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1. 发明授权

US11344910B2 Spin dispenser module substrate surface protection system 有权
公开(公告)号：US11344910B2
公开(公告)日：2022-05-31
申请号：US15858797
申请日：2017-12-29
申请人： Taiwan Semiconductor Manufacturing Company, Ltd.
发明人： Ching-Hai Yang , Yao-Hwan Kao , Shang-Sheng Li , Kuo-Pin Chen , Hsiang-Kai Tseng , Chuan-Wei Chen
IPC分类号： B05D1/00 , B05C11/10 , B05C11/08 , B05B11/00 , G03F7/16 , G03F7/30 , H01L21/67
摘要： A spin dispenser module and methods for using the same is disclosed. The spin dispenser module includes a cup having a basin with sidewalls and an exhaust, a rotatable platform situated inside the cup adapted for holding and rotating a substrate, a liquid dispenser disposed over the rotatable platform for dispensing a liquid coating material on top of the substrate, one or more ejector inlets disposed over the rotatable platform, the one or more ejectors connected to a negative pressure source, and a motor coupled to the rotatable platform to rate the rotatable platform at different rotational speeds. The one or more ejector inlets may be translatable and/or rotatable with optionally adjustable suction pressure. The ejector inlets operate after a liquid coating material is dispensed to avoid deposition of suspended organic compounds after a coating is formed.

2. 发明申请

US20180117621A1 Spin Dispenser Module Substrate Surface Protection System 审中-公开
公开(公告)号：US20180117621A1
公开(公告)日：2018-05-03
申请号：US15858797
申请日：2017-12-29
申请人： Taiwan Semiconductor Manufacturing Company, Ltd.
发明人： Ching-Hai Yang , Yao-Hwan Kao , Shang-Sheng Li , Kuo-Pin Chen , Hsiang-Kai Tseng , Chuan-Wei Chen
IPC分类号： B05C11/10 , B05C11/08 , G03F7/30 , G03F7/16 , H01L21/67 , B05B11/00
CPC分类号： B05C11/1039 , B05B11/3097 , B05C11/08 , G03F7/162 , G03F7/3021 , H01L21/6715
摘要： A spin dispenser module and methods for using the same is disclosed. The spin dispenser module includes a cup having a basin with sidewalls and an exhaust, a rotatable platform situated inside the cup adapted for holding and rotating a substrate, a liquid dispenser disposed over the rotatable platform for dispensing a liquid coating material on top of the substrate, one or more ejector inlets disposed over the rotatable platform, the one or more ejectors connected to a negative pressure source, and a motor coupled to the rotatable platform to rate the rotatable platform at different rotational speeds. The one or more ejector inlets may be translatable and/or rotatable with optionally adjustable suction pressure. The ejector inlets operate after a liquid coating material is dispensed to avoid deposition of suspended organic compounds after a coating is formed.

3. 发明授权

US09081306B2 Method of optimizing lithography tools utilization 有权
标题翻译：优化光刻工具利用的方法
公开(公告)号：US09081306B2
公开(公告)日：2015-07-14
申请号：US13622675
申请日：2012-09-19
申请人： Taiwan Semiconductor Manufacturing Company, Ltd.
发明人： Yao-Hwan Kao , Fei-Gwo Tsai , Li-Kong Tum , Ching-Hai Yang , Steven Liu
IPC分类号： G03B27/42 , G03B27/32 , G03F7/20 , H01L21/67
CPC分类号： G03F7/70733 , G03F7/20 , H01L21/67155
摘要： A lithography cluster includes at least two lithography cells having a first lithography cell and a second lithography cell, an interface unit configured to integrate with the first lithography cell and the second lithography cell. The first lithography cell includes a first track and a first exposing tool and a second lithography cell includes a second track and a second exposing tool. The interface station includes a first interface buffer configured to couple the first track, a second interface buffer configured to couple the second track, a conveyor configured to couple the first interface buffer and the second interface buffer, and a robot configure to move along the conveyor, where in the robot transfers a substrate between functions of multiple functions within the first lithography cell, the second lithography cell, or between the first lithography cell and the second lithography cell.
摘要翻译：光刻簇包括具有第一光刻单元和第二光刻单元的至少两个光刻单元，被配置为与第一光刻单元和第二光刻单元集成的接口单元。第一光刻单元包括第一轨道和第一曝光工具，第二光刻单元包括第二轨道和第二曝光工具。接口站包括被配置为耦合第一轨道的第一接口缓冲器，被配置为耦合第二轨道的第二接口缓冲器，被配置为耦合第一接口缓冲器和第二接口缓冲器的传送器，以及被配置为沿着传送器移动的机器人其中机器人在第一光刻单元，第二光刻单元或第一光刻单元与第二光刻单元之间的多功能功能之间传送基板。

4. 发明申请

US20140054212A1 SYSTEM AND METHOD FOR REPLACING RESIST FILTER TO REDUCE RESIST FILTER-INDUCED WAFER DEFECTS 有权
标题翻译：用于更换阻抗滤波器以减少抗性滤波器诱导的波形缺陷的系统和方法
公开(公告)号：US20140054212A1
公开(公告)日：2014-02-27
申请号：US14075923
申请日：2013-11-08
申请人： Taiwan Semiconductor Manufacturing Company, Ltd.
发明人： Yao-Hwan Kao , Po-Chang Huang
IPC分类号： B01D35/02
CPC分类号： B01D35/02 , G03F7/162 , G03F7/3092
摘要： System and method for replacing a resist filter in such a manner as to reduce filter-induced wafer defects are described. In one embodiment, the system comprises a filtration system connected to a dispenser, the filtration system comprising a filter; and a switch connected to the filter for selectively connecting the filtration system to throughput one of a first chemical solution and a second chemical solution.
摘要翻译：描述了以减少滤波器引起的晶片缺陷的方式替换抗蚀剂滤光器的系统和方法。在一个实施例中，系统包括连接到分配器的过滤系统，该过滤系统包括过滤器; 以及连接到过滤器的开关，用于将过滤系统选择性地连接到第一化学溶液和第二化学溶液中的一种。

5. 发明申请

US20150224532A1 Spin Dispenser Module Substrate Surface Protection System 有权
标题翻译：旋转分配器模块基板表面保护系统
公开(公告)号：US20150224532A1
公开(公告)日：2015-08-13
申请号：US14179337
申请日：2014-02-12
申请人： Taiwan Semiconductor Manufacturing Company, Ltd.
发明人： Ching-Hai Yang , Yao-Hwan Kao , Shang-Sheng Li , Kuo-Pin Chen , Hsiang-Kai Tseng , Chuan-Wei Chen
IPC分类号： B05C11/10 , B05D1/00 , B05C11/08
CPC分类号： B05C11/1039 , B05B11/3097 , B05C11/08 , G03F7/162 , G03F7/3021 , H01L21/6715
摘要： A spin dispenser module and methods for using the same is disclosed. The spin dispenser module includes a cup having a basin with sidewalls and an exhaust, a rotatable platform situated inside the cup adapted for holding and rotating a substrate, a liquid dispenser disposed over the rotatable platform for dispensing a liquid coating material on top of the substrate, one or more ejector inlets disposed over the rotatable platform, the one or more ejectors connected to a negative pressure source, and a motor coupled to the rotatable platform to rate the rotatable platform at different rotational speeds. The one or more ejector inlets may be translatable and/or rotatable with optionally adjustable suction pressure. The ejector inlets operate after a liquid coating material is dispensed to avoid deposition of suspended organic compounds after a coating is formed.
摘要翻译：公开了一种旋转分配器模块及其使用方法。旋转分配器模块包括具有带有侧壁和排气口的盆的杯子，位于杯内部的适于保持和旋转基底的可旋转平台，设置在可旋转平台上的液体分配器，用于在基底顶部分配液体涂层材料设置在所述可旋转平台上的一个或多个喷射器入口，所述一个或多个喷射器连接到负压源，以及耦合到所述可旋转平台的马达，以在不同转速下对所述可旋转平台进行评估。一个或多个喷射器入口可以是可任意调节的吸入压力的可平移和/或旋转。喷射器入口在液体涂层材料分配后运行，以避免在形成涂层后沉积悬浮的有机化合物。

6. 发明授权

US12019370B2 Method and system for manufacturing a semiconductor device 有权
公开(公告)号：US12019370B2
公开(公告)日：2024-06-25
申请号：US17462943
申请日：2021-08-31
申请人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
发明人： Wei-Han Huang , Hao Yuan Chang , Yao-Hwan Kao
IPC分类号： G03F7/00 , G03F7/16 , G03F7/32
CPC分类号： G03F7/0025 , G03F7/32 , G03F7/70933 , G03F7/162
摘要： A method for manufacturing a semiconductor device includes forming a photoresist layer comprising a photoresist composition over a substrate to form a photoresist-coated substrate. The photoresist layer is selectively exposed to actinic radiation to form a latent pattern in the photoresist layer. The latent pattern is developed by applying a developer to the selectively exposed photoresist layer to form a patterned photoresist layer exposing a portion of the substrate, and a purge gas is applied to the patterned photoresist layer.

7. 发明授权

US09855579B2 Spin dispenser module substrate surface protection system 有权
公开(公告)号：US09855579B2
公开(公告)日：2018-01-02
申请号：US14179337
申请日：2014-02-12
申请人： Taiwan Semiconductor Manufacturing Company, Ltd.
发明人： Ching-Hai Yang , Yao-Hwan Kao , Shang-Sheng Li , Kuo-Pin Chen , Hsiang-Kai Tseng , Chuan-Wei Chen
IPC分类号： B05C11/10 , B05C11/08 , B05B11/00 , G03F7/16 , G03F7/30 , H01L21/67
CPC分类号： B05C11/1039 , B05B11/3097 , B05C11/08 , G03F7/162 , G03F7/3021 , H01L21/6715
摘要： A spin dispenser module and methods for using the same is disclosed. The spin dispenser module includes a cup having a basin with sidewalls and an exhaust, a rotatable platform situated inside the cup adapted for holding and rotating a substrate, a liquid dispenser disposed over the rotatable platform for dispensing a liquid coating material on top of the substrate, one or more ejector inlets disposed over the rotatable platform, the one or more ejectors connected to a negative pressure source, and a motor coupled to the rotatable platform to rate the rotatable platform at different rotational speeds. The one or more ejector inlets may be translatable and/or rotatable with optionally adjustable suction pressure. The ejector inlets operate after a liquid coating material is dispensed to avoid deposition of suspended organic compounds after a coating is formed.

8. 发明授权

US09375665B2 System and method for replacing resist filter to reduce resist filter-induced wafer defects 有权
公开(公告)号：US09375665B2
公开(公告)日：2016-06-28
申请号：US14075923
申请日：2013-11-08
申请人： Taiwan Semiconductor Manufacturing Company, Ltd.
发明人： Yao-Hwan Kao , Po-Chang Huang
IPC分类号： B01D35/02 , G03F7/26 , G03F7/16 , G03F7/30
CPC分类号： B01D35/02 , G03F7/162 , G03F7/3092
摘要： System and method for replacing a resist filter in such a manner as to reduce filter-induced wafer defects are described. In one embodiment, the system comprises a filtration system connected to a dispenser, the filtration system comprising a filter; and a switch connected to the filter for selectively connecting the filtration system to throughput one of a first chemical solution and a second chemical solution.

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