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1. 发明授权

US07511179B2 Fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer 有权
标题翻译：含氟聚合物，由相同的新型含氟单体制备的抗蚀剂组合物
公开(公告)号：US07511179B2
公开(公告)日：2009-03-31
申请号：US11438669
申请日：2006-05-17
申请人： Takayuki Araki , Takuji Ishikawa , Meiten Koh
发明人： Takayuki Araki , Takuji Ishikawa , Meiten Koh
IPC分类号： C07C23/08 , G03C1/675 , G03F7/028 , G03F7/038
CPC分类号： C07C25/13 , C07C25/18 , C07C25/22 , C07C31/38 , C07C33/423 , C07C33/44 , C07C35/52 , C07C43/313 , C07C45/63 , C07C49/167 , C07C2601/08 , C07C2602/42 , C07F9/5407 , C07F9/5435 , C07F9/5442 , C07F9/5449 , C07F9/5456 , C07F9/59 , C08F8/00 , C08F214/18 , C08F214/186 , C08F2800/10 , C08F2800/20 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0395 , Y02P20/55 , Y10S430/106 , Y10S430/108 , C08F214/265 , C08F232/04 , C08F234/00 , C08F220/22
摘要： A fluorine-containing unsaturated cyclic compound represented by the formula (1)(a): wherein Z3 are the same or different and each is —Rf3-Z4, in which Z4 is at least one functional group selected from the group consisting of OH group, COOH group, a derivative of carboxylic acid group and a functional group protected by a protective group which can convert the functional group to OH group by reaction with an acid; Rf3 is a fluorine-containing alkylene group which has 1 to 30 carbon atoms and may have ether bond; n11 is an integer of from 1 to 4.
摘要翻译：由式（1）（a）表示的含氟不饱和环状化合物：其中Z3相同或不同，各自为-Rf3-Z4，其中Z4为至少一个选自OH基团的官能团，COOH基，羧酸基的衍生物和被保护基保护的官能团，其可以通过与酸反应将官能团转化为OH基; Rf3是碳原子数为1〜30，可以具有醚键的含氟亚烷基; n11为1〜4的整数。

2. 发明申请

US20050287471A1 Novel fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same 审中-公开
标题翻译：具有酸反应性基团的新型含氟聚合物和由其制备的化学放大型光致抗蚀剂组合物
公开(公告)号：US20050287471A1
公开(公告)日：2005-12-29
申请号：US11033954
申请日：2005-01-13
申请人： Takayuki Araki , Meiten Koh , Yoshito Tanaka , Takuji Ishikawa , Hirokazu Aoyama , Tetsuo Shimizu
发明人： Takayuki Araki , Meiten Koh , Yoshito Tanaka , Takuji Ishikawa , Hirokazu Aoyama , Tetsuo Shimizu
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , G03F7/075 , G03C1/76
CPC分类号： G03F7/039 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/0758 , Y10S430/106 , Y10S430/108
摘要： There is provided a novel fluorine-containing polymer having an acid-reactive group which has a high transparency against energy rays (radioactive rays) in a vacuum ultraviolet region (157 nm), and further there are provided a material for fluorine-containing base polymer prepared from the polymer and suitable for a photoresist and a chemically amplifying type resist composition obtained therefrom. The polymer has a number average molecular weight of from 1,000 to 1,000,000 and represented by the formula: -(M1)-(M2)-(A)-, wherein M1 is a structural unit having an acid-labile or acid-degradable functional group, M2 is a structural unit of fluorine-containing acryl ester, A is a structural unit derived from other copolymerizable monomer, the percent by mole ratio M1/M2 is 1 to 99/99 to 1 and the polymer comprises from 1 to 99% by mole of the structural unit M1, from 1 to 99% by mole of the structural unit M2 and from 0 to 98% by mole of the structural unit A1. The material for fluorine-containing base polymer comprises a fluorine-containing polymer having an acid-reactive group such as the above-mentioned polymer and is suitable for a photoresist, and the chemically amplifying type resist composition is obtained from those polymer and material.
摘要翻译：提供了一种具有酸反应性基团的新型含氟聚合物，其具有对真空紫外区域（157nm）中的能量射线（放射线）的高透明性，并且还提供了含氟基础聚合物由聚合物制备并适用于由其获得的光致抗蚀剂和化学放大型抗蚀剂组合物。聚合物的数均分子量为1,000〜1,000,000，由下式表示： - （M1） - （M2） - （A） - ，其中M1是具有酸不稳定性或酸可降解官能团的结构单元 M2是含氟丙烯酸酯的结构单元，A是来自其它可共聚单体的结构单元，M1 / M2的摩尔比为1〜99/99〜1，聚合物的含量为1〜99％结构单元M1的摩尔数，结构单元M2的1〜99摩尔％和结构单元A1的0〜98摩尔％。含氟基础聚合物的材料包括具有酸反应性基团的含氟聚合物如上述聚合物，并且适用于光致抗蚀剂，化学放大型抗蚀剂组合物由那些聚合物和材料获得。

3. 发明申请

US20050191578A1 Process for preparing fluorine-containing polymer and photoresist composition 审中-公开
标题翻译：制备含氟聚合物和光致抗蚀剂组合物的方法
公开(公告)号：US20050191578A1
公开(公告)日：2005-09-01
申请号：US11104554
申请日：2005-04-13
申请人： Takayuki Araki , Takuji Ishikawa , Meiten Koh , Minoru Toriumi
发明人： Takayuki Araki , Takuji Ishikawa , Meiten Koh , Minoru Toriumi
IPC分类号： C08F4/34 , C08F8/00 , C08F214/18 , G03C1/492 , G03F7/004 , G03F7/039
CPC分类号： C08F214/18 , C08F8/00 , C08F2800/20 , G03C1/492 , G03F7/0046 , G03F7/0392 , C08F214/26
摘要： There is provided a process for preparing a fluorine-containing polymer for resist which is excellent in transparency in a vacuum ultraviolet region, comprises a structural unit derived from a fluorine-containing ethylenic monomer and/or a structural unit derived from a monomer which can provide an aliphatic ring structure in the polymer trunk chain and may have a fluorine atom, and has an acid-reactive group Y1 reacting with an acid or a group Y2 which can be converted to the acid-reactive group Y1, in which the fluorine-containing ethylenic monomer and/or the monomer which can provide an aliphatic ring structure in the polymer trunk chain are subjected to radical polymerization by using an organic peroxide represented by the formula (1): wherein R50 and R51 are the same or different and each is a hydrocarbon group having 1 to 30 carbon atoms which may have ether bond (an atom at an end of bond is not oxygen atom); p1 and p2 are the same or different and each is 0 or 1; p3 is 1 or 2, and also there is provided a photoresist composition comprising the obtained polymer. The fluorine-containing polymer is excellent in transparency in a vacuum ultraviolet region, and can form an ultra fine pattern as a polymer for a photoresist, particularly for a F2 resist.
摘要翻译：提供了一种制备真空紫外线区域的透明度优异的抗蚀剂用含氟聚合物的方法，包括衍生自含氟乙烯性单体的结构单元和/或衍生自单体的结构单元，其可以提供聚合物主链中的脂族环结构，并且可以具有氟原子，并且具有与酸或Y 2的基团反应的酸反应性基团Y 1，其可以是转化为酸反应性基团Y 1，其中可以在聚合物主链中提供脂族环结构的含氟乙烯性单体和/或单体通过使用由式（1）表示的有机过氧化物：其中R 50和R 51相同或不同，并且各自为具有1至30个碳原子的烃基，其可以具有醚键（键的末端的原子不是氧原子）; p1和p2相同或不同，分别为0或1; p3为1或2，并且还提供包含所得聚合物的光致抗蚀剂组合物。含氟聚合物在真空紫外区域的透明度优异，并且可以形成作为光致抗蚀剂的聚合物的超细图案，特别是用于F2抗蚀剂。

4. 发明申请

US20060251991A1 Novel fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer 有权
公开(公告)号：US20060251991A1
公开(公告)日：2006-11-09
申请号：US11438669
申请日：2006-05-17
申请人： Takayuki Araki , Takuji Ishikawa , Meiten Koh
发明人： Takayuki Araki , Takuji Ishikawa , Meiten Koh
IPC分类号： G03C1/76
CPC分类号： C07C25/13 , C07C25/18 , C07C25/22 , C07C31/38 , C07C33/423 , C07C33/44 , C07C35/52 , C07C43/313 , C07C45/63 , C07C49/167 , C07C2601/08 , C07C2602/42 , C07F9/5407 , C07F9/5435 , C07F9/5442 , C07F9/5449 , C07F9/5456 , C07F9/59 , C08F8/00 , C08F214/18 , C08F214/186 , C08F2800/10 , C08F2800/20 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0395 , Y02P20/55 , Y10S430/106 , Y10S430/108 , C08F214/265 , C08F232/04 , C08F234/00 , C08F220/22
摘要： There is provided a fluorine-containing copolymer having an aliphatic monocyclic structure in the polymer trunk chain which has a number average molecular weight of from 500 to 1,000,000 and is represented by the formula (Ma): -(M1)-(M2a)-(N)- (Ma) in which the structural unit M1 is a structural unit derived from an ethylenic monomer having 2 or 3 carbon atoms and at least one fluorine atom, the structural unit M2a is at least one structural unit which introduces an aliphatic monocyclic structure in the polymer trunk chain and is represented by the formula (a): wherein R1 is at least one hydrocarbon group selected from the group consisting of a divalent hydrocarbon group having 1 to 8 carbon atoms and constituting a ring which may be further substituted with a hydrocarbon group or a fluorine-containing alkyl group and a divalent hydrocarbon group having ether bond which has the sum of carbon atoms and oxygen atoms of 2 to 8, constitutes a ring and may be further substituted with a hydrocarbon group or a fluorine-containing alkyl group; R2 is an alkylene group which has 1 to 3 carbon atoms and constitutes a ring; R3 and R4 are the same or different and each is a divalent alkylene group which has 1 or 2 carbon atoms and constitutes a ring; n1, n2 and n3 are the same or different and each is 0 or 1, the structural unit N is a structural unit derived from a monomer copolymerizable with the monomers to introduce the structural units M1 and M2a, and the structural units M1, M2a and N are contained in amounts of from 1 to 99% by mole, from 1 to 99% by mole and from 0 to 98% by mole, respectively. The fluorine-containing polymer possesses excellent dry etching resistance and transparency in a vacuum ultraviolet region.

5. 发明授权

US07115690B2 Fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer 有权
公开(公告)号：US07115690B2
公开(公告)日：2006-10-03
申请号：US10815801
申请日：2004-04-02
申请人： Takayuki Araki , Takuji Ishikawa , Meiten Koh
发明人： Takayuki Araki , Takuji Ishikawa , Meiten Koh
IPC分类号： C08F12/20
CPC分类号： C07C25/13 , C07C25/18 , C07C25/22 , C07C31/38 , C07C33/423 , C07C33/44 , C07C35/52 , C07C43/313 , C07C45/63 , C07C49/167 , C07C2601/08 , C07C2602/42 , C07F9/5407 , C07F9/5435 , C07F9/5442 , C07F9/5449 , C07F9/5456 , C07F9/59 , C08F8/00 , C08F214/18 , C08F214/186 , C08F2800/10 , C08F2800/20 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0395 , Y02P20/55 , Y10S430/106 , Y10S430/108 , C08F214/265 , C08F232/04 , C08F234/00 , C08F220/22
摘要： There is provided a fluorine-containing copolymer having an aliphatic monocyclic structure in the polymer trunk chain which has a number average molecular weight of from 500 to 1,000,000 and is represented by the formula (Ma): -(M1)-(M2a)-(N)— (Ma) in which the structural unit M1 is a structural unit derived from an ethylenic monomer having 2 or 3 carbon atoms and at least one fluorine atom, the structural unit M2a is at least one structural unit which introduces an aliphatic monocyclic structure in the polymer trunk chain and is represented by the formula (a): wherein R1 is at least one hydrocarbon group selected from the group consisting of a divalent hydrocarbon group having 1 to 8 carbon atoms and constituting a ring which may be further substituted with a hydrocarbon group or a fluorine-containing alkyl group and a divalent hydrocarbon group having ether bond which has the sum of carbon atoms and oxygen atoms of 2 to 8, constitutes a ring and may be further substituted with a hydrocarbon group or a fluorine-containing alkyl group; R2 is an alkylene group which has 1 to 3 carbon atoms and constitutes a ring; R3 and R4 are the same or different and each is a divalent alkylene group which has 1 or 2 carbon atoms and constitutes a ring; n1, n2 and n3 are the same or different and each is 0 or 1, the structural unit N is a structural unit derived from a monomer copolymerizable with the monomers to introduce the structural units M1 and M2a, and the structural units M1, M2a and N are contained in amounts of from 1 to 99% by mole, from 1 to 99% by mole and from 0 to 98% by mole, respectively. The fluorine-containing polymer possesses excellent dry etching resistance and transparency in a vacuum ultraviolet region.

6. 发明授权

US06908724B2 Fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same 有权
标题翻译：具有酸反应性基团的含氟聚合物和由其制备的化学放大型光致抗蚀剂组合物
公开(公告)号：US06908724B2
公开(公告)日：2005-06-21
申请号：US10262893
申请日：2002-10-03
申请人： Takayuki Araki , Meiten Koh , Yoshito Tanaka , Takuji Ishikawa , Hirokazu Aoyama , Tetsuo Shimizu
发明人： Takayuki Araki , Meiten Koh , Yoshito Tanaka , Takuji Ishikawa , Hirokazu Aoyama , Tetsuo Shimizu
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , G03F7/075
CPC分类号： G03F7/039 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/0758 , Y10S430/106 , Y10S430/108
摘要： There is provided a novel fluorine-containing polymer having an acid-reactive group which has a high transparency against energy rays (radioactive rays) in a vacuum ultraviolet region (157 nm), and further there are provided a material for fluorine-containing base polymer prepared from the polymer and suitable for a photoresist and a chemically amplifying type resist composition obtained therefrom.The polymer has a number average molecular weight of from 1,000 to 1,000,000 and represented by the formula: —(M1)—(M2)—(A)—, wherein M1 is a structural unit having an acid-labile or acid-degradable functional group, M2 is a structural unit of fluorine-containing acryl ester, A is a structural unit derived from other copolymerizable monomer, the percent by mole ratio M1/M2 is 1 to 99/99 to 1 and the polymer comprises from 1 to 99% by mole of the structural unit M1, from 1 to 99% by mole of the structural unit M2 and from 0 to 98% by mole of the structural unit A1. The material for fluorine-containing base polymer comprises a fluorine-containing polymer having an acid-reactive group such as the above-mentioned polymer and is suitable for a photoresist, and the chemically amplifying type resist composition is obtained from those polymer and material.
摘要翻译：提供了一种具有酸反应性基团的新型含氟聚合物，其具有对真空紫外区域（157nm）中的能量射线（放射线）的高透明性，并且还提供了含氟基础聚合物由聚合物制备并适用于由其获得的光致抗蚀剂和化学放大型抗蚀剂组合物。聚合物的数均分子量为1,000〜1,000,000，由下式表示： - （M1） - （M2） - （A） - ，其中M1是具有酸不稳定性或酸可降解官能团的结构单元 M2是含氟丙烯酸酯的结构单元，A是来自其它可共聚单体的结构单元，M1 / M2的摩尔比为1〜99/99〜1，聚合物的含量为1〜99％结构单元M1的摩尔数，结构单元M2的1〜99摩尔％和结构单元A1的0〜98摩尔％。含氟基础聚合物的材料包括具有酸反应性基团的含氟聚合物如上述聚合物，并且适用于光致抗蚀剂，化学放大型抗蚀剂组合物由那些聚合物和材料获得。

7. 发明申请

US20060204893A1 Novel fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer 审中-公开
公开(公告)号：US20060204893A1
公开(公告)日：2006-09-14
申请号：US11434917
申请日：2006-05-17
申请人： Takayuki Araki , Takuji Ishikawa , Meiten Koh
发明人： Takayuki Araki , Takuji Ishikawa , Meiten Koh
IPC分类号： G03C1/76
CPC分类号： C07C25/13 , C07C25/18 , C07C25/22 , C07C31/38 , C07C33/423 , C07C33/44 , C07C35/52 , C07C43/313 , C07C45/63 , C07C49/167 , C07C2601/08 , C07C2602/42 , C07F9/5407 , C07F9/5435 , C07F9/5442 , C07F9/5449 , C07F9/5456 , C07F9/59 , C08F8/00 , C08F214/18 , C08F214/186 , C08F2800/10 , C08F2800/20 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0395 , Y02P20/55 , Y10S430/106 , Y10S430/108 , C08F214/265 , C08F232/04 , C08F234/00 , C08F220/22
摘要： There is provided a fluorine-containing copolymer having an aliphatic monocyclic structure in the polymer trunk chain which has a number average molecular weight of from 500 to 1,000,000 and is represented by the formula (Ma): -(M1)-(M2a)-(N)- (Ma) in which the structural unit M1 is a structural unit derived from an ethylenic monomer having 2 or 3 carbon atoms and at least one fluorine atom, the structural unit M2a is at least one structural unit which introduces an aliphatic monocyclic structure in the polymer trunk chain and is represented by the formula (a): wherein R1 is at least one hydrocarbon group selected from the group consisting of a divalent hydrocarbon group having 1 to 8 carbon atoms and constituting a ring which may be further substituted with a hydrocarbon group or a fluorine-containing alkyl group and a divalent hydrocarbon group having ether bond which has the sum of carbon atoms and oxygen atoms of 2 to 8, constitutes a ring and may be further substituted with a hydrocarbon group or a fluorine-containing alkyl group; R2 is an alkylene group which has 1 to 3 carbon atoms and constitutes a ring; R3 and R4 are the same or different and each is a divalent alkylene group which has 1 or 2 carbon atoms and constitutes a ring; n1, n2 and n3 are the same or different and each is 0 or 1, the structural unit N is a structural unit derived from a monomer copolymerizable with the monomers to introduce the structural units M1 and M2a, and the structural units M1, M2a and N are contained in amounts of from 1 to 99% by mole, from 1 to 99% by mole and from 0 to 98% by mole, respectively. The fluorine-containing polymer possesses excellent dry etching resistance and transparency in a vacuum ultraviolet region.

8. 发明申请

US20120107689A1 BINDER COMPOSITION FOR ELECTRODE 审中-公开
标题翻译：电极组合物
公开(公告)号：US20120107689A1
公开(公告)日：2012-05-03
申请号：US13318736
申请日：2011-05-09
申请人： Kenzou Takahashi , Mai Koyama , Emi Miyanaga , Meiten Koh , Hideo Sakata , Hiroyuki Arima , Tomoyo Sanagi , Hitomi Nakazawa , Takuji Ishikawa , Atsuko Tanaka , Toshiki Ichisaka
发明人： Kenzou Takahashi , Mai Koyama , Emi Miyanaga , Meiten Koh , Hideo Sakata , Hiroyuki Arima , Tomoyo Sanagi , Hitomi Nakazawa , Takuji Ishikawa , Atsuko Tanaka , Toshiki Ichisaka
IPC分类号： H01M4/62 , H01G9/155 , C08L27/16 , C08L79/08 , C08L27/18 , C08K5/3415
CPC分类号： H01G11/38 , C08K5/3415 , C08L3/04 , C08L2205/02 , C09D127/16 , C09D127/18 , H01M4/621 , H01M4/623 , H01M10/052 , Y02E60/13 , C08L27/18 , C08L27/16
摘要： The present invention provides a binder composition for an electrode. The binder composition includes PTFE particles as primary particles uniformly dispersed in an organic solvent at a high concentration. The present invention relates to a binder composition for an electrode, comprising an organosol composition containing PTFE particles (A), a polymer (B), and a fluorine-free organic solvent (C); and no electrode active material (J), wherein the polymer (B) is soluble in the fluorine-free organic solvent (C).
摘要翻译：本发明提供一种电极用粘合剂组合物。粘合剂组合物包括作为主要颗粒的PTFE颗粒以高浓度均匀分散在有机溶剂中。本发明涉及一种电极用粘合剂组合物，其含有PTFE颗粒（A），聚合物（B）和无氟有机溶剂（C）的有机溶胶组合物。无电极活性物质（J），其中聚合物（B）可溶于无氟有机溶剂（C）。

9. 发明申请

US20050181304A1 Method of forming fine pattern 审中-公开
标题翻译：形成精细图案的方法
公开(公告)号：US20050181304A1
公开(公告)日：2005-08-18
申请号：US11057832
申请日：2005-02-15
申请人： Takayuki Araki , Tsuneo Yamashita , Takuji Ishikawa , Tomohiro Yoshida , Takuya Hagiwara , Takamitsu Furukawa
发明人： Takayuki Araki , Tsuneo Yamashita , Takuji Ishikawa , Tomohiro Yoshida , Takuya Hagiwara , Takamitsu Furukawa
IPC分类号： C08F214/18 , C08F232/08 , G03C1/492 , G03F7/004 , G03F7/033 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0046 , G03F7/0395 , G03F7/0397
摘要： There is provided a method of forming a fine pattern by using a highly practicable fluorine-containing polymer which has a high transparency to exposure light having a short wavelength such as F2 laser and can improve dry etching resistance without remarkably lowering transparency. The method comprises (I) a step for preparing a resist composition comprising (a) a fluorine-containing polymer having protective group, (b) a photoacid generator and (c) a solvent; (II) a step for forming a resist film comprising the above-mentioned resist composition on a substrate or on a given layer on the substrate; (III) a step for exposing by selectively irradiating given areas of the resist film with energy ray, and (IV) a step for subjecting the exposed resist film to developing treatment and selectively removing the exposed portions of the resist film to form a fine pattern, in which the fluorine-containing polymer (a) having protective group is a fluorine-containing polymer comprising a structural unit (M2-1A) derived from a norbornene derivative having OH group and a structural unit (M2-1B) derived from a norbornene derivative having a saturated hydrocarbon group containing bicyclo saturated hydrocarbon structure as a protective group.
摘要翻译：提供了一种通过使用对具有短波长的诸如F 2激光的曝光光具有高透明度的高度实用的含氟聚合物形成精细图案的方法，并且可以提高无干蚀刻电阻，而无需显着降低透明度。该方法包括（I）制备抗蚀剂组合物的步骤，其包含（a）具有保护基的含氟聚合物，（b）光致酸产生剂和（c）溶剂; （II）在衬底上或衬底上的给定层上形成包含上述抗蚀剂组合物的抗蚀剂膜的步骤; （III）通过用能量射线选择性地照射抗蚀剂膜的给定区域进行曝光的步骤，以及（IV）对曝光的抗蚀剂膜进行显影处理并选择性地除去抗蚀剂膜的曝光部分以形成精细图案的步骤其中，具有保护基的含氟聚合物（a）为含有衍生自具有OH基的降冰片烯衍生物的结构单元（M2-1A）和来自降冰片烯的结构单元（M2-1B）的含氟聚合物具有含有双环饱和烃结构的饱和烃基作为保护基的衍生物。

10. 发明授权

US07186773B2 Process for preparing fluorine-containing norbornene derivative 有权
公开(公告)号：US07186773B2
公开(公告)日：2007-03-06
申请号：US10753529
申请日：2004-01-09
申请人： Takayuki Araki , Takuji Ishikawa , Takuji Kume , Akinori Yamamoto
发明人： Takayuki Araki , Takuji Ishikawa , Takuji Kume , Akinori Yamamoto
IPC分类号： C08G61/00 , C08F32/00
CPC分类号： G03F7/0395 , C07C33/44 , C07C43/313 , C07C45/45 , C07C49/567 , C07C61/28 , C07C69/96 , C07C2602/42 , C07C2603/86 , G03F7/0046 , G03F7/0382
摘要： There are provided a novel norbornene derivative which is a material for a chemically amplifying type photoresist for F2 laser, possesses excellent transparency and improved dry etching resistivity and has a fluorine-containing ketone unit or fluorine-containing tertiary alcohol unit directly bonded to the norbornene backbone; a fluorine-containing polymer obtained by using the norbornene derivative as a copolymerizable monomer; and a chemically amplifying type photoresist composition comprising the fluorine-containing polymer, a photoacid generator and a solvent.

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