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    • 5. 发明申请
    • MEMORY SYSTEM INCLUDING KEY-VALUE STORE
    • 存储系统,包括键值存储
    • US20130042055A1
    • 2013-02-14
    • US13569542
    • 2012-08-08
    • Atsuhiro KINOSHITATakao MarukameKosuke Tatsumura
    • Atsuhiro KINOSHITATakao MarukameKosuke Tatsumura
    • G06F12/06G06F12/02G06F12/00
    • G06F17/30587G06F12/0292
    • According to one embodiment, a memory system including a key-value store containing key-value data as a pair of a key and a value corresponding to the key, includes a first memory, a control circuit and a second memory. The first memory is configured to contain a data area for storing data, and a table area containing the key-value data. The control circuit is configured to perform write and read to the first memory by addressing, and execute a request based on the key-value store. The second memory is configured to store the key-value data in accordance with an instruction from the control circuit. The control circuit performs a set operation by using the key-value data stored in the first memory, and the key-value data stored in the second memory.
    • 根据一个实施例,包括包含键值数据作为一对键和与该键对应的值的键值存储器的存储器系统包括第一存储器,控制电路和第二存储器。 第一存储器被配置为包含用于存储数据的数据区域和包含键值数据的表区域。 控制电路被配置为通过寻址来执行对第一存储器的写入和读取,并且基于键值存储执行请求。 第二存储器被配置为根据来自控制电路的指令存储键值数据。 控制电路通过使用存储在第一存储器中的键值数据和存储在第二存储器中的键值数据来执行设置操作。
    • 6. 发明申请
    • NEURON DEVICE
    • 神经元设备
    • US20090250742A1
    • 2009-10-08
    • US12043193
    • 2008-03-06
    • Atsuhiro KINOSHITAYoshifumi Nishi
    • Atsuhiro KINOSHITAYoshifumi Nishi
    • H01L29/788
    • H01L29/7881H01L21/28273H01L27/11521H01L29/42324H01L29/66825H01L29/785
    • A neuron device includes: a semiconductor layer; source and drain regions formed in the semiconductor layer at a distance from each other; a protection film formed on an upper face of the semiconductor layer; a channel region formed in the semiconductor layer between the source region and the drain region; a pair of gate insulating films formed on two side faces of the channel region; a floating gate electrode including: a first portion covered on the gate insulating films and the protection film; a second portion connected to the first portion; and a third portion provided on the substrate so as to connect to the end portion of the second portion on the opposite side from the first portion; an interelectrode insulating film provided on the first to third portions; and a plurality of control gate electrodes provided on the third portion.
    • 神经元装置包括:半导体层; 源极和漏极区域形成在半导体层中彼此间隔一定距离; 形成在所述半导体层的上表面上的保护膜; 在所述源极区域和所述漏极区域之间的所述半导体层中形成的沟道区域; 形成在沟道区域的两个侧面上的一对栅极绝缘膜; 一种浮栅电极,包括:覆盖在栅极绝缘膜和保护膜上的第一部分; 连接到第一部分的第二部分; 以及第三部分,设置在所述基板上,以便在与所述第一部分相反的一侧连接到所述第二部分的端部; 设置在所述第一至第三部分上的电极间绝缘膜; 以及设置在第三部分上的多个控制栅电极。
    • 8. 发明申请
    • NONVOLATILE PROGRAMMABLE LOGIC SWITCH
    • 非易失性可编程逻辑开关
    • US20120080739A1
    • 2012-04-05
    • US13221292
    • 2011-08-30
    • Daisuke HAGISHIMAAtsuhiro KINOSHITAKazuya MATSUZAWAKazutaka IKEGAMIYoshifumi NISHI
    • Daisuke HAGISHIMAAtsuhiro KINOSHITAKazuya MATSUZAWAKazutaka IKEGAMIYoshifumi NISHI
    • H01L29/792
    • H01L29/7881G11C16/0408H01L27/1052H01L27/11521H01L27/11526H01L27/11546H01L27/11807H01L29/66825
    • A nonvolatile programmable logic switch according to an embodiment includes: a memory cell transistor including: a first source region and a first drain region of a second conductivity type formed at a distance from each other in a first semiconductor region of a first conductivity type; a first insulating film, a charge storage film, a second insulating film, and a control gate stacked in this order and formed on the first semiconductor region between the first source region and the first drain region; a pass transistor including: a second source region and a second drain region of a second conductivity type formed at a distance from each other in a second semiconductor region of the first conductivity type; a third insulating film, a gate electrode stacked in this order and formed on the second semiconductor region between the second source region and the second drain region, the gate electrode being electrically connected to the first drain region; and an electrode for applying a substrate bias to the first and second semiconductor regions.
    • 根据实施例的非易失性可编程逻辑开关包括:存储单元晶体管,包括:在第一导电类型的第一半导体区域中彼此间隔开形成的第二导电类型的第一源极区域和第一漏极区域; 第一绝缘膜,电荷存储膜,第二绝缘膜和控制栅极,并且形成在第一源极区域和第一漏极区域之间的第一半导体区域上; 传输晶体管,包括:在第一导电类型的第二半导体区域中彼此成一定距离地形成的第二导电类型的第二源极区域和第二漏极区域; 第三绝缘膜,栅极电极,并且形成在第二源极区域和第二漏极区域之间的第二半导体区域上,栅极电连接到第一漏极区域; 以及用于将衬底偏压施加到第一和第二半导体区域的电极。
    • 10. 发明申请
    • NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME
    • 非易失性半导体存储器件及其制造方法
    • US20120068241A1
    • 2012-03-22
    • US13236734
    • 2011-09-20
    • Kiwamu SAKUMAAtsuhiro KINOSHITA
    • Kiwamu SAKUMAAtsuhiro KINOSHITA
    • H01L29/78H01L21/28
    • H01L27/11578H01L27/11519H01L27/11524H01L27/11551H01L27/11565H01L29/785H01L29/792
    • According to one embodiment, a memory device includes first and second fin type stacked structures each includes first to i-th memory strings (i is a natural number except 1) that are stacked in a first direction, the first and second fin type stacked structures which extend in a second direction and which are adjacent in a third direction, a first portion connected to one end in the second direction of the first fin type stacked structure, a width in the third direction of the first portion being greater than a width in the third direction of the first fin type stacked structure, and a second portion connected to one end in the second direction of the second fin type stacked structure, a width in the third direction of the second portion being greater than a width in the third direction of the second fin type stacked structure.
    • 根据一个实施例,存储器件包括第一和第二鳍式堆叠结构,每个第一和第二鳍式堆叠结构每个包括沿第一方向堆叠的第一至第i存储器串(i是除1之外的自然数),第一和第二鳍式堆叠结构 其在第二方向上延伸并且在第三方向上相邻,第一部分连接到第一鳍式堆叠结构的第二方向上的一端,第一部分的第三方向上的宽度大于第一方向上的宽度 第一鳍式堆叠结构的第三方向和与第二鳍式堆叠结构的第二方向的一端连接的第二部分,第二部分的第三方向上的宽度大于第三方向上的宽度 的第二鳍式堆叠结构。