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1. 发明申请

US20100178512A1 CHANGING SURFACE PROPERTIES BY FUNCTIONALIZED NANOPARTICLES 审中-公开
标题翻译：通过功能化纳米粒子改变表面特性
公开(公告)号：US20100178512A1
公开(公告)日：2010-07-15
申请号：US12516890
申请日：2007-11-26
申请人： Thomas Giesenberg , Pascal Hayoz , Thomas Vogel , Andreas Muhlebach , Markus Frey , Stephan Ilg , Rachel Kohli Steck , Laurent Michau , Francois Rime
发明人： Thomas Giesenberg , Pascal Hayoz , Thomas Vogel , Andreas Muhlebach , Markus Frey , Stephan Ilg , Rachel Kohli Steck , Laurent Michau , Francois Rime
IPC分类号： B32B5/16 , B05D3/00 , B05D3/06 , C08G79/00 , C08G79/10 , C08F20/06 , C08F14/06 , C08F12/08
CPC分类号： C08F2/44 , B05D3/065 , B05D3/142 , B05D5/00 , B05D7/04 , B05D2401/32 , B29C70/64 , B82Y30/00 , C01P2004/03 , C01P2004/64 , C08F2/48 , C08F291/00 , C08F292/00 , C08J7/123 , C08J2323/06 , C08J2323/12 , C08K3/18 , C08K9/08 , C08L51/003 , C08L51/10 , C09C1/3081 , C09C3/063 , C09D5/1618 , C09D7/62 , Y10T428/2995 , Y10T428/31663 , Y10T428/31678 , Y10T428/31855 , C08L2666/02
摘要： A process for modifying the surface of an inorganic or organic substrate with strongly adherent nanoparticles is described, providing to the surface modified substrate durable effects like hydrophobicity, hydrophilicity, electrical conductivity, magnetic properties, flame retardance, color, adhesion, roughness, scratch resistance, UV-absorbance, antimicrobial properties, antifouling properties, antiprotein properties, antistatic properties, antifog properties, release properties. In this process, an optional first step a) a low-temperature plasma, ozonization, high energy irradiation, corona discharge or a flame is caused to act on the inorganic or organic substrate, and in a second step b) one or more defined nanoparticles or mixtures of defined nanoparticles with monomers, containing at least one ethylenically unsaturated group, or solutions, suspensions or emulsions of the afore-mentioned substances, are applied, preferably at normal pressure, to the inorganic or organic substrate. In a third step c) suitable methods are applied to dry or cure those afore-mentioned substances and, optionally, in a fourth step d) a further coating is applied on the substrate so pretreated.
摘要翻译：描述了一种用强粘附纳米颗粒改性无机或有机基材的表面的方法，为表面改性的基材提供耐久效果，如疏水性，亲水性，导电性，磁性，阻燃性，颜色，粘合性，粗糙度，耐擦伤性，紫外线吸收，抗菌性，防污性，抗蛋白性，抗静电性，防雾性，脱模性。在该过程中，引入可选的第一步骤a）低温等离子体，臭氧化，高能辐射，电晕放电或火焰作用于无机或有机衬底，并且在第二步骤中b）一个或多个限定的纳米颗粒或含有至少一个烯属不饱和基团的限定的纳米颗粒与单体的混合物，或上述物质的溶液，悬浮液或乳液，优选常压下施用于无机或有机基材。在第三步骤中，c）应用合适的方法来干燥或固化上述物质，并且任选地在第四步骤中d）将另外的涂层施加在基材上以进行预处理。

2. 发明申请

US20090208872A1 Sulphonium Salt Initiators 有权
标题翻译：锍盐引发剂
公开(公告)号：US20090208872A1
公开(公告)日：2009-08-20
申请号：US11922444
申请日：2006-06-21
申请人： Jean-Pierre Wolf , Attila Latika , Jean-Luc Birbaum , Stephan Ilg , Pascal Hayoz
发明人： Jean-Pierre Wolf , Attila Latika , Jean-Luc Birbaum , Stephan Ilg , Pascal Hayoz
IPC分类号： G03F7/20 , G03F7/004 , C07D209/88 , C07C321/30
CPC分类号： C07D209/88 , B33Y70/00 , C07C309/06 , C07C381/12 , G03F7/0045 , G03F7/038 , Y10S430/122
摘要： Compounds of the formula (I), (II), (III), (IV) and wherein, R is hydrogen, C1-C20alkyl; C2-C20alkyl interrupted by one or more O; is -L-X—R2 or -L-R2; R1 has for example one of the meanings as given for R; R2 is a monovalent sensitizer or photoinitiator moiety; Ar1 and Ar2 for example independently of one another are phenyl substituted by C1-C20alkyl, halogen or OR3; or are unsubstituted naphthyl, anthryl, phenanthryl or biphenylyl; or are naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OH or OR3; or are —Ar4-A-Ar3; Ar3 is unsubstituted phenyl naphthyl, anthryl, phenanthryl or biphenylyl; or is phenyl, naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OR3 or benzoyl; Ar4 is phenylene, naphthylene, anthrylene or phenanthrylene; A is a direct bond, S, O or C1-C20alkylene; X is CO, C(O)O, OC(O), O, S or NR3; L is C1-C20alkylene or C2-C20alkylene interrupted by one or more O; R3 is C1-C20alkyl or C1-C20hydroxyalkyl; and Y is an anion, are suitable as photolatent acid generators.
摘要翻译：式（I），（II），（III），（IV）的化合物，其中R是氢，C 1 -C 20烷基; 被一个或多个O中断的C 2 -C 20烷基; 是-L-X-R2或-L-R2; R1具有例如R给出的含义之一; R2是单价敏化剂或光引发剂部分; Ar 1和Ar 2例如彼此独立地是被C 1 -C 20烷基，卤素或OR 3取代的苯基; 或未取代的萘基，蒽基，菲基或联苯基; 或被C 1 -C 20烷基，OH或OR 3取代的萘基，蒽基，菲基或联苯基; 或为-Ar4-A-Ar3; Ar 3是未取代的苯基萘基，蒽基，菲基或联苯基; 或由C 1 -C 20烷基，OR 3或苯甲酰基取代的苯基，萘基，蒽基，菲基或联苯基; Ar4是亚苯基，亚萘基，亚蒽基或菲基; A是直接键合，S，O或C1-C20亚烷基; X是CO，C（O）O，OC（O），O，S或NR 3; L是被一个或多个O中断的C1-C20亚烷基或C2-C20亚烷基; R3是C1-C20烷基或C1-C20羟烷基; 并且Y是阴离子，适合作为光潜酸产生剂。

3. 发明申请

US20090197987A1 Sulphonium Salt Initiators 有权
标题翻译：锍盐引发剂
公开(公告)号：US20090197987A1
公开(公告)日：2009-08-06
申请号：US12226116
申请日：2007-04-04
申请人： Pascal Hayoz , Stephan Ilg
发明人： Pascal Hayoz , Stephan Ilg
IPC分类号： C07C319/02 , C08F2/50
CPC分类号： C09D11/101 , B33Y70/00 , C07C319/20 , C07C381/12 , C09D5/033 , C09D5/08 , G03F7/0045 , C07C323/22
摘要： Compounds of the formula (I), L, L′, L″, L1, L′1, L″1, L2, L′2, L″2, L3, L′3, L″3, L4, L′4, L″4, L5, L′5, L″5, L6, L′6, L″6, L7, L′7, L″7, L8, L′8 and L″8 independently of one another are hydrogen or an organic substituent; and/or one or more of the pairs L3 and L5, L′3 and L′5 or L″3 and L″5 together denote a single bond, provided that the respective X, X′ or X″ is not a single bond; and/or L3 and L5, L′3 and L′5 or L″3 and L″5 together denote an organic linking group; and/or one or more of the pairs L1 and L3, L1 and L, L5 and L7, L′1 and L′3, L′1 and L′, L′5 and L′7, L″1 and L″3, L″1 and L″, or L″5 and L″7, together denote an organic linking group; provided that at least one of L, L′, L″, L1, L′1, L″1, L2, L′2, L″2, L3, L′3, L″3, L4, L′4, L″4, L5, L′5, L″5, L6, L′6, L″6, L7, L′7, L″7, L8, L′8 and L″8 is other than hydrogen; X, X′ and X″ independently of one another are a single bond, CRaRb O, S, NRc or NCORc; Ra, Rb and Rc independently of one another are hydrogen or an organic substituent; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.
摘要翻译：式（I），L，L'，L“，L1，L'1，L''1，L2，L'2，L''2，L3，L'3，L''3， L4，L'4，L''4，L5，L'5，L''5，L6，L'6，L''6，L7，L'7，L''7，L8，L'8和彼此独立地是氢或有机取代基; 和/或成对L3和L5，L'3和L'5或L''3和L''5中的一个或多个一起表示单键，条件是各自的X，X'或X“不是单一债券和/或L3和L5，L'3和L'5或L''3和L''5一起表示有机连接基团; 和/或一对或多个L1和L3，L1和L，L5和L7，L'1和L'3，L'1和L'，L'5和L'7，L'1和L “3”，“1”和“L”，或“5”和“7”表示有机连接基团; 条件是L，L'，L“，L1，L'1，L''1，L2，L'2，L''2，L3，L'3，L'3， L'4，L''4，L 5，L'5，L''5，L 6，L'6，L''6，L 7，L'7，L''7，L8，L'8和L' '8不是氢; X，X'和X“彼此独立是单键，CRaRbO，S，NRc或NCORc; R a，R b和R c彼此独立地是氢或有机取代基; Y为无机或有机阴离子; 适合作为光潜酸产生剂。

4. 发明申请

US20100112364A1 SUBSTRATES WITH BIOPASSIVE COATING 失效
标题翻译：具有生物涂层的基材
公开(公告)号：US20100112364A1
公开(公告)日：2010-05-06
申请号：US12595969
申请日：2008-04-11
申请人： Andreas Muehlebach , Erich Nyfeler , Stephan Ilg , Pascal Hayoz , Jens Moeller
发明人： Andreas Muehlebach , Erich Nyfeler , Stephan Ilg , Pascal Hayoz , Jens Moeller
IPC分类号： B32B27/08 , B05D3/00 , C08F2/46
CPC分类号： C08J7/18 , C08F255/00 , C08F291/00 , C08J7/047 , C08J7/16 , C08J2433/00 , C08J2471/00 , C08L51/003 , C08L51/06 , C09D151/003 , C09D151/06 , Y10T428/31913 , C08L2666/02
摘要： The present invention provides a process for imparting decreased adhesion of biological material to the surface of a substrate comprises the following steps (i) oxidizing the surface of the substrate (ii) applying a composition comprising one or more ethylenically unsaturated compounds to the oxidized surface of the substrate and (iii) curing the composition in order to form a coating layer.
摘要翻译：本发明提供了一种赋予生物材料对基材表面附着力降低的方法，其包括以下步骤：（i）将基材表面氧化（ⅱ）将包含一种或多种烯属不饱和化合物的组合物施加到氧化表面基材和（iii）固化组合物以形成涂层。

5. 发明申请

US20100087563A1 SULPHONIUM SALT PHOTOINITIATORS 有权
标题翻译：硫酸钡光敏剂
公开(公告)号：US20100087563A1
公开(公告)日：2010-04-08
申请号：US12442823
申请日：2007-09-24
申请人： Pascal Hayoz , Jean-Luc Birbaum , Stephan Ilg
发明人： Pascal Hayoz , Jean-Luc Birbaum , Stephan Ilg
IPC分类号： G03F7/004 , C07C381/12 , C08F2/46
CPC分类号： C07C381/12 , B33Y70/00 , B33Y80/00 , C07C2601/14 , C08K5/375 , C09D7/63 , G03F7/0045 , G03F7/038
摘要： Compounds of the formula (I), wherein L1, L2, L3 and L4 independently of one another are hydrogen or an organic substituent; R is for example C1-C20alkyl, C5-C12cycloalkyl, C2-C20alkenyl, substituted C1-C20alkyl; X is O, S, NRa or NCORa; Ra is for example hydrogen or C1-C20alkyl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.
摘要翻译：式（I）的化合物，其中L1，L2，L3和L4彼此独立地是氢或有机取代基; R是例如C 1 -C 20烷基，C 5 -C 12环烷基，C 2 -C 20烯基，取代的C 1 -C 20烷基; X为O，S，NRa或NCORa; R a是例如氢或C 1 -C 20烷基; Y为无机或有机阴离子; 适合作为光潜酸产生剂。

6. 发明授权

US08414982B2 Process for the production of strongly adherent coatings 有权
标题翻译：生产强粘附涂层的方法
公开(公告)号：US08414982B2
公开(公告)日：2013-04-09
申请号：US11792747
申请日：2005-12-12
申请人： Pascal Hayoz , Stephan Ilg
发明人： Pascal Hayoz , Stephan Ilg
IPC分类号： C08F4/00
CPC分类号： C07D295/185 , B05D3/0446 , B05D3/06 , B05D3/067 , B05D3/08 , B05D3/14 , B05D3/144 , B05D7/04 , C07C51/412 , C07C69/738 , C07C225/22 , C07C235/80 , C07C323/62 , C07F9/54 , C08F2/50 , C07C59/06
摘要： The invention relates to a process for the production of strongly adherent coatings on an inorganic or organic substrate, wherein in a first step a) a low-temperature plasma, a corona discharge or a flame is caused to act on the inorganic or organic substrate, in a second step b) one or more defined photoinitiators or mixtures of defined photoinitiators with monomers, containing at least one ethylenically unsaturated group, or solutions, suspensions or emulsions of the afore-mentioned substances, are applied, preferably at normal pressure, to the inorganic or organic substrate, in a third step c) using suitable methods those afore-mentioned substances are dried and/or irradiated with electromagnetic waves and, optionally, in a fourth step d) on the substrate so pretreated is applied a further coating.
摘要翻译：本发明涉及一种用于在无机或有机基底上生产强粘附涂层的方法，其中在第一步骤中，a）使低温等离子体，电晕放电或火焰作用于无机或有机基底上，在第二步中b）将一种或多种限定的光引发剂或含有至少一种烯键式不饱和基团的单体，或上述物质的溶液，悬浮液或乳液的限定的光引发剂或混合物，优选常压下施用于无机或有机衬底，第三步骤c）使用合适的方法，将上述物质用电磁波干燥和/或照射，并且任选地在第四步骤d）中，将预处理施加到另外的涂层上。

7. 发明授权

US08623459B2 Substrates with biopassive coating 失效
标题翻译：具有生物被动涂层的基材
公开(公告)号：US08623459B2
公开(公告)日：2014-01-07
申请号：US12595969
申请日：2008-04-11
申请人： Andreas Mühlebach , Erich Nyfeler , Stephan Ilg , Pascal Hayoz , Jens Möller
发明人： Andreas Mühlebach , Erich Nyfeler , Stephan Ilg , Pascal Hayoz , Jens Möller
IPC分类号： B05D3/00 , B05D3/02 , B32B27/08
CPC分类号： C08J7/18 , C08F255/00 , C08F291/00 , C08J7/047 , C08J7/16 , C08J2433/00 , C08J2471/00 , C08L51/003 , C08L51/06 , C09D151/003 , C09D151/06 , Y10T428/31913 , C08L2666/02
摘要： The present invention provides a process for imparting decreased adhesion of biological material to the surface of a substrate comprises the following steps (i) oxidizing the surface of the substrate (ii) applying a composition comprising one or more ethylenically unsaturated compounds to the oxidized surface of the substrate and (iii) curing the composition in order to form a coating layer.
摘要翻译：本发明提供了一种赋予生物材料对基材表面附着力降低的方法，其包括以下步骤：（i）将基材表面氧化（ⅱ）将包含一种或多种烯属不饱和化合物的组合物施加到氧化表面基材和（iii）固化组合物以形成涂层。

8. 发明授权

US08067643B2 Sulphonium salt initiators 有权
标题翻译：锍盐引发剂
公开(公告)号：US08067643B2
公开(公告)日：2011-11-29
申请号：US12226116
申请日：2007-04-04
申请人： Pascal Hayoz , Stephan Ilg
发明人： Pascal Hayoz , Stephan Ilg
IPC分类号： C07C381/00 , C08F2/50
CPC分类号： C09D11/101 , B33Y70/00 , C07C319/20 , C07C381/12 , C09D5/033 , C09D5/08 , G03F7/0045 , C07C323/22
摘要： Compounds of the formula (I), L, L′, L″, L1, L′1, L″1, L2, L′2, L″2, L3, L′3, L″3, L4, L′4, L″4, L5, L′5, L″5, L6, L′6, L″6, L7, L′7, L″7, L8, L′8 and L″8 independently of one another are hydrogen or an organic substituent; and/or one or more of the pairs L3 and L5, L′3 and L′5 or L″3 and L″5 together denote a single bond, provided that the respective X, X′ or X″ is not a single bond; and/or L3 and L5, L′3 and L′5 or L″3 and L″5 together denote an organic linking group; and/or one or more of the pairs L1 and L3, L1 and L, L5 and L7, L′1 and L′3, L′1 and L′, L′5 and L′7, L″1 and L″3, L″1 and L″, or L″5 and L″7, together denote an organic linking group; provided that at least one of L, L′, L″, L1, L′1, L″1, L2, L′2, L″2, L3, L′3, L″3, L4, L′4, L″4, L5, L′5, L″5, L6, L′6, L″6, L7, L′7, L″7, L8, L′8 and L″8 is other than hydrogen; X, X′ and X″ independently of one another are a single bond, CRaRb O, S, NRc or NCORc; Ra, Rb and Rc independently of one another are hydrogen or an organic substituent; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.
摘要翻译：式（I），L，L'，L“，L1，L'1，L”1，L2，L'2，L“2，L3，L'3，L”3，L4，L' 4，L“4，L5，L'5，L”5，L6，L'6，L“6，L7，L'7，L”7，L8，L'8和L“8彼此独立氢或有机取代基; 和/或成对L3和L5，L'3和L'5或L“3和L”5中的一个或多个一起表示单键，条件是相应的X，X'或X“不是单键 ; 和/或L3和L5，L'3和L'5或L“3和L”5一起表示有机连接基团; 和/或一对或多对L1和L3，L1和L，L5和L7，L'1和L'3，L'1和L'，L'5和L'7，L“1和L” 3，L“1和L”或L“5和L”7一起表示有机连接基团; 只要L，L'，L“，L1，L'1，L”1，L2，L'2，L“2，L3，L'3，L”3，L4， L“4，L5，L'5，L”5，L6，L'6，L“6，L7，L'7，L”7，L8，L'8和L“8不同于氢; X，X'和X“彼此独立是单键，CRaRb O，S，NRc或NCORc; R a，R b和R c彼此独立地是氢或有机取代基; Y为无机或有机阴离子; 适合作为光潜酸产生剂。

9. 发明授权

US08012672B2 Sulphonium salt photoinitiators 有权
标题翻译：锍盐光引发剂
公开(公告)号：US08012672B2
公开(公告)日：2011-09-06
申请号：US12442823
申请日：2007-09-24
申请人： Pascal Hayoz , Jean-Luc Birbaum , Stephan Ilg
发明人： Pascal Hayoz , Jean-Luc Birbaum , Stephan Ilg
IPC分类号： C07C381/12 , G03F7/004 , G03F7/039 , G03C1/73
CPC分类号： C07C381/12 , B33Y70/00 , B33Y80/00 , C07C2601/14 , C08K5/375 , C09D7/63 , G03F7/0045 , G03F7/038
摘要： Compounds of the formula (I), wherein L1, L2, L3 and L4 independently of one another are hydrogen or an organic substituent; R is for example C1-C20alkyl, C5-C12cycloalkyl, C2-C20alkenyl, substituted C1-C20alkyl; X is O, S, NRa or NCORa; Ra is for example hydrogen or C1-C20alkyl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.
摘要翻译：式（I）的化合物，其中L1，L2，L3和L4彼此独立地是氢或有机取代基; R是例如C 1 -C 20烷基，C 5 -C 12环烷基，C 2 -C 20烯基，取代的C 1 -C 20烷基; X为O，S，NRa或NCORa; R a是例如氢或C 1 -C 20烷基; Y为无机或有机阴离子; 适合作为光潜酸产生剂。

10. 发明授权

US07901867B2 Sulphonium salt initiators 有权
标题翻译：锍盐引发剂
公开(公告)号：US07901867B2
公开(公告)日：2011-03-08
申请号：US11922444
申请日：2006-06-21
申请人： Jean-Pierre Wolf , Attila Latika , Jean-Luc Birbaum , Stephan Ilg , Pascal Hayoz
发明人： Jean-Pierre Wolf , Attila Latika , Jean-Luc Birbaum , Stephan Ilg , Pascal Hayoz
IPC分类号： G03F7/004 , G03F7/30 , C07C381/12
CPC分类号： C07D209/88 , B33Y70/00 , C07C309/06 , C07C381/12 , G03F7/0045 , G03F7/038 , Y10S430/122
摘要： Compounds of the formula (I), (II), (III), (IV) and wherein, R is hydrogen, C1-C20alkyl; C2-C20alkyl interrupted by one or more O; is -L-X—R2 or -L-R2; R1 has for example one of the meanings as given for R; R2 is a monovalent sensitizer or photoinitiator moiety; Ar1 and Ar2 for example independently of one another are phenyl substituted by C1-C20alkyl, halogen or OR3; or are unsubstituted naphthyl, anthryl, phenanthryl or biphenylyl; or are naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OH or OR3; or are —Ar4-A-Ar3; Ar3 is unsubstituted phenyl naphthyl, anthryl, phenanthryl or biphenylyl; or is phenyl, naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OR3 or benzoyl; Ar4 is phenylene, naphthylene, anthrylene or phenanthrylene; A is a direct bond, S, O or C1-C20alkylene; X is CO, C(O)O, OC(O), O, S or NR3; L is C1-C20alkylene or C2-C20alkylene interrupted by one or more O; R3 is C1-C20alkyl or C1-C20hydroxyalkyl; and Y is an anion, are suitable as photolatent acid generators.
摘要翻译：式（I），（II），（III），（IV）的化合物，其中R是氢，C 1 -C 20烷基; 被一个或多个O中断的C 2 -C 20烷基; 是-L-X-R2或-L-R2; R1具有例如R给出的含义之一; R2是单价敏化剂或光引发剂部分; Ar 1和Ar 2例如彼此独立地是被C 1 -C 20烷基，卤素或OR 3取代的苯基; 或未取代的萘基，蒽基，菲基或联苯基; 或被C 1 -C 20烷基，OH或OR 3取代的萘基，蒽基，菲基或联苯基; 或为-Ar4-A-Ar3; Ar 3是未取代的苯基萘基，蒽基，菲基或联苯基; 或由C 1 -C 20烷基，OR 3或苯甲酰基取代的苯基，萘基，蒽基，菲基或联苯基; Ar4是亚苯基，亚萘基，亚蒽基或菲基; A是直接键合，S，O或C1-C20亚烷基; X是CO，C（O）O，OC（O），O，S或NR 3; L是被一个或多个O中断的C 1 -C 20亚烷基或C 2 -C 20亚烷基; R3是C1-C20烷基或C1-C20羟烷基; 并且Y是阴离子，适合作为光潜酸产生剂。

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