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    • 3. 发明授权
    • Method of optimizing lithography tools utilization
    • 优化光刻工具利用的方法
    • US09081306B2
    • 2015-07-14
    • US13622675
    • 2012-09-19
    • Taiwan Semiconductor Manufacturing Company, Ltd.
    • Yao-Hwan KaoFei-Gwo TsaiLi-Kong TumChing-Hai YangSteven Liu
    • G03B27/42G03B27/32G03F7/20H01L21/67
    • G03F7/70733G03F7/20H01L21/67155
    • A lithography cluster includes at least two lithography cells having a first lithography cell and a second lithography cell, an interface unit configured to integrate with the first lithography cell and the second lithography cell. The first lithography cell includes a first track and a first exposing tool and a second lithography cell includes a second track and a second exposing tool. The interface station includes a first interface buffer configured to couple the first track, a second interface buffer configured to couple the second track, a conveyor configured to couple the first interface buffer and the second interface buffer, and a robot configure to move along the conveyor, where in the robot transfers a substrate between functions of multiple functions within the first lithography cell, the second lithography cell, or between the first lithography cell and the second lithography cell.
    • 光刻簇包括具有第一光刻单元和第二光刻单元的至少两个光刻单元,被配置为与第一光刻单元和第二光刻单元集成的接口单元。 第一光刻单元包括第一轨道和第一曝光工具,第二光刻单元包括第二轨道和第二曝光工具。 接口站包括被配置为耦合第一轨道的第一接口缓冲器,被配置为耦合第二轨道的第二接口缓冲器,被配置为耦合第一接口缓冲器和第二接口缓冲器的传送器,以及被配置为沿着传送器移动的机器人 其中机器人在第一光刻单元,第二光刻单元或第一光刻单元与第二光刻单元之间的多功能功能之间传送基板。