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    • 10. 发明授权
    • Plasma CVD method, plasma CVD apparatus, and electrode
    • 等离子体CVD法,等离子体CVD装置和电极
    • US06503579B1
    • 2003-01-07
    • US09403772
    • 1999-11-02
    • Yasuo MurakamiTakahiro Nakahigashi
    • Yasuo MurakamiTakahiro Nakahigashi
    • H05H146
    • H01J37/32532C23C16/26C23C16/509H01J37/32H01J37/32009
    • The invention provides a plasma CVD method and device which can form a uniform or substantially uniform film on an outer surface of an object independently of the shape of the object, and also provides an electrode used in the method and device. More specifically, a plasma is formed from a deposition material gas by supplying an electric power to the gas, and a film is formed on the outer surface of a hollow object having an opening under the plasma. The electrodes for supplying the electric power for forming the gas plasma include an internal electrode arranged in an inner space of the hollow object and an external electrode arranged outside the object. The internal electrode can selectively have a reduced form allowing passage of the electrode through the opening of the hollow object and an enlarged form predetermined in accordance with the volume and shape of the inner space of the object.
    • 本发明提供了一种等离子体CVD方法和装置,其能够独立于物体的形状在物体的外表面上形成均匀或基本均匀的膜,并且还提供了用于该方法和装置的电极。 更具体地,通过向气体供给电力,由沉积材料气体形成等离子体,并且在等离子体下具有开口的中空物体的外表面上形成膜。 用于供应用于形成气体等离子体的电力的电极包括布置在中空物体的内部空间中的内部电极和布置在物体外部的外部电极。 内部电极可以选择性地具有减小的形状,允许电极通过中空物体的开口,并且根据物体的内部空间的体积和形状预定的放大形式。