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    • 1. 发明申请
    • Solid state imaging device, method for driving the same and camera using the same
    • 固态成像装置,其驱动方法及使用其的相机
    • US20060119725A1
    • 2006-06-08
    • US11332885
    • 2006-01-17
    • Takao KurodaSei SuzukiKidera Akito
    • Takao KurodaSei SuzukiKidera Akito
    • H04N5/335
    • H04N5/3728H04N5/357H04N5/3597
    • In making solid state imaging devices smaller and increasing their number of pixels, it is desirable to increase the charge amount that can be handled per unit area of the transfer portions. It is possible to achieve this by making the insulating film thinner, but this leads to electric fields in the semiconductor substrate that are too strong, and causes problems such as the generation of noise and the deterioration of the transfer efficiency. This invention relaxes potential steps in the transfer region by applying, when a signal charge 1 is being read out (t=t2), a high voltage to the electrode 43 for reading out the signal charge, a low voltage to at least one of the electrodes 41, 45-47 for preventing unnecessary mixing of signal charges, and an intermediate voltage between the high voltage and the low voltage to the electrodes 42 and 44, which are adjacent to the electrode 43 to which the high voltage is applied.
    • 在使固态成像装置更小并且其像素数量增加的情况下,期望增加可以在转印部分的每单位面积处理的电荷量。 可以通过使绝缘膜更薄而实现这一点,但是这导致半导体衬底中的电场太强,并且引起噪声的产生和传输效率的劣化等问题。 本发明通过在读出信号电荷1(t = t 2 2)时施加向读出信号电荷的电极43施加的高电压,放松了转印区域中的潜在步骤, 低电压至至少一个电极41,45-47,用于防止信号电荷的不必要的混合,以及与电极43相邻的电极42和44的高电压和低电压之间的中间电压, 施加高电压。
    • 2. 发明授权
    • Solid state imaging device, method for driving the same and camera using the same
    • 固态成像装置,其驱动方法及使用其的相机
    • US07038723B1
    • 2006-05-02
    • US09558888
    • 2000-04-26
    • Takao KurodaSei SuzukiAkito Kidera
    • Takao KurodaSei SuzukiAkito Kidera
    • H04N3/14
    • H04N5/3728H04N5/357H04N5/3597
    • In making solid state imaging devices smaller and increasing their number of pixels, it is desirable to increase the charge amount that can be handled per unit area of the transfer portions. It is possible to achieve this by making the insulating film thinner, but this leads to electric fields in the semiconductor substrate that are too strong, and causes problems such as the generation of noise and the deterioration of the transfer efficiency. This invention relaxes potential steps in the transfer region by applying, when a signal charge 1 is being read out (t=t2), a high voltage to the electrode 43 for reading out the signal charge, a low voltage to at least one of the electrodes 41, 45–47 for preventing unnecessary mixing of signal charges, and an intermediate voltage between the high voltage and the low voltage to the electrodes 42 and 44, which are adjacent to the electrode 43 to which the high voltage is applied.
    • 在使固态成像装置更小并且其像素数量增加的情况下,期望增加可以在转印部分的每单位面积处理的电荷量。 可以通过使绝缘膜更薄而实现这一点,但是这导致半导体衬底中的电场太强,并且引起噪声的产生和传输效率的劣化等问题。 本发明通过在读出信号电荷1(t = t 2 2)时施加向读出信号电荷的电极43施加的高电压,放松了转印区域中的潜在步骤, 低电压至电极41,45-47中的至少一个,用于防止信号电荷的不必要的混合,以及与电极43相邻的电极42和44的高电压和低电压之间的中间电压, 施加高电压。
    • 3. 发明申请
    • Solid state imaging device, method for driving the same and camera using the same
    • 固态成像装置,其驱动方法及使用其的相机
    • US20050088557A1
    • 2005-04-28
    • US10990724
    • 2004-11-17
    • Takao KurodaSei SuzukiAkito Kidera
    • Takao KurodaSei SuzukiAkito Kidera
    • H01L27/148H04N3/14H04N5/357H04N5/376
    • H04N5/3728H04N5/357H04N5/3597
    • In making solid state imaging devices smaller and increasing their number of pixels, it is desirable to increase the charge amount that can be handled per unit area of the transfer portions. It is possible to achieve this by making the insulating film thinner, but this leads to electric fields in the semiconductor substrate that are too strong, and causes problems such as the generation of noise and the deterioration of the transfer efficiency. This invention relaxes potential steps in the transfer region by applying, when a signal charge 1 is being read out (t=t2), a high voltage to the electrode 43 for reading out the signal charge, a low voltage to at least one of the electrodes 41, 45-47 for preventing unnecessary mixing of signal charges, and an intermediate voltage between the high voltage and the low voltage to the electrodes 42 and 44, which are adjacent to the electrode 43 to which the high voltage is applied.
    • 在使固态成像装置更小并且其像素数量增加的情况下,期望增加可以在转印部分的每单位面积处理的电荷量。 可以通过使绝缘膜更薄而实现这一点,但是这导致半导体衬底中的电场太强,并且引起噪声的产生和传输效率的劣化等问题。 本发明通过在读出信号电荷1(t = t 2 2)时施加向读出信号电荷的电极43施加的高电压,放松了转印区域中的潜在步骤, 低电压至至少一个电极41,45-47,用于防止信号电荷的不必要的混合,以及与电极43相邻的电极42和44的高电压和低电压之间的中间电压, 施加高电压。
    • 4. 发明申请
    • Semiconductor Device And Method For Manufacturing Same
    • 半导体器件及其制造方法相同
    • US20080012048A1
    • 2008-01-17
    • US11570658
    • 2005-12-14
    • Takao Kuroda
    • Takao Kuroda
    • H01L27/148H01L21/339H01L29/76
    • H01L27/14689H01L27/14806H01L29/76833
    • In a semiconductor device 10 including a structure where transfer electrodes 2a to 2c are disposed on a semiconductor substrate 1 via an insulation layer 3, a first semiconductor region 4 of a first conductivity type, a second semiconductor region 5 of a conductivity type opposite to the first conductivity type, and a third semiconductor region 6 of the first conductivity type in a position that overlaps a region of the semiconductor substrate 1 directly underneath the transfer electrodes 2a to 2c. The second semiconductor region 5 is formed on the first semiconductor region 4. The third semiconductor region 6 is formed on the second semiconductor region 5 so that a position of a maximal point 8 of electric potential of the second semiconductor region 5 when being depleted is deeper than a position of the maximal point 8 in a case where the third semiconductor region 6 does not exist.
    • 在包括通过绝缘层3设置在半导体衬底1上的转移电极2a至2c的结构的半导体器件10中,具有第一导电类型的第一半导体区域4,导电类型的第二半导体区域5 第一导电类型的第三半导体区域6以及直接位于转移电极2a至2c下方的与半导体衬底1的区域重叠的位置。 第二半导体区域5形成在第一半导体区域4上。 第三半导体区域6形成在第二半导体区域5上,使得当第三半导体区域6被耗尽时第二半导体区域5的电位的最大点8的位置比第三半导体区域5的第三半导体区域5的最大点8的位置更深 半导体区域6不存在。
    • 7. 发明授权
    • Charge transfer device, process for its manufacture, and method of
driving the device
    • 电荷转移装置,其制造方法和驱动装置的方法
    • US5315137A
    • 1994-05-24
    • US790782
    • 1991-11-12
    • Masaji AsaumiTakao Kuroda
    • Masaji AsaumiTakao Kuroda
    • H01L21/339H01L29/423H01L29/768H01L29/796
    • H01L29/66954H01L29/42396H01L29/76833H01L29/76858
    • The present invention relates to a charge transfer device having high transfer efficiency without leaving over signal charges, a charge transfer device substantially shortened in the gate length so as to enhance the transfer speed, and a method of manufacturing and a method of driving such device. In the charge transfer device of the invention, the n.sup.- diffusion layer is formed on the semiconductor substrate. In the surface region of the n.sup.- diffusion layer, a plurality of n diffusion layers are formed at equal intervals. The interval of the adjacent n diffusion layers is about 5 to 10 .mu.m. On the n.sup.- diffusion layer, an insulation film is formed. On the insulation film, transfer electrodes having two different shapes are formed. The transfer electrodes of these two types are alternately arranged. These transfer electrodes differ in length. The length of the longer transfer electrodes is about twice the length of the shorter transfer electrodes. Furthermore, the right end of the n diffusion layer nearly coincides with the right end of the longer transfer electrodes formed on the gate oxide film in the spatial position.
    • 本发明涉及一种电荷转移装置,其具有高的转印效率而不会离开信号电荷,电荷转移装置基本上缩短了栅极长度,从而提高了传送速度,以及一种制造方法和驱动该装置的方法。 在本发明的电荷转移装置中,在半导体衬底上形成n-扩散层。 在n扩散层的表面区域中,以等间隔形成多个n个扩散层。 相邻n个扩散层的间隔约为5〜10μm。 在n-扩散层上形成绝缘膜。 在绝缘膜上形成具有两种不同形状的转印电极。 这两种类型的转移电极交替排列。 这些转移电极的长度不同。 较长的传输电极的长度约为短传输电极长度的两倍。 此外,n扩散层的右端几乎与在空间位置上形成在栅极氧化膜上的较长传输电极的右端重合。