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1. 发明授权

US06288401B1 Electrostatic alignment of a charged particle beam 失效
标题翻译：带电粒子束的静电排列
公开(公告)号：US06288401B1
公开(公告)日：2001-09-11
申请号：US09364777
申请日：1999-07-30
申请人： Tai-Hon P Chang , Marian Mankos , Lawrence P Muray , Ho-Seob Kim , Kim Y Lee
发明人： Tai-Hon P Chang , Marian Mankos , Lawrence P Muray , Ho-Seob Kim , Kim Y Lee
IPC分类号： G21K108
CPC分类号： H01J29/54 , H01J37/073 , H01J2237/06316 , H01J2237/06341 , H01J2237/1501
摘要： A field emission source produces a charged particle beam that can be electrostatically aligned with the optical axis. Quadrupole (or higher multipole) centering electrodes approximately centered on the optical axis are placed between the emitter and the extraction electrode. By applying centering potentials of equal amplitude and opposite polarity on opposing elements of the centering electrodes, an electrostatic deflection field is created near the optical axis. The electrostatic deflection field aligns the charged particle beam with the optical axis thereby obviating the need to mechanically align the emitter with the optical axis. A second set of centering electrodes may be used to deflect the charged particle beam back and to ensure that the charged particle beam is parallel with the optical axis. Further, the extraction electrode may be split into a quadrupole arrangement with the extraction and centering potentials superimposed.
摘要翻译：场发射源产生可以与光轴静电对准的带电粒子束。大约以光轴为中心的四极（或更高的多极）定心电极放置在发射极和引出电极之间。通过在定心电极的相对元件上施加相等振幅和相反极性的定心电位，在光轴附近产生静电偏转场。静电偏转磁场将带电粒子束与光轴对准，从而避免了将发射器与光轴机械对准的需要。可以使用第二组定心电极将带电粒子束偏转回来并确保带电粒子束与光轴平行。此外，提取电极可以被分成四极排列，其中提取和对中电位叠加。

2. 发明授权

US06555829B1 High precision flexure stage 失效
标题翻译：高精度弯曲台
公开(公告)号：US06555829B1
公开(公告)日：2003-04-29
申请号：US09481103
申请日：2000-01-10
申请人： James P. Spallas , Lawrence P. Muray , David Trost , Ho-Seob Kim , Tai-Hon P. Chang
发明人： James P. Spallas , Lawrence P. Muray , David Trost , Ho-Seob Kim , Tai-Hon P. Chang
IPC分类号： G01B902
CPC分类号： B23Q1/34 , B23Q1/621 , H01J37/023 , H01J2237/20264 , H01L21/68
摘要： Disclosed is a positioning stage for precisely positioning an object within a limited range of travel (e.g. 100 &mgr;m). By way of example, the stage can be used to position an electron source such as a field emitter in an electron beam microcolumn. The stage includes a block which defines a channel to allow flexure along a first axis. The block also defines another channel to allow flexure along a second axis perpendicular to the first axis. Using actuators in the channels to flex a portion of the block, the object supported by the block can be precisely positioned to a desired location in a horizontal plane defined by the first and second axes.
摘要翻译：公开了一种用于在有限的旅行范围内（例如，100mum）精确地定位物体的定位台。作为示例，该级可用于将诸如场致发射体的电子源定位在电子束微柱中。舞台包括限定通道以允许沿着第一轴弯曲的块。该块还限定另一个通道，以允许沿垂直于第一轴线的第二轴线弯曲。使用通道中的致动器来弯曲块的一部分，由块支撑的物体可精确地定位在由第一和第二轴限定的水平平面中的期望位置。

3. 发明授权

US06369385B1 Integrated microcolumn and scanning probe microscope arrays 失效
标题翻译：集成微柱和扫描探针显微镜阵列
公开(公告)号：US06369385B1
公开(公告)日：2002-04-09
申请号：US09305975
申请日：1999-05-05
申请人： Lawrence P. Muray , Ho-Seob Kim , T. H. Philip Chang
发明人： Lawrence P. Muray , Ho-Seob Kim , T. H. Philip Chang
IPC分类号： H01J3728
CPC分类号： G01Q30/02 , H01J37/28 , H01J37/3174 , H01J2237/1205 , H01J2237/2818 , Y10S977/707 , Y10S977/849 , Y10S977/86 , Y10S977/869 , Y10S977/874 , Y10S977/881 , Y10S977/887
摘要： An apparatus for surface inspection and processing of a wafer includes a microcolumn and an associated scanning probe microscope. The microcolumn enables high speed scanning of the wafer at a relatively high resolution, while the scanning probe microscope provides atomic resolution of highly localized areas of the wafer. The microcolumn and scanning probe microscope can be partially fabricated out of the same substrate. Additionally, the microcolumn and scanning probe microscope can be a portion of an array of microcolumns and/or scanning probe microscopes. The apparatus may be used for imaging, lithography and spectroscopy.
摘要翻译：用于表面检查和处理晶片的装置包括微柱和相关联的扫描探针显微镜。微柱可以以相对高的分辨率高速扫描晶片，而扫描探针显微镜提供晶片的高度局部化区域的原子分辨率。微柱和扫描探针显微镜可以由相同的基底部分制成。另外，微柱和扫描探针显微镜可以是微柱阵列和/或扫描探针显微镜的一部分。该装置可用于成像，光刻和光谱学。

4. 发明授权

US6023060A T-shaped electron-beam microcolumn as a general purpose scanning electron microscope 失效
标题翻译： T型电子束微柱作为通用扫描电子显微镜
公开(公告)号：US6023060A
公开(公告)日：2000-02-08
申请号：US34893
申请日：1998-03-03
申请人： Tai-Hon P. Chang , Ho-Seob Kim
发明人： Tai-Hon P. Chang , Ho-Seob Kim
IPC分类号： H01J37/26 , G01Q30/02 , G01Q30/20 , G01Q70/08 , G01S19/04 , G01S19/13 , H01J37/16 , H01J37/28 , H01J3/14 , G21K7/00
CPC分类号： H01J37/28 , H01J2237/1205
摘要： A charged particle-beam microcolumn, which for example may be used for charged particle microscopy, with a T-shape configuration has a relatively narrow base structure supporting the beam forming charged particle optical column. The narrow base structure permits the T-shaped microcolumn and sample to be positioned at an angle other than normal with respect to each other, which allows generation of three-dimensional-like images of the sample surface. Thus, the incidence angle of the charged particle beam generated by the T-shaped microcolumn may be varied while a short working distance is maintained. A conventional secondary/backscattered charged particle detector may be used because the reflected angle of the charged particles allows a charged particle detector to be separated from the T-shaped microcolumn. Further, the small size of the T-shaped microcolumn permits observation of different parts of a large stationary sample by moving the T-shaped microcolumn with respect to the sample. Moreover, multiple T-shaped microcolumns may be arrayed to improve throughput.
摘要翻译：具有T形构造的例如可用于带电粒子显微镜的带电粒子束微柱具有支撑束形成带电粒子光学柱的相对狭窄的基底结构。狭窄的基部结构允许T形微柱和样品相对于彼此以正常的角度定位，这允许产生样品表面的三维样图像。因此，由T形微柱产生的带电粒子束的入射角可以变化，同时保持短的工作距离。可以使用常规的二次/反向散射带电粒子检测器，因为带电粒子的反射角允许带电粒子检测器与T形微柱分离。此外，T形微柱的小尺寸允许通过相对于样品移动T形微柱来观察大的固定样品的不同部分。此外，可以排列多个T形微柱以提高产量。

5. 发明授权

US06281508B1 Precision alignment and assembly of microlenses and microcolumns 失效
标题翻译：精密对准和组装微透镜和微柱
公开(公告)号：US06281508B1
公开(公告)日：2001-08-28
申请号：US09246573
申请日：1999-02-08
申请人： Kim Y. Lee , Ho-Seob Kim , Stephen A. Rishton , Tai-Hon Philip Chang
发明人： Kim Y. Lee , Ho-Seob Kim , Stephen A. Rishton , Tai-Hon Philip Chang
IPC分类号： G21K108
CPC分类号： B82Y15/00 , H01J9/18 , H01J37/12 , H01J2237/1205
摘要： A method and the associated apparatus for alignment and assembly of microlenses and microcolumns in which aligning structures such as rigid fibers are used to precisely align multiple microlens components. Alignment openings are formed in the microlens components and standard optical fibers are threaded through the openings in each microlens component as they are stacked. The fibers provide sufficient stiffness and stability to the structure to precisely align the apertures of the microlens components and thereby allow for increased assembly efficiency over traditional microlens and microcolumn bonding techniques.
摘要翻译：用于对准和组装微透镜和微柱的方法和相关联的装置，其中使用诸如刚性纤维的对准结构来精确对准多个微透镜组件。在微透镜部件中形成对准开口，并且当它们堆叠时，标准光纤穿过每个微透镜部件中的开口。纤维为结构提供足够的刚度和稳定性，以精确地对准微透镜部件的孔，从而相对于传统的微透镜和微柱接合技术允许提高组装效率。

6. 发明授权

US6077417A Silicon microlens cleaning system 失效
标题翻译：硅微透镜清洗系统
公开(公告)号：US6077417A
公开(公告)日：2000-06-20
申请号：US195843
申请日：1998-11-19
申请人： Kim Y. Lee , T. H. Philip Chang , Ho-Seob Kim
发明人： Kim Y. Lee , T. H. Philip Chang , Ho-Seob Kim
IPC分类号： G01N20060101 , G01N13/12 , G01N30/00 , G12B21/00 , H01J37/12 , H01J37/26
CPC分类号： B82Y15/00
摘要： A method and system for cleaning the silicon microlenses in an electron-beam microcolumn in situ. The microlenses individually are heated by passing a current through each microlens. The current is utilized to heat the microlens to at least two hundred degrees Centigrade to prevent contamination and occasionally to a temperature on the order of six to seven hundred degrees Centigrade to remove any builtup or potential contamination.
摘要翻译：一种电子束微柱原位清洗硅微透镜的方法和系统。通过使电流通过每个微透镜来单独地加热微透镜。该电流用于将微透镜加热至至少二百摄氏度以防止污染，并且偶尔达到六至七百摄氏度的温度以除去任何积聚或潜在的污染物。

7. 发明授权

US06195214B1 Microcolumn assembly using laser spot welding 失效
标题翻译：使用激光点焊的微柱组件
公开(公告)号：US06195214B1
公开(公告)日：2001-02-27
申请号：US09364822
申请日：1999-07-30
申请人： Lawrence Peter Muray , Kim Y. Lee , Stephen A. Rishton , Ho-Seob Kim , Tai-Hon Philip Chang
发明人： Lawrence Peter Muray , Kim Y. Lee , Stephen A. Rishton , Ho-Seob Kim , Tai-Hon Philip Chang
IPC分类号： G02B702
CPC分类号： H01J37/12 , H01J9/18 , H01J2237/1205
摘要： A method for forming microcolumns in which laser spot welding bonds the multiple layers of an electron beam microcolumn. A silicon microlens is laser spot welded to a glass insulation layer by focusing a laser through the insulation layer onto the silicon microlens. The glass layer is transparent to the laser, allowing all of the energy to be absorbed by the silicon. This causes the silicon to heat, which, in turn, heats the adjacent surface of the glass insulation layer creating a micro-weld between the silicon and glass. The insulation layer includes a portion which protrudes beyond the edge of the first microlens so that when a second microlens is attached to the opposite side of the insulation layer, the second microlens can be laser spot welded to the protruding portion of the insulation layer by focusing a laser through the protruding portion of the insulation layer to heat the second microlens.
摘要翻译：一种形成微柱的方法，其中激光点焊结合电子束微柱的多层。将硅微透镜通过将激光通过绝缘层聚焦到硅微透镜上而被激光点焊到玻璃绝缘层。玻璃层对于激光是透明的，允许所有的能量被硅吸收。这导致硅加热，这进而加热玻璃绝缘层的相邻表面，从而在硅和玻璃之间形成微焊缝。绝缘层包括突出超过第一微透镜的边缘的部分，使得当第二微透镜附着到绝缘层的相对侧时，第二微透镜可以通过聚焦被激光点焊到绝缘层的突出部分激光穿过绝缘层的突出部分以加热第二微透镜。

8. 发明授权

US06297584B1 Precision alignment of microcolumn tip to a micron-size extractor aperture 失效
标题翻译：微柱尖端与微米尺寸提取孔的精确对准
公开(公告)号：US06297584B1
公开(公告)日：2001-10-02
申请号：US09675567
申请日：2000-09-29
申请人： Ho-Seob Kim , Kim Y. Lee , T. H. P. Chang
发明人： Ho-Seob Kim , Kim Y. Lee , T. H. P. Chang
IPC分类号： H01J3706
CPC分类号： H01J9/18 , H01J37/067 , H01J2201/304 , H01J2237/1501
摘要： A method and an accompanied apparatus for aligning an electron emitter with an extractor hole of a microcolumn. Four V-grooves, defined together with the window for forming the membrane and having bottoms situated on two axis are microfabricated on a chip. The axis intersect at a right angle and defines a center point for the extractor hole. The V-grooves are then used as references to align the electron emitter with the extractor hole, one axis at a time. The emitter is precisely aligned to the extractor hole because the extractor hole was formed with reference to the V-grooves. The thickness of the chip is used as the spacing reference between the emitter and the extractor.
摘要翻译：用于将电子发射器与微柱的提取孔对准的方法和伴随装置。与形成膜并且具有位于两个轴上的底部的窗口一起定义的四个V形槽在芯片上微加工。轴线以直角相交，并定义了提取孔的中心点。然后使用V形槽作为参考，以将电子发射体与提取孔对准，一次一个轴。由于提取孔是相对于V形槽形成的，所以发射极精确地对准提取孔。芯片的厚度用作发射器和提取器之间的间距基准。

9. 发明授权

US06171165B2 Precision alignment of microcolumn tip to a micron-size extractor aperture 失效
公开(公告)号：US06171165B2
公开(公告)日：2001-01-09
申请号：US09197092
申请日：1998-11-19
申请人： Ho-Seob Kim , Kim Y. Lee , T. H. P. Chang
发明人： Ho-Seob Kim , Kim Y. Lee , T. H. P. Chang
IPC分类号： H01J904
CPC分类号： H01J9/18 , H01J37/067 , H01J2201/304 , H01J2237/1501
摘要： A method and an accompanied apparatus for aligning an electron emitter with an extractor hole of a microcolumn. Four V-grooves, defined together with the window for forming the membrane and having bottoms situated on two axis are microfabricated on a chip. The axis intersect at a right angle and defines a center point for the extractor hole. The V-grooves are then used as references to align the electron emitter with the extractor hole, one axis at a time. The emitter is precisely aligned to the extractor hole because the extractor hole was formed with reference to the V-grooves. The thickness of the chip is used as the spacing reference between the emitter and the extractor.

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