid after copolymerizing a monomer of the following formula (2), wherein R1 represents a hydrogen atom or a methyl group, and R2 and R3 represent saturated hydrocarbon groups having 1-4 carbon atoms or bond together to form a cyclic ether having 3-7 carbon atoms, wherein R1′ represents a hydrogen atom or a methyl group, and R4, R5, and R6 represent saturated hydrocarbon groups having 1-4 carbon atoms.
摘要翻译：提供了一种共聚物，其表现出改进的分辨率，灵敏度和曝光宽容度，并且在图案崩溃边缘方面优异。该共聚物含有一个重复单元，在共聚单体后，将下式（1）的单体与一种水解部分酸不稳定基团的重复单元共聚后，完全水解为酸不稳定基团下式（2）其中R 1表示氢原子或甲基，R 2和R 3表示饱和烃基，其具有 1-4个碳原子或键合在一起形成具有3-7个碳原子的环醚，其中R 1'表示氢原子或甲基，R 4' R 5，R 6和R 6表示具有1-4个碳原子的饱和烃基。

2. 发明申请

US20060166138A1 Radiation-sensitive resin composition 审中-公开
标题翻译：辐射敏感树脂组合物
公开(公告)号：US20060166138A1
公开(公告)日：2006-07-27
申请号：US11340741
申请日：2006-01-27
申请人： Daisuke Shimizu , Tomoki Nagai , Kouichirou Yoshida , Hirotaka Mizuno
发明人： Daisuke Shimizu , Tomoki Nagai , Kouichirou Yoshida , Hirotaka Mizuno
IPC分类号： G03C1/76
CPC分类号： C09D125/18 , C08F8/12 , C08F212/14 , C08K5/42 , C08K5/43 , G03F7/0392 , C08F212/08
摘要： A radiation-sensitive resin composition is provided which exhibits improved resolution, sensitivity, and focal depth allowance (process margin) and can eliminate development residues when forming a resist pattern. The radiation-sensitive resin composition comprises an acid-labile group-containing resin (A) which is insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid, and a photoacid generator (B), the acid-labile group-containing resin (A) comprises a copolymer prepared by anionic polymerization of monomers including a substituted or unsubstituted styrene and have a terminal shown by the following formula (x). wherein R14 and R15 individually represent a hydrogen atom or a linear or branched saturated hydrocarbon group having 1-6 carbon atoms.
摘要翻译：提供了一种辐射敏感性树脂组合物，其表现出改进的分辨率，灵敏度和焦深度余量（工艺余量），并且可以在形成抗蚀剂图案时消除显影残留。该辐射敏感性树脂组合物包含不溶于碱性或几乎不溶于碱的酸不稳定基团的树脂（A），但通过酸作用而变成碱溶性的光致酸性发生剂（B），酸不稳定性含有基团的树脂（A）包含由包含取代或未取代的苯乙烯的单体的阴离子聚合制备的共聚物，并且具有下式（x）所示的末端。其中R 14和R 15各自表示氢原子或具有1-6个碳原子的直链或支链饱和烃基。

3. 发明申请

US20090318652A1 NOVEL COMPOUND, POLYMER, AND RESIN COMPOSITION 有权
标题翻译：新型化合物，聚合物和树脂组合物
公开(公告)号：US20090318652A1
公开(公告)日：2009-12-24
申请号：US12097414
申请日：2006-12-13
申请人： Tomoki Nagai , Takuma Ebata , Nobuji Matsumura
发明人： Tomoki Nagai , Takuma Ebata , Nobuji Matsumura
IPC分类号： C08F28/02 , C07C69/533
CPC分类号： G03F7/0045 , C07C309/06 , C07C309/19 , C07C381/12 , C07C2602/42 , C08F220/38 , G03F7/0397
摘要： A radiation-sensitive resin composition which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, exhibiting high resolution performance, excellent DOF and LER, and high resistance to a liquid medium used in liquid immersion lithography is provided. Also provided are a polymer which can be used in the composition, a novel compound useful for synthesizing the polymer, and a method of producing the composition. A radiation-sensitive resin composition having an excellent resistance to a liquid medium can be obtained by using the novel compound shown by the following formula (1), wherein R1 represents a methyl group or a hydrogen atom, R2, R3 and R4 individually represent a substituted or unsubstituted monovalent organic group having 1 to 10 carbon atoms, n is an integer from 0 to 3, A represents a methylene group, a linear or branched alkylene group having 2 to 10 carbon atoms, or an arylene group, and X− represents a counter ion of S+.
摘要翻译：对辐射具有高透明度的辐射敏感性树脂组合物，作为抗敏剂如感光度，分辨率和图案形状的基本性能优异，特别是表现出高分辨率性能，优异的DOF和LER，以及对提供了用于液浸光刻的液体介质。还提供了可用于组合物中的聚合物，可用于合成聚合物的新化合物，以及该组合物的制备方法。通过使用由下式（1）表示的新化合物，其中R 1表示甲基或氢原子，可以得到对液体介质具有优异抗性的辐射敏感性树脂组合物，R2，R3和R4分别表示取代或未取代的碳原子数1〜10的一价有机基团，n表示0〜3的整数，A表示亚甲基，碳原子数2〜10的直链或支链亚烷基或亚芳基，X表示 S +的反离子。

4. 发明授权

US08273837B2 Compound, polymer, and resin composition 有权
标题翻译：化合物，聚合物和树脂组合物
公开(公告)号：US08273837B2
公开(公告)日：2012-09-25
申请号：US12097414
申请日：2006-12-13
申请人： Tomoki Nagai , Takuma Ebata , Nobuji Matsumura
发明人： Tomoki Nagai , Takuma Ebata , Nobuji Matsumura
IPC分类号： C08F118/02
CPC分类号： G03F7/0045 , C07C309/06 , C07C309/19 , C07C381/12 , C07C2602/42 , C08F220/38 , G03F7/0397
摘要： A radiation-sensitive resin composition which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, exhibiting high resolution performance, excellent DOF and LER, and high resistance to a liquid medium used in liquid immersion lithography is provided. Also provided are a polymer which can be used in the composition, a novel compound useful for synthesizing the polymer, and a method of producing the composition. A radiation-sensitive resin composition having an excellent resistance to a liquid medium can be obtained by using the novel compound shown by the following formula (1), wherein R1 represents a methyl group or a hydrogen atom, R2, R3 and R4 individually represent a substituted or unsubstituted monovalent organic group having 1 to 10 carbon atoms, n is an integer from 0 to 3, A represents a methylene group, a linear or branched alkylene group having 2 to 10 carbon atoms, or an arylene group, and X− represents a counter ion of S+.
摘要翻译：对辐射具有高透明度的辐射敏感性树脂组合物，作为抗敏剂如感光度，分辨率和图案形状的基本性能优异，特别是表现出高分辨率性能，优异的DOF和LER，以及对提供了用于液浸光刻的液体介质。还提供了可用于组合物中的聚合物，可用于合成聚合物的新化合物，以及该组合物的制备方法。通过使用由下式（1）表示的新化合物，其中R 1表示甲基或氢原子，可以得到对液体介质具有优异抗性的辐射敏感性树脂组合物，R2，R3和R4分别表示取代或未取代的碳原子数1〜10的一价有机基团，n表示0〜3的整数，A表示亚甲基，碳原子数2〜10的直链或支链亚烷基或亚芳基，X表示 S +的反离子。

5. 发明申请

US20060078821A1 Positive-tone radiation-sensitive resin composition 有权
标题翻译：正色辐射敏感树脂组合物
公开(公告)号：US20060078821A1
公开(公告)日：2006-04-13
申请号：US11235101
申请日：2005-09-27
申请人： Daisuke Shimizu , Tomoki Nagai , Yuuji Yada , Kentarou Gotou
发明人： Daisuke Shimizu , Tomoki Nagai , Yuuji Yada , Kentarou Gotou
IPC分类号： G03C1/76
CPC分类号： G03F7/0045 , G03F7/0392 , G03F7/091 , Y10S430/106 , Y10S430/111 , Y10S430/127
摘要： A positive-tone radiation-sensitive resin composition containing an anthracene-based carboxylic acid component with low sublimation properties and excellent compatibility with other components is provided. The composition exhibits optimum controllability of radiation transmittance as a chemically amplified positive-tone resist effectively responding to active radiation, particularly to deep ultraviolet rays, effectively controlling line width variation in resist patterns due to fluctuation in the resist film thickness on a highly refractive substrate, and exhibiting excellent focal depth allowance. The composition comprises (A) an anthracene derivative of the following formula (1), (B) a photoacid generator comprising a sulfonimide compound, and, (C) a resin containing an acid-dissociable group, wherein R1 is a hydrogen atom or a monovalent organic group, R2 is a monovalent organic group, e is an integer of 0-3, and f is an integer of 0-8. The metal impurity content in the component (A), in terms of the total ion content, is preferably 5,000 ppb or less.
摘要翻译：提供了含有具有低升华性和与其它成分的良好相容性的蒽类羧酸成分的正色散辐射敏感性树脂组合物。该组合物作为化学扩增的正色调抗蚀剂具有最佳的辐射透射性可控性，其有效地响应于主动辐射，特别是对深紫外线，有效地控制由于高折射性基底上的抗蚀剂膜厚度的波动导致的抗蚀剂图案的线宽变化，并表现出优异的焦深度补偿。该组合物包含（A）下式（1）的蒽衍生物，（B）包含磺酰亚胺化合物的光酸产生剂，和（C）含有酸解离基团的树脂，其中R 1， SUP>是氢原子或一价有机基团，R 2是一价有机基团，e是0-3的整数，f是0-8的整数。组分（A）中的金属杂质含量相对于总离子含量优选为5,000ppb以下。

6. 发明授权

US07335457B2 Positive-tone radiation-sensitive resin composition 有权
标题翻译：正色辐射敏感树脂组合物
公开(公告)号：US07335457B2
公开(公告)日：2008-02-26
申请号：US11235101
申请日：2005-09-27
申请人： Daisuke Shimizu , Tomoki Nagai , Yuuji Yada , Kentarou Gotou
发明人： Daisuke Shimizu , Tomoki Nagai , Yuuji Yada , Kentarou Gotou
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0392 , G03F7/091 , Y10S430/106 , Y10S430/111 , Y10S430/127
摘要： A positive-tone radiation-sensitive resin composition containing an anthracene-based carboxylic acid component with low sublimation properties and excellent compatibility with other components is provided. The composition exhibits optimum controllability of radiation transmittance as a chemically amplified positive-tone resist effectively responding to active radiation, particularly to deep ultraviolet rays, effectively controlling line width variation in resist patterns due to fluctuation in the resist film thickness on a highly refractive substrate, and exhibiting excellent focal depth allowance.The composition comprises (A) an anthracene derivative of the following formula (1), (B) a photoacid generator comprising a sulfonimide compound, and, (C) a resin containing an acid-dissociable group, wherein R1 is a hydrogen atom or a monovalent organic group, R2 is a monovalent organic group, e is an integer of 0-3, and f is an integer of 0-8. The metal impurity content in the component (A), in terms of the total ion content, is preferably 5,000 ppb or less.
摘要翻译：提供了含有具有低升华性和与其它成分的良好相容性的蒽类羧酸成分的正色散辐射敏感性树脂组合物。该组合物作为化学扩增的正色调抗蚀剂具有最佳的辐射透射性可控性，其有效地响应于有源辐射，特别是对深紫外线，有效地控制由于高折射性基底上的抗蚀剂膜厚度的波动导致的抗蚀剂图案的线宽度变化，并表现出优异的焦深度补偿。该组合物包含（A）下式（1）的蒽衍生物，（B）包含磺酰亚胺化合物的光酸产生剂，和（C）含有酸解离基团的树脂，其中R 1， SUP>是氢原子或一价有机基团，R 2是一价有机基团，e是0-3的整数，f是0-8的整数。组分（A）中的金属杂质含量相对于总离子含量优选为5,000ppb以下。

7. 发明授权

US07105269B2 Copolymer, polymer mixture, and radiation-sensitive resin composition 有权
标题翻译：共聚物，聚合物混合物和辐射敏感树脂组合物
公开(公告)号：US07105269B2
公开(公告)日：2006-09-12
申请号：US10321518
申请日：2002-12-18
申请人： Tomoki Nagai , Daisuke Shimizu , Tsutomu Shimokawa , Fumihisa Miyajima , Masaaki Miyaji
发明人： Tomoki Nagai , Daisuke Shimizu , Tsutomu Shimokawa , Fumihisa Miyajima , Masaaki Miyaji
IPC分类号： C03F7/004 , C08L29/00 , C08F232/00
CPC分类号： C08F212/14 , C08F220/18 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： 1. A copolymer having recurring units of the following formulas (1), (2), and (3), wherein R1, R4, R5, and R6 are a hydrogen atom or a methyl group, R2, R3, and R7 represent a monovalent organic group, k is 1 or 2, 1 is 0–4, n is 1–3, m is 0–3, R8 is a substituted methyl group, 1-substituted ethyl group, 1-branched alkyl group, triorganosilyl group, triorganogermyl group, alkoxycarbonyl group, acyl group, or cyclic acid-dissociable group, with two or more R8 groups being the same or different, q is 1–3, and p is 0–3, the copolymer having a GPC average molecular weight of 3,000–100,000. The composition is useful as a polymer component for a radiation-sensitive resin composition suitable as a chemically-amplified resist.
摘要翻译： 1.具有下式（1），（2）和（3）的重复单元的共聚物，其中R 1，R 4，R 5 R 6和R 6是氢原子或甲基，R 2，R 3和R 7 表示一价有机基团，k为1或2，1为0-4，n为1-3，m为0-3，R 8为取代甲基，1 取代乙基，1-支链烷基，三有机甲硅烷基，三有机甲基，烷氧基羰基，酰基或环状酸解离基，其中两个或多个R 8基团相同或不同， q为1-3，p为0-3，GPC的平均分子量为3,000〜100,000。该组合物可用作适合作为化学增幅抗蚀剂的辐射敏感性树脂组合物的聚合物组分。

8. 发明申请

US20060223010A1 Positive type radiation-sensitive resin composition 有权
标题翻译：正型辐射敏感树脂组合物
公开(公告)号：US20060223010A1
公开(公告)日：2006-10-05
申请号：US11391257
申请日：2006-03-29
申请人： Takayuki Tsuji , Tomoki Nagai , Kentarou Harada , Daisuke Shimizu
发明人： Takayuki Tsuji , Tomoki Nagai , Kentarou Harada , Daisuke Shimizu
IPC分类号： G03C5/00
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/114
摘要： A positive type radiation-sensitive resin composition suitable as a chemically-amplified resist sensitive to active radiation particularly to deep ultraviolet rays represented by a KrF excimer laser, an ArF excimer laser, or an F2 excimer laser, excelling particularly in a process margin for the KrF excimer laser is provided. The positive type radiation-sensitive resin composition comprises a photoacid generator and an acid-labile group-containing resin which is insoluble or scarcely soluble in alkali, but becomes alkali-soluble by the action of an acid, wherein the photoacid generator is a mixed photoacid generator containing a photoacid generator of the following formula (1) and a photoacid generator which is at least one compound selected from sulfonyloxyimide and disulfonyldiazomethane.
摘要翻译：适合作为对活性辐射敏感的化学增幅抗蚀剂的正型辐射敏感树脂组合物，特别是由KrF准分子激光器，ArF准分子激光器或F 2激子准分子激光器表示的深紫外线，提供特别是在KrF准分子激光器的工艺余量中优异。正型辐射敏感性树脂组合物包含光酸产生剂和不溶于或几乎不溶于碱的酸不稳定基团的树脂，但通过酸的作用而变成碱溶性，其中光酸产生剂是混合的光酸含有下式（1）的光致酸产生剂和光酸产生剂，其为选自磺酰氧基酰亚胺和二磺酰基重氮甲烷中的至少一种化合物。

9. 发明授权

US07488566B2 Positive type radiation-sensitive resin composition 有权
标题翻译：正型辐射敏感树脂组合物
公开(公告)号：US07488566B2
公开(公告)日：2009-02-10
申请号：US11391257
申请日：2006-03-29
申请人： Takayuki Tsuji , Tomoki Nagai , Kentarou Harada , Daisuke Shimizu
发明人： Takayuki Tsuji , Tomoki Nagai , Kentarou Harada , Daisuke Shimizu
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/114
摘要： A positive type radiation-sensitive resin composition suitable as a chemically-amplified resist sensitive to active radiation particularly to deep ultraviolet rays represented by a KrF excimer laser, an ArF excimer laser, or an F2 excimer laser, excelling particularly in a process margin for the KrF excimer laser is provided. The positive type radiation-sensitive resin composition comprises a photoacid generator and an acid-labile group-containing resin which is insoluble or scarcely soluble in alkali, but becomes alkali-soluble by the action of an acid, wherein the photoacid generator is a mixed photoacid generator containing a photoacid generator of the following formula (1) and a photoacid generator which is at least one compound selected from sulfonyloxyimide and disulfonyldiazomethane.
摘要翻译：适合作为对活性辐射敏感的化学放大抗蚀剂的正型辐射敏感性树脂组合物，特别是由KrF准分子激光器，ArF准分子激光器或F2准分子激光器表示的深紫外线，特别优选在提供KrF准分子激光器。正型辐射敏感性树脂组合物包含光酸产生剂和不溶于或几乎不溶于碱的酸不稳定基团的树脂，但通过酸的作用而变成碱溶性，其中光酸产生剂是混合的光酸含有下式（1）的光致酸产生剂和光酸产生剂，其为选自磺酰氧基酰亚胺和二磺酰基重氮甲烷中的至少一种化合物。

10. 发明授权

US09040221B2 Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound 有权
标题翻译：辐射敏感性树脂组合物，抗蚀剂图案形成方法，聚合物和化合物
公开(公告)号：US09040221B2
公开(公告)日：2015-05-26
申请号：US13699007
申请日：2011-05-19
申请人： Hitoshi Osaki , Yusuke Asano , Mitsuo Sato , Tomoki Nagai
发明人： Hitoshi Osaki , Yusuke Asano , Mitsuo Sato , Tomoki Nagai
IPC分类号： G03F7/004 , C08F22/18 , C08F220/26 , G03F7/038 , G03F7/039 , G03F7/20 , C07C69/653 , C07C69/753 , C07D307/93 , C08F24/00 , C08F220/24
CPC分类号： G03F7/004 , C07C69/653 , C07C69/753 , C07D307/93 , C08F22/18 , C08F24/00 , C08F220/24 , C08F220/26 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/2041
摘要： A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a fluorine-containing polymer having a structural unit (I) that includes a group represented by the following formula (1), and (B) a radiation-sensitive acid generator.
摘要翻译：提供了一种在液浸光刻工艺中提供抗蚀剂涂膜的辐射敏感性树脂组合物，该曝光敏感性树脂组合物能够在曝光期间表现出很大的动态接触角，由此抗蚀剂涂膜的表面可呈现出排水性优异，并且能够导致显影期间动态接触角显着降低的放射线敏感性树脂组合物，从而可以抑制显影缺陷的产生，并且进一步缩短动态变化所需的时间段接触角启用。一种辐射敏感性树脂组合物，其包含（A）具有由下式（1）表示的基团的结构单元（I）的含氟聚合物和（B）辐射敏感性酸发生剂。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式