专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06328629B1 Method and apparatus for polishing workpiece 失效
标题翻译：抛光工件的方法和设备
公开(公告)号：US06328629B1
公开(公告)日：2001-12-11
申请号：US09026122
申请日：1998-02-19
申请人： Tetsuji Togawa , Norio Kimura , Koji Ono
发明人： Tetsuji Togawa , Norio Kimura , Koji Ono
IPC分类号： B24B4908
CPC分类号： B24B37/30 , B24B37/0053 , B24B37/013 , B24B49/08 , B24B49/16
摘要： A workpiece such as a semiconductor wafer is held by a top ring, and a lower surface of the workpiece is polished to a flat mirror finish by being pressed against a polishing surface of the turntable while the top ring and the turntable are rotated. While the workpiece is being polished, at least one of the pressure and the flow rate of a fluid which is supplied to an upper surface of the workpiece is detected. When at least one of the detected pressure and the detected flow rate changes, the polishing of the workpiece is stopped.
摘要翻译：诸如半导体晶片的工件由顶环保持，并且当顶环和转盘旋转时，通过被压靠在转盘的抛光表面上而将工件的下表面抛光成平坦的镜面。当工件被抛光时，检测供给到工件的上表面的流体的压力和流速中的至少一个。当检测到的压力和检测到的流量中的至少一个改变时，停止对工件的抛光。

2. 发明授权

US06139677A Polishing apparatus 失效
标题翻译：抛光设备
公开(公告)号：US06139677A
公开(公告)日：2000-10-31
申请号：US787916
申请日：1997-01-23
申请人： Tetsuji Togawa , Seiji Katsuoka , Norio Kimura , Toyomi Nishi
发明人： Tetsuji Togawa , Seiji Katsuoka , Norio Kimura , Toyomi Nishi
IPC分类号： B24B53/007 , B24B53/017 , B24B55/04 , C23F1/02
CPC分类号： B24B53/017 , B24B55/045
摘要： A polishing apparatus 70 is used for polishing a workpiece such as a semiconductor wafer to a flat mirror finish by a combination of chemical polishing and mechanical polishing. The polishing apparatus includes a turntable 73 with a polishing 74 cloth mounted on an upper surface thereof, a top ring 75 for supporting the workpiece to be polished and pressing the workpiece against the polishing cloth, and a dressing tool 79 for dressing the polishing cloth on the turntable. The polishing apparatus further includes a cover 10 which covers an upper surface of the turntable for preventing liquid on the turntable from being scattered, and inserting holes 17 and 21 formed in an upper wall of the cover for inserting the top ring and the dressing tool therethrough.
摘要翻译：抛光装置70用于通过化学抛光和机械抛光的组合将诸如半导体晶片的工件抛光到平面镜面。抛光装置包括：转台73，其上表面安装有抛光74布;顶环75，用于支撑待抛光的工件并将工件压靠在抛光布上;以及修整工具79，用于将抛光布修整在转盘。抛光装置还包括覆盖转台上表面以防止转台上的液体散落的盖10，以及形成在盖的上壁中的插入孔17和21，用于将顶环和修整工具穿过其中。

3. 发明授权

US5839947A Polishing apparatus 失效
标题翻译：抛光设备
公开(公告)号：US5839947A
公开(公告)日：1998-11-24
申请号：US795511
申请日：1997-02-05
申请人： Norio Kimura , Kunihiko Sakurai , Tetsuji Togawa , Seiji Katsuoka , Toyomi Nishi
发明人： Norio Kimura , Kunihiko Sakurai , Tetsuji Togawa , Seiji Katsuoka , Toyomi Nishi
IPC分类号： B24B53/007 , B24B53/017 , B24B5/00 , B24B29/00
CPC分类号： B24B53/017
摘要： A polishing apparatus is used for polishing a workpiece such as a semiconductor wafer to a flat mirror finish. The polishing apparatus includes a turntable having a polishing surface thereon, a top ring, for holding a workpiece to be polished and pressing the workpiece against the polishing surface, which is movable between a polishing position inside of the turntable and a standby position outside of the turntable, and a first device for keeping at least a lower surface of the top ring wet while the top ring is in the standby position. The polishing apparatus further includes a dressing tool for dressing the polishing surface on the turntable, and a second device for keeping at least a lower surface of the dressing tool wet while the dressing tool is in a standby position.
摘要翻译：抛光装置用于将诸如半导体晶片的工件抛光到平面镜面。抛光装置包括其上具有抛光表面的转台，用于保持要抛光的工件的顶环，并将工件压靠在抛光表面上，该抛光表面可在转盘内部的抛光位置和位于转盘外部的待机位置之间移动转盘和用于在顶环处于待机位置时保持顶环的至少下表面湿润的第一装置。抛光装置还包括用于修整转台上的抛光表面的修整工具，以及用于在修整工具处于待机位置时保持敷料工具的至少下表面湿润的第二装置。

4. 发明授权

US06413357B1 Polishing apparatus 失效
标题翻译：抛光设备
公开(公告)号：US06413357B1
公开(公告)日：2002-07-02
申请号：US09666855
申请日：2000-09-21
申请人： Tetsuji Togawa , Seiji Katsuoka , Norio Kimura , Toyomi Nishi
发明人： Tetsuji Togawa , Seiji Katsuoka , Norio Kimura , Toyomi Nishi
IPC分类号： C23F102
CPC分类号： B24B53/017 , B24B55/045
摘要： A polishing apparatus is used for polishing a workpiece such as a semiconductor wafer to a flat mirror finish by a combination of chemical polishing and mechanical polishing. The polishing apparatus includes a turntable with a polishing cloth mounted on an upper surface thereof, a top ring for supporting the workpiece to be polished and pressing the workpiece against the polishing cloth, and a dressing tool for dressing the polishing cloth on the turntable. The polishing apparatus further includes a cover which covers an upper surface of the turntable for preventing liquid on the turntable from being scattered, and inserting holes formed in an upper wall of the cover for inserting the top ring and the dressing tool therethrough.
摘要翻译：抛光装置用于通过化学抛光和机械抛光的组合将诸如半导体晶片的工件抛光到平整镜面。抛光装置包括：具有安装在其上表面上的抛光布的转台，用于支撑待抛光工件的顶环，并将工件压靠在抛光布上;以及修整工具，用于将抛光布修整在转台上。抛光装置还包括覆盖转盘上表面以防止转台上的液体散落的盖，以及形成在盖的上壁中的插孔，用于插入顶环和修整工具。

5. 发明授权

US5670011A Apparatus and method for polishing workpiece 失效
标题翻译：抛光工件的设备和方法
公开(公告)号：US5670011A
公开(公告)日：1997-09-23
申请号：US643099
申请日：1996-05-02
申请人： Tetsuji Togawa , Norio Kimura
发明人： Tetsuji Togawa , Norio Kimura
IPC分类号： B24B37/00 , B24B37/30 , B24B57/02 , B24B7/22
CPC分类号： B24B37/04 , B24B57/02
摘要： A workpiece such as a semiconductor wafer is polished to a flat mirror finish. The workpiece is held by a top ring, and a lower surface of the workpiece is polished by pressing the workpiece against an abrasive cloth mounted on a turntable while applying an abrasive solution onto the abrasive cloth. While the workpiece is being polished, an upper surface of the semiconductor wafer is prevented from being etched by supplying a neutralizer between the upper surface of the semiconductor wafer and the holding surface of the top ring.
摘要翻译：诸如半导体晶片的工件被抛光成平面镜面。工件由顶环保持，并且通过在安装在转盘上的研磨布上将工件压靠在研磨布上的同时将工件的下表面抛光。当抛光工件时，通过在半导体晶片的上表面和顶环的保持表面之间提供中和剂来防止半导体晶片的上表面被蚀刻。

6. 发明授权

US08895960B2 Electrode covering material, electrode structure and semiconductor device 有权
标题翻译：电极覆盖材料，电极结构和半导体器件
公开(公告)号：US08895960B2
公开(公告)日：2014-11-25
申请号：US12515585
申请日：2007-11-21
申请人： Masaki Murata , Nobuhide Yoneya , Norio Kimura
发明人： Masaki Murata , Nobuhide Yoneya , Norio Kimura
IPC分类号： H01L29/08 , H01L51/00 , H01L51/10 , H01L51/05
CPC分类号： H01L51/0095 , H01L51/0035 , H01L51/0083 , H01L51/0541 , H01L51/0545 , H01L51/105 , Y10T428/31533 , Y10T428/31681 , Y10T428/31692
摘要： A semiconductor device is provided and includes a field effect transistor having a gate electrode, a gate insulating layer, a channel forming region composed of an organic semiconductor material layer and a source/drain electrode made of a metal. A portion of the source/drain electrode in contact with the organic semiconductor material layer comprising the channel forming region is covered with an electrode coating material. Because the electrode coating material is composed of organic molecules having a functional group which can be bound to a metal ion and a functional group that binds to the source/drain electrode composed of the metal, low contact resistance and high mobility can be achieved.
摘要翻译：提供一种半导体器件，并且包括具有栅电极，栅极绝缘层，由有机半导体材料层构成的沟道形成区域和由金属制成的源极/漏极电极的场效应晶体管。与包含沟道形成区域的有机半导体材料层接触的源极/漏极电极的一部分被电极涂覆材料覆盖。由于电极涂层材料由具有与金属离子结合的官能团的有机分子和与由金属构成的源/漏电极结合的官能团构成，所以可以实现低接触电阻和高迁移率。

7. 发明授权

US08657135B2 Artificial nipple and nursing container using same 有权
标题翻译：人造乳头和使用相同的护理容器
公开(公告)号：US08657135B2
公开(公告)日：2014-02-25
申请号：US13505155
申请日：2010-10-29
申请人： Daisuke Yamashita , Norio Kimura , Masakazu Yoshida , Mitsuo Tashiro
发明人： Daisuke Yamashita , Norio Kimura , Masakazu Yoshida , Mitsuo Tashiro
IPC分类号： A61J9/04 , A61J11/02
CPC分类号： A61J9/04 , A61J11/02 , A61J11/04
摘要： An artificial nipple can include a nipple tip section that can sufficiently reach the sucking fossa and can be appropriately squashed The artificial nipple can have a base section that widens to match an attachment object, an areola section formed contiguously to the base section and that extends while narrowing gradually, and a nipple section that extends from the areola section and that narrows more than the areola section. A flange section can be provided in the base section with a predetermined thickness. A check valve can be formed with a valve body so as to be entirely accommodated within the thickness dimension of the flange, and provided in the base section.
摘要翻译：人造乳头可以包括可以充分到达吸吮窝并能够适当地挤压的乳头末端部分。人造乳头可以具有加宽以匹配附着对象的基部部分，与基部部分连续形成并且延伸的乳晕部分逐渐变细，以及从乳晕部分延伸并且比乳晕部分更窄的乳头部分。凸缘部分可以以预定厚度设置在基部部分中。止回阀可以形成有阀体，以便完全容纳在凸缘的厚度尺寸内，并设置在基部中。

8. 发明授权

US08614839B2 Image reader, auto document feeder, and image forming apparatus capable of generating shading data 有权
标题翻译：图像读取器，自动文件馈送器和能够生成阴影数据的图像形成装置
公开(公告)号：US08614839B2
公开(公告)日：2013-12-24
申请号：US12458875
申请日：2009-07-27
申请人： Motoya Sano , Takashi Fujii , Hiroshi Kubo , Shinya Kitaoka , Takeshi Akai , Atsushi Kanaya , Shingo Matsushita , Norio Kimura , Kenichiro Morita
发明人： Motoya Sano , Takashi Fujii , Hiroshi Kubo , Shinya Kitaoka , Takeshi Akai , Atsushi Kanaya , Shingo Matsushita , Norio Kimura , Kenichiro Morita
IPC分类号： H04N1/04 , H04N1/40
CPC分类号： H04N1/1215 , H04N1/00588 , H04N1/00602 , H04N1/0061 , H04N1/0062 , H04N1/00652 , H04N1/00689 , H04N1/00694 , H04N1/00705 , H04N1/0071 , H04N1/00713 , H04N1/00732 , H04N1/00734 , H04N1/00745 , H04N1/0075 , H04N1/00755 , H04N1/00774 , H04N1/00782 , H04N1/125 , H04N1/193 , H04N1/2032 , H04N2201/0098
摘要： In an image reader, a reading member fixedly mounted in the image reader reads an image on a sheet conveyed into the image reader. A guide is disposed opposite the reading member to support the sheet with respect to the reading member. A guide moving member moves the guide with respect to the reading member in a main scanning direction in which the reading member reads the image on the sheet. A guide rotating member rotates the guide in a sub-scanning direction perpendicular to the main scanning direction. A controller controls the reading member to scan different positions on the guide moved by the guide moving member and rotated by the guide rotating member to generate shading data.
摘要翻译：在图像读取器中，固定地安装在图像读取器中的读取部件读取传送到图像读取器中的片材上的图像。引导件布置成与读取构件相对，以相对于读取构件支撑片材。引导移动构件在读取构件读取片材上的图像的主扫描方向上相对于读取构件移动引导件。导向旋转构件沿垂直于主扫描方向的副扫描方向旋转引导件。控制器控制读取构件扫描由引导移动构件移动并由引导旋转构件旋转的引导件上的不同位置，以产生阴影数据。

9. 发明授权

US08038140B2 Document feeding device, image forming apparatus including same, and control method for the document feeding device 有权
标题翻译：文件馈送装置，包括它的图像形成装置以及文件馈送装置的控制方法
公开(公告)号：US08038140B2
公开(公告)日：2011-10-18
申请号：US12659152
申请日：2010-02-26
申请人： Norio Kimura , Hideki Tobinaga , Akira Hirose , Shinya Kitaoka , Motoya Sano , Atsushi Kanaya , Michitaka Suzuki
发明人： Norio Kimura , Hideki Tobinaga , Akira Hirose , Shinya Kitaoka , Motoya Sano , Atsushi Kanaya , Michitaka Suzuki
IPC分类号： B65H5/00
CPC分类号： B65H7/18 , B65H3/0607 , B65H3/0684 , B65H2404/6111 , B65H2405/3321 , B65H2511/11 , B65H2511/514 , B65H2513/10 , B65H2513/412 , B65H2513/50 , B65H2513/514 , B65H2701/1313 , B65H2801/39 , B65H2220/01 , B65H2220/02 , B65H2220/11 , B65H2220/03
摘要： A document feeding device includes a carrying unit capable of carrying documents, a drawing device drawing and supplying the documents, a drawing device drive source driving the drawing device, a separation unit including a separation device to separate the documents one by one, a separation device drive source driving the separation device, a conveying device conveying the documents, a reading unit including a reading device to read information of the documents, a discharge device discharging the documents, a first document detector provided between a document set position and the separation unit to detect the documents, and a second document detector provided downstream of the separation unit and near a separation position to detect the documents. The first and second document detectors detect the trailing end of each of the documents to control the operation of the drawing device on the basis of the result of the detection.
摘要翻译：文件馈送装置包括能够携带文件的携带单元，绘图和提供文件的绘图装置，驱动绘图装置的绘图装置驱动源，包括分离装置的分离单元，用于逐个分离文件;分离装置驱动分离装置的驱动源，传送文件的传送装置，读取单元，包括读取文件信息的读取装置，放出文件的放电装置，设置在原稿设置位置和分离单元之间的第一文件检测器，检测文档，以及第二文档检测器，其设置在分离单元的下游并且靠近分离位置以检测文档。第一和第二文档检测器检测每个文档的后端，以根据检测结果控制绘图装置的操作。

10. 发明申请

US20110155905A1 SPECIMEN OBSERVATION METHOD AND DEVICE, AND INSPECTION METHOD AND DEVICE USING THE METHOD AND DEVICE 有权
标题翻译：标本观察方法和装置，以及使用方法和装置的检查方法和装置
公开(公告)号：US20110155905A1
公开(公告)日：2011-06-30
申请号：US12937145
申请日：2009-04-10
申请人： Masahiro Hatakeyama , Takeshi Murakami , Yoshihiko Naito , Kenji Terao , Norio Kimura , Kenji Watanabe
发明人： Masahiro Hatakeyama , Takeshi Murakami , Yoshihiko Naito , Kenji Terao , Norio Kimura , Kenji Watanabe
IPC分类号： G01N23/225 , G01N23/00
CPC分类号： H01J37/28 , H01J37/22 , H01J37/244 , H01J37/29 , H01J2237/24475 , H01J2237/24585 , H01J2237/24592 , H01J2237/2805 , H01J2237/2806 , H01J2237/2817 , H01L22/12
摘要： A technique capable of improving the ability to observe a specimen using an electron beam in an energy region which has not been conventionally given attention is provided. This specimen observation method comprises: irradiating the specimen with an electron beam; detecting electrons to be observed which have been generated and have obtained information on the specimen by the electron beam irradiation; and generating an image of the specimen from the detected electrons to be observed. The electron beam irradiation comprises irradiating the specimen with the electron beam with a landing energy set in a transition region between a secondary emission electron region in which secondary emission electrons are detected and a mirror electron region in which mirror electrons are detected, thereby causing the secondary emission electrons and the mirror electrons to be mixed as the electrons to be observed. The detection of the electrons to be observed comprises performing the detection in a state where the secondary emission electrons and the mirror electrons are mixed. Observation and inspection can be quickly carried out for a fine foreign material and pattern of 100 nm or less.
摘要翻译：提供了一种技术，其能够提高在未经常被注意的能量区域中使用电子束观察样本的能力。该样本观察方法包括：用电子束照射样本; 检测已经产生的待观察的电子，并通过电子束照射获得关于样品的信息; 以及从所检测的电子产生待观察的样本的图像。电子束照射包括用电子束照射样本，其中在其中检测到二次发射电子的二次发射电子区域和其中检测到反射镜电子的镜电子区域之间的过渡区域中设置的着陆能量，从而使次级发射电子和镜电子作为待观察的电子进行混合。要观察的电子的检测包括在二次发射电子和镜电子混合的状态下进行检测。对于100nm以下的细小异物和图案，可以快速进行观察和检查。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式