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1. 发明申请

US20140020721A1 SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND STORAGE MEDIUM 审中-公开
标题翻译：基板加工方法，基板加工设备和储存介质
公开(公告)号：US20140020721A1
公开(公告)日：2014-01-23
申请号：US13941836
申请日：2013-07-15
申请人： Tokyo Electron Limited , Kabushiki Kaisha Toshiba
发明人： Hidekazu HAYASHI , Yohei SATO , Hisashi OKUCHI , Hiroshi TOMITA , Kazuyuki MITSUOKA , Gen YOU , Hiroki OHNO , Takehiko ORII , Takayuki TOSHIMA
IPC分类号： H01L21/02
CPC分类号： H01L21/02101 , B08B7/0021 , H01L21/02041 , H01L21/02057 , H01L21/67017 , H01L21/67051 , H01L21/67109
摘要： A substrate processing method and apparatus for preventing evaporation of an anti-drying fluorine-containing organic solvent from a substrate during transportation of the substrate into a processing container and can prevent decomposition of a fluorine-containing organic solvent in the processing container. A substrate, the surface of which is covered with a first fluorine-containing organic solvent, is carried into a processing container. The first fluorine-containing organic solvent is removed from the substrate surface by forming a high-pressure fluid atmosphere of a mixture of the first fluorine-containing organic solvent and a second fluorine-containing organic solvent, having a lower boiling point than the first fluorine-containing organic solvent, in the processing container e.g. by supplying a high-pressure fluid of the second fluorine-containing organic solvent into the processing container. Thereafter, a fluid in the state of a high-pressure fluid or a gas is discharged from the processing container to obtain the substrate in the dried state.
摘要翻译：一种基材处理方法和装置，用于在将基材输送到处理容器中时防止基材的防干燥含氟有机溶剂的蒸发，并且可以防止处理容器中的含氟有机溶剂的分解。其表面被第一含氟有机溶剂覆盖的基材被携带到处理容器中。通过形成第一含氟有机溶剂和第二含氟有机溶剂的混合物的高压流体气氛，第一含氟有机溶剂的沸点低于第一氟在处理容器中，例如，通过将第二含氟有机溶剂的高压流体供给到处理容器中。此后，将处于高压流体或气体状态的流体从处理容器排出，从而获得处于干燥状态的基板。

2. 发明申请

US20150219994A1 COATING AND DEVELOPING APPARATUS AND METHOD 审中-公开
标题翻译：涂料和开发设备和方法
公开(公告)号：US20150219994A1
公开(公告)日：2015-08-06
申请号：US14626295
申请日：2015-02-19
申请人： TOKYO ELECTRON LIMITED
发明人： Nobuaki MATSUOKA , Akira MIYATA , Shinichi HAYASHI , Suguru ENOKIDA , Hiroshi TOMITA , Makoto HAYAKAWA , Tatsuhei YOSHIDA
IPC分类号： G03F7/16
CPC分类号： G03F7/16 , H01L21/6715
摘要： In one embodiment, a coating and developing apparatus includes a processing block having two early-stage coating unit blocks, two later-stage coating unit blocks and two developing unit blocks, each unit blocks being vertically stacked on each other, The apparatus has at least two operation modes M1 and M2 adapted for abnormality. In mode M1 the processing module that processed the abnormal substrate in the developing unit blocks is identified, and subsequent substrates are transported to the processing module or modules, of the same type as the identified processing module, other than the identified processing module. In mode M2, the developing unit block that processed the abnormal substrate is identified, and subsequent substrates are transported to the developing unit block other than the identified developing unit block.
摘要翻译：在一个实施例中，涂层和显影装置包括具有两个早期涂覆单元块，两个后期涂层单元块和两个显影单元块的处理块，每个单元块彼此垂直堆叠。该装置至少具有适用于异常的两种操作模式M1和M2。在模式M1中，识别处理显影单元块中的异常衬底的处理模块，并且随后的衬底被传送到除了所识别的处理模块之外的与所识别的处理模块相同类型的处理模块。在模式M2中，识别处理异常衬底的显影单元块，并且随后的衬底被传送到除了所识别的显影单元块之外的显影单元块。

3. 发明申请

US20140160451A1 SUBSTRATE REFERENCE IMAGE CREATION METHOD, SUBSTRATE DEFECT INSPECTION METHOD, SUBSTRATE REFERENCE IMAGE CREATION APPARATUS, SUBSTRATE DEFECT INSPECTION UNIT AND NON-TRANSITORY COMPUTER STORAGE MEDIUM 有权
标题翻译：基板参考图像创建方法，基板缺陷检查方法，基板参考图像创建装置，基板缺陷检查单元和非终端计算机存储介质
公开(公告)号：US20140160451A1
公开(公告)日：2014-06-12
申请号：US14083906
申请日：2013-11-19
申请人： Tokyo Electron Limited
发明人： Izumi HASEGAWA , Hiroshi TOMITA , Shuji IWANAGA , Tadashi NISHIYAMA
IPC分类号： G03F7/20
CPC分类号： G03F7/7065 , G03F7/702 , G03F7/705
摘要： In the present invention, a planar distribution of pixel values in a picked-up substrate image is decomposed into a plurality of pixel value distribution components through use of a Zernike polynomial for each of substrate images; Zernike coefficients of the pixel value distribution components decomposed through use of the Zernike polynomial are calculated; a median value and values deviated from the median value by a predetermined value or more are extracted for every Zernike coefficients having a same couple of degrees from the calculated Zernike coefficients; substrate images having the extracted values are specified; and a substrate image being a defect inspection reference is created by combining the specified substrate images.
摘要翻译：在本发明中，通过对每个基板图像使用泽尼克多项式，将拾取的基板图像中的像素值的平面分布分解为多个像素值分布分量; 计算通过使用Zernike多项式分解的像素值分布分量的Zernike系数; 从与所计算的Zernike系数具有相同的度数的每个Zernike系数提取中值和从中值偏离预定值以上的值; 指定具有提取值的基板图像; 并且通过组合指定的基板图像来创建作为缺陷检查基准的基板图像。

4. 发明申请

US20140055599A1 INSPECTION DEVICE, BONDING SYSTEM AND INSPECTION METHOD 审中-公开
标题翻译：检查装置，接合系统和检查方法
公开(公告)号：US20140055599A1
公开(公告)日：2014-02-27
申请号：US13967938
申请日：2013-08-15
申请人： TOKYO ELECTRON LIMITED
发明人： Shinji KOGA , Akinori MIYAHARA , Hiroshi TOMITA , Shuji IWANAGA , Takeshi TAMURA
IPC分类号： G01N21/95 , H04N5/33
CPC分类号： G01N21/9503 , G01N21/9501 , G01N21/9505 , H01L22/12 , H04N5/33
摘要： An inspection device for inspecting the interior of an overlapped substrate produced by bonding one substrate and another substrate, comprising: a first holding unit configured to hold the rear surface of the overlapped substrate and include a cutout formed to expose a portion of the rear surface of the overlapped substrate when viewed from the top; a second holding unit configured to hold and rotate the overlapped substrate; an infrared irradiator configured to irradiate the rear surface or front surface exposed from the cutout of the overlapped substrate held on the first holding unit with an infrared ray; and an image pickup unit configured to receive the infrared ray emitted from the infrared irradiator and image the overlapped substrate held on the first holding unit in division for each of regions exposed from the cutout.
摘要翻译：一种检查装置，用于检查通过粘合一个基板和另一个基板而产生的重叠基板的内部，包括：第一保持单元，其构造成保持重叠基板的后表面，并且包括切口，其形成为将背面的一部分从顶部观察时的重叠基板; 第二保持单元，其构造成保持并旋转所述重叠的基板; 红外线照射器，被配置为用从红外线照射被保持在第一保持单元上的重叠基板的切口露出的后表面或前表面; 以及图像拾取单元，被配置为接收从所述红外线照射器发射的红外线，并且对于从所述切口暴露的每个区域划分，对保持在所述第一保持单元上的重叠基板进行成像。

5. 发明公开

US20230333531A1 TREATMENT CONDITION SETTING METHOD, STORAGE MEDIUM, AND SUBSTRATE TREATMENT SYSTEM 审中-公开
公开(公告)号：US20230333531A1
公开(公告)日：2023-10-19
申请号：US18337222
申请日：2023-06-19
申请人： Tokyo Electron Limited
发明人： Takuya MORI , Tadashi NISHIYAMA , Akiko KIYOTOMI , Hiroshi TOMITA
IPC分类号： G05B19/042 , H01L21/67 , G03F7/38 , G03F7/20 , G03F7/34
CPC分类号： G05B19/042 , H01L21/67225 , G03F7/38 , G03F7/20 , G03F7/34 , G03F7/162
摘要： This method includes: a step of imaging, by an imaging apparatus in a substrate treatment system, a reference substrate which is a reference for condition setting and acquiring a captured image of the reference substrate; a step of imaging, by the imaging apparatus, a treated substrate on which the predetermined treatment has been performed under a current treatment condition and acquiring a captured image of the treated substrate; a step of calculating a deviation amount in color information between the captured image of the treated substrate and the captured image of the reference substrate; a step of calculating a correction amount of the treatment condition based on a correlation model acquired in advance and on the deviation amount in the color information; and a step of setting the treatment condition based on the correction amount, wherein steps other than the step of acquiring a captured image of the reference substrate are performed for each of the treatment apparatuses.

6. 发明申请

US20160246187A1 EDGE EXPOSURE APPARATUS, EDGE EXPOSURE METHOD AND NON-TRANSITORY COMPUTER STORAGE MEDIUM 有权
标题翻译：边缘曝光装置，边缘曝光方法和非计算机存储介质
公开(公告)号：US20160246187A1
公开(公告)日：2016-08-25
申请号：US15015254
申请日：2016-02-04
申请人： Tokyo Electron Limited
发明人： Hiroshi TOMITA
IPC分类号： G03F7/20
CPC分类号： G03F7/2028 , G03F7/2022
摘要： An edge exposure apparatus includes: an imaging unit that images a front surface of a substrate; a substrate holding unit; an exposure unit that exposes an edge portion of the substrate held on the substrate holding unit; a first moving mechanism that moves and rotates the substrate holding unit; a second moving mechanism that moves the exposure unit; and a control unit that controls the first moving mechanism and the second moving mechanism, wherein the first moving mechanism and the second moving mechanism are controlled so as to acquire array information of shots of a pattern on the substrate from a substrate image of a substrate, which has already been subjected to pattern exposure, imaged by the imaging unit, and expose the edge portion of the substrate, based on the acquired array information.
摘要翻译：边缘曝光装置包括：成像单元，其对基板的前表面进行成像; 基板保持单元; 曝光单元，其暴露保持在所述基板保持单元上的所述基板的边缘部分; 移动和旋转衬底保持单元的第一移动机构; 移动曝光单元的第二移动机构; 以及控制单元，其控制第一移动机构和第二移动机构，其中，控制第一移动机构和第二移动机构，以从基板的基板图像获取基板上的图案的拍摄的阵列信息，已经经过图案曝光，由成像单元成像，并且基于获取的阵列信息曝光基板的边缘部分。

7. 发明申请

US20140054463A1 INSPECTION DEVICE, BONDING SYSTEM AND INSPECTION METHOD 有权
标题翻译：检查装置，接合系统和检查方法
公开(公告)号：US20140054463A1
公开(公告)日：2014-02-27
申请号：US13967896
申请日：2013-08-15
申请人： Tokyo Electron Limited
发明人： Shinji KOGA , Akinori MIYAHARA , Hiroshi TOMITA , Shuji IWANAGA , Takeshi TAMURA
IPC分类号： G01N21/84
CPC分类号： G01N21/84 , G01B11/00 , G01B11/028 , G01N21/9505 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： According to an embodiment of the present disclosure, an apparatus of inspecting an overlapped substrate obtained by bonding substrates together is provided. The apparatus includes a first holding unit configured to hold and rotate the overlapped substrate, and a displacement gauge configured to measure displacements of peripheral sides of a first substrate and a second substrate constituting the overlapped substrate while rotating the overlapped substrate held by the first holding unit.
摘要翻译：根据本公开的实施例，提供了一种检查通过将基板接合在一起而获得的重叠基板的装置。该装置包括：第一保持单元，被配置为保持和旋转重叠的基板;以及位移计，配置为测量构成重叠基板的第一基板和第二基板的周边的位移，同时旋转由第一保持单元保持的重叠基板。

8. 发明申请

US20220198981A1 DISPLAY DEVICE, DISPLAY METHOD, AND STORAGE MEDIUM 有权
公开(公告)号：US20220198981A1
公开(公告)日：2022-06-23
申请号：US17553271
申请日：2021-12-16
申请人： TOKYO ELECTRON LIMITED
发明人： Megumi JOHSAKA , Hiroshi TOMITA , Takuya MORI , Hideki UCHIGAKI
IPC分类号： G09G3/20 , C23C16/52
摘要： A display device for displaying information about substrate processing executed in a substrate processing apparatus, includes: a display control part configured to, in response to a first instruction from a user, allow the display screen to display a first image based on first capturing data obtained by capturing an image of a display target substrate among the substrates in the substrate processing apparatus, and configured to, in response to a second instruction from the user, allow the display screen to display a second image based on second capturing data obtained by capturing the image of the display target substrate in the substrate processing apparatus, wherein the first capturing data is obtained by capturing the image of the display target substrate at a different timing from the second capturing data, or by capturing the image of the display target substrate in a different capturing region from the second capturing data.

9. 发明申请

US20160271640A1 ADJUSTMENT METHOD OF CHEMICAL LIQUID SUPPLY DEVICE, NON-TRANSITORY STORAGE MEDIUM, AND CHEMICAL LIQUID SUPPLY DEVICE 审中-公开
标题翻译：化学液体供应装置的调整方法，非接触式储存介质和化学液体供应装置
公开(公告)号：US20160271640A1
公开(公告)日：2016-09-22
申请号：US15065435
申请日：2016-03-09
申请人： TOKYO ELECTRON LIMITED
发明人： Hiroshi TOMITA , Shinichi MIZUSHINO
IPC分类号： B05C11/02 , B05D1/02
CPC分类号： B05D1/02 , B05D1/005 , G03F7/162 , G03F7/168 , H01L21/6708 , H01L21/6715 , H01L21/67253
摘要： A method for adjusting a chemical liquid supply device of supplying a chemical liquid through a nozzle for removing a coating film on a peripheral portion of a substrate having the coating film formed on a surface thereof and horizontally held by a holding table is provided. The method includes discharging the chemical liquid from the nozzle, performing, by an image pickup part, continuous image pickup on a region including a leading end of the nozzle and a region in which the chemical liquid discharged from the leading end forms a liquid stream in the air, acquiring area change data representing a temporal change in area of the chemical liquid in an image pickup region based on an image pickup result obtained by the image pickup part, and adjusting a supply control device installed in a chemical liquid supply path connected to the nozzle based on the area change data.
摘要翻译：本发明提供了一种调整药液供给装置的方法，所述化学液体供给装置通过用于除去由其表面上形成有所述涂膜并且由保持台水平保持的所述涂膜的基板的周边部分上的涂膜除去涂膜而形成的药液。该方法包括从喷嘴排出化学液体，通过图像拾取部件对包括喷嘴的前端的区域进行连续的图像拾取，以及从前端排出的化学液体形成液体流的区域空气，获取区域改变数据，其基于由图像拾取部分获得的图像拾取结果，表示图像拾取区域中的化学液体的面积的时间变化，并且调整安装在连接到图像拾取部分的药液供应路径中的供应控制装置喷嘴基于面积变化数据。

10. 发明申请

US20140124479A1 METHOD OF REMOVING COATING FILM OF SUBSTRATE PERIPHERAL PORTION, SUBSTRATE PROCESSING APPARATUS AND NON-TRANSITORY STORAGE MEDIUM 审中-公开
标题翻译：基板外围部分涂层膜的剥离方法，基板处理装置和非交联储存介质
公开(公告)号：US20140124479A1
公开(公告)日：2014-05-08
申请号：US14069463
申请日：2013-11-01
申请人： TOKYO ELECTRON LIMITED
发明人： Hiroshi TOMITA , Kazuya HISANO
IPC分类号： B05B15/04
CPC分类号： H01L21/02087 , H01L21/6708 , H01L21/6715 , H01L21/681
摘要： A method of removing a coating film of a substrate peripheral portion, is provided with holding and supporting a circular substrate by allowing a transfer body to transfer a rear surface of the substrate to a supporting part; removing a coating film in the shape of a ring by a predetermined width size by supplying a solvent from a solvent nozzle to a peripheral portion of the coating film formed on the surface of the substrate; transferring the substrate to an inspection module for inspecting a state of the coating film by imaging the entire surface of the substrate; detecting a removal region of the coating film based on image data acquired by the inspection module; and correcting a delivery position of a succeeding substrate with respect to the supporting part by the transfer body based on the detection result of the removal region of the coating film.
摘要翻译：通过使转印体将基板的后表面转印到支撑部上，除去基板周边部分的涂膜的方法设置有保持和支撑圆形基板; 通过将溶剂从溶剂喷嘴供给到形成在基材表面上的涂膜的周边部分，将预定宽度尺寸的环状涂膜去除; 将基板转移到检查模块，用于通过对基板的整个表面进行成像来检查涂膜的状态; 基于由检查模块获取的图像数据检测涂膜的去除区域; 并且基于所述涂膜的去除区域的检测结果，通过所述转印体校正后续基板相对于所述支撑部的输送位置。

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