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1. 发明申请

US20060188812A1 Phenolic hydroxyl group-containing copolymer and radiation-sensitive resin composition 审中-公开
标题翻译：含酚羟基的共聚物和辐射敏感树脂组合物
公开(公告)号：US20060188812A1
公开(公告)日：2006-08-24
申请号：US11356003
申请日：2006-02-17
申请人： Tomoki Nagai , Hirotaka Mizuno , Kouichirou Yoshida , Yoshikazu Yamaguchi , Daisuke Shimizu , Nobuji Matsumura , Satoru Nishiyama , Toshiyuki Kai
发明人： Tomoki Nagai , Hirotaka Mizuno , Kouichirou Yoshida , Yoshikazu Yamaguchi , Daisuke Shimizu , Nobuji Matsumura , Satoru Nishiyama , Toshiyuki Kai
IPC分类号： G03C1/76
CPC分类号： G03F7/0392 , C08F8/12 , C08F212/08 , C08F212/14 , C08J5/18
摘要： A copolymer is provided which exhibits improved resolution, sensitivity, and exposure latitude and excels in pattern collapse margin. The copolymer contains a recurring unit which is hydrolyzed completely an acid-labile group with an acid after copolymerizing a monomer of the following formula(1) and a recurring unit which is hydrolyzed partially acid-labile group with an acid after copolymerizing a monomer of the following formula (2), wherein R1 represents a hydrogen atom or a methyl group, and R2 and R3 represent saturated hydrocarbon groups having 1-4 carbon atoms or bond together to form a cyclic ether having 3-7 carbon atoms, wherein R1′ represents a hydrogen atom or a methyl group, and R4, R5, and R6 represent saturated hydrocarbon groups having 1-4 carbon atoms.
摘要翻译：提供了一种共聚物，其表现出改进的分辨率，灵敏度和曝光宽容度，并且在图案崩溃边缘方面优异。该共聚物含有一个重复单元，在共聚单体后，将下式（1）的单体与一种水解部分酸不稳定基团的重复单元共聚后，完全水解为酸不稳定基团下式（2）其中R 1表示氢原子或甲基，R 2和R 3表示饱和烃基，其具有 1-4个碳原子或键合在一起形成具有3-7个碳原子的环醚，其中R 1'表示氢原子或甲基，R 4' R 5，R 6和R 6表示具有1-4个碳原子的饱和烃基。

2. 发明授权

US08119324B2 Method of forming pattern, composition for forming upper-layer film, and composition for forming under-layer film 有权
标题翻译：形成图案的方法，用于形成上层膜的组合物和用于形成底层膜的组合物
公开(公告)号：US08119324B2
公开(公告)日：2012-02-21
申请号：US12375915
申请日：2007-07-27
申请人： Hikaru Sugita , Nobuji Matsumura , Daisuke Shimizu , Toshiyuki Kai , Tsutomu Shimokawa
发明人： Hikaru Sugita , Nobuji Matsumura , Daisuke Shimizu , Toshiyuki Kai , Tsutomu Shimokawa
IPC分类号： G03F7/00 , G03F7/004 , G03F7/20 , G03F7/26 , G03F7/40
CPC分类号： G03F7/11 , G03F7/0045 , G03F7/0757 , G03F7/265
摘要： A pattern formation method suitable for forming micro-patterns using electron beams (EB), X-rays, or extreme ultraviolet radiation (EUV) is provided. The method includes the following steps in the following order: (1) a step of forming and curing a under-layer film containing a radiation-sensitive acid generator which generates an acid upon exposure to radiation on a substrate, (2) a step of irradiating the under-layer film with radiation through a mask to cause an acid to be selectively generated in the exposed area of the under-layer film, (3) a step of forming an upper-layer film which does not contain a radiation-sensitive acid generator, but contains a composition capable of polymerization or crosslinking by the action of an acid, (4) a step of forming a cured film by polymerization or crosslinking selectively in the area of the upper-layer film corresponding to the area of the under-layer film in which the acid has been generated, and (5) a step of removing the area of the upper-layer film corresponding to the area of the under-layer film in which the acid has not been generated.
摘要翻译：提供了适用于使用电子束（EB），X射线或极紫外线（EUV）形成微图案的图形形成方法。该方法按以下顺序包括以下步骤：（1）形成和固化含有辐射敏感性酸产生剂的底层膜的步骤，所述辐射敏感酸产生剂在暴露于基材上时产生酸，（2）步骤通过掩模用辐射照射底层膜以在底层膜的暴露区域中选择性地产生酸，（3）形成不含辐射敏感性的上层膜的步骤酸产生剂，但含有能够通过酸的作用聚合或交联的组合物，（4）通过聚合或选择性地在上层膜对应于下面的区域的区域中选择性地交联固化膜的步骤产生酸的层 - 膜，以及（5）除去与未生成酸的下层膜的面积对应的上层膜的面积的工序。

3. 发明授权

US08361691B2 Radiation-sensitive composition and process for producing low-molecular compound for use therein 有权
标题翻译：辐射敏感组合物及其制备用于其中的低分子化合物的制备方法
公开(公告)号：US08361691B2
公开(公告)日：2013-01-29
申请号：US12439860
申请日：2007-08-28
申请人： Nobuji Matsumura , Daisuke Shimizu , Toshiyuki Kai
发明人： Nobuji Matsumura , Daisuke Shimizu , Toshiyuki Kai
IPC分类号： G03F7/004 , G03F7/039 , C07C309/12 , C07C381/12 , C07C69/96 , H01L21/027
CPC分类号： G03F7/004 , C07C309/12 , C07C381/12 , G03F7/0045
摘要： A radiation-sensitive composition contains (A) a low-molecular-weight compound having one or more acid-dissociable groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule, and having a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000, and (B) a solvent.
摘要翻译：辐射敏感性组合物包含（A）具有一个或多个酸解离基团的低分子量化合物，其通过酸的作用分解以增强在碱性显影溶液中的溶解度和一种或多种辐射敏感的产酸并且通过凝胶渗透色谱法（GPC）测定的聚苯乙烯换算的数均分子量（Mn）为500〜4000，以及（B）溶剂，在每分子施用活性射线或辐射时产生酸的基团。

4. 发明授权

US08173348B2 Method of forming pattern and composition for forming of organic thin-film for use therein 有权
标题翻译：形成用于形成有机薄膜的图案和组合物的方法
公开(公告)号：US08173348B2
公开(公告)日：2012-05-08
申请号：US12305893
申请日：2007-06-21
申请人： Daisuke Shimizu , Hikaru Sugita , Nobuji Matsumura , Toshiyuki Kai , Tsutomu Shimokawa
发明人： Daisuke Shimizu , Hikaru Sugita , Nobuji Matsumura , Toshiyuki Kai , Tsutomu Shimokawa
IPC分类号： G03F7/00 , G03F7/004 , G03F7/075 , G03F7/40
CPC分类号： C07D333/18 , G03F7/0045 , G03F7/0757 , G03F7/265
摘要： A method for forming a pattern contains (1) a step of forming an underlayer film containing (A) a radiation-sensitive acid generator capable of generating an acid upon exposure to radiation rays or (B) a radiation-sensitive base generator capable of generating a base upon exposure to radiation rays on a substrate; (2) a step of irradiating the underlayer film with radiation rays through a mask with a predetermined pattern to obtain an exposed underlayer film portion having been selectively exposed through the predetermined pattern; (3) a step of forming (C) an organic thin film on the underlayer film so as to attain chemical bonding of the exposed underlayer film portion with the organic thin-film formed on the exposed underlayer film portion; and (4) a step of removing the organic thin film formed on areas of the underlayer film other than the exposed underlayer film portion.
摘要翻译：形成图案的方法包括（1）形成下层膜的步骤，其含有（A）在暴露于辐射线时能够产生酸的辐射敏感性酸产生剂，或（B）能够产生基底上暴露于辐射线; （2）通过具有预定图案的掩模的辐射线照射下层膜以获得通过预定图案选择性曝光的曝光的下层膜部分的步骤; （3）在下层膜上形成（C）有机薄膜以使曝光的下层膜与形成在曝光的下层膜部上的有机薄膜化学接合的工序; 以及（4）除去在下层膜以外的形成在有机薄膜上的除了曝光的下层膜部分以外的部分的工序。

5. 发明授权

US08450045B2 Pattern forming method 有权
标题翻译：图案形成方法
公开(公告)号：US08450045B2
公开(公告)日：2013-05-28
申请号：US13352384
申请日：2012-01-18
申请人： Hikaru Sugita , Nobuji Matsumura , Daisuke Shimizu , Toshiyuki Kai , Tsutomu Shimokawa
发明人： Hikaru Sugita , Nobuji Matsumura , Daisuke Shimizu , Toshiyuki Kai , Tsutomu Shimokawa
IPC分类号： G03F7/00 , G03F7/004 , G03F7/20 , G03F7/40
CPC分类号： G03F7/11 , G03F7/0045 , G03F7/0757 , G03F7/265
摘要： A pattern forming method includes providing and curing a under-layer film containing a radiation-sensitive acid generator which generates an acid upon exposure to radiation on a substrate. The under-layer film is irradiated with radiation through a mask to cause an acid to be selectively generated in an exposed area of the under-layer film. An upper-layer film which does not contain a radiation-sensitive acid generator and which contains a composition capable of polymerizing or crosslinking by an action of an acid is provided. A cured film is provided by polymerization or crosslinking selectively in an area of the upper-layer film corresponding to the exposed area of the under-layer film in which the acid has been generated. An area of the upper-layer film corresponding to an area of the under-layer film in which the acid has not been generated is removed.
摘要翻译：图案形成方法包括提供和固化含有辐射敏感性酸产生剂的底层膜，其在暴露于基底上的辐射时产生酸。底层膜通过掩模用辐射照射，以在底层膜的暴露区域中选择性地产生酸。提供了不含有辐射敏感性酸产生剂并且含有能够通过酸的作用聚合或交联的组合物的上层膜。通过在与产生酸的底层膜的暴露区域相对应的上层膜的区域中选择性地聚合或交联固化膜。除去与未生成酸的下层膜的区域对应的上层膜的区域。

6. 发明申请

US20100233635A1 METHOD OF FORMING PATTERN AND COMPOSITION FOR FORMING OF ORGANIC THIN-FILM FOR USE THEREIN 有权
标题翻译：形成用于形成有机薄膜的图案和组合物的方法
公开(公告)号：US20100233635A1
公开(公告)日：2010-09-16
申请号：US12305893
申请日：2007-06-21
申请人： Daisuke Shimizu , Hikaru Sugita , Nobuji Matsumura , Toshiyuki Kai , Tsutomu Shimokawa
发明人： Daisuke Shimizu , Hikaru Sugita , Nobuji Matsumura , Toshiyuki Kai , Tsutomu Shimokawa
IPC分类号： G03F7/20 , C09K3/00
CPC分类号： C07D333/18 , G03F7/0045 , G03F7/0757 , G03F7/265
摘要： A method for forming a pattern contains (1) a step of forming an underlayer film containing (A) a radiation-sensitive acid generator capable of generating an acid upon exposure to radiation rays or (B) a radiation-sensitive base generator capable of generating a base upon exposure to radiation rays on a substrate; (2) a step of irradiating the underlayer film with radiation rays through a mask with a predetermined pattern to obtain an exposed underlayer film portion having been selectively exposed through the predetermined pattern; (3) a step of forming (C) an organic thin film on the underlayer film so as to attain chemical bonding of the exposed underlayer film portion with the organic thin-film formed on the exposed underlayer film portion; and (4) a step of removing the organic thin film formed on areas of the underlayer film other than the exposed underlayer film portion.
摘要翻译：形成图案的方法包括（1）形成下层膜的步骤，其含有（A）在暴露于辐射线时能够产生酸的辐射敏感性酸产生剂，或（B）能够产生基底上暴露于辐射线; （2）通过具有预定图案的掩模的辐射线照射下层膜以获得通过预定图案选择性曝光的曝光的下层膜部分的步骤; （3）在下层膜上形成（C）有机薄膜以使曝光的下层膜与形成在曝光的下层膜部上的有机薄膜化学接合的工序; 以及（4）除去在下层膜以外的形成在有机薄膜上的除了曝光的下层膜部分以外的部分的工序。

7. 发明申请

US20090311622A1 METHOD OF FORMING PATTERN, COMPOSITION FOR FORMING UPPER-LAYER FILM, AND COMPOSITION FOR FORMING UNDER-LAYER FILM 有权
标题翻译：形成图案的方法，形成上层膜的组合物和形成层状膜的组合物
公开(公告)号：US20090311622A1
公开(公告)日：2009-12-17
申请号：US12375915
申请日：2007-07-27
申请人： Hikaru Sugita , Nobuji Matsumura , Daisuke Shimizu , Toshiyuki Kai , Tsutomu Shimokawa
发明人： Hikaru Sugita , Nobuji Matsumura , Daisuke Shimizu , Toshiyuki Kai , Tsutomu Shimokawa
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/11 , G03F7/0045 , G03F7/0757 , G03F7/265
摘要： A pattern formation method suitable for forming micro-patterns using electron beams (EB), X-rays, or extreme ultraviolet radiation (EUV) is provided. The method includes the following steps in the following order: (1) a step of forming and curing a under-layer film containing a radiation-sensitive acid generator which generates an acid upon exposure to radiation on a substrate, (2) a step of irradiating the under-layer film with radiation through a mask to cause an acid to be selectively generated in the exposed area of the under-layer film, (3) a step of forming an upper-layer film which does not contain a radiation-sensitive acid generator, but contains a composition capable of polymerization or crosslinking by the action of an acid, (4) a step of forming a cured film by polymerization or crosslinking selectively in the area of the upper-layer film corresponding to the area of the under-layer film in which the acid has been generated, and (5) a step of removing the area of the upper-layer film corresponding to the area of the under-layer film in which the acid has not been generated.
摘要翻译：提供了适用于使用电子束（EB），X射线或极紫外线（EUV）形成微图案的图形形成方法。该方法按以下顺序包括以下步骤：（1）形成和固化含有辐射敏感性酸产生剂的底层膜的步骤，所述辐射敏感酸产生剂在暴露于基材上时产生酸，（2）步骤通过掩模用辐射照射底层膜以在底层膜的暴露区域中选择性地产生酸，（3）形成不含辐射敏感性的上层膜的步骤酸产生剂，但含有能够通过酸的作用聚合或交联的组合物，（4）通过聚合或选择性地在上层膜对应于下面的区域的区域中选择性地交联固化膜的步骤产生酸的层 - 膜，以及（5）除去与未生成酸的下层膜的面积对应的上层膜的面积的工序。

8. 发明申请

US20090280433A1 RADIATION-SENSITIVE COMPOSITION AND PROCESS FOR PRODUCING LOW-MOLECULAR COMPOUND FOR USE THEREIN 有权
标题翻译：辐射敏感性组合物及其制备低分子化合物的方法
公开(公告)号：US20090280433A1
公开(公告)日：2009-11-12
申请号：US12439860
申请日：2007-08-28
申请人： Nobuji Matsumura , Daisuke Shimizu , Toshiyuki Kai
发明人： Nobuji Matsumura , Daisuke Shimizu , Toshiyuki Kai
IPC分类号： G03F7/004 , C07C69/96
CPC分类号： G03F7/004 , C07C309/12 , C07C381/12 , G03F7/0045
摘要： A radiation-sensitive composition contains (A) a low-molecular-weight compound having one or more acid-dissociable groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule, and having a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000, and (B) a solvent.
摘要翻译：辐射敏感性组合物包含（A）具有一个或多个酸解离基团的低分子量化合物，其通过酸的作用分解以增强在碱性显影溶液中的溶解度和一种或多种辐射敏感的产酸并且通过凝胶渗透色谱法（GPC）测定的聚苯乙烯换算的数均分子量（Mn）为500〜4000，以及（B）溶剂，在每分子施用活性射线或辐射时产生酸的基团。

9. 发明申请

US20090318652A1 NOVEL COMPOUND, POLYMER, AND RESIN COMPOSITION 有权
标题翻译：新型化合物，聚合物和树脂组合物
公开(公告)号：US20090318652A1
公开(公告)日：2009-12-24
申请号：US12097414
申请日：2006-12-13
申请人： Tomoki Nagai , Takuma Ebata , Nobuji Matsumura
发明人： Tomoki Nagai , Takuma Ebata , Nobuji Matsumura
IPC分类号： C08F28/02 , C07C69/533
CPC分类号： G03F7/0045 , C07C309/06 , C07C309/19 , C07C381/12 , C07C2602/42 , C08F220/38 , G03F7/0397
摘要： A radiation-sensitive resin composition which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, exhibiting high resolution performance, excellent DOF and LER, and high resistance to a liquid medium used in liquid immersion lithography is provided. Also provided are a polymer which can be used in the composition, a novel compound useful for synthesizing the polymer, and a method of producing the composition. A radiation-sensitive resin composition having an excellent resistance to a liquid medium can be obtained by using the novel compound shown by the following formula (1), wherein R1 represents a methyl group or a hydrogen atom, R2, R3 and R4 individually represent a substituted or unsubstituted monovalent organic group having 1 to 10 carbon atoms, n is an integer from 0 to 3, A represents a methylene group, a linear or branched alkylene group having 2 to 10 carbon atoms, or an arylene group, and X− represents a counter ion of S+.
摘要翻译：对辐射具有高透明度的辐射敏感性树脂组合物，作为抗敏剂如感光度，分辨率和图案形状的基本性能优异，特别是表现出高分辨率性能，优异的DOF和LER，以及对提供了用于液浸光刻的液体介质。还提供了可用于组合物中的聚合物，可用于合成聚合物的新化合物，以及该组合物的制备方法。通过使用由下式（1）表示的新化合物，其中R 1表示甲基或氢原子，可以得到对液体介质具有优异抗性的辐射敏感性树脂组合物，R2，R3和R4分别表示取代或未取代的碳原子数1〜10的一价有机基团，n表示0〜3的整数，A表示亚甲基，碳原子数2〜10的直链或支链亚烷基或亚芳基，X表示 S +的反离子。

10. 发明授权

US08273837B2 Compound, polymer, and resin composition 有权
标题翻译：化合物，聚合物和树脂组合物
公开(公告)号：US08273837B2
公开(公告)日：2012-09-25
申请号：US12097414
申请日：2006-12-13
申请人： Tomoki Nagai , Takuma Ebata , Nobuji Matsumura
发明人： Tomoki Nagai , Takuma Ebata , Nobuji Matsumura
IPC分类号： C08F118/02
CPC分类号： G03F7/0045 , C07C309/06 , C07C309/19 , C07C381/12 , C07C2602/42 , C08F220/38 , G03F7/0397
摘要： A radiation-sensitive resin composition which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, exhibiting high resolution performance, excellent DOF and LER, and high resistance to a liquid medium used in liquid immersion lithography is provided. Also provided are a polymer which can be used in the composition, a novel compound useful for synthesizing the polymer, and a method of producing the composition. A radiation-sensitive resin composition having an excellent resistance to a liquid medium can be obtained by using the novel compound shown by the following formula (1), wherein R1 represents a methyl group or a hydrogen atom, R2, R3 and R4 individually represent a substituted or unsubstituted monovalent organic group having 1 to 10 carbon atoms, n is an integer from 0 to 3, A represents a methylene group, a linear or branched alkylene group having 2 to 10 carbon atoms, or an arylene group, and X− represents a counter ion of S+.
摘要翻译：对辐射具有高透明度的辐射敏感性树脂组合物，作为抗敏剂如感光度，分辨率和图案形状的基本性能优异，特别是表现出高分辨率性能，优异的DOF和LER，以及对提供了用于液浸光刻的液体介质。还提供了可用于组合物中的聚合物，可用于合成聚合物的新化合物，以及该组合物的制备方法。通过使用由下式（1）表示的新化合物，其中R 1表示甲基或氢原子，可以得到对液体介质具有优异抗性的辐射敏感性树脂组合物，R2，R3和R4分别表示取代或未取代的碳原子数1〜10的一价有机基团，n表示0〜3的整数，A表示亚甲基，碳原子数2〜10的直链或支链亚烷基或亚芳基，X表示 S +的反离子。

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