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    • 1. 发明授权
    • Heat treatment method and device
    • 热处理方法及装置
    • US5645419A
    • 1997-07-08
    • US409098
    • 1995-03-23
    • Tetsu OhsawaHiroyuki IwaiHisashi KikuchiShingo WatanabeKeiji TakanoTsutomu HaraokaKen Nakao
    • Tetsu OhsawaHiroyuki IwaiHisashi KikuchiShingo WatanabeKeiji TakanoTsutomu HaraokaKen Nakao
    • H01L21/00H01L21/677F23D11/44
    • H01L21/67115H01L21/67769H01L21/67781
    • A heat treatment device including a handling chamber that has a carriers feed in/out opening for carriers holding plural sheets of objects to be treated parallelly vertical, a vertical heat treatment furnace for heat treating the objects and a posture changer for swinging the carriers near the carriers feed in/out opening of the handling chamber on a rotational center into a territory of lower sides of the carriers to change the posture of the objects to be treated from the vertical position to the horizontal position. The heat treatment device also has a carriers storage unit disposed above the posture changing means for storing a plural number of posture changed carriers, conveying device for conveying the carriers between the storage unit and the posture changing device and the heat treatment furnace side. Also, provided is a transferrer for transferring the objects-to-be-treated to/from an objects-to-be-treated holder for loading and unloading into/out of the heat treatment furnace side. The posture changer swings the carriers on the rotational center to sides of the carriers to change the carriers' posture from vertical to horizontal so the carriers have postures changed along a swing track of a minimum radius with small bulge amounts and a minimum moving amount. Thus, a conveying distance and a conveying time for conveying the posture changed carriers to the upper storage unit be reduced, and the heat treatment device can be smaller-sized and have improved processing efficiency.
    • 一种热处理装置,其特征在于,具备搬运室,该处理室具有用于保持待平行放置待处理的多个物体的载体的进/出开口,用于对物体进行热处理的立式热处理炉,以及用于使载体附近的载体摆动的姿势变换器 载体将转动中心的处理室的进/出开口输送到载体的下侧的区域中,以将被处理物体的姿态从垂直位置改变到水平位置。 该热处理装置还具有:载置体存放部,其设置在姿势变更机构的上方,用于存储多个姿势变化的载体,用于在存放部与姿势变更装置以及热处理炉侧之间输送载体的输送装置。 而且,提供了一种转移器,用于将待处理物体转移到待处理的待处理的保持器,用于装载和卸载进入/离开热处理炉侧。 姿态变换器将转动中心的载体摆动到载体的侧面,以将载体的姿态从垂直方向转换为水平,使得载体具有沿着具有小凸起量和最小移动量的最小半径的摆动轨道改变的姿势。 因此,能够减少用于输送姿势的输送距离和输送时间,使载体向上部存储单元减少,并且热处理装置可以更小尺寸并且具有改善的处理效率。
    • 3. 发明授权
    • Substrate transferring apparatus
    • 基板转印装置
    • US5445486A
    • 1995-08-29
    • US263216
    • 1994-06-17
    • Hirofumi KitayamaHiroyuki IwaiShinichi WadaTetsu Oosawa
    • Hirofumi KitayamaHiroyuki IwaiShinichi WadaTetsu Oosawa
    • B65G49/07H01L21/677H01L21/687B65G65/00
    • H01L21/68707H01L21/67781Y10S414/137
    • According to the invention, there is provided a substrate transferring apparatus for transferring substrates from a substrate transport container containing a plurality of substrates to be treated to a substrate holder for holding a plurality of substrates to be treated or vice versa, the apparatus including arms for supporting substrate, a supporting member for supporting the arms, and a drive arrangement for driving the supporting member to operate. Each of the arms include a plate shaped arm main body having a connecting section for connecting the arm to the drive arrangement, supporting sections having a thickness greater than that of the arm main body for supporting corresponding peripheral areas of the substrate, and stoppers having a thickness greater than that of the supporting sections for abutting lateral sides of the substrate to rigidly hold the substrate.
    • 根据本发明,提供了一种用于将衬底从含有待处理的多个衬底的衬底输送容器转移到用于保持多个待处理衬底或反之亦然的衬底保持器的衬底转移装置,该装置包括用于 支撑基板,用于支撑臂的支撑构件,以及用于驱动支撑构件进行操作的驱动装置。 每个臂包括板形臂主体,其具有用于将臂连接到驱动装置的连接部分,其具有大于臂主体的厚度的支撑部分,用于支撑基板的相应周边区域,并且具有 厚度大于用于邻接基板的侧面的支撑部分的厚度以刚性地保持基板。
    • 4. 发明授权
    • Method of loading and unloading wafer boat
    • 装载和卸载晶圆舟的方法
    • US5055036A
    • 1991-10-08
    • US661103
    • 1991-02-26
    • Takanobu AsanoHiroyuki IwaiYuji Ono
    • Takanobu AsanoHiroyuki IwaiYuji Ono
    • C30B35/00F27B17/00H01L21/677H01L21/687
    • H01L21/67757C30B35/005F27B17/0025H01L21/67781H01L21/68707
    • A wafer boats supporting wafers is loaded into and unloaded from a reaction tube with a lid therebelow in a vertical heat treatment apparatus, while holding the wafer boat vertical with respect to the lid. An arm is provided in a space below the reaction tube, for transferring wafer boats along a path, while holding the wafer boats vertical and in a substantially horizontal plane. Three stations are formed in the path. At the first station, unprocessed wafers are mounted on a first wafer boat located, while wafers mounted on a first wafer boat is being heat-treated in said reaction tube. Then, the first wafer boat is transferred from the first station to the third station, and is held at the third station. While the first wafer boat is held at the third station, the second wafer boat is lowered to the second station to unload the second wafer boat from the reaction tube, and then is transferred to the first station. Thereafter, the heat-treated wafers are removed from the second wafer boat located at the first station. Next, the first wafer boat is transferred from the third station to the second station, while the second wafer boat is located at the first station, and then is mounted onto the lid, thereby to load the first wafer boat into the reaction tube.
    • 在垂直热处理装置中,将晶片舟片装载在具有盖的反应管中并从其卸载,同时将晶片舟皿相对于盖垂直。 在反应管下面的空间中设置有一个臂,用于沿着路径传送晶片舟,同时将晶片舟垂直并且在基本水平的平面中。 路上形成了三个站。 在第一站处,未加工的晶片安装在位于第一晶片舟的位置上,而安装在第一晶片舟皿上的晶片在所述反应管中进行热处理。 然后,将第一晶片舟从第一站传送到第三站,并保持在第三站。 当第一晶片舟被保持在第三站时,第二晶片舟被降低到第二站,以将第二晶片舟从反应管卸载,然后被传送到第一站。 此后,将热处理的晶片从位于第一工位的第二晶片舟皿移除。 接下来,将第一晶片舟从第三站传送到第二站,而第二晶片舟位于第一站,然后安装到盖上,从而将第一晶片舟装载到反应管中。
    • 6. 发明授权
    • Vertical heat-treatment apparatus having a wafer transfer mechanism
    • 具有晶片传送机构的立式热处理装置
    • US5110248A
    • 1992-05-05
    • US550981
    • 1990-07-11
    • Takanobu AsanoHirofumi KitayamaHiroyuki IwaiYuuji Ono
    • Takanobu AsanoHirofumi KitayamaHiroyuki IwaiYuuji Ono
    • H01L21/00H01L21/677
    • H01L21/67115H01L21/67781
    • A vertical heat-treatment apparatus is provided with a mechanism for automatically transferring semiconductor wafers from carriers to a boat for a vertical type furnace. The automatic transferring mechanism comprises a port for receiving a plurality of carriers arranged in series in an upright state, a posture change mechanism for changing the posture of wafers in the carriers from the upright state to the horizontal state, a parallel transfer mechanism for transferring the carriers on the boat to the posture change mechanism, a carrier loading/unloading mechanism for loading the carriers on a station, a wafer loading/unloading mechanism for taking out the wafers from the carriers on the station in turn and transferring the taken-out wafers to the boat in turn, and a mounting mechanism for mounting the boat in the furnace. The carrier loading/unloading mechanism and the wafer loading/unloading mechanism are mounted on a common frame and are rotated and lifted at the same time.
    • 立式热处理装置设置有用于将半导体晶片从载体自动转移到垂直型炉的船的机构。 自动转印机构包括用于接收以直立状态串联布置的多个载体的端口,用于将载体中的晶片的姿势从直立状态改变为水平状态的姿势改变机构,用于传送 船上的载体到姿势改变机构,用于将载体载载在车站上的载体装载/卸载机构,用于依次从车站上的载体取出晶片的晶片装载/卸载机构,并传送取出的晶片 依次转到船上,以及用于将船安装在炉中的安装机构。 载体装载/卸载机构和晶片装载/卸载机构安装在公共框架上并同时旋转和提升。
    • 9. 发明授权
    • Treatment apparatus
    • 治疗仪器
    • US5562383A
    • 1996-10-08
    • US583669
    • 1996-01-05
    • Hiroyuki IwaiTamotsu TanifujiTakanobu AsanoRyoichi Okura
    • Hiroyuki IwaiTamotsu TanifujiTakanobu AsanoRyoichi Okura
    • H01L21/304H01L21/677H01L21/00
    • H01L21/67769H01L21/67772Y10S414/137Y10S414/139Y10S414/14
    • A treatment apparatus comprises a treatment chamber for performing a treatment for a workpiece W, a loading chamber connected to the treatment chamber, for loading and unloading a holding member which contains the workpiece into and from the treatment chamber, and an input/output chamber for inputting and outputting the workpiece to and from the loading chamber. The input/output chamber includes a cassette accommodating vessel port which holds a cassette accommodating vessel. The vessel is filled with clean air or an inert gas, and is airtightly closed. A cassette receiving mechanism is disposed below the port and lowers only the cassette of the vessel so as to receive the cassette. Thus, when the cassette is input and output to and from the outside of the treatment apparatus, the workpiece contained within the cassette is not exposed to the atmosphere in a working region. Consequently, it is not necessary to improve the cleanliness level of the atmosphere in the working region. As a result, the construction cost of the clean room and the operation cost thereof can be reduced. A clean air blowing device is disposed below the port. The clean air blowing device blows a side flow of clean air. Thus, the atmosphere at a position below the port where air tends to stay is circulated. Thus, since the surface of the workpiece loaded in the treatment chamber is exposed to the side flow, particles and the like that adhere thereto are purged.
    • 处理装置包括:处理室,用于对工件W进行处理,连接到处理室的装载室,用于将包含工件的保持构件装载到处理室和从处理室中卸载;以及输入/输出室, 将工件输入和输出到装载室。 输入/输出室包括容纳容纳容器的盒式磁带容纳容器端口。 容器内装有清洁空气或惰性气体,并且气密地关闭。 盒接收机构设置在端口下方,并且仅降低容器的盒以便接收盒。 因此,当盒子从处理设备的外部输入和输出时,包含在盒内的工件不会暴露在工作区域中的大气中。 因此,不需要提高工作区域的气氛的清洁度。 因此,能够降低洁净室的建筑成本及其运转成本。 清洁吹风装置设置在端口下方。 清洁吹风装置吹扫清洁空气的侧流。 因此,空气倾向于停留的港口下方的气氛被循环。 因此,由于装载在处理室中的工件的表面暴露于侧流,所以清除附着在其上的颗粒等。