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1. 发明授权

US06196154B1 Air lock for introducing substrates to and/or removing them from a treatment chamber 有权
标题翻译：用于将基材引入和/或将其从处理室中移出的气锁
公开(公告)号：US06196154B1
公开(公告)日：2001-03-06
申请号：US09249445
申请日：1999-02-12
申请人： Tomas Baumecker , Helmut Grimm , Jürgen Henrich , Klaus Michael , Gert Rödling , Jürgen Ulrich
发明人： Tomas Baumecker , Helmut Grimm , Jürgen Henrich , Klaus Michael , Gert Rödling , Jürgen Ulrich
IPC分类号： C23C1600
CPC分类号： C23C16/54 , B65G21/00 , C23C14/56
摘要： In an air lock for continuous introduction into and/or removal of workpieces from spaces (1,4) separated atmospherically, the individual substrates (3,13) are transported through a transfer channel (24). At least one lock chamber (7a-7m) serving to accommodate the substrates (3,13) is arranged movably in the transfer channel (24). During the substrate transport in the transfer channel (24), the lock chamber (7a-7m) is atmospherically separated both from the exterior (1) having normal pressure and from the coating chamber (4). The air lock (2) includes a carrousel lock which has a carrousel housing (24) and a lock chamber wheel (10). On the periphery in the lock chamber wheel (10) individual lock chambers (7a-7m) are provided, in which the workpieces (3,13) to be brought into the chamber to be loaded (4) are inserted freely accessible on the normal pressure side. By turning the lock chamber wheel (10), the substrates (3,13) in the lock chambers (7a-7m) are transported from the coating station (A) to the transfer station (B) into the treatment chamber (4) diametrically opposite the normal pressure side. In the transfer station (B) the substrates (3,13) are removed from the transfer channels (7a-7m) by means of a transfer device (17′) and are available for further treatment in the treatment chamber (4). The treatment chamber (4) includes, for instance, of a vacuum-coating chamber in which the workpieces (3,13) as the substrates to be coated are coated by a vacuum-supported coating method.
摘要翻译：在用于从气氛分离的空间（1,4）连续引入和/或移除工件的气锁中，各个基板（3,13）通过传送通道（24）传送。用于容纳基板（3,13）的至少一个锁定室（7a-7m）可移动地布置在输送通道（24）中。在传送通道（24）中的基板传送期间，锁定室（7a-7m）与具有常压的外部（1）和涂覆室（4）大气分离。气锁（2）包括具有转盘壳体（24）和锁室轮（10）的转盘锁。在锁室轮（10）的周边设有单独的锁定室（7a-7m），其中待进入待加载室的工件（3,13）可以在正常情况下自由地接近压力侧。通过转动锁定室轮（10），锁定室（7a-7m）中的基板（3,13）从涂覆站（A）到转印站（B）沿直径传送到处理室（4）与正常压力侧相反。在传送站（B）中，通过传送装置（17'）从传送通道（7a-7m）移除基板（3,13），并且可用于在处理室（4）中进一步处理。处理室（4）例如包括真空涂布室，其中作为待涂布的基板的工件（3,13）通过真空支撑的涂覆方法被涂覆。

2. 发明授权

US06335054B1 Air lock for introducing substrates to and/or removing them from a treatment chamber 有权
标题翻译：用于将基材引入和/或将其从处理室中移出的气锁
公开(公告)号：US06335054B1
公开(公告)日：2002-01-01
申请号：US09631940
申请日：2000-08-03
申请人： Tomas Baumecker , Helmut Grimm , Jürgen Henrich , Klaus Michael , Gert Rödling , Jürgen Ulrich
发明人： Tomas Baumecker , Helmut Grimm , Jürgen Henrich , Klaus Michael , Gert Rödling , Jürgen Ulrich
IPC分类号： C23C1400
CPC分类号： C23C16/54 , B65G21/00 , C23C14/56
摘要： In an air lock for continuous introduction into and/or removal of workpieces from spaces (1, 4) separated atmospherically, the individual substrates (3, 13) are transported through a transfer channel (24). At least one lock chamber (7a-7m) serving to accommodate the substrates (3, 13) is arranged movably in the transfer channel (24). During the substrate transport in the transfer channel (24), the lock chamber (7a-7m) is atmospherically separated both from the exterior (1) having normal pressure and from the coating chamber (4). The air lock (2) includes a carrousel lock which has a carrousel housing (24) and a lock chamber wheel (10). On the periphery in the lock chamber wheel (10) individual lock chambers (7a-7m) are provided, in which the workpieces (3, 13) to be brought into the chamber to be loaded (4) are inserted freely accessible on the normal pressure side. By turning the lock chamber wheel (10), the substrates (3, 13) in the lock chambers (7a-7m) are transported from the coating station [sic; loading station] (A) to the transfer station (B) into the treatment chamber (4) diametrically opposite the normal pressure side. In the transfer station (B) the substrates (3, 13) are removed from the transfer channels (7a-7m) by means of a transfer device (17′) and are available for further treatment in the treatment chamber (4).
摘要翻译：在用于从空气分离的空间（1,4）中连续引入和/或移除工件的气锁中，各个基板（3,13）通过传送通道（24）传送。用于容纳基板（3,13）的至少一个锁定室（7a-7m）可移动地布置在输送通道（24）中。在传送通道（24）中的基板传送期间，锁定室（7a-7m）与具有常压的外部（1）和涂覆室（4）大气分离。气锁（2）包括具有转盘壳体（24）和锁室轮（10）的转盘锁。在锁定室轮（10）的周边上，设置有单独的锁定室（7a-7m），其中待进入待装载室（4）的工件（3,13）在正常情况下自由地接近压力侧。通过转动锁定室轮（10），锁定室（7a-7m）中的基板（3,13）从涂布站传送; 装载站]（A）到转运站（B）进入与正常压力侧直径相对的处理室（4）。在转运站（B）中，借助于转移装置（17'）将基板（3,13）从转移通道（7a-7m）中移出，并且可用于在处理室（4）中进一步处理。

3. 发明授权

US6132562A Method and device for transporting cylindrical substrates to be coated 失效
标题翻译：用于输送待涂覆的圆柱形基底的方法和装置
公开(公告)号：US6132562A
公开(公告)日：2000-10-17
申请号：US249444
申请日：1999-02-12
申请人： Tomas Baumecker , Helmut Grimm , Jurgen Henrich , Klaus Michael , Gert Rodling , Jurgen Ulrich
发明人： Tomas Baumecker , Helmut Grimm , Jurgen Henrich , Klaus Michael , Gert Rodling , Jurgen Ulrich
IPC分类号： B05B13/02 , B65G49/07 , C03C17/00 , C23C14/50 , C23C14/56 , C23C14/22 , B65G49/00 , C23C14/34
CPC分类号： C23C14/56 , C23C14/505
摘要： For coating substrates (17,18,20,21,22) in a vacuum-coating chamber (2) the substrates are introduced by an air lock into the coating chamber (2) and moved along a transport path in front of the coating sources (50a,b,c,d) producing a coating cloud. To this end, the substrates (17,18,20,21,22) are led past the coating sources (50a,b,c,d) by means of holding devices (24) arranged movably on a transport belt (9) during at least two successive coating phases. During the one coating phase, the substrates (17,18,20,21,22) are oriented along one transport direction T.sub.3 oriented towards the coating sources (50a,b,c,d) such that essentially the substrate bottom of the cylindrical substrate is coated. During the subsequent second coating phase, the substrates are oriented in front of the coating sources (50a,b,c,d) in a direction T.sub.4 opposite the transport direction T.sub.3, wherein the substrates (17,18,20,21,22) are oriented such that essentially the cylindrical side surface is coated. By this method, the substrates (17,18,20,21,22) are coated successively in an identical manner and independently of possible substrate positions with relation to the coating sources (50a,b,c,d) during the coating process. Bottle-shaped containers, in particular, plastic bottles are vapor-coated with a gas- or fluid-barrier layer using the method. The coating sources (50a,b,c,d) include thermal vaporizers and/or plasma cathode sputter sources.
摘要翻译：对于在真空涂覆室（2）中的涂覆基底（17,18,20,21,22），基底通过气锁引入涂覆室（2）中并且沿着涂覆源前面的输送路径移动（50a，b，c，d）产生涂层云。为此，通过可移动地布置在输送带（9）上的保持装置（24）将衬底（17,18,20,21,22）引导通过涂覆源（50a，b，c，d）至少两个连续的涂层阶段。在一个涂层阶段期间，衬底（17,18,20,21,22）沿着朝向涂层源（50a，b，c，d）定向的一个输送方向T3定向，使得基本上圆柱形基底被涂层。在随后的第二涂覆阶段期间，基板在与输送方向T3相反的方向T4上定向在涂层源（50a，b，c，d）的前方，其中基板（17,18,20,21,22）被定向为使得基本上圆柱形侧表面被涂覆。通过这种方法，在涂覆过程中，相对于涂覆源（50a，b，c，d），基板（17,18,20,21,22）以相同的方式依次涂覆并且独立于可能的基板位置。使用该方法，使用气体或流体阻挡层对瓶形容器，特别是塑料瓶进行蒸气涂覆。涂层源（50a，b，c，d）包括热蒸发器和/或等离子体阴极溅射源。

4. 发明授权

US06187160B1 Apparatus for the coating of substrates in a vacuum chamber 有权
标题翻译：用于在真空室中涂覆基底的装置
公开(公告)号：US06187160B1
公开(公告)日：2001-02-13
申请号：US09334499
申请日：1999-06-17
申请人： Alfred Rick , Helmut Eberhardt , Klaus Michael , Jörg Krempel-Hesse
发明人： Alfred Rick , Helmut Eberhardt , Klaus Michael , Jörg Krempel-Hesse
IPC分类号： C23C1400
CPC分类号： H01J37/3455 , H01J37/3405
摘要： An apparatus is disclosed for the coating of substrates (10) with thin films, having a vacuum chamber (1), a target (6) to be atomized, situated opposite the substrate (10) in the vacuum chamber (1), with magnets (19, 19′, 19″; 20, 20′, 20″) to produce a magnetic tunnel in front of the area of the target (6) to be atomized, an inlet (8) for a process gas into the process space (11), an anode (12), which is electrically insulated with respect to the vacuum chamber (1), and a current-voltage supply to produce a plasma in front of the target (6). The target (6) is shaped as a rotation-symmetrical body, which provides a ring-shaped enclosure around the substrate (10), wherein the magnets (19,19′, . . . ; 20,20′, . . . ) are supported on the side of the hollow cylindrical target (6), facing away from the substrate (10), and can move around the rotational axis (R) of the target (6). The substrate (10) is electrically insulated, with respect to the vacuum chamber (1), and a part of an insulator (13), configuring the anode (12), is supported on the bottom of the process space (1).
摘要翻译：公开了一种用薄膜涂覆衬底（10）的装置，其具有真空室（1），要被雾化的靶（6），与真空室（1）中的衬底（10）相对，具有磁体（19,19'，19“; 20,20'，20”），以在所述目标（6）的要被雾化的区域的前方产生磁通道，用于将工艺气体引入处理空间（11），相对于真空室（1）电绝缘的阳极（12）和用于在靶（6）前方产生等离子体的电流 - 电压供应。目标（6）成形为旋转对称的主体，其在基底（10）周围提供环形外壳，其中磁体（19,19'，... 20,20'，...）被支撑在中空圆柱形目标（6）的背离基板（10）的一侧上，并且可以围绕目标（6）的旋转轴线（R）移动。基板（10）相对于真空室（1）电绝缘，并且构成阳极（12）的绝缘体（13）的一部分被支撑在处理空间（1）的底部。

5. 发明授权

US4936180A Apparatus for machining workpieces, particularly flat circular disk-shaped substrates 失效
标题翻译：用于加工工件的装置，特别是平的圆形盘形基片
公开(公告)号：US4936180A
公开(公告)日：1990-06-26
申请号：US295232
申请日：1989-01-09
申请人： Klaus Michael , Andreas Petz
发明人： Klaus Michael , Andreas Petz
IPC分类号： B23Q7/04
CPC分类号： B23Q7/04 , Y10S425/201 , Y10T82/10 , Y10T82/11 , Y10T82/2516
摘要： A lathe apparatus for machining flat, circular disk-shaped recording media, for example, audio, video or ROM compact disks, for the purpose of improving their surface quality and their dimensional stability is provided which comprises a driven lathe spindle (7), a vacuum chuck (8) for holding the recording medium or substrate (15, 15') to be machined, a carriage (9) for holding and guiding the tool (5), and magazines (14) for holding the machined and unmachined substrates. A robot (10) provided on the base (2) or bed (4) of the lathe comprises a gripper arm (11) with gripping tongs (12) movable in several planes which transports the substrates from one magazine (14) to the vacuum chuck (8) or from the vacuum chuck to the other magazine. The stacking axes (L) of the two magazines extend at an angle to the horizontal plane (E), and the magazines are maintained within the range of action of the gripper arm (11) with gripping tongs (12).
摘要翻译：提供了一种用于加工扁平圆盘形记录介质（例如音频，视频或ROM光盘）的车床设备，用于提高其表面质量和尺寸稳定性，其包括从动车床主轴（7），用于保持要加工的记录介质或基板（15,15'）的真空卡盘（8），用于保持和引导工具（5）的托架（9）和用于保持加工和未加工基板的盒子（14）。设置在车床的基座（2）或床（4）上的机器人（10）包括具有夹钳（12）的夹持臂（11），该钳夹臂（12）可在几个平面中移动，这些平面将基板从一个仓（14）输送到真空卡盘（8）或从真空吸盘到另一个匣。两个箱体的堆叠轴线（L）以水平面（E）成一定角度延伸，并且用夹钳（12）将杂物保持在夹持臂（11）的作用范围内。

6. 发明申请

US20050207874A1 Device for coating hollow bodies, in particular plastic bottles, that has a high vaccum region and sluice 审中-公开
标题翻译：用于涂覆具有高真空区域和闸门的中空体，特别是塑料瓶的装置
公开(公告)号：US20050207874A1
公开(公告)日：2005-09-22
申请号：US10848370
申请日：2004-05-18
申请人： Klaus Michael , Jurgen Henrich , Thomas Gebele , Helmut Drimm
发明人： Klaus Michael , Jurgen Henrich , Thomas Gebele , Helmut Drimm
IPC分类号： B65G49/00 , B01J3/02 , B65G1/00 , B65G47/84 , C23C14/56
CPC分类号： C23C14/566
摘要： Plastic bottles as well as other hollow bodies are given thin functional layers by means of high vacuum coating devices. The relevant process takes place in high vacuum. The bottles to be coated as well as the coated bottles are inserted into a high vacuum chamber (20) through a sluice, which consists of carrousel drum unit. Due to the difference of pressure in the atmosphere and the high vacuum chamber, carrousel within the drum suffers a displacement or tipping, which makes the sealing of the carrousel with respect to the drum difficult. Hence the invention proposes a sluice system consisting of two sluices (23, 25) of the mentioned type, which are connected with one another by means of an intermediate vacuum chamber (22). It is thus achieved that the load due to the pressure on each drum (3) decreases, so that each sluice (23, 25) functions with lesser tendency to develop faults.
摘要翻译：塑料瓶以及其他中空体通过高真空镀膜装置给予薄的功能层。相关过程在高真空下进行。待涂覆的瓶子以及涂覆的瓶子通过由转盘筒单元组成的闸门插入高真空室（20）中。由于大气压力和高真空室的差异，鼓内的转盘具有位移或倾翻，这使得转盘相对于转鼓的密封变得困难。因此，本发明提出了一种由上述类型的两个闸门（23,25）组成的闸门系统，它们通过中间真空室（22）相互连接。因此，由于每个鼓（3）上的压力引起的负载减小，使得每个闸（23,25）以较小的发生故障的倾向起作用。

7. 发明授权

US5108789A Method for manufacturing disk-shaped recording media 失效
标题翻译：用于制造盘形记录介质的方法
公开(公告)号：US5108789A
公开(公告)日：1992-04-28
申请号：US489162
申请日：1990-03-06
申请人： Klaus Michael , Andreas Petz
发明人： Klaus Michael , Andreas Petz
IPC分类号： B23Q7/04
CPC分类号： B23Q7/04 , Y10S425/201 , Y10T82/10 , Y10T82/11 , Y10T82/2516
摘要： Method for machining flat, circular disk-shaped recording media, for example, audio, video or ROM compact disks, for the purpose of improving their surface quality and their dimensional stability, employs a lathe having a driven lathe spindle (7), a vacuum chuck (8) for holding the recording medium or substrate (15, 15'. . . ) to be machined, and a carriage (9) for holding and guiding the cuting tool (5) magazine (14) hold the machined and unmachined substrates, there being further provided a robot (10) held on the base (2) or bed (4) of the lathe and having a gripper arm (11) with gripping tongs (12) movable in several planes which transport the substrates from one magazine (14) to the vacuum chuck (8) or from the vacuum chuck to the other magazine, the stacking axes (L) of the two magazines extending at an angle to the horizontal plane (E), and the magazines being maintained within the range of action of the gripper arm (11) with gripping tongs (12).

8. 发明授权

US4936329A Device for cleaning, testing and sorting of workpieces 失效
标题翻译：用于清洁，测试和分类工件的设备
公开(公告)号：US4936329A
公开(公告)日：1990-06-26
申请号：US345947
申请日：1989-05-01
申请人： Klaus Michael , Andreas Petz
发明人： Klaus Michael , Andreas Petz
IPC分类号： B07C5/10 , B07C5/36
CPC分类号： B07C5/10 , B07C5/36 , Y10S134/902
摘要： A device for the automatic cleaning, testing, and sorting of discoidal, flat substrates (9, 9', . . . ) for example magnetic memory plates, having three support mandrels (12, 13, 23) for the substrates (9, 9', . . . ) to be treated, three magazines (6, 7, 8) to deposit the treated and the untreated substrates (9, 9', . . . ), and having a transporting device fixed to a machine frame (2) or a machine support with several transferring arms (14, 15, 16) which can be moved on several levels and which are equipped with gripping devices (20, 21, 22) is provided with a motor-driven first support mandrel (23) rotating round its longitudinal axis (r) and with a nozzle (25, 26) disposed directly adjacent to said support mandrel in order to apply a cleaning liquid onto the substrate (9, 9', . . . ) which is firmly held by the first support mandrel. Moreover, each of the two further support mandrels (12, 13) disposed next to the first support mandrel (23) are provided with a scanning and testing device (27); the first transferring arm (14, 14', . . . ) serves to transport the substrate (9, 9', . . . ) from the first magazine (6) to the first support mandrel (23) and the second transferring arm (15, 15', . . . ) serves to transport the substrate (9, 9', . . . ) from the first to the second support mandrel (12) and the third transferring arm transports the substrate (9, 9', . . . ) from the second to the third support mandrel and from the latter to a second or third magazine (7 or 8). An electrical circuit which is disposed in the machine frame interacts with the testing device (27), thus actuating the motors of the transferring arms (14, 15, 16).
摘要翻译：一种用于自动清洁，测试和分类盘形平面基板（9,9'）例如磁记录板的装置，具有用于基板（9,9）的三个支撑心轴（12,13,23）待处理的三个杂志（6,7,8）以沉积经处理和未处理的基板（9,9'，...），并且具有固定到机架（2）上的输送装置）或具有多个可以在多个水平上移动且具有夹持装置（20,21,22）的多个传送臂（14,15,16））的机器支撑件设置有电动驱动的第一支撑心轴（23）围绕其纵向轴线（r）旋转并且与直接邻近所述支撑心轴设置的喷嘴（25,26）一起旋转，以便将清洁液体施加到基板（9,9'...）上，所述基板被牢固地保持在第一支撑心轴此外，设置在第一支撑心轴（23）旁边的两个另外的支撑心轴（12,13）中的每一个设置有扫描和测试装置（27）; 第一传送臂（14,14'...）用于将基板（9,9'...）从第一盒（6）传送到第一支撑心轴（23）和第二传送臂（ 15，15'，...）用于将基底（9,9'，...）从第一支撑心轴（12）输送到第二支撑心轴（12），第三输送臂输送基底（9,9'，...）。 ...）从第二至第三支撑心轴和从后者到第二或第三料仓（7或8）。设置在机架中的电路与测试装置（27）相互作用，从而致动传递臂（14,15,16）的电动机。

9. 发明申请

US20110097517A1 DYNAMIC VERTICAL MICROWAVE DEPOSITION OF DIELECTRIC LAYERS 审中-公开
标题翻译：电介质层的动态垂直微波沉积
公开(公告)号：US20110097517A1
公开(公告)日：2011-04-28
申请号：US12833571
申请日：2010-07-09
申请人： Michael W. Stowell , Klaus Michael
发明人： Michael W. Stowell , Klaus Michael
IPC分类号： C23C16/511 , C23C16/455 , C23C16/458 , C23C16/46
CPC分类号： H01J27/16 , C23C14/221 , H01J37/32192 , H01J37/3222 , H05H1/46
摘要： Systems and methods for depositing protection and dielectric layers using a vertical microwave deposition processes are provided. In some embodiments, a microwave antenna is vertically attached to a sidewall of a processing chamber. A substrate can be introduced of placed within the processing chamber in a substantially vertical configuration or in a configuration where the substrate is parallel to a sidewall of the processing chamber. A plasma can be formed with the microwave antenna and various precursor materials, such as precursors that include magnesium or silicon. A processing chamber with multiple sub-chambers is also provided according to some embodiments of the invention. Various sub-chambers can have vertical microwave plasma line sources. Other sub-chambers can providing heating and other processes. At least one substrate supporting member can be used to move the substrate vertically from one sub-chamber to another.
摘要翻译：提供了使用垂直微波沉积工艺沉积保护和介电层的系统和方法。在一些实施例中，微波天线垂直地附接到处理室的侧壁。可以以基本垂直的配置或基板平行于处理室的侧壁的结构将基底放置在处理室内。可以用微波天线和各种前体材料（例如包括镁或硅的前体）形成等离子体。根据本发明的一些实施例，还提供具有多个子室的处理室。各种子室可以具有垂直微波等离子体线源。其他子室可以提供加热和其他工艺。可以使用至少一个基板支撑构件将基板从一个子室垂直移动到另一个子室。

10. 发明授权

US06206975B1 Vacuum treatment system for application of thin, hard layers 失效
标题翻译：真空处理系统，应用薄，硬层
公开(公告)号：US06206975B1
公开(公告)日：2001-03-27
申请号：US09302491
申请日：1999-04-30
申请人： Alfred Rick , Josef Hoffmann , Klaus Michael
发明人： Alfred Rick , Josef Hoffmann , Klaus Michael
IPC分类号： C23C1600
CPC分类号： C23C14/56
摘要： Vacuum treatment system for application of thin layers onto substrates (36, 38, 40, 42) with a transfer chamber (5) and several treatment chambers (6, 8, 10, 12), said treatment chambers peripherally attached to the transfer chamber and being connected to said transfer chamber by means of a common opening (27, 29, 31, 33) for inlet and outlet of substrate (36, 38, 40, 42), and with a handling device (24) for transport of the substrate (36, 38, 40, 42) between the treatment chambers (6, 8, 10, 12), whereby the handling device (24) has at least one substrate holder (37, 39, 41, 43) with one pivot and/or rotating retaining part to hold the substrates (36, 38, 40, 42), by means of which the substrates (36, 38, 40, 42) can pivot and/or rotate in the treatment chambers (6, 8, 10, 12).
摘要翻译：用于将薄层施加到具有传送室（5）和多个处理室（6,8,10,12）的基板（36,38,40,42）上的真空处理系统，所述处理室周边附接到传送室，通过用于衬底（36,38,40,42）的入口和出口的公共开口（27,29,31,33）连接到所述传送室，以及用于传送衬底的处理装置（24）（36,88,40,42），其中处理室（6,8,10,12）具有至少一个具有一个枢轴和/或一个枢轴的衬底保持器（37,39,41,43）或旋转保持部分以保持基板（36,38,40,42），通过该基板，基板（36,38,40,42）可以在处理室（6,8,10和42）中枢转和/或旋转， 12）。

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