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1. 发明授权

US08665415B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US08665415B2
公开(公告)日：2014-03-04
申请号：US13090410
申请日：2011-04-20
申请人： Takahiro Nakayama , Shigeru Terashima , Yutaka Watanabe
发明人： Takahiro Nakayama , Shigeru Terashima , Yutaka Watanabe
IPC分类号： G03B27/52 , G03B27/54
CPC分类号： G03F7/70925
摘要： An exposure apparatus which projects exposure light from a pattern of an illuminated original onto a substrate, comprises a projection system including an optical element and configured to project the exposure light onto the substrate, an enclosure configured to enclose the projection system, and a cleaning mechanism configured to clean the optical element by irradiating the optical element with ultraviolet light under an environment in which oxygen is present within the enclosure, the cleaning mechanism including a light source configured to generate ultraviolet light, a tubular member including an exit window and configured to partially enclose an optical path between the light source and the optical element, and a regulating device configured to regulate an environment of a space inside the tubular member so that a partial pressure of oxygen becomes lower in the space inside the tubular member than in a space which is outside the tubular member.
摘要翻译：将曝光光从照明原稿的图案投影到基板上的曝光装置包括：投影系统，包括光学元件，并将曝光光投射到基板上;被构造成包围投影系统的外壳;以及清洁机构被配置为通过在所述外壳内存在氧气的环境下用紫外线照射所述光学元件来清洁所述光学元件，所述清洁机构包括被配置为产生紫外线的光源，所述管状部件包括出射窗，在光源和光学元件之间包围光路，以及调节装置，其被配置为调节管状部件内的空间的环境，使得在管状部件内的空间中氧的分压变低在管状构件外。

2. 发明申请

US20110262866A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20110262866A1
公开(公告)日：2011-10-27
申请号：US13090410
申请日：2011-04-20
申请人： Takahiro Nakayama , Shigeru Terashima , Yutaka Watanabe
发明人： Takahiro Nakayama , Shigeru Terashima , Yutaka Watanabe
IPC分类号： G03F7/20 , G03B27/52
CPC分类号： G03F7/70925
摘要： An exposure apparatus which projects exposure light from a pattern of an illuminated original onto a substrate, comprises a projection system including an optical element and configured to project the exposure light onto the substrate, an enclosure configured to enclose the projection system, and a cleaning mechanism configured to clean the optical element by irradiating the optical element with ultraviolet light under an environment in which oxygen is present within the enclosure, the cleaning mechanism including a light source configured to generate ultraviolet light, a tubular member including an exit window and configured to partially enclose an optical path between the light source and the optical element, and a regulating device configured to regulate an environment of a space inside the tubular member so that a partial pressure of oxygen becomes lower in the space inside the tubular member than in a space which is outside the tubular member.
摘要翻译：将曝光光从照明原稿的图案投影到基板上的曝光装置包括：投影系统，包括光学元件，并将曝光光投射到基板上;被构造成包围投影系统的外壳;以及清洁机构被配置为通过在所述外壳内存在氧气的环境下用紫外线照射所述光学元件来清洁所述光学元件，所述清洁机构包括被配置为产生紫外线的光源，所述管状部件包括出射窗，在光源和光学元件之间包围光路，以及调节装置，其被配置为调节管状部件内的空间的环境，使得在管状部件内的空间中氧的分压变低在管状构件外。

3. 发明授权

US08563950B2 Energy beam drawing apparatus and method of manufacturing device 失效
标题翻译：能量射束拉制装置及其制造方法
公开(公告)号：US08563950B2
公开(公告)日：2013-10-22
申请号：US13353571
申请日：2012-01-19
申请人： Takahiro Nakayama , Shigeru Terashima
发明人： Takahiro Nakayama , Shigeru Terashima
IPC分类号： H01J37/317 , G03F7/20 , H01L31/18 , B82Y10/00 , B82Y40/00
CPC分类号： H01J37/317 , B82Y10/00 , B82Y40/00 , G03F7/70841 , G03F7/70925 , H01J37/3174 , H01J2237/022
摘要： An energy beam drawing apparatus includes a member, positioned between an energy beam source and a substrate, on which a deposit is deposited and a removing unit which removes the deposit. The removing unit includes a catalyst for generating, from a gas, an active species for decomposing the deposit by irradiation with the energy beam, a supplying mechanism for supplying the gas to a position where the active species is generated, and a moving mechanism for moving, when executing processing of removing the deposit, the catalyst to a first position which is irradiated with the energy beam, and moving, when executing drawing processing on the substrate, the catalyst to a second position which is not irradiated with the energy beam.
摘要翻译：能量束描绘装置包括位于能量束源和衬底之间的构件，沉积物沉积在其上，以及去除沉积物的去除单元。除去单元包括用于从气体产生用于通过用能量束照射分解沉积物的活性物质的催化剂，用于将气体供给到产生活性物质的位置的供给机构，以及用于移动的移动机构当执行将所述沉积物去除的处理时，将所述催化剂移动到被所述能量束照射的第一位置，并且当在所述基板上执行拉伸处理时将所述催化剂移动到未被所述能量束照射的第二位置。

4. 发明授权

US08004657B2 Exposure apparatus, control method for the same, and device manufacturing method 失效
标题翻译：曝光装置，其控制方法和装置制造方法
公开(公告)号：US08004657B2
公开(公告)日：2011-08-23
申请号：US11677241
申请日：2007-02-21
申请人： Masayuki Tanabe , Yutaka Watanabe , Shigeru Terashima , Mika Kanehira
发明人： Masayuki Tanabe , Yutaka Watanabe , Shigeru Terashima , Mika Kanehira
IPC分类号： F21V9/04 , G03B27/32 , G03B27/42 , G03B27/52 , G03B27/54
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70308 , G03F7/70316 , G03F7/70925 , G21K1/062
摘要： An exposure apparatus that includes a chamber in which an optical element, including a capping layer, is arranged, and that exposes a substrate to exposure light via the optical element. The apparatus includes a supply unit configured to supply a material into the chamber and a providing unit configured to provide electromagnetic waves to the capping layer. The apparatus is configured so that the electromagnetic waves provided by the providing unit cause a photochemical reaction of the material, to grow a layer on the capping layer, with at least one of a condition of supply of the material by the supply unit and a condition of provision of the electromagnetic waves by the providing unit being changed in accordance with each position of the capping layer, based on information of a decrease in an amount of the capping layer at each position, so as to repair the capping layer.
摘要翻译：一种曝光装置，包括其中布置有包括封盖层的光学元件并且经由所述光学元件将基板暴露于曝光光的室。该设备包括：供给单元，其被配置为将材料供应到所述室中;以及提供单元，被配置为向所述封盖层提供电磁波。该设备被配置为使得由提供单元提供的电磁波引起材料的光化学反应，以在覆盖层上生长层中的至少一种，其中至少一种是通过供应单元供应材料的条件和条件基于每个位置处的覆盖层的量的减少的信息，根据封盖层的每个位置来改变提供单元的电磁波的提供，以修复封盖层。

5. 发明申请

US20080304031A1 EXPOSURE APPARATUS 审中-公开
标题翻译：曝光装置
公开(公告)号：US20080304031A1
公开(公告)日：2008-12-11
申请号：US12047579
申请日：2008-03-13
申请人： Mika Kanehira , Shigeru Terashima , Yutaka Watanabe
发明人： Mika Kanehira , Shigeru Terashima , Yutaka Watanabe
IPC分类号： G03B27/42
CPC分类号： G03F7/70916 , G03F7/70808 , G03F7/70841
摘要： An exposure apparatus exposes a substrate using light from a light source having a wavelength of 20 nm or smaller, and includes plural optical elements, each of which is configured to reflect the light, plural vacuum chambers, each of which houses one or more of the plural optical elements, and a gas supplier configured to supply to each vacuum chamber independently a gas used to inhibit contaminations that could occur on the optical element housed in each vacuum chamber, wherein the gas supplier supplies different types of gases to the plural vacuum chambers according to an illuminance of an illumined region on the optical element housed in each vacuum chamber.
摘要翻译：曝光装置使用来自具有20nm以下的波长的光源的光来曝光基板，并且包括多个用于反射光的光学元件，多个真空室容纳一个或多个多个光学元件和气体供给器，被配置为独立地向每个真空室提供用于抑制容纳在每个真空室中的光学元件上可能发生的污染物的气体，其中，所述气体供应器根据到容纳在每个真空室中的光学元件上的照明区域的照度。

6. 发明授权

US06603833B2 X-ray exposure apparatus 失效
公开(公告)号：US06603833B2
公开(公告)日：2003-08-05
申请号：US10003100
申请日：2001-12-06
申请人： Shigeru Terashima , Yutaka Watanabe
发明人： Shigeru Terashima , Yutaka Watanabe
IPC分类号： G03G1504
CPC分类号： G03F7/708 , G03F7/7035 , G03F7/70358 , G03F7/70808 , G21K5/04
摘要： An X-ray exposure apparatus includes a partition structure for defining therein an ambience of one of an atmospheric pressure and a reduced pressure, for accommodating an X-ray mask and an article to be exposed, an X-ray window provided on the partition structure for spatially isolating the inside of the partition structure and an X-ray source, and having a function for transmitting therethrough an X-ray beam with which the article as placed inside the partition structure can be exposed through the X-ray mask, and a scanning mechanism for scanningly moving the X-ray window in a direction intersecting with an optical axis of the X-ray beam, in a single exposure and without interruption at least from just before the start of the exposure to just after the end of the exposure.

7. 发明申请

US20070202423A1 EXPOSURE APPARATUS, CONTROL METHOD FOR THE SAME, AND DEVICE MANUFACTURING METHOD 失效
标题翻译：曝光装置及其控制方法及装置制造方法
公开(公告)号：US20070202423A1
公开(公告)日：2007-08-30
申请号：US11677241
申请日：2007-02-21
申请人： Masayuki Tanabe , Yutaka Watanabe , Shigeru Terashima , Mika Kanehira
发明人： Masayuki Tanabe , Yutaka Watanabe , Shigeru Terashima , Mika Kanehira
IPC分类号： G03G15/04
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70308 , G03F7/70316 , G03F7/70925 , G21K1/062
摘要： An exposure apparatus includes a chamber where an optical element having a capping layer is arranged, and exposes a substrate by using the optical element. The exposure apparatus includes a supply unit which supplies a material to repair the capping layer into the chamber, and a providing unit which provides electromagnetic waves to the optical element. The electromagnetic waves cause a photochemical reaction of the material to grow a layer on the capping layer so as to repair the capping layer.
摘要翻译：曝光装置包括其中布置有具有盖层的光学元件的室，并且通过使用光学元件使基板曝光。曝光装置包括供给单元，该供给单元将覆盖层修复到室中的材料，以及向光学元件提供电磁波的提供单元。电磁波引起材料的光化学反应，以在覆盖层上生长层，从而修复覆盖层。

8. 发明授权

US06351512B1 X-ray exposure apparatus 失效
标题翻译： X射线曝光装置
公开(公告)号：US06351512B1
公开(公告)日：2002-02-26
申请号：US09489914
申请日：2000-01-24
申请人： Shigeru Terashima , Yutaka Watanabe
发明人： Shigeru Terashima , Yutaka Watanabe
IPC分类号： G01N2300
CPC分类号： G03F7/708 , G03F7/7035 , G03F7/70358 , G03F7/70808 , G21K5/04
摘要： An X-ray exposure apparatus includes a partition structure for defining therein an ambience of one of an atmospheric pressure and a reduced pressure, for accommodating an X-ray mask and an article to be exposed, an X-ray window provided on the partition structure for spatially isolating the inside of the partition structure and an X-ray source, and having a function for transmitting therethrough an X-ray beam with which the article as placed inside the partition structure can be exposed through the X-ray mask, and a scanning mechanism for scanningly moving the X-ray window in a direction intersecting with an optical axis of the X-ray beam, in a single exposure and without interruption at least from just before the start of the exposure to just after the end of the exposure.
摘要翻译： X射线曝光装置包括用于在其中限定大气压和减压之一的气氛的分隔结构，用于容纳X射线掩模和待曝光的物品，设置在分隔结构上的X射线窗口用于空间隔离分隔结构的内部和X射线源，并且具有透射X射线束的功能，通过该X射线束，可以通过X射线掩模将分配结构中放置的物品暴露出来，扫描机构，用于在与曝光结束之后至少从曝光开始之前到曝光结束之后的单次曝光和不间断地沿与X射线束的光轴相交的方向扫描地移动X射线窗口。

9. 发明授权

US06463119B1 Exposure method, exposure apparatus and semiconductor manufacturing apparatus 失效
标题翻译：曝光方法，曝光装置和半导体制造装置
公开(公告)号：US06463119B1
公开(公告)日：2002-10-08
申请号：US09589812
申请日：2000-06-09
申请人： Shigeru Terashima , Takeshi Miyachi , Yutaka Watanabe , Kazuyuki Kasumi
发明人： Shigeru Terashima , Takeshi Miyachi , Yutaka Watanabe , Kazuyuki Kasumi
IPC分类号： G21K500
CPC分类号： G03F7/70066
摘要： An exposure apparatus for exposing a photosensitive substrate to a pattern on a mask within an exposure view angle to transfer the pattern onto the photosensitive substrate using X-ray as exposure radiation, wherein exposure light on the mask is limited by a light blocking plate for blocking the exposure radiation, thus accomplishing efficient manufacturing of the semiconductor devices.
摘要翻译：一种曝光装置，用于将感光基片曝光于曝光视角下的掩模上的图案，以使用X射线作为曝光辐射将图案转印到感光基片上，其中掩模上的曝光光被遮光板遮挡曝光辐射，从而实现半导体器件的高效制造。

10. 发明授权

US5790630A Radiation window and radiation system using the same 失效
标题翻译：辐射窗和辐射系统使用相同
公开(公告)号：US5790630A
公开(公告)日：1998-08-04
申请号：US697863
申请日：1996-08-30
申请人： Yutaka Watanabe , Shigeru Terashima
发明人： Yutaka Watanabe , Shigeru Terashima
IPC分类号： G21K5/00 , G21K5/02 , G21K5/04 , H01J5/18 , H05H7/00 , H05H13/04 , G21K1/00
CPC分类号： G21K5/04 , H01J5/18 , H05H7/00
摘要： A radiation window includes a radiation transmitting window material, a supporting frame for gas-tightly supporting an outer periphery of the radiation transmitting window material, a flange for gas-tightly supporting an outer periphery of the supporting frame, and a structure for reducing a stress related to mounting the supporting frame onto the flange.
摘要翻译：辐射窗包括辐射透射窗材料，用于气密地支撑辐射透射窗材料的外周的支撑框架，用于气密地支撑支撑框架的外周的凸缘和用于降低应力的结构涉及将支撑框架安装到凸缘上。

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