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1. 发明授权

US07749620B2 Electromagnetic wave shield material and process for producing the same 有权
标题翻译：电磁波屏蔽材料及其制造方法
公开(公告)号：US07749620B2
公开(公告)日：2010-07-06
申请号：US10520927
申请日：2003-07-11
申请人： Taro Yoshida , Atsushi Suzuki , Yasuo Tsubai , Kazuhisa Kobayashi
发明人： Taro Yoshida , Atsushi Suzuki , Yasuo Tsubai , Kazuhisa Kobayashi
IPC分类号： B32B5/16
CPC分类号： H05K9/0096 , C23C18/1608 , C23C18/1612 , C23C18/208 , C23C18/2086 , C23C18/30 , C25D3/38 , C25D5/56 , C25D7/001 , Y10T428/12896 , Y10T428/24917
摘要： The present invention is to provide an electromagnetic wave shielding material which comprises a transparent substrate and a fine line pattern formed thereon, wherein the fine line pattern comprises a metal plating film using a physically developed metal silver as a catalytic nucleus and a process for preparing an electromagnetic wave shielding material which comprises exposing a light-sensitive material having a physical development nuclei layer and a silver halide emulsion layer on a transparent substrate in this order, precipitating metal silver with an optional fine line pattern onto the physical development nuclei layer by physical development, then, removing a layer provided on the physical development nuclei layer, and subjecting to plating a metal with the use of the physically developed metal silver as a catalytic nucleus.
摘要翻译：本发明提供一种电磁波屏蔽材料，其包括透明基板和形成在其上的细线图案，其中细线图案包括使用物理显影的金属银作为催化核的金属镀膜，以及制备电磁波屏蔽材料，其包括在透明基板上依次将具有物理显影核层和卤化银乳剂层的感光材料依次曝光，通过物理显影将金属银以任选的细线图案沉淀到物理显影核层上然后，移除在物理显影核层上提供的层，并且使用物理显影的金属银作为催化核进行镀覆金属。

2. 发明申请

US20060115636A1 Electromagnetic wave shield material and process for producing the same 有权
标题翻译：电磁波屏蔽材料及其制造方法
公开(公告)号：US20060115636A1
公开(公告)日：2006-06-01
申请号：US10520927
申请日：2003-07-11
申请人： Taro Yoshida , Atsushi Suzuki , Yasuo Tsubai , Kazuhisa Kobayashi
发明人： Taro Yoshida , Atsushi Suzuki , Yasuo Tsubai , Kazuhisa Kobayashi
IPC分类号： B32B15/00 , B32B3/00
CPC分类号： H05K9/0096 , C23C18/1608 , C23C18/1612 , C23C18/208 , C23C18/2086 , C23C18/30 , C25D3/38 , C25D5/56 , C25D7/001 , Y10T428/12896 , Y10T428/24917
摘要： The present invention is to provide an electromagnetic wave shielding material which comprises a transparent substrate and a fine line pattern formed thereon, wherein the fine line pattern comprises a metal plating film using a physically developed metal silver as a catalytic nucleus and a process for preparing an electromagnetic wave shielding material which comprises exposing a light-sensitive material having a physical development nuclei layer and a silver halide emulsion layer on a transparent substrate in this order, precipitating metal silver with an optional fine line pattern onto the physical development nuclei layer by physical development, then, removing a layer provided on the physical development nuclei layer, and subjecting to plating a metal with the use of the physically developed metal silver as a catalytic nucleus
摘要翻译：本发明提供一种电磁波屏蔽材料，其包括透明基板和形成在其上的细线图案，其中细线图案包括使用物理显影的金属银作为催化核的金属镀膜，以及制备电磁波屏蔽材料，其包括在透明基板上依次将具有物理显影核层和卤化银乳剂层的感光材料依次曝光，通过物理显影将金属银以任选的细线图案沉淀到物理显影核层上然后，去除物理显影核层上提供的层，并且使用物理研磨的金属银作为催化核进行金属镀覆

3. 发明授权

US08012676B2 Process for preparing conductive material 有权
标题翻译：制备导电材料的方法
公开(公告)号：US08012676B2
公开(公告)日：2011-09-06
申请号：US12305929
申请日：2007-06-22
申请人： Takenobu Yoshiki , Shigeki Shino , Kazuhisa Kobayashi
发明人： Takenobu Yoshiki , Shigeki Shino , Kazuhisa Kobayashi
IPC分类号： G03C1/00 , G03C1/005 , G03C5/26 , G03C1/06 , G03F7/00
CPC分类号： H05K3/106 , H05K2203/0786 , H05K2203/1157 , H05K2203/122
摘要： It is to provide a process for preparing a conductive material in which transparency and conductivity are both high, and storage stability is high, and further, in a process for preparing a conductive material utilizing ultra fine silver particles, to provide a process for preparing a conductive material having high conductivity without requiring a calcination step which has conventionally been required.A process for preparing a conductive material having a conductive pattern containing silver on a support, which process for preparing a conductive material comprises acting at least one of the following mentioned (I) to (IV) on the pattern portion containing silver provided on the support:(I) a reducing substance,(II) a water-soluble phosphorus oxo acid compound,(III) a water-soluble halogen compound,(IV) warm water of 55° C. or higher.
摘要翻译：本发明提供一种制备透明性和导电性均高，储存稳定性高的导电材料的方法，此外，在制备使用超细银粒子的导电材料的方法中，提供制备具有高导电性的导电材料，而不需要通常需要的煅烧步骤。一种用于制备具有在载体上含有银的导电图案的导电材料的方法，该制备导电材料的方法包括在设置在载体上的含有银的图案部分上起到以下提及的（I）至（IV）中的至少一种作用：（I）还原物质，（II）水溶性磷含氧化合物，（III）水溶性卤素化合物，（IV）55℃以上的温水。

4. 发明授权

US06648621B2 Apparatus for forming pattern onto article during injection molding 失效
公开(公告)号：US06648621B2
公开(公告)日：2003-11-18
申请号：US09865588
申请日：2001-05-29
申请人： Shinpei Oono , Kazushi Miyazawa , Keiji Hanamoto , Takashi Tarutani , Takashi Matano , Kazuhisa Kobayashi , Hiroyuki Atake
发明人： Shinpei Oono , Kazushi Miyazawa , Keiji Hanamoto , Takashi Tarutani , Takashi Matano , Kazuhisa Kobayashi , Hiroyuki Atake
IPC分类号： B29C4514
CPC分类号： B29C45/1418 , B29C2045/14213 , B29C2045/14286 , Y10S425/048 , Y10S425/221
摘要： In the method, after the pattern-bearing film is fed to the female mold, the distal end of the film is fixed under a lower portion of the female mold, and at the same time the film is retreated by a force from the film supply portion. Thus, this tightens up the film so that the slacks or wrinkles cannot be formed on the film. Therefore, the film can be fortunately spread around the parting surface of the female mold. In the apparatus, the film suppressing frame is pressed to the female mold through the sliding rod arranged in the female mold, in such a manner that the female mold embraces the frame. Thus, the pressing of the frame is performed by a simple structure, and the film is accurately positioned to the internal surface of the female mold. Also, the film suppressing frame is constituted to advance from and retreat to the female mold. Thus, this causes a space between the both molds and an outside standby position to be useless. A space around the apparatus can be effectively utilized.

5. 发明申请

US20070144253A1 Liquid surface detection device 审中-公开
标题翻译：液面检测装置
公开(公告)号：US20070144253A1
公开(公告)日：2007-06-28
申请号：US11526665
申请日：2006-09-26
申请人： Kazuhisa Kobayashi
发明人： Kazuhisa Kobayashi
IPC分类号： G01F23/26 , G01B7/14 , G01N1/14 , G01N35/10
CPC分类号： G01N35/1011 , G01F23/28 , G01N2035/1025
摘要： A liquid surface detector is constituted of an oscillator that outputs an alternating current signal at a frequency of 130 kHz, and a modulator circuit for modulating the alternating current signal with a capacitance index signal that indicates a change in capacitance. The capacitance changes with movement of a suction probe relative to a cup containing a liquid. An output signal of the modulator is filtered and amplified by a first filtering circuit that passes a frequency component of 130 kHz through it. Through a wave detector circuit and a second filtering circuit that passes a frequency component of 2 kHz, a signal corresponding to the capacitance index signal is detected from an output of the first filtering circuit, and is compared with a reference signal, to detect that the probe gets into contact with the liquid surface.
摘要翻译：液面检测器由输出130kHz频率的交流信号的振荡器和调制电路构成，该调制电路用电容指数信号调制交流信号。电容随着吸头相对于含有液体的杯的移动而变化。调制器的输出信号被通过其通过130kHz的频率分量的第一滤波电路进行滤波和放大。通过波检测器电路和通过2kHz的频率分量的第二滤波电路，从第一滤波电路的输出检测对应于电容指数信号的信号，并将其与参考信号进行比较，以检测是否探头与液面接触。

6. 发明授权

US06416306B2 Apparatus for forming pattern onto article during injection molding 有权
标题翻译：用于在注射成型期间将图案形成到制品上的装置
公开(公告)号：US06416306B2
公开(公告)日：2002-07-09
申请号：US09865568
申请日：2001-05-29
申请人： Shinpei Oono , Kazushi Miyazawa , Keiji Hanamoto , Takashi Tarutani , Takashi Matano , Kazuhisa Kobayashi , Hiroyuki Atake
发明人： Shinpei Oono , Kazushi Miyazawa , Keiji Hanamoto , Takashi Tarutani , Takashi Matano , Kazuhisa Kobayashi , Hiroyuki Atake
IPC分类号： B29C4514
CPC分类号： B29C45/1418 , B29C2045/14213 , B29C2045/14286 , Y10S425/048 , Y10S425/221
摘要： In the method, after the pattern-bearing film is fed to the female mold, the distal end of the film is fixed under a lower portion of the female mold, and at the same time the film is retreated by a force from the film supply portion. Thus, this tightens up the film so that the slacks or wrinkles cannot be formed on the film. Therefore, the film can be fortunately spread around the parting surface of the female mold. In the apparatus, the film suppressing frame is pressed to the female mold through the sliding rod arranged in the female mold, in such a manner that the female mold embraces the frame. Thus, the pressing of the frame is performed by a simple structure, and the film is accurately positioned to the internal surface of the female mold Also, the film suppressing frame is constituted to advance from and retreat to the female mold. Thus, this causes a space between the both molds and an outside standby position to be useless. A space around the apparatus can be effectively utilized.
摘要翻译：在该方法中，在将图案承载膜供给到阴模之后，将膜的前端固定在阴模的下部，同时通过来自胶片供给的力使膜退回一部分。因此，这会使胶片收紧，使得在胶片上不能形成松弛或皱纹。因此，这款电影可以幸福地散布在阴模的分型面上。在该装置中，通过设置在阴模中的滑动杆将膜抑制框架按压到阴模，使得阴模包围框架。因此，通过简单的结构进行框架的按压，并且将膜精确地定位到阴模的内表面。另外，膜抑制框架构成为前进和后退到阴模。因此，这将导致两个模具和外部备用位置之间的空间是无用的。可以有效地利用装置周围的空间。

7. 发明授权

US6110316A Method and apparatus for curved-surface transfer 有权
标题翻译：曲面转移的方法和装置
公开(公告)号：US6110316A
公开(公告)日：2000-08-29
申请号：US125692
申请日：1998-10-16
申请人： Kazuhisa Kobayashi , Mitsutoyo Miyakoshi , Masaru Okamoto , Haruo Miyashita , Hirohisa Yoshikawa , Haruo Ono , Reiko Kan , Kazuo Kitamura , Tutomu Ichihashi
发明人： Kazuhisa Kobayashi , Mitsutoyo Miyakoshi , Masaru Okamoto , Haruo Miyashita , Hirohisa Yoshikawa , Haruo Ono , Reiko Kan , Kazuo Kitamura , Tutomu Ichihashi
IPC分类号： B41M3/12 , B44C1/16 , B44C1/17 , B32B3/00 , B32B31/12
CPC分类号： B41M3/12 , B44C1/16 , B44C1/17 , Y10S428/914 , Y10T156/1705 , Y10T156/171 , Y10T428/24802
摘要： In order to produce a decorative laminate by adhering a transfer printing sheet to the three-dimensional irregular surface of a base, solid particles (P) are caused to collide with the transfer printing sheet (S) from the back surface thereof with the transfer printing sheet (S) facing the irregular surface of the base (B), and the transfer printing sheet (S) is brought into pressure contact with the irregular surface of the base (B) by utilizing the collisional pressure, thereby transferring the transfer printing sheet (S) to the base (B). In the case where a thermally stretchable transfer printing sheet is used, it is better to conduct transfer printing by heating at least one of the base, the transfer printing sheet, the solid particles, and so on.
摘要翻译： PCT No.PCT / JP97 / 04490 Sec。 371日期：1998年10月16日 102（e）日期1998年10月16日PCT 1997年12月8日PCT公布。公开号WO98 / 29265 日期1998年7月9日为了通过将转印印刷片粘附到基体的三维不规则表面来制造装饰层压体，使固体颗粒（P）从转印纸（S）的背面碰撞通过利用碰撞压力使转印用印刷用纸（S）与基材（B）的不规则表面相对，并且转印用纸（S）与基材（B）的不规则表面压力接触，由此将转印纸（S）转印到基材（B）上。在使用热拉伸转印纸的情况下，最好通过加热基材，转印印刷片，固体颗粒等中的至少一种来进行转印。

8. 发明授权

US06270331B1 Apparatus for forming pattern onto article during injection molding 有权
公开(公告)号：US06270331B1
公开(公告)日：2001-08-07
申请号：US09263817
申请日：1999-03-08
申请人： Shinpei Oono , Kazushi Miyazawa , Keiji Hanamoto , Takashi Tarutani , Takashi Matano , Kazuhisa Kobayashi , Hiroyuki Atake
发明人： Shinpei Oono , Kazushi Miyazawa , Keiji Hanamoto , Takashi Tarutani , Takashi Matano , Kazuhisa Kobayashi , Hiroyuki Atake
IPC分类号： B29C4516
CPC分类号： B29C45/1418 , B29C2045/14213 , B29C2045/14286 , Y10S425/048 , Y10S425/221
摘要： In the method, after the pattern-bearing film is fed to the female mold, the distal end of the film is fixed under a lower portion of the female mold, and at the same time the film is retreated by a force from the film supply portion. Thus, this tightens up the film so that the slacks or wrinkles cannot be formed on the film. Therefore, the film can be fortunately spread around the parting surface of the female mold. In the apparatus, the film suppressing frame is pressed to the female mold through the sliding rod arranged in the female mold, in such a manner that the female mold embraces the frame. Thus, the pressing of the frame is performed by a simple structure, and the film is accurately positioned to the internal surface of the female mold. Also, the film suppressing frame is constituted to advance from and retreat to the female mold. Thus, this causes a space between the both molds and an outside standby position to be useless. A space around the apparatus can be effectively utilized.

9. 发明授权

US6071456A Process for effecting injection-molded-in decoration 失效
标题翻译：注塑成型工艺
公开(公告)号：US6071456A
公开(公告)日：2000-06-06
申请号：US617888
申请日：1996-05-15
申请人： Keiji Hanamoto , Takeshi Matano , Kazuhisa Kobayashi , Masayuki Shibata , Hiroyuki Atake
发明人： Keiji Hanamoto , Takeshi Matano , Kazuhisa Kobayashi , Masayuki Shibata , Hiroyuki Atake
IPC分类号： B29C33/18 , B29C45/14 , B29C45/16 , B29C45/26 , B29C45/72 , B29K105/20 , B29L9/00
CPC分类号： B29C45/1418 , B29C2045/14286 , B29C2045/14918
摘要： A decoration sheet is retained on the cavity periphery by a sheet clamp in such a state that it is projected into a molding cavity of a female die. Then the decoration sheet is heated and softened by a curved hot platen, and thereafter it is drawn through suction ports of the female die to bring the sheet into close fit to the inner periphery of the molding cavity. The deformation amount of the decoration sheet heated and softened is decreased in premolding the sheet into the molding cavity surface of the female die. Therefore, distortion of the decoration sheet, appearance of wrinkles, and breakage thereof become little. Next, the female die and the male die are coupled with each other to effect die clamping, and a molten resin is poured to fill the molding cavity to effect injection molding.
摘要翻译： PCT No.PCT / JP95 / 01509 Sec。 371日期：1996年5月15日 102（e）日期1996年5月15日PCT提交1995年7月28日PCT公布。公开号WO96 / 03268 日期1996年2月8日装饰片通过片夹在空腔周边保持，使其突出到阴模的模腔中。然后通过弯曲的热压板加热和软化装饰片，然后通过阴模的吸入口拉动装饰片，使片材紧密地配合到模腔的内周。加热软化的装饰片的变形量在将片材预成型为阴模的模腔表面时减少。因此，装饰片的变形，皱纹的外观和破损变小。接下来，阴模和阳模相互耦合以实现模夹紧，并且注入熔融树脂以填充模腔以实现注塑。

10. 发明授权

US5102780A Silver halide photographic photosensitive material 失效
公开(公告)号：US5102780A
公开(公告)日：1992-04-07
申请号：US514968
申请日：1990-04-26
申请人： Eiichi Terashima , Seiichi Sumi , Kazuhisa Kobayashi , Yoshio Shibata
发明人： Eiichi Terashima , Seiichi Sumi , Kazuhisa Kobayashi , Yoshio Shibata
IPC分类号： G03C1/005 , G03C1/30 , G03C1/74
CPC分类号： G03C1/30 , G03C1/305 , G03C1/74
摘要： The present invention provides a silver halide photographic photosensitive material excellent in dimensional stability which comprises a polyethylene terephthalate film support and, provided thereon, at least one gelatin layer containing an active halogen type hardener, wherein water content in the gelatin layer is 20% by weight or less based on total amount of gelatin. Further provided is a method for producing such silver halide photographic photosensitive material which comprises coating a gelatin coating solution containing an active halogen type hardener on a polyethylene terephthalate film support and then drying the coat, wherein the coat is dried so that water content based on total amount of gelatin is 20% by weight or less and then, is subjected to a heat treatment.

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