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1. 发明授权

US07129965B2 Exposure device and image forming device 失效
标题翻译：曝光装置和成像装置
公开(公告)号：US07129965B2
公开(公告)日：2006-10-31
申请号：US10501509
申请日：2003-01-09
申请人： Tadashi Iwamatsu , Shigeru Nishio , Tetsuya Inui
发明人： Tadashi Iwamatsu , Shigeru Nishio , Tetsuya Inui
IPC分类号： B41J2/447 , H05B33/02 , H01L27/32 , H01L51/50
CPC分类号： B41J2/45
摘要： An emissive element array of a plurality of organic EL elements is arranged linearly on a single-crystal silicon substrate or polycrystalline silicon substrate with a drive circuit including an element switching its respective emissive element. The organic EL emissive elements have an edge emitting structure utilizing light emitted in an edge direction perpendicular to the direction of deposition of electrode layers and organic compound layers, and is constructed such that the emitting area of one emisive element, S, as viewed in the direction of deposition, and the period of emissive elements disposed side by side, d, have the relationship of S>d2. In this way, organic EL techniques can be applied to provide the required amount of light exposure and to produce an exposure device that is small and inexpensive.
摘要翻译：多个有机EL元件的发射元件阵列线性地布置在单晶硅衬底或多晶硅衬底上，其中驱动电路包括切换其各自发射元件的元件。有机EL发光元件具有利用沿垂直于电极层和有机化合物层的沉积方向的边缘方向发射的光的边缘发射结构，并且被构造成使得一个辐射元件S的发射面积沉积方向和并排设置的发射元件的周期d具有S> d <2>的关系。以这种方式，可以应用有机EL技术来提供所需量的曝光并且产生小而便宜的曝光装置。

2. 发明申请

US20050151824A1 Exposure device and image forming device 失效
标题翻译：曝光装置和成像装置
公开(公告)号：US20050151824A1
公开(公告)日：2005-07-14
申请号：US10501509
申请日：2003-01-09
申请人： Tadashi Iwamatsu , Shigeru Nishio , Tetsuya Inui
发明人： Tadashi Iwamatsu , Shigeru Nishio , Tetsuya Inui
IPC分类号： B41J2/44 , B41J2/447 , B41J2/45 , B41J2/455 , G02B6/122 , H01L51/50 , H04N1/036 , H05B33/00 , B41J2/435
CPC分类号： B41J2/45
摘要： An emissive element array of a plurality of organic EL elements is arranged linearly on a single-crystal silicon substrate or polycrystalline silicon substrate with a drive circuit including an element switching its respective emissive element. The organic EL emissive elements have an edge emitting structure utilizing light emitted in an edge direction perpendicular to the direction of deposition of electrode layers and organic compound layers, and is constructed such that the emitting area of one emissive element, S, as viewed in the direction of deposition, and the period of emissive elements disposed side by side, d, have the relationship of S>d2. In this way, organic EL techniques can be applied to provide the required amount of light exposure and to produce an exposure device that is small and inexpensive.
摘要翻译：多个有机EL元件的发射元件阵列线性地布置在单晶硅衬底或多晶硅衬底上，其中驱动电路包括切换其各自发射元件的元件。有机EL发光元件具有利用沿垂直于电极层和有机化合物层的沉积方向的边缘方向发射的光的边缘发射结构，并且被构造成使得在一个发射元件S的发射面积沉积方向和并排设置的发射元件的周期d具有S> d <2>的关系。以这种方式，可以应用有机EL技术来提供所需量的曝光并且产生小而便宜的曝光装置。

3. 发明申请

US20080237593A1 Semiconductor Device, Method of Fabricating the Same, and Apparatus for Fabricating the Same 审中-公开
标题翻译：半导体装置及其制造方法及其制造装置
公开(公告)号：US20080237593A1
公开(公告)日：2008-10-02
申请号：US11794874
申请日：2006-01-06
申请人： Junichiro Nakayama , Ikumi Itsumi , Tetsuya Inui
发明人： Junichiro Nakayama , Ikumi Itsumi , Tetsuya Inui
IPC分类号： H01L29/04 , H01L21/00 , H01S3/098
CPC分类号： H01L21/0268 , H01L21/0242 , H01L21/02422 , H01L21/02488 , H01L21/02532
摘要： There is provided a semiconductor device including a substrate and a semiconductor film deposited on the substrate, characterized in that the semiconductor film has a laterally grown crystal having an end with a surface projection height smaller than the thickness of the semiconductor film. There are also provided a semiconductor device fabrication method and apparatus utilizing a method and apparatus for fabricating the semiconductor device, that is capable of reducing a surface projection height or a ridge formed in a last region in repeating laser exposure in the SLS method, and a semiconductor device fabricated thereby.
摘要翻译：提供了一种半导体器件，其包括沉积在衬底上的衬底和半导体膜，其特征在于，所述半导体膜具有横向生长的晶体，其端部的表面突出高度小于半导体膜的厚度。还提供了一种半导体器件制造方法和装置，其利用半导体器件的制造方法和装置，其能够减少在SLS方法中重复激光曝光的最后区域中形成的表面突出高度或脊，由此制造半导体器件。

4. 发明申请

US20060183303A1 Crystallized semiconductor device, method for producing same and crystallization apparatus 审中-公开
标题翻译：结晶半导体器件及其制造方法及结晶装置
公开(公告)号：US20060183303A1
公开(公告)日：2006-08-17
申请号：US10542663
申请日：2004-01-19
申请人： Tetsuya Inui , Hiroshi Tsunazawa , Shinya Okazaki
发明人： Tetsuya Inui , Hiroshi Tsunazawa , Shinya Okazaki
IPC分类号： H01L21/84 , C30B11/00 , H01L21/20
CPC分类号： H01L21/02675 , H01L21/02686 , H01L21/2026 , Y10T117/1024
摘要： In a method of manufacturing a crystallized semiconductor device of the present invention, a thermal diffusion layer (1) having higher thermal conductivity than that of a substrate (4) is formed on a surface of a semiconductor layer (2), and then laser light is applied to the semiconductor layer (2) from above the thermal diffusion layer (1). As a result, it becomes possible to manufacture the crystallized semiconductor device in which a crystal is longer than that of a conventional arrangement. According to the present invention, it is possible to provide the crystallized semiconductor device having the semiconductor layer in which the size of the crystal grain is larger than that of the conventional arrangement.
摘要翻译：在制造本发明的结晶化半导体器件的方法中，在半导体层（2）的表面上形成热导率高于衬底（4）的热扩散层（1），然后将激光从热扩散层（1）的上方施加到半导体层（2）。结果，可以制造晶体长于常规布置的晶体化半导体器件。根据本发明，可以提供具有其中晶粒尺寸大于常规布置的半导体层的结晶半导体器件。

5. 发明授权

US6031816A Optical recording medium, method for manufacturing the same, and optical information recording and reproducing device used with respect to the same 有权
标题翻译：光记录介质及其制造方法以及与此相关的光信息记录再现装置
公开(公告)号：US6031816A
公开(公告)日：2000-02-29
申请号：US330495
申请日：1999-06-11
申请人： Tetsuya Inui , Hideaki Sato , Junichiro Nakayama , Naoyasu Iketani , Michinobu Mieda , Yoshiteru Murakami , Junji Hirokane , Akira Takahashi
发明人： Tetsuya Inui , Hideaki Sato , Junichiro Nakayama , Naoyasu Iketani , Michinobu Mieda , Yoshiteru Murakami , Junji Hirokane , Akira Takahashi
IPC分类号： G11B7/005 , G11B7/007 , G11B7/09 , G11B7/24 , G11B7/26 , G11B11/105
CPC分类号： G11B7/005 , G11B7/00718 , G11B7/00745 , G11B7/0901 , G11B7/261 , G11B11/10578 , G11B11/10582 , G11B7/0938 , G11B7/24
摘要： An optical disk has address recording sections each of which has a wobbled part of one of side walls of a groove. Each address recording section is formed by providing convexes of a groove in an adjacent land so as to widen the groove. With the wobbles thus provided in a concavo-convex form, address information is recorded. Besides, the address recording sections thus provided in the grooves are linearly disposed in radial directions of the optical disk. By thus arranging the optical disk on whose grooves and/or lands information is recorded, mixing of wobble frequency components in reproduced information signals does not occur, the sector method is applicable to the optical disk, and information signals of high quality can be obtained.
摘要翻译：光盘具有地址记录部分，每个地址记录部分具有凹槽的一个侧壁的摆动部分。每个地址记录部分通过在相邻的凸台中提供凹槽的凸起来形成，以便加宽凹槽。由于以这样提供的摆动形式为凹凸形式，所以记录地址信息。此外，这样设置在凹槽中的地址记录部分在光盘的径向上线性地设置。通过这样布置记录有槽和/或焊盘信息的光盘，不会发生重放信息信号中的摆动频率分量的混合，扇区方法可应用于光盘，并且可以获得高质量的信息信号。

6. 发明授权

US5586109A Optical memory having narrowed track pitch 失效
标题翻译：具有窄轨道间距的光学存储器
公开(公告)号：US5586109A
公开(公告)日：1996-12-17
申请号：US354457
申请日：1994-12-12
申请人： Tetsuya Inui , Akira Takahashi , Kenji Ohta , Michinobu Mieda , Yoshiteru Murakami
发明人： Tetsuya Inui , Akira Takahashi , Kenji Ohta , Michinobu Mieda , Yoshiteru Murakami
IPC分类号： G11B7/0045 , G11B7/007 , G11B7/09 , G11B7/24 , G11B7/26 , G11B11/105 , G11B3/70
CPC分类号： G11B7/261 , G11B11/10582 , G11B7/24 , G11B7/24079 , G11B7/26 , G11B7/00454 , G11B7/007 , G11B7/0938
摘要： A transparent substrate of an optical memory is produced by injection molding using a stamper. Grooves and lands are alternately arranged on the optical memory, for tracking of light converged on the optical memory. The groove width is set in the range of 0.3 .mu.m to 0.4 .mu.m and the groove depth is set in the rage of 80 nm to 100 nm. A decrease in the width of a land at each edge is restrained to 0.2 .mu.m in maximum. With such dimensions, even when the track pitch is set to about 1.4 .mu.m, it is possible to obtain a track crossing signal with intensity sufficient for performing an access operation to a target track. Moreover, since the dimensions bring about an improved reflectance at a land, the optical memory achieves an improved C/N and recording density.
摘要翻译：通过使用压模的注射成型制造光学存储器的透明基板。沟槽和焊盘交替布置在光学存储器上，用于跟踪会聚在光学存储器上的光。槽宽度设定在0.3μm〜0.4μm的范围内，槽深度设定在80nm〜100nm的范围内。每个边缘的陆地宽度减小最大限制在0.2亩。利用这样的尺寸，即使当轨道间距设置为大约1.4μm时，也可以获得具有足以对目标轨道进行访问操作的强度的轨迹交叉信号。此外，由于尺寸在陆地上产生改进的反射率，所以光学存储器实现了改进的C / N和记录密度。

7. 发明授权

US5457006A Method of manufacturing photo-mask and photo-mask manufactured thereby 失效
标题翻译：由此制造光掩模和光掩模的方法
公开(公告)号：US5457006A
公开(公告)日：1995-10-10
申请号：US684680
申请日：1991-03-29
申请人： Junji Hirokane , Hiroyuki Katayama , Akira Takahashi , Tetsuya Inui , Kenji Ohta , Junichi Washo , Tomoyuki Miyake , Kazuo Van , Michinobu Mieda
发明人： Junji Hirokane , Hiroyuki Katayama , Akira Takahashi , Tetsuya Inui , Kenji Ohta , Junichi Washo , Tomoyuki Miyake , Kazuo Van , Michinobu Mieda
IPC分类号： G03F1/00 , G03F1/54 , G03F1/68 , G11B7/26 , G03C5/00
CPC分类号： G03F1/54 , G03F1/68 , G11B7/261 , Y10S430/146
摘要： A photo-mask and a method of manufacturing a photo-mask, which includes the steps of applying a resist film onto a substrate of quartz, glass and the like, subjecting the resist film to light exposure and development to form a fine resist pattern, etching the mask substrate covered by the fine resist pattern, causing a non-light transmitting thin film of Cr, Ta, etc. to adhere thereon by vapor deposition, sputtering and the like, and removing the thin film on the resist pattern together with the resist film, thereby to form the photo-mask.
摘要翻译：一种光掩模和一种制造光掩模的方法，其包括以下步骤：将抗蚀剂膜施加到石英，玻璃等的基板上，对抗蚀剂膜进行曝光和显影以形成精细的抗蚀剂图案，蚀刻由精细抗蚀剂图案覆盖的掩模基板，通过气相沉积，溅射等使Cr，Ta等的非透光性薄膜附着在其上，并且将抗蚀剂图案上的薄膜与抗蚀剂膜，从而形成光掩模。

8. 发明授权

US5403683A Photo-mask 失效
公开(公告)号：US5403683A
公开(公告)日：1995-04-04
申请号：US102229
申请日：1993-08-05
申请人： Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
发明人： Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
IPC分类号： G03F1/48 , G11B7/26 , G03F9/00
CPC分类号： G03F1/48 , G11B7/261 , Y10T428/24868 , Y10T428/24917
摘要： A photo-mask comprises a light-permeable substrate, a plurality of light-shielding films that are disposed on the substrate, the light-shielding films forming a mask pattern, and a light-permeable protective film that is disposed over the surface of the substrate including the light-shielding films so as to protect the light-shielding films.

9. 发明授权

US5341362A Optical memory device having guide tracks shaped for increasing the quality of information signals 失效
标题翻译：具有引导轨道的光存储器件，其形状用于提高信息信号的质量
公开(公告)号：US5341362A
公开(公告)日：1994-08-23
申请号：US978039
申请日：1992-11-18
申请人： Yoshikazu Fujii , Tetsuya Inui , Toshihisa Deguchi , Kenji Ohta
发明人： Yoshikazu Fujii , Tetsuya Inui , Toshihisa Deguchi , Kenji Ohta
IPC分类号： G11B7/013 , G11B11/105 , G11B7/24 , G11B13/04
CPC分类号： G11B7/24085 , G11B11/10565 , G11B11/10578 , G11B11/10584
摘要： An optical memory device comprising a substrate and guide tracks having a depth of .lambda./8n or less formed on said substrate, wherein .lambda. is the wavelength of laser light used for the optical memory device, and n is the refraction index of the guide track portion of the substrate.
摘要翻译：一种光学存储器件，包括衬底和在所述衬底上形成的深度为λ/ 8n或更小的导轨，其中λ是用于光存储器件的激光的波长，n是导轨部分的折射率的基底。

10. 发明授权

US5260150A Photo-mask with light shielding film buried in substrate 失效
标题翻译：光掩模与遮光膜埋在基板上
公开(公告)号：US5260150A
公开(公告)日：1993-11-09
申请号：US631277
申请日：1990-12-20
申请人： Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
发明人： Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
IPC分类号： G03F1/48 , G11B7/26 , G03F9/00
CPC分类号： G03F1/48 , G11B7/261 , Y10T428/24868 , Y10T428/24917
摘要： A photo-mask comprises a light-permeable substrate, a plurality of light-shielding films that are disposed on the substrate, the light-shielding films forming a mask pattern, and a light-permeable protective film that is disposed over the surface of the substrate including the light-shielding films so as to protect the light-shielding films.
摘要翻译：光掩模包括透光基板，设置在基板上的多个遮光膜，形成掩模图案的遮光膜，以及设置在该基板的表面上的透光保护膜包括遮光膜的基板，以保护遮光膜。

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