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1. 发明授权

US08518618B2 Electrophotographic photoconductor, image forming apparatus, and process cartridge 有权
标题翻译：电子照相感光体，成像设备和处理盒
公开(公告)号：US08518618B2
公开(公告)日：2013-08-27
申请号：US13171794
申请日：2011-06-29
申请人： Takafumi Iwamoto , Naohiro Toda , Yoshitaka Uenoyama , Hidetoshi Ono
发明人： Takafumi Iwamoto , Naohiro Toda , Yoshitaka Uenoyama , Hidetoshi Ono
IPC分类号： G03G5/00
CPC分类号： G03G15/751 , G03G5/0539 , G03G5/0542 , G03G5/0546 , G03G5/0589 , G03G5/0592 , G03G5/0596 , G03G5/071 , G03G5/14717 , G03G5/14726 , G03G5/14734 , G03G5/14747 , G03G5/14786 , G03G5/14791 , G03G5/14795
摘要： To provide an electrophotographic photoconductor, containing: a conductive support; a photosensitive layer provided above the conductive support; and a hardened protective layer provided above the photosensitive layer, wherein the hardened protective layer contains a hardened product of a radical polymerizable compound containing an adamantane skeleton.
摘要翻译：提供电子照相感光体，其包含：导电性支持体; 设置在所述导电支撑体上方的感光层; 以及设置在感光层上方的硬化保护层，其中硬化保护层含有含有金刚烷骨架的自由基聚合性化合物的硬化产物。

2. 发明申请

US20120009513A1 ELECTROPHOTOGRAPHIC PHOTOCONDUCTOR, IMAGE FORMING APPARATUS, AND PROCESS CARTRIDGE 有权
标题翻译：电子照相机，图像形成装置和工艺盒
公开(公告)号：US20120009513A1
公开(公告)日：2012-01-12
申请号：US13171794
申请日：2011-06-29
申请人： Takafumi IWAMOTO , Naohiro Toda , Yoshitaka Uenoyama , Hidetoshi Ono
发明人： Takafumi IWAMOTO , Naohiro Toda , Yoshitaka Uenoyama , Hidetoshi Ono
IPC分类号： G03G15/00 , G03G21/16
CPC分类号： G03G15/751 , G03G5/0539 , G03G5/0542 , G03G5/0546 , G03G5/0589 , G03G5/0592 , G03G5/0596 , G03G5/071 , G03G5/14717 , G03G5/14726 , G03G5/14734 , G03G5/14747 , G03G5/14786 , G03G5/14791 , G03G5/14795
摘要： To provide an electrophotographic photoconductor, containing: a conductive support; a photosensitive layer provided above the conductive support; and a hardened protective layer provided above the photosensitive layer, wherein the hardened protective layer contains a hardened product of a radical polymerizable compound containing an adamantane skeleton.
摘要翻译：提供电子照相感光体，其包含：导电性支持体; 设置在所述导电支撑体上方的感光层; 以及设置在感光层上方的硬化保护层，其中硬化保护层含有含有金刚烷骨架的自由基聚合性化合物的硬化产物。

3. 发明申请

US20130143157A1 HOMOADAMANTANE DERIVATIVES, PROCESS FOR PREPARING SAME, AND PHOTORESIST COMPOSITIONS 有权
标题翻译：同型异构体衍生物，其制备方法和光电组合物
公开(公告)号：US20130143157A1
公开(公告)日：2013-06-06
申请号：US13816071
申请日：2011-07-26
申请人： Shinji Tanaka , Yoshitaka Uenoyama , Hidetoshi Ono , Naoya Kawano , Katsuki Ito
发明人： Shinji Tanaka , Yoshitaka Uenoyama , Hidetoshi Ono , Naoya Kawano , Katsuki Ito
IPC分类号： G03F7/004 , C07D313/06
CPC分类号： G03F7/004 , C07D313/06 , C07D313/10 , C08F220/28 , C08F220/30 , G03F7/0397
摘要： A compound represented by the following formula (I), wherein R1 is a hydrogen atom, a halogen atom, a methyl group or a trifluoromethyl group.
摘要翻译：由下式（I）表示的化合物，其中R 1是氢原子，卤素原子，甲基或三氟甲基。

4. 发明授权

US09513545B2 Homoadamantane derivatives, process for preparing same, and photoresist compositions 有权
标题翻译：高金刚烷衍生物，其制备方法和光致抗蚀剂组合物
公开(公告)号：US09513545B2
公开(公告)日：2016-12-06
申请号：US13816071
申请日：2011-07-26
申请人： Shinji Tanaka , Yoshitaka Uenoyama , Hidetoshi Ono , Naoya Kawano , Katsuki Ito
发明人： Shinji Tanaka , Yoshitaka Uenoyama , Hidetoshi Ono , Naoya Kawano , Katsuki Ito
IPC分类号： C08F220/28 , C08F220/30 , C07D313/06 , C07D313/10 , G03F7/004 , G03F7/039
CPC分类号： G03F7/004 , C07D313/06 , C07D313/10 , C08F220/28 , C08F220/30 , G03F7/0397
摘要： A compound represented by the following formula (I), wherein R1 is a hydrogen atom, a halogen atom, a methyl group or a trifluoromethyl group.

5. 发明申请

US20130022914A1 HOMOADAMANTANE DERIVATIVE, METHOD FOR PRODUCING THE SAME AND PHOTOSENSITIVE MATERIALS FOR PHOTORESIST 审中-公开
标题翻译：羟基衍生物衍生物，其制备方法和光致抗蚀剂的感光材料
公开(公告)号：US20130022914A1
公开(公告)日：2013-01-24
申请号：US13638979
申请日：2011-03-16
申请人： Shinji Tanaka , Yoshitaka Uenoyama , Hidetoshi Ono , Naoya Kawano , Katsuki Ito
发明人： Shinji Tanaka , Yoshitaka Uenoyama , Hidetoshi Ono , Naoya Kawano , Katsuki Ito
IPC分类号： C07D313/06 , G03F7/004 , G03F7/20 , C08F122/20
CPC分类号： G03F7/039 , C07D313/10 , C08F20/26 , C08F222/10 , C08F224/00 , G03F7/0397 , G03F7/165 , G03F7/20 , G03F7/30 , G03F7/322
摘要： A homoadamantane derivative represented by the following formula (I): wherein R1 and R2 are independently a hydrogen atom or a linear, branched or cyclic hydrocarbon group having 1 to 6 carbon atoms, x is a hydroxyl group or a halogen atom, and n and m are independently an integer of 0 to 3, provided that n and m are not simultaneously 0.
摘要翻译：由下式（I）表示的高金刚烷衍生物：其中R1和R2独立地为氢原子或具有1至6个碳原子的直链，支链或环状烃基，x为羟基或卤素原子，n和 m独立地为0〜3的整数，条件是n和m不同时为0。

6. 发明申请

US20150316847A1 HOMOADAMANTANE DERIVATIVE, METHOD FOR PRODUCING THE SAME AND PHOTOSENSITIVE MATERIALS FOR PHOTORESIST 审中-公开
标题翻译：羟基衍生物衍生物，其制备方法和光致抗蚀剂的感光材料
公开(公告)号：US20150316847A1
公开(公告)日：2015-11-05
申请号：US14798990
申请日：2015-07-14
申请人： Shinji TANAKA , Yoshitaka Uenoyama , Hidetoshi Ono , Naoya Kawano , Katsuki Ito
发明人： Shinji TANAKA , Yoshitaka Uenoyama , Hidetoshi Ono , Naoya Kawano , Katsuki Ito
IPC分类号： G03F7/039 , C08F222/10 , G03F7/30 , G03F7/16 , G03F7/20
CPC分类号： G03F7/039 , C07D313/10 , C08F20/26 , C08F222/10 , C08F224/00 , G03F7/0397 , G03F7/165 , G03F7/20 , G03F7/30 , G03F7/322
摘要： A (meth)acrylic polymer obtained by polymerizing a (meth)acrylic ester of formula wherein R1 and R2 are each independently a hydrogen atom or a linear, branched or cyclic hydrocarbon group having 1 to 6 carbon atoms; R3 is a hydrogen atom, a methyl group, or a trifluoromethyl group; and n and m are each independently an integer of 0 to 3, provided that n and m are not simultaneously 0. Also, a positive photoresist composition including the (meth)acrylic polymer and a method of forming a photoresist pattern with the positive photoresist composition.
摘要翻译：通过使下式的（甲基）丙烯酸酯聚合而得到的（甲基）丙烯酸系聚合物，其中R 1和R 2各自独立地为氢原子或具有1〜6个碳原子的直链，支链或环状烃基; R3是氢原子，甲基或三氟甲基; n和m各自独立地为0〜3的整数，条件是n和m不同时为O.此外，包含（甲基）丙烯酸类聚合物的正性光致抗蚀剂组合物和形成具有正性光致抗蚀剂组合物的光刻胶图案的方法。

7. 发明授权

US07402712B2 Adamantyl vinyl ether compound and production process for the same 失效
标题翻译：金刚烷基乙烯基醚化合物及其制备方法相同
公开(公告)号：US07402712B2
公开(公告)日：2008-07-22
申请号：US10862423
申请日：2004-06-08
申请人： Naoyoshi Hatakeyama , Shinji Tanaka , Hidetoshi Ono , Kouichi Kodoi
发明人： Naoyoshi Hatakeyama , Shinji Tanaka , Hidetoshi Ono , Kouichi Kodoi
IPC分类号： C07C43/18
CPC分类号： C07C43/30 , C07C43/313 , C07C49/753 , C07C2603/74
摘要： Provided by the present invention are an adamantyl vinyl ether compound which is useful as a monomer for functional resins in the photolithography field or a raw material therefor and medical and agricultural intermediates and a production process for the same.The present invention relates to a production process for an adamantyl vinyl ether compound, characterized by subjecting an adamantyl vinyl ether compound having a specific structure and alcohol having an eliminating group in a β position to chloroalkyl-etherification, then subjecting it to etherification to form an adamantyl group-containing ether and then subjecting it to vinyl-etherification.
摘要翻译：由本发明提供的金刚烷基乙烯基醚化合物可用作光刻领域中的功能性树脂的单体或其原料，医药和农业中间体及其生产方法。金刚烷基乙烯基醚化合物的制造方法技术领域本发明涉及一种金刚烷基乙烯基醚化合物的制造方法，其特征在于，将具有特定结构的金刚烷基乙烯基醚化合物和具有消除基团的醇在β位置进行氯代烷基醚化，然后使其进行醚化，形成含有金刚烷基的醚，然后使其进行乙烯基醚化。

8. 发明申请

US20050131247A1 Perfluoroadamantly acrylate compound and intermediate therefor 失效
标题翻译：全氟多官能丙烯酸酯化合物及其中间体
公开(公告)号：US20050131247A1
公开(公告)日：2005-06-16
申请号：US10499305
申请日：2002-12-20
申请人： Shinji Tanaka , Toshihide Yoshitome , Kouichi Kodoi , Hidetoshi Ono , Naoyoshi Hatakeyama
发明人： Shinji Tanaka , Toshihide Yoshitome , Kouichi Kodoi , Hidetoshi Ono , Naoyoshi Hatakeyama
IPC分类号： C07C69/54 , C07C35/52 , C07C69/00 , C07C69/013 , C07C69/653 , C08F20/22 , C08F297/04 , C08L33/06 , C08L33/08 , C08L53/02 , C07C69/62 , C07C35/22 , C07C69/52
CPC分类号： C07C69/653 , C07C35/52 , C07C2603/74 , C08F297/04 , C08L33/04 , C08L33/06 , C08L33/08 , C08L53/02 , C08L53/025 , C08L2666/24 , C08L33/00 , C08L2666/04 , C08L2666/02
摘要： A perfluoroadamantyl acrylate compound which is highly useful as a raw material for functional resins,etc.;and an intermediate therefore. The perfluoroadamantyl acrylate compound comprises perfluoroadamantane having a CH2═C(R)COO group(wherein R is a hydrogen atom, a methyl group or a trifluoromethyl group) at the 1-position, at each of the 1- and 3-positions, at each of the 1-,3- and 5-positions, at each of the 1-,3-,5- and 7-positions, or at the 2-position.
摘要翻译：作为功能性树脂的原料高度有用的丙烯酸全氟金刚烷酯化合物等;以及中间体。全氟金刚烷基丙烯酸酯化合物包括在1位上具有CH 2 -C（R）COO基团（其中R是氢原子，甲基或三氟甲基）的全氟金刚烷，在1 - ，3 - ，5 - 和7 - 位，或2-位的每个位置上，在1 - ，3 - 和5 - 位的每个位置上有1 - 和3 - 位。

9. 发明申请

US20100022730A1 POLYMERIZABLE COMPOUND HAVING ADAMANTANE STRUCTURE, PROCESS FOR PRODUCTION OF THE SAME, AND RESIN COMPOSITION 审中-公开
标题翻译：具有ADAMANTANE结构的可聚合化合物，其生产方法和树脂组合物
公开(公告)号：US20100022730A1
公开(公告)日：2010-01-28
申请号：US12376122
申请日：2007-07-09
申请人： Naoyoshi Hatakeyama , Hidetoshi Ono , Katsuki Ito
发明人： Naoyoshi Hatakeyama , Hidetoshi Ono , Katsuki Ito
IPC分类号： C08F18/20 , C07C69/54 , C07C69/593
CPC分类号： C07C67/10 , C07C67/29 , C07C2601/14 , C07C2603/74 , C08F220/24 , G03F7/0046 , G03F7/027 , G03F7/0397 , G03F7/11 , G03F7/2041 , C07C69/653
摘要： A polymerizable compound having a fluorinated substituent (Z) represented by the general formula (1), an adamantane structure and a polymerizable group (A) having the structure represented by the general formula (1), a production method thereof, and a photoresist composition, a thermocurable resin composition and a photocurable resin composition containing a polymer obtained using the polymerizable compound are provided. Use of the polymerizable compound with the adamantane structure and a resin composition thereof in the present invention provides in the field of photolithography the effect of preventing a liquid immersion medium from penetration and improving dry etching resistance in a liquid immersion exposure method as well as reducing adhesion to a mold and improving dry etching resistance in a nanoimprint method.
摘要翻译：具有由通式（1）表示的氟化取代基（Z），金刚烷结构和具有通式（1）表示的结构的聚合性基团（A）的聚合性化合物，其制造方法和光致抗蚀剂组合物提供了一种耐热树脂组合物和含有使用该聚合性化合物得到的聚合物的光固化性树脂组合物。在本发明中使用具有金刚烷结构的可聚合化合物和其树脂组合物在光刻领域中提供了防止液浸介质渗透的效果，并且在液浸曝光方法中提高了耐干蚀刻性以及降低附着力并且在纳米压印方法中提高干蚀刻电阻。

10. 发明申请

US20060149073A1 Adamantane derivative and process for producing the same 有权
标题翻译：金刚烷衍生物及其制备方法
公开(公告)号：US20060149073A1
公开(公告)日：2006-07-06
申请号：US10540547
申请日：2003-12-18
申请人： Shinji Tanaka , Hidetoshi Ono , Kouichi Kodoi , Naoyoshi Hatakeyama
发明人： Shinji Tanaka , Hidetoshi Ono , Kouichi Kodoi , Naoyoshi Hatakeyama
IPC分类号： C07C43/18
CPC分类号： C07C43/12 , C07C43/192 , C07C49/517 , C07C2603/74 , G03F7/0045
摘要： Provided is an adamantane derivative represented by Formula (I) or (II): wherein X represents a halogen atom; Y represents an alkyl group having 1 to 10 carbon atoms, a halogenated alkyl group having 1 to 10 carbon atoms, a halogen atom or a hetero atom-containing group; R1 to R4 represent independently hydrogen, a halogen atom, an alkyl group having 1 to 10 carbon atoms or a halogenated alkyl group having 1 to 10 carbon atoms; m represents an integer of 0 to 15, and n represents an integer of 0 to 10; and excluded is a case where in Formula (I), m and n are 0 at the same time and R3 and R4 are a hydrogen atom at the same time. Capable of being provided is a novel adamantane derivative which is useful as a modifying agent for a resin for a photoresist and a dry etching resistance-improving agent in the photolithography field, agricultural and medical intermediates and other various industrial products.
摘要翻译：提供由式（I）或（II）表示的金刚烷衍生物：其中X表示卤素原子; Y表示碳原子数1〜10的烷基，碳原子数1〜10的卤代烷基，卤原子或含杂原子的基团。 R 1至R 4独立地表示氢，卤素原子，具有1至10个碳原子的烷基或具有1至10个碳原子的卤代烷基; m表示0〜15的整数，n表示0〜10的整数。并且排除是在式（I）中同时m和n同时为0并且R 3和R 4同时为氢原子的情况。可以提供的是一种新颖的金刚烷衍生物，其可用作光刻胶树脂和光刻领域的干蚀刻抗蚀剂改性剂，农业和医疗中间体等各种工业产品的改性剂。

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