专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08723452B2 D.C. charged particle accelerator and a method of accelerating charged particles 有权
标题翻译： D.C.带电粒子促进剂和加速带电粒子的方法
公开(公告)号：US08723452B2
公开(公告)日：2014-05-13
申请号：US13186513
申请日：2011-07-20
申请人： Geoffrey Ryding , Steven Richards , Paul Eide , Theodore H. Smick , Malcolm Barnett
发明人： Geoffrey Ryding , Steven Richards , Paul Eide , Theodore H. Smick , Malcolm Barnett
IPC分类号： H05H7/22
CPC分类号： H05H5/04
摘要： A d. c. charged particle accelerator comprises accelerator electrodes separated by insulating spacers defining acceleration gaps between adjacent pairs of electrodes. Individually regulated gap voltages are applied across each adjacent pair of accelerator electrodes. In an embodiment, direct connections are provided to gap electrodes from the stage points of a multistage Cockcroft Walton type voltage multiplier circuit. The described embodiment enables an ion beam to be accelerated to high energies and high beam currents, with good accelerator stability.
摘要翻译：广告。 C。带电粒子加速器包括通过绝缘垫片间隔开的加速器电极，其限定相邻电极对之间的加速间单独调节的间隙电压施加在每个相邻的加速器电极对之间。在一个实施例中，从多级Cockcroft Walton型电压倍增器电路的级点向间隙电极提供直接连接。所描述的实施例使得能够将离子束加速到高能量和高束流，具有良好的加速器稳定性。

2. 发明申请

US20120171809A1 Method and Apparatus for Forming a Thin Lamina 有权
标题翻译：用于形成薄层的方法和装置
公开(公告)号：US20120171809A1
公开(公告)日：2012-07-05
申请号：US13331909
申请日：2011-12-20
申请人： Adam Kell , Robert Clark-Phelps , Joseph D. Gillespie , Gopal Prabhu , Takao Sakase , Theodore H. Smick , Steve Zuniga , Steve Bababyan
发明人： Adam Kell , Robert Clark-Phelps , Joseph D. Gillespie , Gopal Prabhu , Takao Sakase , Theodore H. Smick , Steve Zuniga , Steve Bababyan
IPC分类号： H01L31/0376 , H01L21/762
CPC分类号： H01L31/0288 , H01L21/67092 , H01L21/6838 , H01L31/0747 , H01L31/1892 , Y02E10/50
摘要： A method for producing a lamina from a donor body includes implanting the donor body with an ion dosage and heating the donor body to an implant temperature during implanting. The donor body is separably contacted with a susceptor assembly, where the donor body and the susceptor assembly are in direct contact. A lamina is exfoliated from the donor body by applying a thermal profile to the donor body. Implantation and exfoliation conditions may be adjusted in order to maximize the defect-free area of the lamina.
摘要翻译：用于从施主实体产生层的方法包括：在植入期间，将施主体以离子剂量植入，并将施主体加热至植入温度。施主体与供体体和基座组件直接接触的基座组件分离接触。通过向施主体施加热分布，使薄片从供体体剥离。可以调整植入和剥脱条件以最大化层的无缺陷区域。

3. 发明申请

US20120168091A1 Method and Apparatus for Forming a Thin Lamina 有权
标题翻译：用于形成薄层的方法和装置
公开(公告)号：US20120168091A1
公开(公告)日：2012-07-05
申请号：US13331915
申请日：2011-12-20
申请人： Adam Kell , Robert Clark-Phelps , Joseph D. Gillespie , Gopal Prabhu , Takao Sakase , Theodore H. Smick , Steve Zuniga , Steve Bababyan
发明人： Adam Kell , Robert Clark-Phelps , Joseph D. Gillespie , Gopal Prabhu , Takao Sakase , Theodore H. Smick , Steve Zuniga , Steve Bababyan
IPC分类号： B32B38/10
CPC分类号： H01L31/0288 , H01L21/67092 , H01L21/67132 , H01L21/6838 , H01L31/0747 , H01L31/1892 , Y02E10/50 , Y10T156/11 , Y10T156/1132
摘要： A method for producing a lamina from a donor body includes implanting the donor body with an ion dosage and separably contacting the donor body with a susceptor assembly, where the donor body and the susceptor assembly are in direct contact. A lamina is exfoliated from the donor body, and a deforming force is applied to the lamina or to the donor body to separate the lamina from the donor body.
摘要翻译：用于从施主体产生层的方法包括用离子剂量植入施主体，并将施主体与供体体和基座组件直接接触的基座组件分离接触。薄片从供体体剥离，并且将变形力施加到椎板或施主体以将椎板与供体体分开。

4. 发明授权

US07939812B2 Ion source assembly for ion implantation apparatus and a method of generating ions therein 有权
标题翻译：用于离子注入装置的离子源组件及其中产生离子的方法
公开(公告)号：US07939812B2
公开(公告)日：2011-05-10
申请号：US12494272
申请日：2009-06-30
申请人： Hilton Glavish , Geoffrey Ryding , Theodore H. Smick
发明人： Hilton Glavish , Geoffrey Ryding , Theodore H. Smick
IPC分类号： H01J37/317 , H01J37/08 , H01J27/02 , H01J1/50
CPC分类号： H01J37/3171 , H01J37/08 , H01J2237/083
摘要： A hydrogen ion implanter for the exfoliation of silicon from silicon wafers uses a large scan wheel carrying 50+ wafers around its periphery and rotating about an axis. In one embodiment, the axis of rotation of the wheel is fixed and a ribbon beam of hydrogen ions is directed down on a peripheral edge of the wheel. The ribbon beam extends over the full radial width of wafers on the wheel. The beam is generated by an ion source providing an extracted ribbon beam having at least 100 mm major cross-sectional diameter. The ion source may use core-less saddle type coils to provide a uniform field confining the plasma in the ion source. The ribbon beam may be passed through a 90° bending magnet which bends the beam in the plane of the ribbon.
摘要翻译：用于从硅晶片剥离硅的氢离子注入机使用大的扫描轮，围绕其周边承载50个以上的晶圆并围绕一个轴线旋转。在一个实施例中，车轮的旋转轴线是固定的，并且带状的氢离子束被向下指向车轮的周缘。带状束在轮上的晶片的整个径向宽度上延伸。光束由离子源产生，提供具有至少100mm主横截面直径的抽出的带状束。离子源可以使用无芯鞍型线圈来提供限制离子源中的等离子体的均匀场。带状光束可以穿过将光束弯曲在色带平面中的90°弯曲磁体。

5. 发明授权

US06903349B2 Ion implanter and a method of implanting ions 失效
标题翻译：离子注入机和离子注入方法
公开(公告)号：US06903349B2
公开(公告)日：2005-06-07
申请号：US10703164
申请日：2003-11-07
申请人： Robert Mitchell , John Gordon , Keith Relleen , Ronald F. Horner , Theodore H. Smick
发明人： Robert Mitchell , John Gordon , Keith Relleen , Ronald F. Horner , Theodore H. Smick
IPC分类号： H01J37/317
CPC分类号： H01J37/3171 , H01J2237/04735
摘要： An ion implanter incorporates an r.f. accelerator assembly to provide ions for implant at high energies. The accelerator assembly includes electrodes mounted in the vacuum chamber so as to be movable between an operational position for generating and accelerating electric field and a non operational position within the vacuum chamber displaced clear of the beam path. An Actuator moves the electrode between the operational and non operation positions. For energy implanting, the electrodes are in the operational position and for low energy implants the actuator moves the electrodes to the non operational position clear of the beam path.
摘要翻译：离子注入机包含一个r.f. 加速器组件以在高能量下提供用于植入物的离子。加速器组件包括安装在真空室中的电极，以便在用于产生和加速电场的操作位置和在离开光束路径的位置之外的真空室内的非操作位置之间可移动。执行器在操作位置和非操作位置之间移动电极。对于能量注入，电极处于操作位置，对于低能量注入，致动器将电极移动到远离光束路径的非操作位置。

6. 发明授权

US06515288B1 Vacuum bearing structure and a method of supporting a movable member 失效
标题翻译：真空轴承结构和支撑活动件的方法
公开(公告)号：US06515288B1
公开(公告)日：2003-02-04
申请号：US09527029
申请日：2000-03-16
申请人： Geoffrey Ryding , Theodore H. Smick , Marvin Farley , Takao Sakase
发明人： Geoffrey Ryding , Theodore H. Smick , Marvin Farley , Takao Sakase
IPC分类号： G01F2300
CPC分类号： F16C29/025 , F16C32/0603 , F16C32/0618 , F16C33/748 , F16C2300/62 , H01J37/18 , H01J2237/166 , H01J2237/2006 , H01J2237/31701
摘要： A vacuum bearing structure comprises a combination of a planar gas bearing with a differentially-pumped vacuum seal. The bearing surface and the vacuum seal surfaces are formed of a porous material divided into a first outer region through which bearing gas can percolate to provide support and an inner second region providing the vacuum seal. An exhaust groove separates the two regions so that bearing gas can flow to atmosphere. The resulting structure can operate at a lower fly height to reduce loading on the differentially-pumped vacuum seal. The structure is particularly useful for motion feedthroughs into vacuum processes such as ion implantation.
摘要翻译：真空承载结构包括平面气体轴承与差动抽真空密封件的组合。轴承表面和真空密封表面由被分成第一外部区域的多孔材料形成，轴承气体可以通过该第一外部区域渗透以提供支撑，以及提供真空密封的内部第二区域。排气槽分离两个区域，使得轴承气体可以流到大气中。所得到的结构可以在较低的飞行高度下操作以减少差动泵真空密封件上的负载。该结构对于诸如离子注入的真空过程中的运动馈通特别有用。

7. 发明授权

US06323496B1 Apparatus for reducing distortion in fluid bearing surfaces 有权
标题翻译：减少流体轴承表面变形的装置
公开(公告)号：US06323496B1
公开(公告)日：2001-11-27
申请号：US09293955
申请日：1999-04-19
申请人： Takao Sakase , Theodore H. Smick , Geoffrey Ryding
发明人： Takao Sakase , Theodore H. Smick , Geoffrey Ryding
IPC分类号： H01J37317
CPC分类号： F16C32/0662 , F16C32/0603 , F16C33/748 , F16C2300/62 , H01J2237/166 , H01J2237/31701 , Y10S277/913 , Y10S277/927
摘要： A vacuum seal and fluid bearing apparatus for reducing the distortion of the bearing surfaces of a gas bearing is described. The apparatus includes a stator attached around an aperture in a vacuum housing and having a first planar fluid bearing surface. A movable member for closing the vacuum housing aperture having a second fluid bearing surface extending parallel to the first bearing surface is adapted to be supported spaced from the first bearing surface by a bearing fluid. A vacuum seal is provided between the movable member and the stator. In use, a force due to atmospheric pressure acts on the movable member in a direction normal to the bearing surfaces and a movable member includes a pressure relief structure to reduce any bending moment produced in the movable member by the force.
摘要翻译：描述了用于减小气体轴承的支承表面的变形的真空密封和流体轴承装置。该装置包括定子，其围绕真空壳体中的孔附接并且具有第一平面流体支承表面。用于关闭具有平行于第一支承表面延伸的第二流体支承表面的真空容纳孔的可移动构件适于通过轴承流体与第一支承表面间隔开。在可动构件和定子之间设置真空密封件。在使用中，由于大气压而产生的力在垂直于支承面的方向作用在可动件上，并且可移动部件包括压力释放结构，以减少由该力产生的可动件中产生的任何弯矩。

8. 发明授权

US06207959B1 Ion implanter 有权
标题翻译：离子注入机
公开(公告)号：US06207959B1
公开(公告)日：2001-03-27
申请号：US09294995
申请日：1999-04-20
申请人： Shu Satoh , Theodore H. Smick
发明人： Shu Satoh , Theodore H. Smick
IPC分类号： H01J3700
CPC分类号： H01J37/3171 , H01J2237/20228
摘要： An ion implanter for sequentially processing single semiconductor wafers includes a scanning arm extending along a first axis. A wafer holder is mounted on a free end of the arm so as to be rotatable about a second axis centered on and perpendicular to the plane of the wafer. The wafer can be scanned through an ion beam by reciprocating the arm transversely of the first axis. A rotary motor is mounted in the scanning arm near the free end with its axis of rotation parallel to the first axis and perpendicular to the second axis. A right angle rotary drive connects the motor to the wafer holder. A hard stop is provided on the motor to prevent the wafer from being rotated by more than 360°. Connections to the wafer on the holder are provided by a flexible circuit coiled about the second axis. The scanning mechanism can itself be rotated about an axis parallel to the arm so as to tilt the scanning direction, the wafer holder is itself further rotatable about the arm axis relative to the scanning mechanism. This enables the wafer to be rotated to the horizontal when the mechanical scanning mechanism holds the arm with the wafer above the beam.
摘要翻译：用于顺序处理单个半导体晶片的离子注入机包括沿着第一轴延伸的扫描臂。晶片保持器安装在臂的自由端上，以便围绕中心于晶片平面的第二轴可旋转。可以通过横跨第一轴线的臂往复移动离子束来扫描晶片。旋转马达安装在自由端附近的扫描臂中，其旋转轴线平行于第一轴线并垂直于第二轴线。直角旋转驱动器将电机连接到晶片架。在电机上设置了一个硬停止，以防止晶片旋转超过360°。通过围绕第二轴线卷绕的柔性电路提供与支架上的晶片的连接。扫描机构本身可以围绕平行于臂的轴线旋转以便使扫描方向倾斜，晶片保持器本身可相对于扫描机构围绕臂轴线进一步旋转。这使得当机械扫描机构将晶片保持在晶片上方时，晶片能够旋转到水平线。

9. 发明授权

US08426829B2 Ion implantation apparatus 失效
标题翻译：离子注入装置
公开(公告)号：US08426829B2
公开(公告)日：2013-04-23
申请号：US12894229
申请日：2010-09-30
申请人： William H Leavitt , Theodore H Smick , Joseph Daniel Gillespie , William H Park , Paul Eide , Drew Arnold , Geoffrey Ryding
发明人： William H Leavitt , Theodore H Smick , Joseph Daniel Gillespie , William H Park , Paul Eide , Drew Arnold , Geoffrey Ryding
IPC分类号： H01J37/317
CPC分类号： H01J37/20 , H01J37/3171 , H01J2237/2001 , H01J2237/2007 , H01J2237/201
摘要： An ion implanter has an implant wheel with a plurality of wafer carriers distributed about a periphery of the wheel. Each wafer carrier has a heat sink for removing heat from a wafer on the carrier during the implant process by thermal contact between the wafer and the heat sink. The wafer carriers have wafer retaining fences formed as cylindrical rollers with axes in the respective wafer support planes of the wafer carriers. The cylindrical surfaces of the rollers provide wafer abutment surfaces which can move transversely to the wafer support surfaces so that no transverse loading is applied by the fences to wafer edges as the wafer is pushed against the heat sink by centrifugal force. The wafer support surfaces comprise layers of elastomeric material and the movable abutment surfaces of the fences allow even thermal coupling with the heat sink over the whole area of the wafer.
摘要翻译：离子注入机具有植入轮，其具有围绕轮的周边分布的多个晶片载体。每个晶片载体具有散热器，用于在植入过程期间通过晶片和散热器之间的热接触从载体上的晶片去除热量。晶片载体具有晶片保持栅栏，其形成为具有在晶片载体的相应晶片支撑平面中的轴线的圆柱形辊。辊的圆柱形表面提供可以横向移动到晶片支撑表面的晶片邻接表面，使得当晶片通过离心力推靠在散热片上时，栅栏不会向晶片边缘施加横向负载。晶片支撑表面包括弹性体材料层，并且栅栏的可移动邻接表面允许在晶片的整个区域上与散热器的均匀热耦合。

10. 发明申请

US20120146554A1 A D.C. Charged Particle Accelerator, A Method of Accelerating Charged Particles Using D.C. Voltages and a High Voltage Power Supply Apparatus for use Therewith 有权
标题翻译：直流电荷粒子加速器，使用直流电压加速带电粒子的方法和用于其的高压电源装置
公开(公告)号：US20120146554A1
公开(公告)日：2012-06-14
申请号：US12962723
申请日：2010-12-08
申请人： Theodore H. Smick , Geoffrey Ryding , William H. Park , Ronald Horner
发明人： Theodore H. Smick , Geoffrey Ryding , William H. Park , Ronald Horner
IPC分类号： H05H7/22 , H02K16/00
CPC分类号： H05H5/04 , H02K11/0094 , H02K16/00 , H02K21/14 , H02M7/106
摘要： A d. c. charged particle accelerator comprises accelerator electrodes separated by insulating spacers defining acceleration gaps between adjacent pairs of electrodes. Individually regulated gap voltages are applied across each adjacent pair of accelerator electrodes. In embodiments, the individually regulated gap voltages are generated by electrically isolated alternators mounted on a common rotor shaft driven by an electric motor. Alternating power outputs from the alternators provide inputs to individual regulated d. c. power supplies to generate the gap voltages. The power supplies are electrically isolated and have outputs connected in series across successive pairs of accelerator electrodes. The described embodiment enables an ion beam to be accelerated to high energies and high beam currents, with good accelerator stability.
摘要翻译：广告。 C。带电粒子加速器包括通过绝缘垫片间隔开的加速器电极，其限定相邻电极对之间的加速间单独调节的间隙电压施加在每个相邻的加速器电极对之间。在实施例中，单独调节的间隙电压由安装在由电动机驱动的公共转子轴上的电隔离交流发电机产生。交流发电机的交流电源输出为单独调节的d提供输入。 C。电源产生间隙电压。电源是电隔离的，并且具有串联连接成对的加速器电极的输出。所描述的实施例使得能够将离子束加速到高能量和高束流，具有良好的加速器稳定性。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式