专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20190019701A1 SUBSTRATE POSITION ADJUSTMENT METHOD, STORAGE MEDIUM AND SUBSTRATE TREATMENT SYSTEM 审中-公开
公开(公告)号：US20190019701A1
公开(公告)日：2019-01-17
申请号：US16026680
申请日：2018-07-03
申请人： Tokyo Electron Limited
发明人： Makoto HAYAKAWA
IPC分类号： H01L21/67 , H01L21/687 , G03F7/30 , G03F7/16 , G03F7/09 , G06T7/00
摘要： The method includes a step of executing a rotation treatment in a rotation treatment apparatus; a step of imaging a substrate on which the rotation treatment has been executed, in an inspection apparatus; a step of acquiring change amount information stored in advance, being information on an amount of change in orientation of the substrate while the substrate is moved from the rotation treatment apparatus to the inspection apparatus; a step of acquiring, as an execution result information, information on an execution result of the rotation treatment along a circumferential direction of the substrate, based on an imaging result in the inspection apparatus; and a step of correcting a position of the substrate at a time of the rotation treatment, based on the change amount information and the execution result information.

2. 发明申请

US20180136567A1 EXPOSURE APPARATUS, EXPOSURE APPARATUS ADJUSTMENT METHOD AND STORAGE MEDIUM 审中-公开
公开(公告)号：US20180136567A1
公开(公告)日：2018-05-17
申请号：US15813464
申请日：2017-11-15
申请人： Tokyo Electron Limited
发明人： Teruhiko MORIYA , Masaru TOMONO , Ryo SHIMADA , Makoto HAYAKAWA , Seiji NAGAHARA
IPC分类号： G03F7/20
摘要： An exposure apparatus includes a stage on which a substrate is placed, a plurality of light irradiation units configured to emit light independently of each other to different positions in a right and left direction on a surface of the substrate, so as to form a strip-like irradiation area extending from one end of the surface of the substrate to the other end of the substrate, a stage moving mechanism configured to move the stage in a back and forth direction relative to the irradiation area, such that the whole surface of the substrate is exposed, and a light receiving unit configured move in the irradiation area between one end and the other end of the irradiation area in order to detect an illuminance distribution of the irradiation area in a longitudinal direction of the irradiation area.

3. 发明申请

US20180156739A1 SUBSTRATE INSPECTION METHOD, COMPUTER STORAGE MEDIUM AND SUBSTRATE INSPECTION APPARATUS 审中-公开
公开(公告)号：US20180156739A1
公开(公告)日：2018-06-07
申请号：US15577354
申请日：2016-05-13
申请人： Tokyo Electron Limited
发明人： Takuya MORI , Makoto HAYAKAWA
IPC分类号： G01N21/956 , G01N21/95 , H01L21/67
CPC分类号： G01N21/956 , G01N21/9501 , H01L21/6715 , H01L21/67173 , H01L21/67178 , H01L21/67253 , H01L21/67288 , H01L21/67742
摘要： A method of inspecting a substrate to be repeatedly treated along a predetermined transfer way in a plurality of kinds of different treatment apparatuses, includes: imaging a substrate that has been treated in one of the treatment apparatuses, to acquire a first substrate image; imaging a substrate that has been an object for imaging the first substrate image and further treated in another treatment apparatus different from the one treatment apparatus after treated in the one treatment apparatus, to acquire a second substrate image; then performing defect inspection, based on the first substrate image and the second substrate image; and identifying, depending on whether or not a defect detected from the second substrate image is not detected from the first substrate image, whether or not the defect is caused by a treatment after the first substrate image is acquired and a treatment before the second substrate image is acquired.

4. 发明申请

US20200088654A1 SUBSTRATE INSPECTION METHOD, SUBSTRATE TREATMENT SYSTEM, AND COMPUTER STORAGE MEDIUM 审中-公开
公开(公告)号：US20200088654A1
公开(公告)日：2020-03-19
申请号：US16689218
申请日：2019-11-20
申请人： Tokyo Electron Limited
发明人： Takuya MORI , Makoto HAYAKAWA
IPC分类号： G01N21/956 , G03F7/20 , G03F1/84 , G01N21/95 , H01L21/66
摘要： A substrate inspection method in a substrate treatment system including a plurality of treatment apparatuses each performing a predetermined treatment on a substrate, includes: imaging a surface of a substrate before being treated in the treatment apparatuses to acquire a first substrate image; extracting a predetermined feature amount from the first substrate image; selecting an inspection recipe corresponding to the feature amount extracted from the first substrate image, from a storage unit in which a plurality of inspection recipes each set corresponding to the feature amount in a different range are stored; imaging the surface of the substrate after being treated in the treatment apparatuses to acquire a second substrate image; and determining presence or absence of a defect of the substrate, based on the selected inspection recipe and the second substrate image.

5. 发明申请

US20180143144A1 SUBSTRATE INSPECTION METHOD, SUBSTRATE TREATMENT SYSTEM, AND COMPUTER STORAGE MEDIUM 审中-公开
公开(公告)号：US20180143144A1
公开(公告)日：2018-05-24
申请号：US15567997
申请日：2016-05-09
申请人： Tokyo Electron Limited
发明人： Takuya MORI , Makoto HAYAKAWA
IPC分类号： G01N21/956 , G01N21/95 , G03F7/20 , G03F1/84
摘要： A substrate inspection method in a substrate treatment system including a plurality of treatment apparatuses each performing a predetermined treatment on a substrate, includes: imaging a surface of a substrate before being treated in the treatment apparatuses to acquire a first substrate image; extracting a predetermined feature amount from the first substrate image; selecting an inspection recipe corresponding to the feature amount extracted from the first substrate image, from a storage unit in which a plurality of inspection recipes each set corresponding to the feature amount in a different range are stored; imaging the surface of the substrate after being treated in the treatment apparatuses to acquire a second substrate image; and determining presence or absence of a defect of the substrate, based on the selected inspection recipe and the second substrate image.

6. 发明申请

US20180164696A1 OPTICAL PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS 审中-公开
公开(公告)号：US20180164696A1
公开(公告)日：2018-06-14
申请号：US15828906
申请日：2017-12-01
申请人： Tokyo Electron Limited
发明人： Teruhiko MORIYA , Masaru TOMONO , Ryo SHIMADA , Makoto HAYAKAWA , Seiji NAGAHARA
IPC分类号： G03F7/20
摘要： An optical processing apparatus includes: a housing; a stage; and a light irradiation unit configured to cause a light source unit to emit light so as to form a strip-like irradiation area extending over an area wider than a width of a substrate in a right and left direction. The stage and the light irradiation unit are moved by a moving mechanism relatively to each other in a back and forth direction. Light emitted from the light irradiation unit is deviated by a light-path changing unit from a relative movement area of a substrate. When a substrate is relatively moved below the light irradiation unit without the intension of being subjected to a light irradiation process, a control unit outputs a control signal such that an irradiation area is not formed on a surface of the substrate by the light-path changing unit, while the light source unit emitting light.

7. 发明申请

US20150219994A1 COATING AND DEVELOPING APPARATUS AND METHOD 审中-公开
标题翻译：涂料和开发设备和方法
公开(公告)号：US20150219994A1
公开(公告)日：2015-08-06
申请号：US14626295
申请日：2015-02-19
申请人： TOKYO ELECTRON LIMITED
发明人： Nobuaki MATSUOKA , Akira MIYATA , Shinichi HAYASHI , Suguru ENOKIDA , Hiroshi TOMITA , Makoto HAYAKAWA , Tatsuhei YOSHIDA
IPC分类号： G03F7/16
CPC分类号： G03F7/16 , H01L21/6715
摘要： In one embodiment, a coating and developing apparatus includes a processing block having two early-stage coating unit blocks, two later-stage coating unit blocks and two developing unit blocks, each unit blocks being vertically stacked on each other, The apparatus has at least two operation modes M1 and M2 adapted for abnormality. In mode M1 the processing module that processed the abnormal substrate in the developing unit blocks is identified, and subsequent substrates are transported to the processing module or modules, of the same type as the identified processing module, other than the identified processing module. In mode M2, the developing unit block that processed the abnormal substrate is identified, and subsequent substrates are transported to the developing unit block other than the identified developing unit block.
摘要翻译：在一个实施例中，涂层和显影装置包括具有两个早期涂覆单元块，两个后期涂层单元块和两个显影单元块的处理块，每个单元块彼此垂直堆叠。该装置至少具有适用于异常的两种操作模式M1和M2。在模式M1中，识别处理显影单元块中的异常衬底的处理模块，并且随后的衬底被传送到除了所识别的处理模块之外的与所识别的处理模块相同类型的处理模块。在模式M2中，识别处理异常衬底的显影单元块，并且随后的衬底被传送到除了所识别的显影单元块之外的显影单元块。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式