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    • 10. 发明申请
    • LIQUID TREATMENT APPARATUS AND LIQUID TREATMENT METHOD
    • 液体处理装置和液体处理方法
    • US20140148006A1
    • 2014-05-29
    • US13879175
    • 2011-08-31
    • Takashi TanakaYusuke SaitoMitsuaki Iwashita
    • Takashi TanakaYusuke SaitoMitsuaki Iwashita
    • H01L21/67H01L21/288
    • H01L21/6723C23C18/1619C23C18/1653C23C18/1675C23C18/1676C23C18/168C23C18/50H01L21/288
    • A liquid treatment apparatus of continuously performing a plating process on multiple substrates includes a temperature controlling container for accommodating a plating liquid; a temperature controller for controlling a temperature of the plating liquid in the temperature controlling container; a holding unit for holding the substrates one by one at a preset position; a nozzle having a supply hole through which the temperature-controlled plating liquid in the temperature controlling container is discharged to a processing surface of the substrate; a pushing unit for pushing the temperature-controlled plating liquid in the temperature controlling container toward the supply hole of the nozzle; and a supply control unit for controlling a timing when the plating liquid is pushed by the pushing unit. The temperature controller controls the temperature of the plating liquid in the temperature controlling container based on the timing when the plating liquid is pushed by the pushing unit.
    • 在多个基板上连续进行电镀处理的液体处理装置包括:容纳电镀液的温度控制容器; 温度控制器,用于控制温度控制容器中的电镀液的温度; 保持单元,用于将预定位置一个接一个地保持; 具有供给孔的喷嘴,所述温度控制容器中的所述温度控制电镀液通过所述供给孔排出到所述基板的处理面; 推压单元,用于将温度控制容器中的温度控制电镀液朝向喷嘴的供给孔推动; 以及供应控制单元,用于控制当推动单元推动电镀液体时的定时。 温度控制器基于由推动单元推动电镀液的时机,控制温度控制容器中的电镀液的温度。