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1. 发明授权

US5798838A Projection exposure apparatus having function of detecting intensity distribution of spatial image, and method of detecting the same 失效
标题翻译：具有检测空间图像的强度分布功能的投影曝光装置及其检测方法
公开(公告)号：US5798838A
公开(公告)日：1998-08-25
申请号：US713719
申请日：1996-09-13
申请人： Tetsuo Taniguchi , Toshihiko Tsuji , Tadashi Nagayama
发明人： Tetsuo Taniguchi , Toshihiko Tsuji , Tadashi Nagayama
IPC分类号： G03F7/20 , H01L21/30 , G01B11/00
CPC分类号： G03F7/70591 , G03F7/70133 , G03F7/70241 , G03F7/70258 , G03F7/70358
摘要： The invention relates to a projection exposure apparatus for detecting a light-intensity distribution of a spatial image of a mask pattern formed through a projection optical system. The projection exposure apparatus has a knife-edge member which is disposed on the main surface of a wafer stage such that a plane including an exposure surface of a photosensitive substrate is leveled with a light incidence surface of the knife-edge member. The knife-edge member has a transmission area for transmitting the exposure light passing through the projection optical system, a light shielding area for preventing transmission of the exposure light, and a knife-edge defined as a boundary line between the transmission area and the light shielding area. The projection exposure apparatus detects the light-intensity distribution of light from the spatial image while moving the spatial image of the mask pattern and the knife-edge of the knife-edge member relatively to each other. The information related to the light-intensity distribution is used in optically adjusting a projection optical system, or the like.
摘要翻译：本发明涉及一种用于检测通过投影光学系统形成的掩模图案的空间图像的光强度分布的投影曝光装置。投影曝光装置具有刀片部件，其设置在晶片台的主表面上，使得包括感光基板的曝光表面的平面与刀刃部件的光入射面平齐。刀刃部件具有用于透射通过投影光学系统的曝光光的透射区域，用于防止曝光光的透射的遮光区域和被定义为透射区域与光线之间的边界线的刀刃屏蔽区域。投影曝光装置在将掩模图案的空间图像和刀刃部件的刀刃相对于彼此移动的同时，检测来自空间图像的光的光强度分布。与光强分布有关的信息用于光学调整投影光学系统等。

2. 发明申请

US20100129739A1 Surface Position Detection Apparatus, Exposure Apparatus, and Exposure Method 有权
标题翻译：表面位置检测装置，曝光装置和曝光方法
公开(公告)号：US20100129739A1
公开(公告)日：2010-05-27
申请号：US11988239
申请日：2006-06-28
申请人： Yasuhiro Hidaka , Tadashi Nagayama
发明人： Yasuhiro Hidaka , Tadashi Nagayama
IPC分类号： G03F7/20 , G03B27/54 , G01B11/14
CPC分类号： G03F7/70191 , G03F9/7026 , G03F9/7034 , G03F9/7065 , G03F9/7088 , Y10T29/49124
摘要： A surface position detection apparatus capable of highly precisely detecting the surface position of a surface to be detected without substantially being affected by relative positional displacement due to a polarization component occurring in a light flux having passed through a reflective surface. In the apparatus, a projection system has a projection side prism member (7) having first reflective surfaces (7b, 7c), and a light receiving system has a light receiving prism member (8) having second reflective surfaces (8b, 8c) arranged in correspondence with the projection side prism member. The surface position detection apparatus further has a member for compensating relative positional displacement due to a polarization component of a light flux having passed through the first and second reflective surfaces.
摘要翻译：一种表面位置检测装置，其能够高度精确地检测待检测表面的表面位置，而不会受到通过反射表面的光束中产生的偏振分量的相对位置偏移的影响。在该装置中，投影系统具有具有第一反射面（7b，7c）的突出侧棱镜部件（7），并且受光系统具有配置有第二反射面（8b，8c）的受光棱镜部件（8）与突出侧棱镜构件对应。表面位置检测装置还具有用于补偿由于通过第一和第二反射面的光束的偏振分量引起的相对位移的构件。

3. 发明授权

US5797674A Illumination optical system, alignment apparatus, and projection exposure apparatus using the same 失效
标题翻译：照明光学系统，对准装置和使用其的投影曝光装置
公开(公告)号：US5797674A
公开(公告)日：1998-08-25
申请号：US620683
申请日：1996-03-19
申请人： Tadashi Nagayama
发明人： Tadashi Nagayama
IPC分类号： G03F7/20 , G03F7/38 , G03F9/00 , F21V13/12
CPC分类号： G03F9/70 , G03F7/2022 , G03F7/38
摘要： An illumination optical system and an alignment apparatus suitable for reticle alignment in the projection exposure apparatus. There is provided an illumination optical system having parallel beam supply means For supplying a parallel beam and a light guide for guiding the parallel beam from the parallel beam supply means to a target illumination object, comprising diffusion means, arranged between the parallel beam supply means and the light guide for diffusing the parallel beam, wherein an incident end face of the light guide is arranged to be inclined by a predetermined angle with respect to a plane perpendicular to a direction of incidence of the parallel beam onto the diffusion means.
摘要翻译：一种照明光学系统和适用于投影曝光装置中的光罩对准的对准装置。提供了一种具有平行光束供应装置的照明光学系统，用于提供平行光束和用于将平行光束从平行光束提供装置引导到目标照明物体的光导，包括扩散装置，设置在平行光束提供装置和用于漫射平行光束的光导，其中光导的入射端面被布置成相对于垂直于平行光束到扩散装置的入射方向的平面倾斜预定角度。

4. 发明申请

US20060187432A1 Exposure apparatus, exposure method, and method for producing device 有权
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US20060187432A1
公开(公告)日：2006-08-24
申请号：US11399537
申请日：2006-04-07
申请人： Masahiko Yasuda , Takahiro Masada , Yuho Kanaya , Tadashi Nagayama , Kenichi Shiraishi
发明人： Masahiko Yasuda , Takahiro Masada , Yuho Kanaya , Tadashi Nagayama , Kenichi Shiraishi
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/70141 , G03F7/70716 , G03F9/7088
摘要： An exposure apparatus includes a substrate stage movable while holding a substrate, a substrate alignment system which detects an alignment mark (1) on the substrate held by the substrate stage and detects a reference mark (PFM) provided on the substrate stage, and a mask alignment system which detects, via a projection optical system, a reference mark (MFM) provided on the substrate stage. The reference mark (PFM) on the substrate stage is detected without a liquid by using the substrate alignment system, and the reference mark (MFM) on the substrate stage is detected using the mask alignment system via the projection optical system and the liquid. Then, a positional relationship between a detection reference position of the substrate alignment system and a projection position of an image of a pattern is obtained, thereby accurately performing alignment processing in the liquid immersion exposure.
摘要翻译：一种曝光装置，包括：在保持基板的同时可移动的基板台;基板对准系统，其检测由基板台保持的基板上的对准标记（1），并检测设置在基板台上的基准标记（PFM）;以及掩模对准系统，其经由投影光学系统检测设置在基板台上的参考标记（MFM）。通过使用衬底对准系统，无需液体检测衬底台上的参考标记（PFM），并且通过投影光学系统和液体使用掩模对准系统检测衬底台上的参考标记（MFM）。然后，获得基板对准系统的检测基准位置与图案的图像的投影位置之间的位置关系，从而在液浸曝光中精确地进行取向处理。

5. 发明授权

US5754299A Inspection apparatus and method for optical system, exposure apparatus provided with the inspection apparatus, and alignment apparatus and optical system thereof applicable to the exposure apparatus 失效
标题翻译：具有光学系统的检查装置和方法，设置有检查装置的曝光装置，以及适用于曝光装置的对准装置及其光学系统
公开(公告)号：US5754299A
公开(公告)日：1998-05-19
申请号：US584863
申请日：1996-01-11
申请人： Ayako Sugaya , Masahiro Nakagawa , Tadashi Nagayama
发明人： Ayako Sugaya , Masahiro Nakagawa , Tadashi Nagayama
IPC分类号： G03F7/20 , G03F9/00 , G01B11/00
CPC分类号： G03F7/706 , G03F7/70241 , G03F7/70633 , G03F7/70641 , G03F9/70
摘要： The present invention relates to inspection apparatus and method in which, based on images under a plurality of focus conditions formed by way of an optical system to be inspected, namely, using images under a plurality of defocal conditions, tendency in positional change or change of asymmetry between the images is calculated so as to specify at least one of aberration condition and optical adjustment condition of the optical system to be inspected as well as to exposure apparatuses and overlay accuracy measurement apparatuses provided with the inspection apparatus. In addition, the present invention relates to an image-forming optical system suitable to an alignment apparatus which is applicable to the exposure apparatuses. This image-forming optical system comprises a correction optical system for intentionally generating asymmetric aberration or symmetric aberration in the image-forming optical system and a decentering mechanism for decentering the correction optical system to cancel asymmetric aberration or symmetric aberration in the image-forming optical system.
摘要翻译：本发明涉及一种检查装置和方法，其中基于通过待检查的光学系统形成的多个聚焦条件下的图像，即，使用多个放置条件下的图像，位置变化或变化的趋势计算图像之间的不对称性，以便指定要检查的光学系统的像差条件和光学调节条件以及设置有检查装置的曝光装置和重叠精度测量装置中的至少一个。此外，本发明涉及适用于可应用于曝光装置的对准装置的图像形成光学系统。该图像形成光学系统包括用于在图像形成光学系统中有意产生不对称像差或对称像差的校正光学系统和用于使校正光学系统偏心以消除图像形成光学系统中的非对称像差或对称像差的偏心机构。

6. 发明授权

US09069261B2 Surface position detection apparatus, exposure apparatus, and exposure method 有权
标题翻译：表面位置检测装置，曝光装置和曝光方法
公开(公告)号：US09069261B2
公开(公告)日：2015-06-30
申请号：US13405524
申请日：2012-02-27
申请人： Yasuhiro Hidaka , Tadashi Nagayama
发明人： Yasuhiro Hidaka , Tadashi Nagayama
IPC分类号： G03B27/42 , G03B27/72 , G03F9/00
CPC分类号： G03F7/70191 , G03F9/7026 , G03F9/7034 , G03F9/7065 , G03F9/7088 , Y10T29/49124
摘要： A surface position detection apparatus capable of highly precisely detecting the surface position of a surface to be detected without substantially being affected by relative positional displacement due to a polarization component occurring in a light flux having passed through a reflective surface. In the apparatus, a projection system has a projection side prism member (7) having first reflective surfaces (7b, 7c), and a light receiving system has a light receiving prism member (8) having second reflective surfaces (8b, 8c) arranged in correspondence with the projection side prism member. The surface position detection apparatus further has a member for compensating relative positional displacement due to a polarization component of a light flux having passed through the first and second reflective surfaces.
摘要翻译：一种表面位置检测装置，其能够高度精确地检测待检测表面的表面位置，而不会受到通过反射表面的光束中产生的偏振分量的相对位置偏移的影响。在该装置中，投影系统具有具有第一反射面（7b，7c）的突出侧棱镜部件（7），并且受光系统具有配置有第二反射面（8b，8c）的受光棱镜部件（8）与突出侧棱镜构件对应。表面位置检测装置还具有用于补偿由于通过第一和第二反射面的光束的偏振分量引起的相对位移的构件。

7. 发明授权

US08384875B2 Exposure apparatus, exposure method, and method for producing device 有权
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US08384875B2
公开(公告)日：2013-02-26
申请号：US12461508
申请日：2009-08-13
申请人： Yasuhiro Hidaka , Tadashi Nagayama , Tohru Kiuchi
发明人： Yasuhiro Hidaka , Tadashi Nagayama , Tohru Kiuchi
IPC分类号： G03B27/44 , G03B27/42 , G03B27/70 , G03B27/32 , G03B27/54 , G03B27/72
CPC分类号： G03F7/70275 , G03F7/70208
摘要： An exposure apparatus includes a mask-moving section movable in a first direction while holding a mask formed with a pattern; an illumination system which forms first and second illumination areas separated each other by a spacing distance in the first direction; a substrate-moving section movable in a second direction while holding a photosensitive substrate; a projection optical system which forms first and second projected images of the patterns of the first and second illumination areas; and a restricting section which restricts the first and second projected images to be within first and second projection areas respectively. A spacing distance between a first conjugate area with the first projection area and a second conjugate area with the second projection area is set to be such a spacing distance that scanning exposures are successively performed for first and second transfer areas provided adjacently in the second direction.
摘要翻译：曝光装置包括：在保持形成有图案的掩模的同时沿第一方向移动的掩模移动部; 照明系统，其形成第一和第二照明区域，所述第一和第二照明区域在所述第一方向上彼此隔开间隔距离; 基板移动部，其能够在保持感光基板的同时沿第二方向移动; 投影光学系统，其形成第一和第二照明区域的图案的第一和第二投影图像; 以及限制部分，其将第一和第二投影图像分别限制在第一和第二投影区域内。与第一投影区域的第一共轭区域和与第二投影区域的第二共轭区域之间的间隔距离被设定为对于在第二方向上相邻设置的第一和第二传送区域连续进行扫描曝光的间隔距离。

8. 发明申请

US20100079743A1 Exposure apparatus, exposure method, and method for producing device 有权
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US20100079743A1
公开(公告)日：2010-04-01
申请号：US12461508
申请日：2009-08-13
申请人： Yasuhiro Hidaka , Tadashi Nagayama , Tohru Kiuchi
发明人： Yasuhiro Hidaka , Tadashi Nagayama , Tohru Kiuchi
IPC分类号： G03B27/58 , G03B27/32
CPC分类号： G03F7/70275 , G03F7/70208
摘要： An exposure apparatus includes a mask-moving section movable in a first direction while holding a mask formed with a pattern; an illumination system which forms first and second illumination areas separated each other by a spacing distance in the first direction; a substrate-moving section movable in a second direction while holding a photosensitive substrate; a projection optical system which forms first and second projected images of the patterns of the first and second illumination areas; and a restricting section which restricts the first and second projected images to be within first and second projection areas respectively. A spacing distance between a first conjugate area with the first projection area and a second conjugate area with the second projection area is set to be such a spacing distance that scanning exposures are successively performed for first and second transfer areas provided adjacently in the second direction.
摘要翻译：曝光装置包括：在保持形成有图案的掩模的同时沿第一方向移动的掩模移动部; 照明系统，其形成第一和第二照明区域，所述第一和第二照明区域在所述第一方向上彼此隔开间隔距离; 基板移动部，其能够在保持感光基板的同时沿第二方向移动; 投影光学系统，其形成第一和第二照明区域的图案的第一和第二投影图像; 以及限制部分，其将第一和第二投影图像分别限制在第一和第二投影区域内。与第一投影区域的第一共轭区域和与第二投影区域的第二共轭区域之间的间隔距离被设定为对于在第二方向上相邻设置的第一和第二传送区域连续进行扫描曝光的间隔距离。

9. 发明授权

US5552892A Illumination optical system, alignment apparatus, and projection exposure apparatus using the same 失效
标题翻译：照明光学系统，对准装置和使用其的投影曝光装置
公开(公告)号：US5552892A
公开(公告)日：1996-09-03
申请号：US446346
申请日：1995-05-22
申请人： Tadashi Nagayama
发明人： Tadashi Nagayama
IPC分类号： G03F7/20 , G03F7/38 , G03F9/00 , G01B11/00
CPC分类号： G03F9/70 , G03F7/2022 , G03F7/38
摘要： An illumination optical system and an alignment apparatus suitable for reticle alignment in the projection exposure apparatus. There is provided an illumination optical system having parallel beam supply means for supplying a parallel beam and a light guide for guiding the parallel beam from the parallel beam supply means to a target illumination object, comprising diffusion means, arranged between the parallel beam supply means and the light guide, for diffusing the parallel beam, wherein an incident end face of the light guide is arranged to be inclined by a predetermined angle with respect to a plane perpendicular to a direction of incidence of the parallel beam onto the diffusion means.
摘要翻译：一种照明光学系统和适用于投影曝光装置中的光罩对准的对准装置。提供一种具有用于提供平行光束的平行光束供给装置和用于将平行光束从平行光束提供装置引导到目标照明物体的光导的照明光学系统，包括扩散装置，其布置在平行光束供给装置和所述光导用于漫射所述平行光束，其中所述光导的入射端面被布置成相对于垂直于所述平行光束到所述漫射装置的入射方向的平面倾斜预定角度。

10. 发明授权

US09063438B2 Exposure apparatus, exposure method, and method for producing device 有权
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US09063438B2
公开(公告)日：2015-06-23
申请号：US13354899
申请日：2012-01-20
申请人： Masahiko Yasuda , Takahiro Masada , Yuho Kanaya , Tadashi Nagayama
发明人： Masahiko Yasuda , Takahiro Masada , Yuho Kanaya , Tadashi Nagayama
IPC分类号： G03F9/00 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/70141 , G03F7/70716 , G03F9/7088
摘要： A liquid immersion exposure apparatus includes a projection system having a last optical element, the projection system projecting a beam onto a substrate through an immersion liquid; a movable stage having a holder by which the substrate is held; a measurement member provided on the movable stage, the measurement member having a measurement portion covered with a light-transmissive material; a first alignment system by which an alignment mark is detected not through the immersion liquid; and a second alignment system which optically obtains, using the measurement member, first positional information of the beam projected by the projection system through the immersion liquid. In order to obtain the first positional information, the movable stage is moved so that the measurement member is under the projection system and a gap between the projection system and the measurement member is filled with the immersion liquid.
摘要翻译：液浸曝光装置包括具有最后光学元件的投影系统，投影系统通过浸没液体将光束投射到基板上; 可动台，具有保持基板的保持架; 测量构件，设置在所述可移动台上，所述测量构件具有覆盖有透光材料的测量部分; 第一对准系统，通过该第一对准系统不通过浸没液体检测对准标记; 以及第二对准系统，其使用所述测量构件，通过所述浸没液体，光学地获得由所述投影系统投影的所述光束的第一位置信息。为了获得第一位置信息，移动台被移动，使得测量构件在投影系统下方，并且投影系统和测量构件之间的间隙被浸没液体填充。

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