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1. 发明公开

US20230408915A1 DEVELOPING APPARATUS AND SUBSTRATE PROCESSING APPARATUS 审中-公开
公开(公告)号：US20230408915A1
公开(公告)日：2023-12-21
申请号：US18333570
申请日：2023-06-13
申请人： STATS ChipPAC Pte. Ltd.
发明人： Giwoong NAM , Jin KWAK , Jaeseung LEE , Taekyu CHOI , Inho SON , Sanghyun PARK , Yeongwon KANG
IPC分类号： G03F7/00
CPC分类号： G03F7/0025
摘要： The present application relates to a developing apparatus. The developing apparatus comprises a housing; a wafer support disposed within the housing and for holding a wafer; a semipermeable diaphragm disposed within the housing and separating the housing into an upper housing defining an upper chamber and a lower housing defining a low chamber, wherein the semipermeable diaphragm is semipermeable to moisture such that moisture is allowed to move from the lower chamber to the upper chamber, but liquid drops are prohibited to move from the upper chamber to the lower chamber; and a nozzle assembly disposed above the wafer support and for spraying at least developer to the wafer support.

2. 发明公开

US20230168579A1 PRINTER DEVICE, PRINTING METHOD, AND PROGRAM 审中-公开
公开(公告)号：US20230168579A1
公开(公告)日：2023-06-01
申请号：US18054036
申请日：2022-11-09
申请人： FUJIFILM Corporation
发明人： Hiroyuki UCHIYAMA
IPC分类号： G03F7/00 , G03G15/08
CPC分类号： G03F7/0025 , G03F7/003 , G03G15/0855 , G03G15/0872 , G03G15/0877
摘要： There are provided a printer device, a printing method, and a program that can appropriately output an exposure start signal without requiring a film detection device. A printer device includes a loading chamber into which a film cartridge is to be loaded, an exposure head device that is disposed to face a photosensitive surface of a film discharged from the film cartridge and exposes the film to light, a spreading roller that splits a developer pod of the film to spread a developer to the film, a transport roller that transports the film, and a load measuring device that measures a change in load occurring in a case where the film enters at least the spreading roller or the transport roller.

3. 发明公开

US20240045342A1 CRITICAL DIMENSION INSPECTION METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME 审中-公开
公开(公告)号：US20240045342A1
公开(公告)日：2024-02-08
申请号：US18302375
申请日：2023-04-18
申请人： Samsung Electronics Co., Ltd.
发明人： Su Bin KONG , Sang-Ho YUN , Woo Jin JUNG
IPC分类号： G03F7/20 , G03F7/039 , G03F7/00
CPC分类号： G03F7/70625 , G03F7/0392 , G03F7/0025 , G03F7/2002 , G03F7/70466
摘要： A method for inspecting a critical dimension may include providing a substrate, applying a photoresist on the substrate, variably irradiating a dose of light onto the photoresist, performing a photo process to develop the photoresist to form a photoresist pattern, performing an etching process using the photoresist pattern as an etching mask to form a plurality of patterns, measuring a width of each of the plurality of patterns and a spacing between adjacent ones of the plurality of patterns, and identifying a cause of a defect in the photo process based on the measured width and the measured spacing.

4. 发明授权

US11694896B2 Photoresist developer and method of developing photoresist 有权
公开(公告)号：US11694896B2
公开(公告)日：2023-07-04
申请号：US17019094
申请日：2020-09-11
申请人： TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
发明人： Ming-Hui Weng , An-Ren Zi , Ching-Yu Chang , Chen-Yu Liu
IPC分类号： H01L21/027 , G03F7/00 , G03F7/11
CPC分类号： H01L21/0271 , G03F7/0025 , G03F7/11
摘要： A method of forming a pattern in a photoresist includes forming a photoresist layer over a substrate, and selectively exposing the photoresist layer to actinic radiation to form a latent pattern. The latent pattern is developed by applying a developer composition to the selectively exposed photoresist layer to form a pattern. The developer composition includes a first solvent having Hansen solubility parameters of 15 pKa>9.5; and a second solvent having a dielectric constant greater than 18. The first solvent and the second solvent are different solvents.

5. 发明申请

US20180264866A1 OPTICAL SECURITY ELEMENTS WITH OPAQUE MASKS FOR ENHANCED LENS-TO-PRINTED PIXEL ALIGNMENT 审中-公开
公开(公告)号：US20180264866A1
公开(公告)日：2018-09-20
申请号：US15980352
申请日：2018-05-15
申请人： LUMENCO, LLC
发明人： MARK A. RAYMOND , HECTOR ANDRES PORRAS SOTO
IPC分类号： B42D25/30 , B42D25/29 , H04N1/60 , B41J2/21 , B05D1/00 , B05D3/10 , G03F7/00
CPC分类号： B42D25/30 , B05D1/00 , B05D3/107 , B41J2/2132 , B41M3/14 , B42D25/29 , B42D25/305 , B42D25/324 , B42D25/351 , B42D25/355 , B42D25/373 , B42D25/42 , B42D25/45 , B42D25/485 , G03F7/0025 , H04N1/46 , H04N1/6083
摘要： Products, such as branding labels and currency, fabricated to include an optical security element. The optical security assembly may include a carrier film or substrate. An image element, e.g., a printed ink layer, is provided on a first surface of the carrier film/substrate, and the optical security assembly further includes an array or plurality of micro lenses on a second surface of the carrier film/substrate opposite the image element. In order to make the registration and print requirements easier, a mask is provided between the printed ink layer to define color pixels, and the printed ink layer is provided in the form of color blocks in a checkboard pattern with each block aligned with a portion of the mask and a subset of the holes or openings that define the viewable color pixels.

6. 发明授权

US5038710A Developer material coating apparatus 失效
标题翻译：显影剂材料涂布装置
公开(公告)号：US5038710A
公开(公告)日：1991-08-13
申请号：US437516
申请日：1989-11-16
申请人： Shigeru Kagayama , Tetsuya Kitamura
发明人： Shigeru Kagayama , Tetsuya Kitamura
IPC分类号： G03B27/32 , G03F7/00 , G03G15/08
CPC分类号： G03B27/32 , G03F7/0025 , G03G15/08 , G03B2227/325
摘要： A developer material coating apparatus for coating a developer toner on a support member such as a plain paper to form an image on the support member, includes a developer toner coating unit for triboelectrically charging the developer toner and electrostatically coating the charged developer toner on the support member and at least one of heaters for heating the support member before and/or after the support member being coated with the charged developer toner, thereby to heighten adhesion between the support member and the developer toner.
摘要翻译：一种用于在诸如普通纸的支撑构件上涂覆显影剂调色剂以在支撑构件上形成图像的显影剂材料涂覆装置包括显影剂调色剂涂布单元，用于对显影剂调色剂进行摩擦充电，并将载体上的显影剂调色剂静电涂覆在载体上以及用于在支撑构件被带电的显影剂调色剂涂覆之前和/或之后加热支撑构件的加热器中的至少一个，从而提高支撑构件和显影剂调色剂之间的粘合。

7. 发明授权

US12019370B2 Method and system for manufacturing a semiconductor device 有权
公开(公告)号：US12019370B2
公开(公告)日：2024-06-25
申请号：US17462943
申请日：2021-08-31
申请人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
发明人： Wei-Han Huang , Hao Yuan Chang , Yao-Hwan Kao
IPC分类号： G03F7/00 , G03F7/16 , G03F7/32
CPC分类号： G03F7/0025 , G03F7/32 , G03F7/70933 , G03F7/162
摘要： A method for manufacturing a semiconductor device includes forming a photoresist layer comprising a photoresist composition over a substrate to form a photoresist-coated substrate. The photoresist layer is selectively exposed to actinic radiation to form a latent pattern in the photoresist layer. The latent pattern is developed by applying a developer to the selectively exposed photoresist layer to form a patterned photoresist layer exposing a portion of the substrate, and a purge gas is applied to the patterned photoresist layer.

8. 发明公开

US20230333467A1 SPIN COATER 审中-公开
公开(公告)号：US20230333467A1
公开(公告)日：2023-10-19
申请号：US17964376
申请日：2022-10-12
申请人： Samsung Electronics Co., Ltd.
发明人： Sunghwan KIM , Kyungwon KANG , Dongwook KIM , Seungjoon SONG , Seok HEO , Younseon WANG , Dasom LEE
IPC分类号： G03F7/00 , G03F7/30
CPC分类号： G03F7/0025 , G03F7/3021
摘要： A spin coater may include a spin chuck, a nozzle, a first temperature controller and a second temperature controller. The spin chuck may be configured make contact with a central portion of a lower surface of a substrate and may be configured to rotate the substrate when photoresist is on the substrate. The nozzle may be arranged over a central portion of the spin chuck and configured to provide a central portion of an upper surface of the substrate with photoresist. The first temperature controller may be configured to control a temperature in a first region of the spin chuck. The second temperature controller may be configured to control a temperature in a second region of the spin chuck.

9. 发明授权

US5148215A Magazine unit of image recording apparatus for accommodating image recording medium 失效
标题翻译：用于容纳图像记录介质的图像记录装置的杂志单元
公开(公告)号：US5148215A
公开(公告)日：1992-09-15
申请号：US794119
申请日：1991-11-15
申请人： Tatsuya Shindo
发明人： Tatsuya Shindo
IPC分类号： G03C3/00 , G03B27/32 , G03B27/58 , G03D13/00 , G03F7/00
CPC分类号： G03B27/32 , G03B27/588 , G03F7/0025 , G03B2227/325
摘要： A magazine unit for an image recording apparatus such as a copying machine comprises a magazine body to be mounted in the housing of the copying machine through a opening formed at the machine housing, a first winding shaft around which a microcapsule sheet before use is wound, and a second winding shaft around which the microcapsule sheet after the use from the first winding shaft is taken up. The first and second winding shafts have substantially the same structure so as to be used commonly. Thus, a microcapsule sheet can be easily exchanged for a new one.
摘要翻译：用于诸如复印机的图像记录装置的盒单元包括通过形成在机器壳体上的开口安装在复印机的壳体中的盒体，卷绕有使用前的微胶囊片的第一卷绕轴，以及第二卷绕轴，其中从第一卷绕轴使用后的微胶囊片被卷取。第一和第二卷绕轴具有基本相同的结构以便被共同使用。因此，可以容易地更换新的微胶囊片。

10. 发明授权

US5115760A Developer material coating apparatus having developer material removing unit 失效
标题翻译：具有显影剂材料去除单元的显影剂材料涂覆装置
公开(公告)号：US5115760A
公开(公告)日：1992-05-26
申请号：US500903
申请日：1990-03-29
申请人： Masataka Maeda
发明人： Masataka Maeda
IPC分类号： G03D13/00 , G03F7/00 , G03G15/08
CPC分类号： G03G15/08 , G03F7/0025 , G03G15/0806 , G03B2227/325
摘要： A developer material coating apparatus includes a support member feeding unit for feeding the support member to a developer material coating region while carrying the support member thereon, a developer material coating unit for triboelectrically charging the developer material and electrostatically supplying the charged developer material toward the support member feeding unit to coat the developer material on the surface of the support member in the developer material coating region, and a developer material removing unit for sucking and removing the developer material attached to said support member feeding means, except for the developer material attached to the surface of the support member. The developer material removing unit comprises an air nozzle for sucking the developer material attached to the support member feeding unit under a negative pressure, a trap case intercommunicating with the air nozzle for withdrawing the sucked developer material through the air nozzle, an air filter provided in the trap case for trapping the sucked developer material and a negative pressure producing unit intercommunicating with the trap case for producing a negative pressure in said air nozzle to produce an air flow in a predetermined direction.
摘要翻译：一种显影剂材料涂覆装置，包括一个用于在支撑构件上承载支撑构件的同时将支撑构件供给到显影剂材料涂覆区域的支撑构件供给单元，用于对显影剂材料进行摩擦充电并将电荷显影剂材料静电供给支撑体的显影剂材料涂覆单元构件供给单元，用于涂覆显影剂材料涂覆区域中的支撑构件的表面上的显影剂材料;以及显影剂材料去除单元，用于吸附和除去附着到所述支撑构件进给装置上的显影剂材料，支撑构件的表面。显影剂材料去除单元包括用于在负压下吸附附着在支撑构件供给单元上的显影剂材料的空气喷嘴，与空气喷嘴相互连通的捕集器壳体，用于通过空气喷嘴抽出吸取的显影剂材料;空气过滤器，用于捕获吸取的显影剂材料的捕集器壳体和与捕获器相互连通的负压产生单元，用于在所述空气喷嘴中产生负压，以在预定方向上产生空气流。

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