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1. 发明授权

US5061511A Method for forming functional deposited films by means of microwave plasma chemical vapor deposition method 失效
标题翻译：通过微波等离子体蒸发沉积方法形成功能性沉积膜的方法
公开(公告)号：US5061511A
公开(公告)日：1991-10-29
申请号：US551081
申请日：1990-07-11
申请人： Keishi Saitoh , Junichiro Hashizume , Shigehira Iida , Tetsuya Takei , Takayoshi Arai
发明人： Keishi Saitoh , Junichiro Hashizume , Shigehira Iida , Tetsuya Takei , Takayoshi Arai
IPC分类号： C23C16/511
CPC分类号： C23C16/511 , Y10S148/045 , Y10S148/065
摘要： An improved method for forming a functional deposited film by introducing a raw material gas into a substantially enclosed reaction chamber containing a substrate onto which the functional deposited film is to be deposited and coupling microwave energy from a source of microwave energy thereinto to thereby form a glow discharge plasma causing decomposition of the raw material gas whereby forming the functional deposited film on the substrate, the improvement comprising supplying microwave of a power equivalent of 1.1 times or more over that of microwave with which the deposition rate for the decomposed products from the raw material gas being deposited onto the substrate to be saturated to the raw material gas in the reaction chamber and regulating the inner pressure of the reaction chamber to a vacuum of 10 m Torr or less.According to the method of this invention, there can be formed a desired functional deposited film having a wealth of many practically applicable characteristics and having an improved response speed against photocurrent at an improved deposition rate with a raw material gas utilization efficiency of hundred percent or nearly hundred percent. And the method of this invention makes it possible to mass-produce various functional elements comprising such deposited film usable in electrophotographic photosensitive member, photosensor, thin-film transistor, solar cell, etc. on an industrial scale thereby enabling low cost production.

2. 发明授权

US4930442A Microwave plasma CVD apparatus having an improved microwave transmissive window 失效
标题翻译：具有改进的微波透射窗的微波等离子体CVD装置
公开(公告)号：US4930442A
公开(公告)日：1990-06-05
申请号：US173605
申请日：1988-03-25
申请人： Shigehira Iida , Takayoshi Arai , Junichiro Hashizume , Tetsuya Takei , Keishi Saitoh
发明人： Shigehira Iida , Takayoshi Arai , Junichiro Hashizume , Tetsuya Takei , Keishi Saitoh
IPC分类号： C23C16/511
CPC分类号： C23C16/511
摘要： An improved microwave plasma CVD apparatus for the formation of a thin film on a substrate by exciting glow discharge in a reaction chamber, comprising a substantially enclosed reaction chamber to receive the substrate, a means for supplying a film forming raw material gas into said reaction chamber and a means for introducing microwave energy into said reaction chamber, characterized in that said means for introducing microwave energy retains the gas atmosphere in said reaction chamber and as well as is constituted by a microwave transmissive material capable of introducing the microwave energy, said material being alumina ceramics containing glassy component such as SiO.sub.2, CaO and MgO in an amount of 1 wt. % to 10 wt. % and substantially as other component .alpha.-alumina.In the improved apparatus, the microwave transmissive window can be repeatedly used without being damaged for a long period of time and a desirable functional deposited film may be mass-produced at a high deposition rate.
摘要翻译：一种改进的微波等离子体CVD装置，用于通过在反应室中激发辉光放电，在基板上形成薄膜，其包括基本上封闭的反应室以接收基板，用于将成膜原料气体供应到所述反应室以及用于将微波能量引入所述反应室的装置，其特征在于，所述用于引入微波能量的装置将气体气氛保持在所述反应室中，并且由能够引入微波能量的微波透射材料构成，所述材料为含有1重量％的SiO 2，CaO和MgO等玻璃状成分的氧化铝陶瓷。％〜10重量％％和基本上作为其它组分α-氧化铝。在改进的装置中，可以重复使用微波透射窗而不会长期损坏，并且可以以高沉积速率大量生产所需的功能沉积膜。

3. 发明授权

US4953498A Microwave plasma CVD apparatus having substrate shielding member 失效
标题翻译：具有基板屏蔽部件的微波等离子体CVD装置
公开(公告)号：US4953498A
公开(公告)日：1990-09-04
申请号：US477123
申请日：1990-02-07
申请人： Junichiro Hashizume , Tetsuya Takei , Shigehira Iida , Keishi Saitoh , Takayoshi Arai
发明人： Junichiro Hashizume , Tetsuya Takei , Shigehira Iida , Keishi Saitoh , Takayoshi Arai
IPC分类号： C23C16/50 , C23C16/44 , C23C16/455 , C23C16/511 , G03G5/08 , H01J37/32 , H01L21/205 , H01L31/04
CPC分类号： H01J37/32623 , C23C16/511 , H01J37/32633
摘要： An improved MW-PCVD apparatus, characterized in that in the MW-CVD apparatus having a substrate onto which a deposited film to be formed and a space near the substrate for the decomposition of a raw material gas with the action of microwave energy, a shielding member is provided between said substrate and said space, which has an opening to allow part of the decomposed raw material gas species to be passed toward the substrate.
摘要翻译：一种改进的MW-PCVD装置，其特征在于，在具有基板的MW-CVD装置中，其上形成有沉积膜和在基板附近的空间，用于利用微波能量分解原料气体，屏蔽构件设置在所述基板和所述空间之间，所述空间具有允许部分分解的原料气体种类向基板通过的开口。

4. 发明授权

US4897281A Process for the formation of a functional deposited film by way of microwave plasma CVD method 失效
标题翻译：通过微波等离子体CVD法形成功能沉积膜的工艺
公开(公告)号：US4897281A
公开(公告)日：1990-01-30
申请号：US198746
申请日：1988-05-25
申请人： Takayoshi Arai , Shigehira Iida , Keishi Saitoh , Junichiro Hashizume , Tetsuya Takei
发明人： Takayoshi Arai , Shigehira Iida , Keishi Saitoh , Junichiro Hashizume , Tetsuya Takei
IPC分类号： C23C16/50 , B01J19/12 , C23C16/511 , C23C16/52 , H01J37/32 , H01L21/205 , H01L31/0248
CPC分类号： H01J37/32935 , B01J19/126 , C23C16/511 , H01L21/02425 , H01L21/02532 , H01L21/0262 , B01J2219/0894
摘要： According to the present invention, there is provided an improved process for the formation of a deposited film by way of a microwave plasma CVD method, the improvement comprising monitoring an effective power of a microwave to be introduced into a reaction chamber, leading to a control means an output signal indicative of the effective power corresponding a plasma intensity, and automatically controlling the matching between the reaction chamber and the microwave to be introduced into the reaction chamber according to an output signal from the control means. According to the above process, even after a long discharge time has elapsed, the plasma intensity in the reaction chamber may be maintained constant, and the effective power of the microwave to be introduced into the reaction chamber may be therefore maintained constant. Because of this, it becomes possible to repeatedly and stably prepare a desired deposited film excelling in the uniformity of the thickness and that of the quality at a high deposition rate.
摘要翻译：根据本发明，提供了一种通过微波等离子体CVD法形成沉积膜的改进方法，其改进包括监测要引入反应室的微波的有效功率，从而进行控制表示表示与等离子体强度相对应的有效功率的输出信号，并且根据来自控制装置的输出信号自动控制反应室与微波之间的匹配以引入反应室。根据上述处理，即使经过长时间的放电时间，反应室内的等离子体强度也可以保持恒定，因此可以将导入反应室的微波的有效功率保持恒定。因此，能够以高的沉积速度重复且稳定地制备在厚度均匀性和质量均匀性方面优异的所需沉积膜。

5. 发明授权

US5670286A Electrophotographic light receiving member having an outermost surface with a specific metal element-bearing region and a region substantially free of said metal element which are two-dimensionally distributed 失效
标题翻译：具有特定金属元素承载区域的最外表面和基本上不含所述金属元素的区域的二维分布的电子照相光接收元件
公开(公告)号：US5670286A
公开(公告)日：1997-09-23
申请号：US618302
申请日：1996-03-18
申请人： Tetsuya Takei , Junichiro Hashizume
发明人： Tetsuya Takei , Junichiro Hashizume
IPC分类号： G03G5/08 , G03G5/082 , G03G5/147 , G03G15/04
CPC分类号： G03G5/08214 , G03G5/08221
摘要： An electrophotographic light receiving member having an outermost surface portion comprised of a non-single crystal material, characterized in that a region (a) containing at least a metal element selected from the group consisting of metal elements belonging to groups 13, 14, 15 and 16 of the periodic table and a region (b) substantially not containing said metal element are two-dimensionally distributed at said outermost surface of said light receiving layer. An electrophotographic apparatus provided with said electrophotographic light receiving member and an electrophotographic process using said electrophotographic light receiving member.
摘要翻译：一种电子照相光接收元件，具有由非单晶材料构成的最外表面部分，其特征在于，含有至少含有金属元素的区域（a），所述金属元素选自属于第13,14,15族的金属元素， 16和基本上不含有所述金属元素的区域（b）在所述光接收层的所述最外表面二维分布。提供有所述电子照相光接收元件的电子照相设备和使用所述电子照相光接收元件的电子照相工艺。

6. 发明授权

US4957772A Method for forming functional deposited films by means of microwave plasma chemical vapor deposition method 失效
标题翻译：通过微波等离子体化学气相沉积法形成功能性沉积膜的方法
公开(公告)号：US4957772A
公开(公告)日：1990-09-18
申请号：US287666
申请日：1988-12-21
申请人： Keishi Saitoh , Junichiro Hashizume , Shigehira Iida , Tetsuya Takei , Takayoshi Arai
发明人： Keishi Saitoh , Junichiro Hashizume , Shigehira Iida , Tetsuya Takei , Takayoshi Arai
IPC分类号： C23C16/511
CPC分类号： C23C16/511 , Y10S148/045 , Y10S148/065
摘要： An improved method for forming a functional deposited film by introducing a raw material gas into a substantially enclosed reaction chamber containing a substrate onto which the functional deposited film is to be deposited and coupling microwave energy from a source of microwave energy thereinto to thereby form a glow discharge plasma causing decomposition of the raw material gas whereby forming the functional deposited film on the substrate, the improvement comprising supplying microwave of a power equivalent to 1.1 times or more over that of microwave with which the deposition rate for the decomposed products from the raw material gas being deposited onto the substrate to be saturated to the raw material gas in the reaction chamber and regulating the inner pressure of the reaction chamber to a vacuum of 10 m Torr or less.According to the method of this invention, there can be formed a desired functional deposited film having a wealth of many practically applicable characteristics and having an improved response speed against photocurrent at an improved deposition rate with a raw material gas utilization efficiency of hundred percent or nearly hundred percent. And the method of this invention makes it possible to mass-produce various functional elements comprising such deposited film usable in electrophotographic photosensitive member, photosensor, thin-film transistor, solar cell, etc. on an industrial scale thereby enabling low cost production.
摘要翻译：通过将原料气体引入包含要沉积功能性沉积膜的基板的基本封闭的反应室中，并将来自微波能量的微波能量耦合到其中形成发光，从而形成功能沉积膜的改进方法放电等离子体引起原料气体分解，由此在基板上形成功能沉积膜，其改进在于提供微波功率相当于来自原料的分解产物沉积速率的微波的1.1倍或更多倍将沉积在基板上的气体饱和到反应室中的原料气体中，并将反应室的内部压力调节至10mTorr以下的真空。根据本发明的方法，可以形成具有许多实际应用特性的期望的功能性沉积膜，并且在提高的沉积速率下具有改善的光电流响应速度，原料气体利用效率为百分之百或几乎百分之百。并且本发明的方法使得可以在工业规模上大量生产包括可用于电子照相感光构件，光电传感器，薄膜晶体管，太阳能电池等的这种沉积膜的各种功能元件，从而能够实现低成本生产。

7. 发明授权

US4897284A Process for forming a deposited film on each of a plurality of substrates by way of microwave plasma chemical vapor deposition method 失效
标题翻译：通过微波等离子体化学气相沉积法在多个基板上形成沉积膜的工艺
公开(公告)号：US4897284A
公开(公告)日：1990-01-30
申请号：US166553
申请日：1988-03-10
申请人： Takayoshi Arai , Shigehira Iida , Junichiro Hashizume , Tetsuya Takei , Keishi Saitoh
发明人： Takayoshi Arai , Shigehira Iida , Junichiro Hashizume , Tetsuya Takei , Keishi Saitoh
IPC分类号： C23C16/44 , C23C16/24 , C23C16/455 , C23C16/511 , G03G5/08 , G03G5/082 , H01L21/205 , H01L31/0248
CPC分类号： C23C16/24 , C23C16/511 , G03G5/08278
摘要： An improvement in the known MW-PCVD process for forming a deposited film on each of a plurality of cylindrical substrates being so arranged as to surround the discharging space in a substantially enclosed reaction space of a deposition chamber by the glow discharge of raw material gas to generate plasmas containing reactive gaseous materials causing the formation of said deposited film in the discharging space while rotating said plurality of substrates, which comprises providing a gas feed pipe provided with a plurality of gas liberation holes opening into the discharging space in every space between every two of the substrates so as to form an encircled discharging space and an open non-discharging space by said plurality of cylindrical substrates and a plurality of gas feed pipes and regulating the deposit thickness to be deposited per a rotation cycle of the substrate passing through the discharging space and the non-discharging space to a 1000 .ANG. or less.
摘要翻译：用于在多个圆柱形基板中的每一个上形成沉积膜的已知的MW-PCVD工艺的改进被布置成通过原料气体的辉光放电在沉积室的基本封闭的反应空间中包围放电空间，产生包含反应性气体材料的等离子体，导致在排出空间中形成所述沉积膜，同时旋转所述多个基板，其包括提供气体供给管，该气体供给管设置有在每两个空间之间的每个空间中通向排放空间的多个气体释放孔以便通过所述多个圆柱形基底和多个气体供给管形成环绕的排出空间和开放的非排放空间，并且每个循环通过放电的衬底的旋转周期来调节沉积物的沉积厚度空间和不排放空间达到1000安格或以下。

8. 发明授权

US5937260A Dual-sided image forming device with improved recording medium correction part 失效
标题翻译：具有改进的记录介质校正部件的双面成像装置
公开(公告)号：US5937260A
公开(公告)日：1999-08-10
申请号：US893073
申请日：1997-07-15
申请人： Kiyoshi Taninaka , Shigeo Nonoyama , Yoshiya Matsumoto , Tetsuya Takei , Nobuyuki Tanaka
发明人： Kiyoshi Taninaka , Shigeo Nonoyama , Yoshiya Matsumoto , Tetsuya Takei , Nobuyuki Tanaka
IPC分类号： G03G21/14 , B65H5/36 , B65H9/14 , B65H29/58 , G03G15/00
CPC分类号： G03G15/6579
摘要： An image forming device includes an image forming part which forms an image on a recording medium; a stacker which stores the recording mediums one on another; a recording medium switchback portion which receives the recording medium on a first run, one side of which has been printed when passing the image forming part, and sends the recording medium for a second run; an inverted recording medium transfer path through which the recording medium is sent to the image forming part with an upper surface and a lower surface of the recording medium reversed; a recording medium transfer part which transfers the recording medium along the inverted recording medium transfer path; a recording medium position correcting part, located at the inverted recording medium transfer path, which corrects a position in a width direction of the recording medium, and a control means for controlling the recording medium position correcting part with a particular operation timing so that the recording medium position correcting part is operated while the printing means is transferred along the inverted recording medium transfer path by the recording medium transfer part.
摘要翻译：图像形成装置包括：图像形成部，其在记录介质上形成图像; 将记录介质彼此存储的堆垛机; 记录介质回转部分，其在第一行程接收记录介质，其一侧在通过图像形成部分时已经被打印，并且发送记录介质用于第二行程; 反转记录介质传送路径，通过该路径将记录介质发送到图像形成部分，其中记录介质的上表面和下表面反转; 记录介质传送部件，其沿着反转的记录介质传送路径传送记录介质; 位于反转记录介质传送路径处的记录介质位置校正部件，其校正记录介质的宽度方向上的位置;以及控制装置，用于以特定操作定时控制记录介质位置校正部件，使得记录当打印装置通过记录介质传送部分沿着反向记录介质传送路径传送时，中间位置校正部分被操作。

9. 发明授权

US5582648A Apparatus for preparing a functional deposited film by microwave plasma chemical vapor deposition 失效
标题翻译：通过微波等离子体化学气相沉积制备功能沉积膜的装置
公开(公告)号：US5582648A
公开(公告)日：1996-12-10
申请号：US540153
申请日：1995-10-06
申请人： Hiroyuki Katagiri , Tetsuya Takei , Toshiyasu Shirasuna
发明人： Hiroyuki Katagiri , Tetsuya Takei , Toshiyasu Shirasuna
IPC分类号： G03G5/08 , C23C16/44 , C23C16/455 , C23C16/50 , C23C16/511 , G03G5/082 , H01L21/205 , H01L31/0248 , C23C16/00
CPC分类号： C23C16/45508 , C23C16/45578 , C23C16/511 , G03G5/082
摘要： A microwave plasma chemical vapor deposition apparatus for forming a functional deposited film on a plurality of Substrates which includes a substantially enclosed film-forming chamber comprising an outer wall having an end portion thereof provided with a microwave introducing window to which a waveguide extending from a microwave power source is connected, The film-forming chamber has a cylindrical discharge space encircled by a plurality of rotatable cylindrical substrate holders. Each of the cylindrical substrate holders has a substrate thereon. The cylindrical substrate holders are concentrically arranged in the film-forming chamber. The film forming chamber is provided with means for evacuating the film-forming chamber and means for supplying a raw material gas into the discharge space. The means for supplying the raw material gas comprises one or more gas feed pipes provided with a plurality of gas liberation holes capable of supplying a raw material gas radiately against each of the substrates. The gas feed pipes are longitudinally installed substantially at the center position of the discharge space.
摘要翻译：一种用于在多个基板上形成功能性沉积膜的微波等离子体化学气相沉积设备，其包括基本上封闭的成膜室，其包括具有端部的外壁，所述外壁的端部设置有微波引入窗口，从微波延伸的波导电源连接。成膜室具有由多个可旋转圆柱形基板保持件包围的圆柱形放电空间。每个圆柱形衬底保持器在其上具有衬底。圆柱形基板保持器同心地布置在成膜室中。成膜室设置有用于抽出成膜室的装置和用于将原料气体供给到放电空间的装置。用于供给原料气体的装置包括一个或多个气体供给管，该气体供给管设置有能够向每个基板辐射供给原料气体的多个气体释放孔。气体供给管纵向地安装在放电空间的中心位置。

10. 发明授权

US5030476A Process and apparatus for the formation of a functional deposited film on a cylindrical substrate by means of microwave plasma chemical vapor deposition 失效
标题翻译：通过微波等离子体化学气相沉积在圆柱形基底上形成功能沉积膜的方法和装置
公开(公告)号：US5030476A
公开(公告)日：1991-07-09
申请号：US526536
申请日：1990-05-21
申请人： Ryuji Okamura , Hirokazu Otoshi , Tetsuya Takei
发明人： Ryuji Okamura , Hirokazu Otoshi , Tetsuya Takei
IPC分类号： C23C16/50 , C23C16/46 , C23C16/511
CPC分类号： C23C16/511 , C23C16/46
摘要： A process for forming a functional deposited film which is adapted for use in an apparatus which comprises a substantially enclosed reaction chamber, a plurality of cylindrical substrates arranged to surround a discharge space and a microwave introduction means provided at least at one end of each cylindrical substrate and wherein microwave energy is introduced so that a glow discharge plasma containing reactant gases derived from starting gases is formed in the discharge space thereby forming a deposited film on each cylindrical substrate is described. The process is characterized in that a temperature control means is provided in the inside of each of said plurality of cylindrical substrates and simultaneous with the introduction of a thermally conductive gas, the thermally conductive gas is exhausted from the one end of each cylindrical substrate in the vicinity of the microwave introduction means. The process enables the deposited film of good quality to be formed stably at high speed and the deposited film is useful as an element member for semiconductive devices, photosensitive devices for electrophotography, photovoltaic devices, other electronic elements and optical elements.
摘要翻译：一种用于形成功能性沉积膜的方法，其适用于包括基本封闭的反应室的设备，布置成围绕放电空间的多个圆柱形基板和设置在每个圆柱形基板的至少一端的微波引入装置并且其中引入微波能量，使得在放电空间中形成含有源自起始气体的反应气体的辉光放电等离子体，从而在每个圆柱形基板上形成沉积膜。该方法的特征在于，在所述多个圆柱形基板的每一个的内部设置有温度控制装置，并且与引入导热气体同时，导热气体从每个圆柱形基板的一端排出微波引入装置附近。该方法能够以高速稳定地形成高质量的沉积膜，并且沉积膜可用作半导体器件的元件部件，电子照相用光敏器件，光电器件，其它电子元件和光学元件。

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