专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20090318652A1 NOVEL COMPOUND, POLYMER, AND RESIN COMPOSITION 有权
标题翻译：新型化合物，聚合物和树脂组合物
公开(公告)号：US20090318652A1
公开(公告)日：2009-12-24
申请号：US12097414
申请日：2006-12-13
申请人： Tomoki Nagai , Takuma Ebata , Nobuji Matsumura
发明人： Tomoki Nagai , Takuma Ebata , Nobuji Matsumura
IPC分类号： C08F28/02 , C07C69/533
CPC分类号： G03F7/0045 , C07C309/06 , C07C309/19 , C07C381/12 , C07C2602/42 , C08F220/38 , G03F7/0397
摘要： A radiation-sensitive resin composition which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, exhibiting high resolution performance, excellent DOF and LER, and high resistance to a liquid medium used in liquid immersion lithography is provided. Also provided are a polymer which can be used in the composition, a novel compound useful for synthesizing the polymer, and a method of producing the composition. A radiation-sensitive resin composition having an excellent resistance to a liquid medium can be obtained by using the novel compound shown by the following formula (1), wherein R1 represents a methyl group or a hydrogen atom, R2, R3 and R4 individually represent a substituted or unsubstituted monovalent organic group having 1 to 10 carbon atoms, n is an integer from 0 to 3, A represents a methylene group, a linear or branched alkylene group having 2 to 10 carbon atoms, or an arylene group, and X− represents a counter ion of S+.
摘要翻译：对辐射具有高透明度的辐射敏感性树脂组合物，作为抗敏剂如感光度，分辨率和图案形状的基本性能优异，特别是表现出高分辨率性能，优异的DOF和LER，以及对提供了用于液浸光刻的液体介质。还提供了可用于组合物中的聚合物，可用于合成聚合物的新化合物，以及该组合物的制备方法。通过使用由下式（1）表示的新化合物，其中R 1表示甲基或氢原子，可以得到对液体介质具有优异抗性的辐射敏感性树脂组合物，R2，R3和R4分别表示取代或未取代的碳原子数1〜10的一价有机基团，n表示0〜3的整数，A表示亚甲基，碳原子数2〜10的直链或支链亚烷基或亚芳基，X表示 S +的反离子。

2. 发明授权

US08273837B2 Compound, polymer, and resin composition 有权
标题翻译：化合物，聚合物和树脂组合物
公开(公告)号：US08273837B2
公开(公告)日：2012-09-25
申请号：US12097414
申请日：2006-12-13
申请人： Tomoki Nagai , Takuma Ebata , Nobuji Matsumura
发明人： Tomoki Nagai , Takuma Ebata , Nobuji Matsumura
IPC分类号： C08F118/02
CPC分类号： G03F7/0045 , C07C309/06 , C07C309/19 , C07C381/12 , C07C2602/42 , C08F220/38 , G03F7/0397
摘要： A radiation-sensitive resin composition which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, exhibiting high resolution performance, excellent DOF and LER, and high resistance to a liquid medium used in liquid immersion lithography is provided. Also provided are a polymer which can be used in the composition, a novel compound useful for synthesizing the polymer, and a method of producing the composition. A radiation-sensitive resin composition having an excellent resistance to a liquid medium can be obtained by using the novel compound shown by the following formula (1), wherein R1 represents a methyl group or a hydrogen atom, R2, R3 and R4 individually represent a substituted or unsubstituted monovalent organic group having 1 to 10 carbon atoms, n is an integer from 0 to 3, A represents a methylene group, a linear or branched alkylene group having 2 to 10 carbon atoms, or an arylene group, and X− represents a counter ion of S+.
摘要翻译：对辐射具有高透明度的辐射敏感性树脂组合物，作为抗敏剂如感光度，分辨率和图案形状的基本性能优异，特别是表现出高分辨率性能，优异的DOF和LER，以及对提供了用于液浸光刻的液体介质。还提供了可用于组合物中的聚合物，可用于合成聚合物的新化合物，以及该组合物的制备方法。通过使用由下式（1）表示的新化合物，其中R 1表示甲基或氢原子，可以得到对液体介质具有优异抗性的辐射敏感性树脂组合物，R2，R3和R4分别表示取代或未取代的碳原子数1〜10的一价有机基团，n表示0〜3的整数，A表示亚甲基，碳原子数2〜10的直链或支链亚烷基或亚芳基，X表示 S +的反离子。

3. 发明申请

US20100063232A1 POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN 有权
标题翻译：可聚合磺酸钠盐和树脂
公开(公告)号：US20100063232A1
公开(公告)日：2010-03-11
申请号：US12514168
申请日：2007-11-09
申请人： Tomoki Nagai , Takuma Ebata , Makoto Shimizu , Jonathan Joachim Jodry , Satoru Narizuka , Masaki Fujiwara
发明人： Tomoki Nagai , Takuma Ebata , Makoto Shimizu , Jonathan Joachim Jodry , Satoru Narizuka , Masaki Fujiwara
IPC分类号： C08F28/02 , C07C69/533
CPC分类号： C07C309/12 , C07C381/12 , C08F20/38 , G03F7/0045 , G03F7/0046 , G03F7/0392
摘要： A resin that includes a repeating unit shown by the following formula (10) has an excellent performance as a radiation sensitive acid generator, and exhibits only a small adverse effect on the environment and a human body. wherein R1 represents a hydrogen atom or the like, M+ represents a specific cation, and n is an integer from 1 to 5.
摘要翻译：包含下式（10）所示的重复单元的树脂作为辐射敏感性酸发生剂具有优异的性能，并且对环境和人体仅表现出小的不利影响。其中R1表示氢原子等，M +表示特定阳离子，n为1至5的整数。

4. 发明授权

US07897821B2 Sulfonium compound 有权
标题翻译：锍化合物
公开(公告)号：US07897821B2
公开(公告)日：2011-03-01
申请号：US12873265
申请日：2010-08-31
申请人： Tomoki Nagai , Eiji Yoneda , Takuma Ebata , Takanori Kawakami , Makoto Sugiura , Tsutomu Shimokawa , Makoto Shimizu
发明人： Tomoki Nagai , Eiji Yoneda , Takuma Ebata , Takanori Kawakami , Makoto Sugiura , Tsutomu Shimokawa , Makoto Shimizu
IPC分类号： C07C31/34
CPC分类号： C09D133/14 , C07C309/10 , C07C309/12 , C07C309/19 , C07C309/20 , C07C381/12 , C07D209/76 , C08F20/38 , C08F28/00 , C08F28/02 , C08F214/18 , C08F220/12 , C08F220/18 , C08F220/24 , C08F220/28 , C08F228/02 , C09D141/00 , G03F7/0045 , G03F7/0392 , G03F7/0397
摘要： A compound is shown by the following formula (5) in which at least one of Rf groups represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A′ represents a substituted or unsubstituted, linear or branched alkylene group having 1 to 20 carbon atoms, an alkylene group having at least one hetero atom, or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, Mm+ represents an onium cation, m represents a natural number of 1 to 3, and p represents a natural number of 1 to 8.
摘要翻译：下式（5）表示化合物，其中Rf基中的至少一个表示氟原子或具有1-10个碳原子的直链或支链全氟烷基，A'表示取代或未取代的直链或支链亚烷基具有1至20个碳原子，具有至少一个杂原子的亚烷基或单键，G表示具有氟原子或单键的二价有机基团，Mm +表示鎓阳离子，m表示1的自然数至3，p表示1至8的自然数。

5. 发明授权

US07812105B2 Compound, polymer, and radiation-sensitive composition 有权
标题翻译：化合物，聚合物和辐射敏感组合物
公开(公告)号：US07812105B2
公开(公告)日：2010-10-12
申请号：US11914024
申请日：2006-05-11
申请人： Tomoki Nagai , Eiji Yoneda , Takuma Ebata , Takanori Kawakami , Makoto Sugiura , Tsutomu Shimokawa , Makoto Shimizu
发明人： Tomoki Nagai , Eiji Yoneda , Takuma Ebata , Takanori Kawakami , Makoto Sugiura , Tsutomu Shimokawa , Makoto Shimizu
IPC分类号： C08F14/18 , C08F28/02
CPC分类号： C09D133/14 , C07C309/10 , C07C309/12 , C07C309/19 , C07C309/20 , C07C381/12 , C07D209/76 , C08F20/38 , C08F28/00 , C08F28/02 , C08F214/18 , C08F220/12 , C08F220/18 , C08F220/24 , C08F220/28 , C08F228/02 , C09D141/00 , G03F7/0045 , G03F7/0392 , G03F7/0397
摘要： A radiation-sensitive resin composition is provided which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, a high resolution radiation-sensitive resin composition providing a wide DOF and excelling in LER. Also provided are a polymer which can be used in the composition and a novel compound useful for synthesizing the polymer. The novel compound is shown by the following formula (2), wherein R4 represents a methyl group, a trifluoromethyl group, or a hydrogen atom, at least one of the Rfs represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A represents a divalent organic group or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, Mm+ represents a metal ion or an onium cation, m represents an integer of 1 to 3, and p is an integer of 1 to 8.
摘要翻译：提供了对辐射具有高透明度的辐射敏感性树脂组合物，作为抗敏剂，例如灵敏度，分辨率和图案形状，具有优异的基本性能，特别是提供宽DOF和高分辨率辐射敏感性树脂组合物优秀的LER。还提供了可用于组合物中的聚合物和用于合成聚合物的新型化合物。该新化合物由下式（2）表示，其中R4表示甲基，三氟甲基或氢原子，Rfs中的至少一个表示氟原子或具有1至10个的直链或支链全氟烷基碳原子，A表示二价有机基团或单键，G表示具有氟原子或单键的二价有机基团，Mm +表示金属离子或鎓阳离子，m表示1〜3的整数，p表示是1〜8的整数。

6. 发明申请

US20100040977A1 RADIATION-SENSITIVE RESIN COMPOSITION 有权
标题翻译：辐射敏感性树脂组合物
公开(公告)号：US20100040977A1
公开(公告)日：2010-02-18
申请号：US12514212
申请日：2007-11-09
申请人： Tomoki Nagai , Takuma Ebata , Makoto Shimizu
发明人： Tomoki Nagai , Takuma Ebata , Makoto Shimizu
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , Y10S430/108 , Y10S430/111
摘要： A radiation-sensitive resin composition includes a resin that includes a repeating unit shown by the following formula (1) and a solvent. The radiation-sensitive resin composition has an excellent performance as a radiation-sensitive acid generator, includes a resin that adversely affects the environment and a human body to only a small extent, and can form a resist film that has a high resolution and forms an excellent resist pattern. wherein R1 represents a hydrogen atom or the like, M+ represents a specific cation, and n represents an integer from 1 to 5.
摘要翻译：辐射敏感性树脂组合物包括包含下式（1）所示的重复单元和溶剂的树脂。辐射敏感性树脂组合物作为辐射敏感性酸产生剂具有优异的性能，包括仅在很小程度上对环境和人体有不利影响的树脂，并且可以形成具有高分辨率并形成优异的抗蚀剂图案。其中R1表示氢原子等，M +表示特定的阳离子，n表示1〜5的整数。

7. 发明授权

US08440384B2 Compound, salt, and radiation-sensitive resin composition 有权
标题翻译：化合物，盐和辐射敏感性树脂组合物
公开(公告)号：US08440384B2
公开(公告)日：2013-05-14
申请号：US12760509
申请日：2010-04-14
申请人： Takuma Ebata , Tomoki Nagai
发明人： Takuma Ebata , Tomoki Nagai
IPC分类号： G03F7/039
CPC分类号： C07C381/12 , C07C309/19 , C07C2601/14 , C07C2603/74 , C07D333/46 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A compound has a partial structure shown by a following formula (1), wherein R1 represents a hydrogen atom or a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, R2 represents a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, Rf represents a fluorine atom or a perfluoroalkyl group having 1 to 4 carbon atoms, L represents an integer from 0 to 4, n represents an integer from 0 to 10, and m represents an integer from 1 to 4.
摘要翻译：化合物具有下述式（1）所示的部分结构，其中R1表示氢原子或取代或未取代的碳原子数1〜8的烃基，R2表示取代或未取代的碳原子数1〜8的烃基， Rf表示氟原子或碳原子数1〜4的全氟烷基，L表示0〜4的整数，n表示0〜10的整数，m表示1〜4的整数。

8. 发明授权

US08026039B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US08026039B2
公开(公告)日：2011-09-27
申请号：US12514212
申请日：2007-11-09
申请人： Tomoki Nagai , Takuma Ebata , Makoto Shimizu
发明人： Tomoki Nagai , Takuma Ebata , Makoto Shimizu
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , Y10S430/108 , Y10S430/111
摘要： A radiation-sensitive resin composition includes a resin that includes a repeating unit shown by the following formula (1) and a solvent. The radiation-sensitive resin composition has an excellent performance as a radiation-sensitive acid generator, includes a resin that adversely affects the environment and a human body to only a small extent, and can form a resist film that has a high resolution and forms an excellent resist pattern. wherein R1 represents a hydrogen atom or the like, M+ represents a specific cation, and n represents an integer from 1 to 5.
摘要翻译：辐射敏感性树脂组合物包括包含下式（1）所示的重复单元和溶剂的树脂。辐射敏感性树脂组合物作为辐射敏感性酸产生剂具有优异的性能，包括仅在很小程度上对环境和人体有不利影响的树脂，并且可以形成具有高分辨率并形成优异的抗蚀剂图案。其中R1表示氢原子等，M +表示特定的阳离子，n表示1〜5的整数。

9. 发明授权

US07956142B2 Polymerizable sulfonic acid onium salt and resin 有权
标题翻译：可聚合的磺酸鎓盐和树脂
公开(公告)号：US07956142B2
公开(公告)日：2011-06-07
申请号：US12514168
申请日：2007-11-09
申请人： Tomoki Nagai , Takuma Ebata , Makoto Shimizu , Jonathan Joachim Jodry , Satoru Narizuka , Masaki Fujiwara
发明人： Tomoki Nagai , Takuma Ebata , Makoto Shimizu , Jonathan Joachim Jodry , Satoru Narizuka , Masaki Fujiwara
IPC分类号： C08F128/02
CPC分类号： C07C309/12 , C07C381/12 , C08F20/38 , G03F7/0045 , G03F7/0046 , G03F7/0392
摘要： A resin that includes a repeating unit shown by the following formula (10) has an excellent performance as a radiation sensitive acid generator, and exhibits only a small adverse effect on the environment and a human body. wherein R1 represents a hydrogen atom or the like, M+ represents a specific cation, and n is an integer from 1 to 5.
摘要翻译：包含下式（10）所示的重复单元的树脂作为辐射敏感性酸发生剂具有优异的性能，并且对环境和人体仅表现出小的不利影响。其中R1表示氢原子等，M +表示特定阳离子，n为1至5的整数。

10. 发明申请

US20100324329A1 COMPOUND 有权
标题翻译：复合
公开(公告)号：US20100324329A1
公开(公告)日：2010-12-23
申请号：US12873265
申请日：2010-08-31
申请人： Tomoki Nagai , Eiji Yoneda , Takuma Ebata , Takanori Kawakami , Makoto Sugiura , Tsutomu Shimokawa , Makoto Shimizu
发明人： Tomoki Nagai , Eiji Yoneda , Takuma Ebata , Takanori Kawakami , Makoto Sugiura , Tsutomu Shimokawa , Makoto Shimizu
IPC分类号： C07C309/04
CPC分类号： C09D133/14 , C07C309/10 , C07C309/12 , C07C309/19 , C07C309/20 , C07C381/12 , C07D209/76 , C08F20/38 , C08F28/00 , C08F28/02 , C08F214/18 , C08F220/12 , C08F220/18 , C08F220/24 , C08F220/28 , C08F228/02 , C09D141/00 , G03F7/0045 , G03F7/0392 , G03F7/0397
摘要： A compound is shown by the following formula (5) in which at least one of Rf groups represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A′ represents a substituted or unsubstituted, linear or branched alkylene group having 1 to 20 carbon atoms, an alkylene group having at least one hetero atom, or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, Mm+ represents an onium cation, m represents a natural number of 1 to 3, and p represents a natural number of 1 to 8.
摘要翻译：下式（5）表示化合物，其中Rf基中的至少一个表示氟原子或具有1-10个碳原子的直链或支链全氟烷基，A'表示取代或未取代的直链或支链亚烷基具有1至20个碳原子，具有至少一个杂原子的亚烷基或单键，G表示具有氟原子或单键的二价有机基团，Mm +表示鎓阳离子，m表示1的自然数至3，p表示1至8的自然数。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式