专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06885815B2 Thermal processing apparatus performing irradiating a substrate with light 有权
标题翻译：用光照射基板的热处理装置
公开(公告)号：US06885815B2
公开(公告)日：2005-04-26
申请号：US10620874
申请日：2003-07-16
申请人： Tatsufumi Kusuda , Yuko Ikumi
发明人： Tatsufumi Kusuda , Yuko Ikumi
IPC分类号： H01L21/00 , F26B19/00
CPC分类号： H01L21/67248 , H01L21/67115
摘要： A plurality of flash lamps are covered with a reflector. Optical fiber members are attached to the reflector on portions located immediately above the flash lamps. When the flash lamps emit flash light toward a semiconductor wafer, the optical fiber members partially guide the emitted light so that a CCD measures the intensity of light emitted from each of the plurality of flash lamps. A computer detects the emission state of each of the plurality of flash lamps on the basis of a result of measurement. At this time, the computer compares standard luminous intensity obtained when the irradiation state on the semiconductor wafer satisfies a prescribed criterion with the luminous intensity in actual processing for detecting the emission states of the plurality of flash lamps. Thus provided is a thermal processing apparatus capable of reliably and simply detecting deterioration of lamps.
摘要翻译：多个闪光灯被反射器覆盖。光纤构件在紧邻闪光灯的上方的部分附接到反射器。当闪光灯朝向半导体晶片发射闪光时，光纤部件部分地引导发射的光，使得CCD测量从多个闪光灯中的每一个发射的光的强度。计算机基于测量结果检测多个闪光灯中的每一个的发射状态。此时，计算机将当半导体晶片上的照射状态满足规定标准时获得的标准发光强度与用于检测多个闪光灯的发光状态的实际处理中的发光强度进行比较。因此，能够可靠且简单地检测灯的劣化的热处理装置。

IPRDB

热门服务

关于我们

友情链接

联系方式