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1. 发明授权

US5009922A Method of forming a transparent conductive film 失效
标题翻译：形成透明导电膜的方法
公开(公告)号：US5009922A
公开(公告)日：1991-04-23
申请号：US486841
申请日：1990-03-01
申请人： Takeshi Harano , Satoru Takaki , Yuzo Shigesato , Koichi Suzuki , Naoki Hashimoto , Hiroyasu Kojima , Takuji Oyama
发明人： Takeshi Harano , Satoru Takaki , Yuzo Shigesato , Koichi Suzuki , Naoki Hashimoto , Hiroyasu Kojima , Takuji Oyama
IPC分类号： C03C17/245 , C23C14/08 , C23C14/32
CPC分类号： C23C14/325 , C03C17/245 , C03C17/2453 , C23C14/086 , C03C2217/211 , C03C2217/215 , C03C2217/216 , C03C2217/231 , C03C2218/151
摘要： In a method of forming a transparent conductive film, an arc discharge type plasma produced by arc discharging is generated in an atmosphere wherein the pressure of an atmospheric gas is 3.0 .times. 10.sup.-4 Torr or higher; the plasma is converged onto a vapor deposition material for forming a transparent conductive film to thereby evaporate the vapor deposition material, whereby said transparent conductive film is formed on a substrate located above said vapor deposition material.

2. 发明授权

US06468403B1 Methods for producing functional films 失效
标题翻译：功能膜的制备方法
公开(公告)号：US06468403B1
公开(公告)日：2002-10-22
申请号：US08281573
申请日：1994-07-28
申请人： Junichi Shimizu , Shujiro Watanabe , Satoru Takaki , Hisashi Osaki , Takuji Oyama , Eiichi Ando
发明人： Junichi Shimizu , Shujiro Watanabe , Satoru Takaki , Hisashi Osaki , Takuji Oyama , Eiichi Ando
IPC分类号： C23C1434
CPC分类号： H01J37/3444 , C03C17/002 , C03C17/225 , C03C17/245 , C03C17/2453 , C03C17/3435 , C03C2217/211 , C03C2217/213 , C03C2217/214 , C03C2217/215 , C03C2217/216 , C03C2217/231 , C03C2217/24 , C03C2217/244 , C03C2217/281 , C03C2217/948 , C03C2218/154 , C03C2218/155 , C23C14/0652 , C23C14/086 , C23C14/10 , C23C14/34 , C23C14/35 , G02F1/13439 , H01B1/08
摘要： A method for producing a transparent conductive film composed mainly of an oxide by sputtering using a sputtering target capable of forming a transparent conductive film, wherein intermittent electric power is supplied to the target.
摘要翻译：使用能够形成透明导电膜的溅射靶通过溅射主要由氧化物构成的透明导电膜的制造方法，其中向靶标供给间歇电力。

3. 发明授权

US5660700A Sputter coating power processing portion 失效
标题翻译：溅射涂层电源处理部分
公开(公告)号：US5660700A
公开(公告)日：1997-08-26
申请号：US281574
申请日：1994-07-28
申请人： Junichi Shimizu , Shujiro Watanabe , Satoru Takaki , Hisashi Osaki , Takuji Oyama , Eiichi Ando
发明人： Junichi Shimizu , Shujiro Watanabe , Satoru Takaki , Hisashi Osaki , Takuji Oyama , Eiichi Ando
IPC分类号： C03C17/00 , C03C17/22 , C03C17/245 , C03C17/34 , C23C14/06 , C23C14/08 , C23C14/34 , C23C14/35 , G02F1/1343 , H01B1/08 , C23C14/38
CPC分类号： H01J37/3444 , C03C17/002 , C03C17/225 , C03C17/245 , C03C17/2453 , C03C17/3435 , C23C14/0652 , C23C14/086 , C23C14/34 , C23C14/35 , H01B1/08 , C03C2217/211 , C03C2217/213 , C03C2217/214 , C03C2217/215 , C03C2217/216 , C03C2217/231 , C03C2217/24 , C03C2217/244 , C03C2217/281 , C03C2218/154 , C03C2218/155 , G02F1/13439
摘要： A sputtering method comprises applying a negative voltage intermittently in a constant periodic cycle to a cathode disposed in a vacuum chamber, wherein the negative voltage is intermittently applied so that a time during which the negative voltage is not applied includes a time during which the voltage is controlled to be zero volt in a range of from 10 .mu.s to 10 ms, and the zero voltage time is equal to or longer than the time required by one arcing from its generation to extinction.
摘要翻译：溅射方法包括将恒定周期性周期性的负电压施加到设置在真空室中的阴极，其中间歇地施加负电压，使得不施加负电压的时间包括电压为在10μs至10ms的范围内控制为零伏特，并且零电压时间等于或长于从其产生到消光的一次电弧所需的时间。

4. 发明授权

US6110328A Method of an apparatus for sputtering 失效
标题翻译：溅射装置的方法
公开(公告)号：US6110328A
公开(公告)日：2000-08-29
申请号：US759431
申请日：1996-12-05
申请人： Junichi Shimizu , Shujiro Watanabe , Satoru Takaki , Hisashi Osaki , Takuji Oyama , Eiichi Ando
发明人： Junichi Shimizu , Shujiro Watanabe , Satoru Takaki , Hisashi Osaki , Takuji Oyama , Eiichi Ando
IPC分类号： C03C17/00 , C03C17/22 , C03C17/245 , C03C17/34 , C23C14/06 , C23C14/08 , C23C14/34 , C23C14/35 , G02F1/1343 , H01B1/08
CPC分类号： H01J37/3444 , C03C17/002 , C03C17/225 , C03C17/245 , C03C17/2453 , C03C17/3435 , C23C14/0652 , C23C14/086 , C23C14/34 , C23C14/35 , H01B1/08 , C03C2217/211 , C03C2217/213 , C03C2217/214 , C03C2217/215 , C03C2217/216 , C03C2217/231 , C03C2217/24 , C03C2217/244 , C03C2217/281 , C03C2218/154 , C03C2218/155 , G02F1/13439
摘要： A sputtering method comprises applying a negative voltage intermittently in a constant periodic cycle to a cathode disposed in a vacuum chamber, wherein the negative voltage is intermittently applied so that a time during which the negative voltage is not applied includes a time during which the voltage is controlled to be zero volt in a range of from 10 .mu.s to 10 ms, and the zero voltage time is equal to or longer than the time required by one arcing from its generation to extinction.
摘要翻译：溅射方法包括将恒定周期性周期性的负电压施加到设置在真空室中的阴极，其中间歇地施加负电压，使得不施加负电压的时间包括电压为在10μs至10ms的范围内控制为零伏特，并且零电压时间等于或长于从其产生到消光的一次电弧所需的时间。

5. 发明申请

US20120100774A1 TRANSPARENT SUBSTRATE WITH THIN FILM AND METHOD FOR MANUFACTURING TRANSPARENT SUBSTRATE WITH CIRCUIT PATTERN WHEREIN SUCH TRANSPARENT SUBSTRATE WITH THIN FILM IS USED 审中-公开
标题翻译：具有薄膜的透明衬底和用于制造透明衬底的方法，其中使用具有薄膜的这种透明衬底的电路图案
公开(公告)号：US20120100774A1
公开(公告)日：2012-04-26
申请号：US13342553
申请日：2012-01-03
申请人： Ryohei SATOH , Koji Nakagawa , Eiji Morinaga , Reo Usui , Takamitsu Isono , Kenji Tanaka , Satoru Takaki , Kenichi Ebata , Hiroshi Sakamoto
发明人： Ryohei SATOH , Koji Nakagawa , Eiji Morinaga , Reo Usui , Takamitsu Isono , Kenji Tanaka , Satoru Takaki , Kenichi Ebata , Hiroshi Sakamoto
IPC分类号： H01J9/30 , H05K3/00
CPC分类号： H01J9/02 , C03C17/2453 , C03C23/0025 , C03C23/007 , C03C2217/211 , C03C2217/23 , C03C2217/231 , C03C2217/24 , C03C2218/151 , H05K3/027 , H05K2201/0108 , H05K2201/0326 , Y10T29/49124 , Y10T29/49155
摘要： An object of the invention is to provide a method for manufacturing a transparent substrate provided with a tin oxide thin film which can be satisfactorily patterned even by irradiation with a laser light having low energy because an ablation phenomenon occurs therewith. The invention relates to a method for manufacturing a transparent substrate bearing a circuit pattern, which comprises irradiating a thin-film-attached transparent substrate comprising a transparent substrate having thereon a transparent conductive film having a carrier concentration of 5×1019/cm3 or higher, with a laser light having a wavelength of 1,064 nm to form a circuit pattern on the transparent substrate.
摘要翻译：本发明的目的是提供一种制造具有氧化锡薄膜的透明基板的方法，该方法即使通过用能量低的激光照射也能令人满意地进行图案化，因为其中发生烧蚀现象。本发明涉及具有电路图案的透明基板的制造方法，其特征在于，对具有载体浓度为5×1019 / cm3以上的透明导电膜的透明基板进行照射，使用波长为1064nm的激光，以在透明基板上形成电路图案。

6. 发明授权

US06533904B2 Oxide film, laminate and methods for their production 有权
标题翻译：氧化膜，层压板及其生产方法
公开(公告)号：US06533904B2
公开(公告)日：2003-03-18
申请号：US09314294
申请日：1999-05-19
申请人： Junichi Ebisawa , Nobutaka Aomine , Yasuo Hayashi , Satoru Takaki
发明人： Junichi Ebisawa , Nobutaka Aomine , Yasuo Hayashi , Satoru Takaki
IPC分类号： C23C1400
CPC分类号： C03C17/3613 , C03C17/22 , C03C17/245 , C03C17/2453 , C03C17/3417 , C03C17/36 , C03C17/3618 , C03C17/3639 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C17/3671 , C03C2217/211 , C03C2217/212 , C03C2217/214 , C03C2217/216 , C03C2217/228 , C03C2217/23 , C03C2217/282 , C03C2217/78 , C03C2217/948 , C03C2218/154 , C23C14/0057 , C23C14/06 , C23C14/08 , C23C14/086 , C23C28/322 , C23C28/345 , C23C28/3455 , C23C28/42 , Y10T428/12 , Y10T428/12493 , Y10T428/12535 , Y10T428/12542 , Y10T428/12611
摘要： A method for forming an oxide film on a substrate by a sputtering process using a target comprising a metal as the main component, wherein sputtering is carried out in an atmosphere which contains a gas containing carbon atoms.
摘要翻译：通过使用包含金属作为主要成分的靶的溅射法在基板上形成氧化膜的方法，其中在含有含有碳原子的气体的气氛中进行溅射。

7. 发明申请

US20080202798A1 TRANSPARENT SUBSTRATE WITH THIN FILM AND METHOD FOR MANUFACTURING TRANSPARENT SUBSTRATE WITH CIRCUIT PATTERN WHEREIN SUCH TRANSPARENT SUBSTRATE WITH THIN FILM IS USED 审中-公开
标题翻译：具有薄膜的透明衬底和用于制造透明衬底的方法，其中使用具有薄膜的这种透明衬底的电路图案
公开(公告)号：US20080202798A1
公开(公告)日：2008-08-28
申请号：US12110707
申请日：2008-04-28
申请人： Ryohei SATOH , Koji Nakagawa , Eiji Morinaga , Reo Usui , Takamitsu Isono , Kenji Tanaka , Satoru Takaki , Kenichi Ebata , Hiroshi Sakamoto
发明人： Ryohei SATOH , Koji Nakagawa , Eiji Morinaga , Reo Usui , Takamitsu Isono , Kenji Tanaka , Satoru Takaki , Kenichi Ebata , Hiroshi Sakamoto
IPC分类号： H05K1/03 , H05K3/22
CPC分类号： H01J9/02 , C03C17/2453 , C03C23/0025 , C03C23/007 , C03C2217/211 , C03C2217/23 , C03C2217/231 , C03C2217/24 , C03C2218/151 , H05K3/027 , H05K2201/0108 , H05K2201/0326 , Y10T29/49124 , Y10T29/49155
摘要： An object of the invention is to provide a method for manufacturing a transparent substrate provided with a tin oxide thin film which can be satisfactorily patterned even by irradiation with a laser light having low energy because an ablation phenomenon occurs therewith. The invention relates to a method for manufacturing a transparent substrate bearing a circuit pattern, which comprises irradiating a thin-film-attached transparent substrate comprising a transparent substrate having thereon a transparent conductive film having a carrier concentration of 5×1019/cm3 or higher, with a laser light having a wavelength of 1,064 nm to form a circuit pattern on the transparent substrate.
摘要翻译：本发明的目的是提供一种制造具有氧化锡薄膜的透明基板的方法，该方法即使通过用能量低的激光照射也能令人满意地进行图案化，因为其中发生烧蚀现象。本发明涉及一种用于制造承载电路图案的透明基板的方法，该方法包括：照射带有透明基板的薄膜附着透明基板，该透明基板上具有载流子浓度为5×10 19 / > / cm 3以上，具有波长为1064nm的激光，以在透明基板上形成电路图案。

8. 发明申请

US20070190886A1 METHOD FOR FORMING ELECTRODES AND/OR BLACK STRIPES FOR PLASMA DISPLAY SUBSTRATE 有权
标题翻译：用于形成等离子显示基板的电极和/或黑条的方法
公开(公告)号：US20070190886A1
公开(公告)日：2007-08-16
申请号：US11691689
申请日：2007-03-27
申请人： Ryohei Satoh , Yoshinori Iwata , Koji Nakagawa , Kenji Tanaka , Satoru Takaki
发明人： Ryohei Satoh , Yoshinori Iwata , Koji Nakagawa , Kenji Tanaka , Satoru Takaki
IPC分类号： H01J9/24 , H01J9/00
CPC分类号： H01J9/02 , H01J11/12 , H01J11/22 , H01J11/44 , H01J2211/444
摘要： To provide a method for forming electrodes and/or black stripes for a plasma display substrate, wherein display electrodes, bus electrodes and optionally black stripes for a plasma display panel are formed of the same material by the same dry step, whereby a clear image having reflection prevented, can be displayed on a PDP display device with a low load on the environment, at low costs, with low resistance, without erosion by a dielectric. A method for forming electrodes and/or black stripes for a plasma display substrate, which comprises applying a laser beam to a mask layer formed on a transparent substrate to form openings at areas corresponding to the respective patterns of display electrodes, bus electrodes and optionally black stripes, then continuously forming an antireflection layer to provide an antireflection effect over the entire surface and an electrode layer, and applying again a laser beam to peel off the mask layer and at the same time to remove an unnecessary thin film layer.
摘要翻译：为了提供用于等离子体显示基板形成电极和/或黑色条纹的方法，其中显示电极，总线电极和用于等离子体显示面板的任选的黑色条纹由相同的干燥步骤由相同的材料形成，由此具有防止反射，可以低成本地以低电阻显示在环境中的低负载的PDP显示装置上，而不会被电介质侵蚀。一种用于形成等离子体显示基板的电极和/或黑色条纹的方法，包括将激光束施加到形成在透明基板上的掩模层，以在对应于显示电极，总线电极和任选黑色的各个图案的区域处形成开口然后连续地形成抗反射层以在整个表面和电极层上提供抗反射效果，并再次施加激光束以剥离掩模层，同时去除不需要的薄膜层。

9. 发明授权

US06329044B1 Transparent conductive film and method of making the film 失效
标题翻译：透明导电膜及其制作方法
公开(公告)号：US06329044B1
公开(公告)日：2001-12-11
申请号：US09344803
申请日：1999-06-25
申请人： Katsumi Inoue , Yasuhiko Akao , Satoru Takaki , Yasuo Hayashi , Teruo Fujiwara
发明人： Katsumi Inoue , Yasuhiko Akao , Satoru Takaki , Yasuo Hayashi , Teruo Fujiwara
IPC分类号： B32B900
CPC分类号： C23C14/086 , B32B17/10174 , C03C17/253 , C03C2217/231 , C03C2217/24 , C03C2218/15 , C03C2218/152 , C03C2218/154 , H01B1/08 , Y10T428/24917
摘要： Transparent conductive films are provided which provide high sheet resistance, high transparency, high heat resistance and high moisture resistance, wherein the transparent conductive films contain either (a) an oxide film made of a mixed oxide of indium and tin and doped with at least 0.01 and less than 0.6 weight % of nitrogen and a geometrical thickness of from 5 to 25 nm or (b) an oxide film made of a mixed oxide of indium and tin, wherein the oxide film contains tin within a range of from 4.2 to 8.3 atomic % based on indium and a geometrical thickness of from 5 to 20 nm, and where in each case (a) and (b) the oxide film has a light transmittance of more than 90% at a wavelength of 550 nm, transparent conductive film-coated substrates prepared therefrom and touch panels prepared from the transparent conductive film-coated substrates.
摘要翻译：提供透明导电膜，其提供高的薄层电阻，高透明度，高耐热性和高耐湿性，其中透明导电膜包含（a）由铟和锡的混合氧化物制成的氧化物膜，并掺杂至少0.01 和小于0.6重量％的氮，几何厚度为5至25nm，或（b）由铟和锡的混合氧化物制成的氧化物膜，其中所述氧化物膜含有锡在4.2至8.3原子的范围内基于铟的几何厚度为5〜20nm的几何厚度，并且在（a）和（b）的每种情况下，氧化物膜在波长550nm下的透光率大于90％，透明导电膜 - 由其制备的涂覆基材和由透明导电膜涂覆的基材制备的触摸面板。

10. 发明授权

US08418359B2 Method for manufacturing circuit pattern-provided substrate 有权
标题翻译：制造电路图形衬底的方法
公开(公告)号：US08418359B2
公开(公告)日：2013-04-16
申请号：US12364314
申请日：2009-02-02
申请人： Ryohei Satoh , Koji Nakagawa , Eiji Morinaga , Reo Usui , Kenji Tanaka , Satoru Takaki , Kenichi Ebata , Hiroshi Sakamoto
发明人： Ryohei Satoh , Koji Nakagawa , Eiji Morinaga , Reo Usui , Kenji Tanaka , Satoru Takaki , Kenichi Ebata , Hiroshi Sakamoto
IPC分类号： H05K3/02 , H05K3/10
CPC分类号： G03F7/2022 , H01J9/02 , H01J11/10 , Y10T29/49117 , Y10T29/49124 , Y10T29/49128 , Y10T29/49155
摘要： A method for manufacturing a circuit pattern-provided substrate including forming a resist layer on a substrate, forming an opening corresponding to a circuit pattern and having an eaves cross-sectional shape in the resist layer, forming a thin film layer having a portion formed on the substrate in the opening and a portion formed on the resist layer, and removing the resist layer such that the resist layer and the portion of the thin film layer formed on the resist layer are removed from the substrate. The forming of the opening comprises exposing the resist layer with a mask device which changes an exposure amount of the resist layer such that the eaves cross-sectional shape has a space at a boundary between the resist layer and the substrate.
摘要翻译：一种制造电路图形衬底的方法，包括在衬底上形成抗蚀剂层，形成与电路图形相对应的开口，并且在抗蚀剂层中具有檐形横截面形状，形成薄膜层，该薄膜层形成在开口中的基板和形成在抗蚀剂层上的部分，并且去除抗蚀剂层，使得抗蚀剂层和形成在抗蚀剂层上的薄膜层的部分从基板上去除。开口的形成包括用改变抗蚀剂层的曝光量的掩模装置曝光抗蚀剂层，使得檐横截面形状在抗蚀剂层和基底之间的边界处具有空间。

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