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1. 发明授权

US08633458B2 Ion implant apparatus and a method of implanting ions 有权
公开(公告)号：US08633458B2
公开(公告)日：2014-01-21
申请号：US13296436
申请日：2011-11-15
申请人： Theodore Smick , Geoffrey Ryding , Hilton Glavish , Takao Sakase , William Park, Jr. , Paul Eide , Drew Arnold , Ronald Horner , Joseph Gillespie
发明人： Theodore Smick , Geoffrey Ryding , Hilton Glavish , Takao Sakase , William Park, Jr. , Paul Eide , Drew Arnold , Ronald Horner , Joseph Gillespie
IPC分类号： G21G5/00
CPC分类号： C23C14/48 , H01J37/1475 , H01J37/20 , H01J37/3171 , H01J2237/1523 , H01J2237/20214
摘要： Ion implant apparatus using a drum-type scan wheel holds wafers with a total cone angle less than 60°. A collimated scanned beam of ions, for example H+, is directed along a final beam path which is at an angle of at least 45° to the axis of rotation of the scan wheel. Ions are extracted from a source and accelerated along a linear acceleration path to a high implant energy (more than 500 keV) before scanning or mass analysis. The mass analyzer may be located near the axis of rotation and unwanted ions are directed to an annular beam dump which may be mounted on the scan wheel.

2. 发明授权

US08378317B1 Ion implant apparatus and method of ion implantation 失效
标题翻译：离子注入装置和离子注入方法
公开(公告)号：US08378317B1
公开(公告)日：2013-02-19
申请号：US13226590
申请日：2011-09-07
申请人： Theodore Smick , Geoffrey Ryding , Takao Sakase , William Park, Jr. , Joseph Gillespie , Ronald Horner , Paul Eide
发明人： Theodore Smick , Geoffrey Ryding , Takao Sakase , William Park, Jr. , Joseph Gillespie , Ronald Horner , Paul Eide
IPC分类号： A61N5/00
CPC分类号： C23C14/48 , C23C14/505 , H01J37/20 , H01J37/3171 , H01J2237/201 , H01J2237/20214
摘要： An apparatus and a method of ion implantation using a rotary scan assembly having an axis of rotation and a periphery. A plurality of substrate holders is distributed about the periphery, and the substrate holders are arranged to hold respective planar substrates. Each planar substrate has a respective geometric center on the periphery. A beam line assembly provides a beam of ions for implantation in the planar substrates on the holders. The beam line assembly is arranged to direct said beam along a final beam path.
摘要翻译：使用具有旋转轴和周边的旋转扫描组件的离子注入的装置和方法。多个基板保持器围绕周边分布，并且基板保持器布置成保持相应的平面基板。每个平面基板在周边上具有相应的几何中心。束线组件提供离子束以用于植入在支架上的平面基底中。束线组件被布置成沿着最终光束路径引导所述光束。

3. 发明申请

US20130119263A1 Ion Implant Apparatus and a Method of Implanting Ions 有权
标题翻译：离子植入装置和植入离子的方法
公开(公告)号：US20130119263A1
公开(公告)日：2013-05-16
申请号：US13296436
申请日：2011-11-15
申请人： Theodore Smick , Geoffrey Ryding , Hilton Glavish , Takao Sakase , William Park, JR. , Paul Eide , Drew Arnold , Ronald Horner , Joseph Gillespie
发明人： Theodore Smick , Geoffrey Ryding , Hilton Glavish , Takao Sakase , William Park, JR. , Paul Eide , Drew Arnold , Ronald Horner , Joseph Gillespie
IPC分类号： H01J1/50
CPC分类号： C23C14/48 , H01J37/1475 , H01J37/20 , H01J37/3171 , H01J2237/1523 , H01J2237/20214
摘要： Ion implant apparatus using a drum-type scan wheel holds wafers with a total cone angle less than 60°. A collimated scanned beam of ions, for example H+, is directed along a final beam path which is at an angle of at least 45° to the axis of rotation of the scan wheel. Ions are extracted from a source and accelerated along a linear acceleration path to a high implant energy (more than 500 keV) before scanning or mass analysis. The mass analyzer may be located near the axis of rotation and unwanted ions are directed to an annular beam dump which may be mounted on the scan wheel.
摘要翻译：使用鼓式扫描轮的离子注入装置保持总锥角小于60°的晶片。准直的扫描的离子束，例如H +，沿着与扫描轮的旋转轴线成至少45°的角度的最终光束路径被引导。在扫描或质量分析之前，从源中提取离子并沿线性加速路径加速至高注入能量（大于500keV）。质量分析器可以位于旋转轴附近，并且不需要的离子被引导到可以安装在扫描轮上的环形光焦点。

4. 发明申请

US20130056655A1 ION IMPLANT APPARATUS AND METHOD OF ION IMPLANTATION 失效
标题翻译：离子植入装置和离子植入方法
公开(公告)号：US20130056655A1
公开(公告)日：2013-03-07
申请号：US13226590
申请日：2011-09-07
申请人： Theodore Smick , Geoffrey Ryding , Takao Sakase , William Park, JR. , Joseph Gillespie , Ronald Horner , Paul Eide
发明人： Theodore Smick , Geoffrey Ryding , Takao Sakase , William Park, JR. , Joseph Gillespie , Ronald Horner , Paul Eide
IPC分类号： G21K5/10
CPC分类号： C23C14/48 , C23C14/505 , H01J37/20 , H01J37/3171 , H01J2237/201 , H01J2237/20214
摘要： An apparatus and a method of ion implantation using a rotary scan assembly having an axis of rotation and a periphery. A plurality of substrate holders is distributed about the periphery, and the substrate holders are arranged to hold respective planar substrates. Each planar substrate has a respective geometric center on the periphery. A beam line assembly provides a beam of ions for implantation in the planar substrates on the holders. The beam line assembly is arranged to direct said beam along a final beam path.
摘要翻译：使用具有旋转轴和周边的旋转扫描组件的离子注入的装置和方法。多个基板保持器围绕周边分布，并且基板保持器布置成保持相应的平面基板。每个平面基板在周边上具有相应的几何中心。束线组件提供离子束以用于植入在支架上的平面基底中。束线组件被布置成沿着最终光束路径引导所述光束。

5. 发明申请

US20100181470A1 ION BEAM ANGLE CALIBRATION AND EMITTANCE MEASUREMENT SYSTEM FOR RIBBON BEAMS 有权
标题翻译：离子束角度校准和辐射测量系统
公开(公告)号：US20100181470A1
公开(公告)日：2010-07-22
申请号：US12357688
申请日：2009-01-22
申请人： Marvin Farley , Donald Polner , Geoffrey Ryding , Theodore Smick , Takao Sakase , Ronald Horner , Edward Eisner , Paul Eide , Brian Freer , Mark Lambert , Donovan Beckel
发明人： Marvin Farley , Donald Polner , Geoffrey Ryding , Theodore Smick , Takao Sakase , Ronald Horner , Edward Eisner , Paul Eide , Brian Freer , Mark Lambert , Donovan Beckel
IPC分类号： G01D18/00 , A61N5/00 , H01J5/18
CPC分类号： H01J37/244 , H01J37/3171 , H01J2237/024 , H01J2237/24507 , H01J2237/24528 , H01J2237/24535 , H01J2237/24542
摘要： An ion beam angle calibration and emittance measurement system, comprising a plate comprising an elongated slit therein, wherein the elongated slit positioned at a rotation center of the plate and configured to allow a first beam portion to pass therethrough. A beam current detector located downstream of the plate, wherein the beam current detector comprises a slit therein configured to permit a second beam portion of the first beam portion to pass therethrough, wherein the beam current detector is configured to measure a first beam current associated with the first beam portion. A beam angle detector is located downstream of the beam current detector and configured to detect a second beam current associated with the second beam portion. The plate, the current beam detector and the beam angle detector are configured to collectively rotate about the rotation center of the plate.
摘要翻译：一种离子束角度校准和发射测量系统，包括其中包括细长狭缝的板，其中所述细长狭缝位于所述板的旋转中心并且被配置为允许第一梁部分通过。一种位于板的下游的光束电流检测器，其中所述光束电流检测器包括其中的狭缝，其中构造成允许所述第一光束部分的第二光束部分穿过其中，其中所述光束电流检测器被配置为测量与第一梁部分。光束角检测器位于束电流检测器的下游，并被配置为检测与第二光束部分相关联的第二光束电流。板，当前的束检测器和束角检测器构造成围绕板的旋转中心共同旋转。

6. 发明授权

US08168941B2 Ion beam angle calibration and emittance measurement system for ribbon beams 有权
标题翻译：离子束角度校准和光束辐射测量系统
公开(公告)号：US08168941B2
公开(公告)日：2012-05-01
申请号：US12357688
申请日：2009-01-22
申请人： Marvin Farley , Donald Polner , Geoffrey Ryding , Theodore Smick , Takao Sakase , Ronald Horner , Edward Eisner , Paul Eide , Brian Freer , Mark Lambert , Donovan Beckel
发明人： Marvin Farley , Donald Polner , Geoffrey Ryding , Theodore Smick , Takao Sakase , Ronald Horner , Edward Eisner , Paul Eide , Brian Freer , Mark Lambert , Donovan Beckel
IPC分类号： H01J3/00 , G01N27/62
CPC分类号： H01J37/244 , H01J37/3171 , H01J2237/024 , H01J2237/24507 , H01J2237/24528 , H01J2237/24535 , H01J2237/24542
摘要： An ion beam angle calibration and emittance measurement system, comprising a plate comprising an elongated slit therein, wherein the elongated slit positioned at a rotation center of the plate and configured to allow a first beam portion to pass therethrough. A beam current detector located downstream of the plate, wherein the beam current detector comprises a slit therein configured to permit a second beam portion of the first beam portion to pass therethrough, wherein the beam current detector is configured to measure a first beam current associated with the first beam portion. A beam angle detector is located downstream of the beam current detector and configured to detect a second beam current associated with the second beam portion. The plate, the current beam detector and the beam angle detector are configured to collectively rotate about the rotation center of the plate.
摘要翻译：一种离子束角度校准和发射测量系统，包括其中包括细长狭缝的板，其中所述细长狭缝位于所述板的旋转中心并且被配置为允许第一梁部分通过。一种位于板的下游的光束电流检测器，其中所述光束电流检测器包括其中的狭缝，其中构造成允许所述第一光束部分的第二光束部分穿过其中，其中所述光束电流检测器被配置为测量与第一梁部分。光束角检测器位于束电流检测器的下游，并被配置为检测与第二光束部分相关联的第二光束电流。板，当前的束检测器和束角检测器构造成围绕板的旋转中心共同旋转。

7. 发明授权

US07994486B2 Substrate scanner apparatus 有权
标题翻译：基板扫描仪装置
公开(公告)号：US07994486B2
公开(公告)日：2011-08-09
申请号：US11589312
申请日：2006-10-30
申请人： Theodore Smick , Ronald Horner
发明人： Theodore Smick , Ronald Horner
IPC分类号： G01J1/00
CPC分类号： H01J37/3171 , H01J37/20 , H01J2237/20228 , H01J2237/20285 , Y10T74/18072
摘要： This invention relates to an apparatus for scanning substrates through an ion beam in the process chamber of an ion implanter. The apparatus comprises a substrate carriage and reaction mass carriage movably mounted to a fixed base. The substrate carriage is adapted to support a substrate holder. Movement of the substrate carriage results in movement of the substrate holder, and substrate mounted therein, through the ion beam. The reaction mass carriage moves in the opposite direction to the substrate carriage to counter any reaction forces exerted on the fixed base as a result of acceleration of the substrate carriage.
摘要翻译：本发明涉及一种用于通过离子注入机的处理室中的离子束扫描基板的装置。该装置包括可移动地安装到固定基座的基底托架和反作用物质托架。衬底托架适于支撑衬底保持器。衬底托架的移动导致衬底保持器和其中安装的衬底通过离子束的移动。反作用物质托架在与基板托架相反的方向上移动，以抵抗由于基板托架的加速而施加在固定基座上的任何反作用力。

8. 发明授权

US08324592B2 Ion source and a method of generating an ion beam using an ion source 有权
标题翻译：离子源和使用离子源产生离子束的方法
公开(公告)号：US08324592B2
公开(公告)日：2012-12-04
申请号：US12917510
申请日：2010-11-02
申请人： Geoffrey Ryding , Drew Arnold , William H. Park , Ronald Horner
发明人： Geoffrey Ryding , Drew Arnold , William H. Park , Ronald Horner
IPC分类号： H01J27/00 , H01J27/02 , H01J27/04
CPC分类号： H01J27/04 , H01J37/08 , H01J2237/082
摘要： Multiple control electrodes are provided asymmetrically within the plasma chamber of an ion source at respective positions along the length of the plasma chamber. Biasing the control electrodes selectively can selectively enhance the ion extraction current at adjacent positions along the length of the extraction slit. A method of generating an ion beam is disclosed in which the strengths of the transverse electric fields at different locations along the length of the plasma chamber are controlled to modify the ion beam linear current density profile along the length of the slit. The method is used for controlling the uniformity of a ribbon beam.
摘要翻译：多个控制电极在离子源的等离子体室内沿着等离子体室的长度的各个位置处非对称地设置。选择性地偏压控制电极可以选择性地提高沿着提取狭缝的长度的相邻位置处的离子提取电流。公开了一种产生离子束的方法，其中控制沿着等离子体室的长度的不同位置处的横向电场的强度，以沿着狭缝的长度修改离子束线性电流密度分布。该方法用于控制带束束的均匀性。

9. 发明申请

US20080141802A1 Substrate scanner apparatus 有权
标题翻译：基板扫描仪装置
公开(公告)号：US20080141802A1
公开(公告)日：2008-06-19
申请号：US11589312
申请日：2006-10-30
申请人： Theodore Smick , Ronald Horner
发明人： Theodore Smick , Ronald Horner
IPC分类号： F16H21/00
CPC分类号： H01J37/3171 , H01J37/20 , H01J2237/20228 , H01J2237/20285 , Y10T74/18072
摘要： This invention relates to an apparatus for scanning substrates through an ion beam in the process chamber of an ion implanter. The apparatus comprises a substrate carriage and reaction mass carriage movably mounted to a fixed base. The substrate carriage is adapted to support a substrate holder. Movement of the substrate carriage results in movement of the substrate holder, and substrate mounted therein, through the ion beam. The reaction mass carriage moves in the opposite direction to the substrate carriage to counter any reaction forces exerted on the fixed base as a result of acceleration of the substrate carriage.
摘要翻译：本发明涉及一种用于通过离子注入机的处理室中的离子束扫描基板的装置。该装置包括可移动地安装到固定基座的基底托架和反作用物质托架。衬底托架适于支撑衬底保持器。衬底托架的移动导致衬底保持器和其中安装的衬底通过离子束的移动。反作用物质托架在与基板托架相反的方向上移动，以抵抗由于基板托架的加速而施加在固定基座上的任何反作用力。

10. 发明申请

US20120146554A1 A D.C. Charged Particle Accelerator, A Method of Accelerating Charged Particles Using D.C. Voltages and a High Voltage Power Supply Apparatus for use Therewith 有权
标题翻译：直流电荷粒子加速器，使用直流电压加速带电粒子的方法和用于其的高压电源装置
公开(公告)号：US20120146554A1
公开(公告)日：2012-06-14
申请号：US12962723
申请日：2010-12-08
申请人： Theodore H. Smick , Geoffrey Ryding , William H. Park , Ronald Horner
发明人： Theodore H. Smick , Geoffrey Ryding , William H. Park , Ronald Horner
IPC分类号： H05H7/22 , H02K16/00
CPC分类号： H05H5/04 , H02K11/0094 , H02K16/00 , H02K21/14 , H02M7/106
摘要： A d. c. charged particle accelerator comprises accelerator electrodes separated by insulating spacers defining acceleration gaps between adjacent pairs of electrodes. Individually regulated gap voltages are applied across each adjacent pair of accelerator electrodes. In embodiments, the individually regulated gap voltages are generated by electrically isolated alternators mounted on a common rotor shaft driven by an electric motor. Alternating power outputs from the alternators provide inputs to individual regulated d. c. power supplies to generate the gap voltages. The power supplies are electrically isolated and have outputs connected in series across successive pairs of accelerator electrodes. The described embodiment enables an ion beam to be accelerated to high energies and high beam currents, with good accelerator stability.
摘要翻译：广告。 C。带电粒子加速器包括通过绝缘垫片间隔开的加速器电极，其限定相邻电极对之间的加速间单独调节的间隙电压施加在每个相邻的加速器电极对之间。在实施例中，单独调节的间隙电压由安装在由电动机驱动的公共转子轴上的电隔离交流发电机产生。交流发电机的交流电源输出为单独调节的d提供输入。 C。电源产生间隙电压。电源是电隔离的，并且具有串联连接成对的加速器电极的输出。所描述的实施例使得能够将离子束加速到高能量和高束流，具有良好的加速器稳定性。

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