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1. 发明授权

US5457006A Method of manufacturing photo-mask and photo-mask manufactured thereby 失效
标题翻译：由此制造光掩模和光掩模的方法
公开(公告)号：US5457006A
公开(公告)日：1995-10-10
申请号：US684680
申请日：1991-03-29
申请人： Junji Hirokane , Hiroyuki Katayama , Akira Takahashi , Tetsuya Inui , Kenji Ohta , Junichi Washo , Tomoyuki Miyake , Kazuo Van , Michinobu Mieda
发明人： Junji Hirokane , Hiroyuki Katayama , Akira Takahashi , Tetsuya Inui , Kenji Ohta , Junichi Washo , Tomoyuki Miyake , Kazuo Van , Michinobu Mieda
IPC分类号： G03F1/00 , G03F1/54 , G03F1/68 , G11B7/26 , G03C5/00
CPC分类号： G03F1/54 , G03F1/68 , G11B7/261 , Y10S430/146
摘要： A photo-mask and a method of manufacturing a photo-mask, which includes the steps of applying a resist film onto a substrate of quartz, glass and the like, subjecting the resist film to light exposure and development to form a fine resist pattern, etching the mask substrate covered by the fine resist pattern, causing a non-light transmitting thin film of Cr, Ta, etc. to adhere thereon by vapor deposition, sputtering and the like, and removing the thin film on the resist pattern together with the resist film, thereby to form the photo-mask.
摘要翻译：一种光掩模和一种制造光掩模的方法，其包括以下步骤：将抗蚀剂膜施加到石英，玻璃等的基板上，对抗蚀剂膜进行曝光和显影以形成精细的抗蚀剂图案，蚀刻由精细抗蚀剂图案覆盖的掩模基板，通过气相沉积，溅射等使Cr，Ta等的非透光性薄膜附着在其上，并且将抗蚀剂图案上的薄膜与抗蚀剂膜，从而形成光掩模。

2. 发明授权

US5087535A Method of manufacturing photo-mask and photo-mask manufactured thereby 失效
标题翻译：制造照相胶片和制造的照相胶片的方法
公开(公告)号：US5087535A
公开(公告)日：1992-02-11
申请号：US19704
申请日：1987-02-27
申请人： Junji Hirokane , Hiroyuki Katayama , Akira Takahashi , Tetsuya Inui , Kenji Ohta , Junichi Washo , Tomoyuki Miyake , Kazuo Van , Michinobu Mieda
发明人： Junji Hirokane , Hiroyuki Katayama , Akira Takahashi , Tetsuya Inui , Kenji Ohta , Junichi Washo , Tomoyuki Miyake , Kazuo Van , Michinobu Mieda
IPC分类号： G03F1/00 , G03F1/54 , G03F1/68 , G11B7/26
CPC分类号： G03F1/54 , G03F1/68 , G11B7/261 , Y10S430/146
摘要： A photo-mask and a method of manufacturing a photo-mask, which includes the steps of applying a resist film onto a substrate of quartz, glass and the like, subjecting the resist film to light exposure and development to form a fine resist pattern, etching the mask substrate covered by the fine resist pattern causing a non-light transmitting thin film of Cr, Ta, etc. to adhere thereon by vapor deposition, sputtering and the like, and removing the thin film on the resist pattern together with the resist film, thereby to form the photo-mask.

3. 发明授权

US5459711A Optical recording element and driving system 失效
标题翻译：光学记录元件和驱动系统
公开(公告)号：US5459711A
公开(公告)日：1995-10-17
申请号：US219253
申请日：1994-03-29
申请人： Kenji Ohta , Tetsuya Inui , Hiroyuki Katayama , Akira Takahashi , Junji Hirokane , Yukinori Nishitani , Michinobu Mieda , Kazuo Van
发明人： Kenji Ohta , Tetsuya Inui , Hiroyuki Katayama , Akira Takahashi , Junji Hirokane , Yukinori Nishitani , Michinobu Mieda , Kazuo Van
IPC分类号： G11B7/0045 , G11B7/013 , G11B7/09 , G11B7/125 , G11B7/24 , G11B7/24085 , G11B11/105 , G11B19/02 , G11B3/78
CPC分类号： G11B7/0045 , G11B11/10528 , G11B11/10578 , G11B11/10595 , G11B19/02 , G11B7/0938 , G11B7/126 , G11B7/24 , G11B7/24085
摘要： An optical recording element comprising a recording medium which includes an information recording area formed at every unit in a non-continuous condition, the recording medium further including sample pits disposed at intervals of a fixed distance for providing basic information about the locations of the recording units in same track. Each sample pit comprises a plurality of pits disposed next to the sequence of the recording units so that the spacing between the pits differs from the spacing between the recording units. At least one of the plurality of pits is a long-sized inclined pit which is inclined at an angle in the range of 6.degree. to 80.degree. to a recording track. A driving system for driving the optical recording element for recording information in the non-continuous recording area or erasing information stored therein with a light beam the output of which is varied as required and checking whether said recording or erasing has been correctly performed, within a very short time in which the light beam passes through the non-continuous recording area. By using the optical recording element in combination with its driving system, the processing speed for reducing, erasing and verifying these functions can be greatly improved and the irradiating position of the light beam at every recording unit can be correctly controlled.
摘要翻译：一种光记录元件，包括记录介质，该记录介质包括在非连续状态下在每个单元处形成的信息记录区域，所述记录介质还包括以固定距离间隔设置的样品坑，以提供关于记录单元的位置的基本信息在同一轨道。每个采样坑包括靠近记录单元序列设置的多个凹坑，使得凹坑之间的间隔与记录单元之间的间隔不同。多个凹坑中的至少一个是相对于记录轨道以6°至80°的角度倾斜的长尺寸倾斜凹坑。一种驱动系统，用于驱动用于在非连续记录区域中记录信息的光学记录元件，或者用存储在其中的光束擦除信息，该光束的输出根据需要变化，并且检查是否正确地执行了所述记录或擦除光束通过非连续记录区域的非常短的时间。通过与其驱动系统结合使用光学记录元件，可以大大提高用于减少，擦除和验证这些功能的处理速度，并且可以正确地控制每个记录单元处的光束的照射位置。

4. 发明授权

US5170390A Optical recording element and driving system 失效
标题翻译：光学记录元件和驱动系统
公开(公告)号：US5170390A
公开(公告)日：1992-12-08
申请号：US394750
申请日：1989-08-16
申请人： Kenji Ohta , Tetsuya Inui , Hiroyuki Katayama , Akira Takahashi , Junji Hirokane , Yukinori Nishitani , Michinobu Mieda , Kazuo Van
发明人： Kenji Ohta , Tetsuya Inui , Hiroyuki Katayama , Akira Takahashi , Junji Hirokane , Yukinori Nishitani , Michinobu Mieda , Kazuo Van
IPC分类号： G11B7/0045 , G11B7/013 , G11B7/09 , G11B7/125 , G11B7/24 , G11B7/24085 , G11B11/105 , G11B19/02
CPC分类号： G11B7/0045 , G11B11/10528 , G11B11/10578 , G11B11/10595 , G11B19/02 , G11B7/0938 , G11B7/126 , G11B7/24 , G11B7/24085
摘要： An optical recording element comprising a recording medium which includes an information recording area formed at every unit in a non-continuous condition, the recording medium further including sample pits disposed at intervals of a fixed distance for providing basic information about the locations of recording units in the same track. Each sample pit comprises a plurality of pits disposed next to the sequence of the recording units so that the spacing between the pits differs from the spacing between the recording units. At least one of the plurality of pits is a long-sized inclined pit which is inclined at an angle in the range of 6.degree. to 80.degree. to a recording track. A driving system for driving the optical recording element for recording information in the non-continuous recording area or erasing information stored therein with a light beam the output of which is varied as required and checking whether said recording or erasing has been correctly performed, within a very short time in which the light beam passes through the non-continuous recording area. By using the optical recording element in combination with its driving system, the processing speed for reducing, erasing and verifying these functions can be greatly improved and the irradiating position of the light beam at every recording unit can be correctly controlled.

5. 发明授权

US5335220A Optical recording element and driving system 失效
标题翻译：光学记录元件和驱动系统
公开(公告)号：US5335220A
公开(公告)日：1994-08-02
申请号：US821361
申请日：1992-01-16
申请人： Kenji Ohta , Tetsuya Inui , Hiroyuki Katayama , Akira Takahashi , Junji Hirokane , Yukinori Nishitani , Michinobu Mieda , Kazuo Van
发明人： Kenji Ohta , Tetsuya Inui , Hiroyuki Katayama , Akira Takahashi , Junji Hirokane , Yukinori Nishitani , Michinobu Mieda , Kazuo Van
IPC分类号： G11B7/0045 , G11B7/013 , G11B7/09 , G11B7/125 , G11B7/24 , G11B7/24085 , G11B11/105 , G11B19/02 , G11B3/78
CPC分类号： G11B7/0045 , G11B11/10528 , G11B11/10578 , G11B11/10595 , G11B19/02 , G11B7/0938 , G11B7/126 , G11B7/24 , G11B7/24085
摘要： An optical recording element comprising a recording medium which includes an information recording area formed at every unit in a non-continuous condition, the recording medium further including sample pits disposed at intervals of a fixed distance for providing basic information about the locations of the recording units in same track. Each sample pit comprises a plurality of pits disposed next to the sequence of the recording units so that the spacing between the pits differs from the spacing between the recording units. At least one of the plurality of pits is a long-sized inclined pit which is inclined at an angle in the range of 6.degree. to 80.degree. to a recording track. A driving system for driving the optical recording element for recording information in the non-continuous recording area or erasing information stored therein with a light beam the output of which is varied as required and checking whether said recording or erasing has been correctly performed, within a very short time in which the light beam passes through the non-continuous recording area. By using the optical recording element in combination with its driving system, the processing speed for reducing, erasing and verifying these functions can be greatly improved and the irradiating position of the light beam at every recording unit can be correctly controlled.
摘要翻译：一种光记录元件，包括记录介质，该记录介质包括在非连续状态下在每个单元处形成的信息记录区域，所述记录介质还包括以固定距离间隔设置的样品坑，以提供关于记录单元的位置的基本信息在同一轨道。每个采样坑包括靠近记录单元序列设置的多个凹坑，使得凹坑之间的间隔与记录单元之间的间隔不同。多个凹坑中的至少一个是相对于记录轨道以6°至80°的角度倾斜的长尺寸倾斜凹坑。一种驱动系统，用于驱动用于在非连续记录区域中记录信息的光学记录元件，或者用存储在其中的光束擦除信息，该光束的输出根据需要变化，并且检查是否正确地执行了所述记录或擦除光束通过非连续记录区域的非常短的时间。通过与其驱动系统结合使用光学记录元件，可以大大提高用于减少，擦除和验证这些功能的处理速度，并且可以正确地控制每个记录单元处的光束的照射位置。

6. 发明授权

US5403683A Photo-mask 失效
公开(公告)号：US5403683A
公开(公告)日：1995-04-04
申请号：US102229
申请日：1993-08-05
申请人： Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
发明人： Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
IPC分类号： G03F1/48 , G11B7/26 , G03F9/00
CPC分类号： G03F1/48 , G11B7/261 , Y10T428/24868 , Y10T428/24917
摘要： A photo-mask comprises a light-permeable substrate, a plurality of light-shielding films that are disposed on the substrate, the light-shielding films forming a mask pattern, and a light-permeable protective film that is disposed over the surface of the substrate including the light-shielding films so as to protect the light-shielding films.

7. 发明授权

US5260150A Photo-mask with light shielding film buried in substrate 失效
标题翻译：光掩模与遮光膜埋在基板上
公开(公告)号：US5260150A
公开(公告)日：1993-11-09
申请号：US631277
申请日：1990-12-20
申请人： Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
发明人： Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
IPC分类号： G03F1/48 , G11B7/26 , G03F9/00
CPC分类号： G03F1/48 , G11B7/261 , Y10T428/24868 , Y10T428/24917
摘要： A photo-mask comprises a light-permeable substrate, a plurality of light-shielding films that are disposed on the substrate, the light-shielding films forming a mask pattern, and a light-permeable protective film that is disposed over the surface of the substrate including the light-shielding films so as to protect the light-shielding films.
摘要翻译：光掩模包括透光基板，设置在基板上的多个遮光膜，形成掩模图案的遮光膜，以及设置在该基板的表面上的透光保护膜包括遮光膜的基板，以保护遮光膜。

8. 发明授权

US5079113A Photo-mask 失效
标题翻译：照片面具
公开(公告)号：US5079113A
公开(公告)日：1992-01-07
申请号：US450438
申请日：1989-12-14
申请人： Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
发明人： Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
IPC分类号： G03F1/48
CPC分类号： G03F1/48
摘要： A photo-mask comprises a light-permeable substrate, a plurality of light-shielding films that are disposed on the substrate, the light-shielding films forming a mask pattern, and a light-permeable protective film that is disposed over the surface of the substrate including the light-shielding films so as to protect the light-shielding films.
摘要翻译：光掩模包括透光基板，设置在基板上的多个遮光膜，形成掩模图案的遮光膜，以及设置在该基板的表面上的透光保护膜包括遮光膜的基板，以保护遮光膜。

9. 发明授权

US5530685A Magneto-optical recording apparatus having paired devices for applying external magnetic fields 失效
标题翻译：具有用于施加外部磁场的配对装置的磁光记录装置
公开(公告)号：US5530685A
公开(公告)日：1996-06-25
申请号：US330744
申请日：1994-10-28
申请人： Hiroyuki Katayama , Junichiro Nakayama , Michinobu Mieda , Junji Hirokane , Akira Takahashi , Kenji Ohta
发明人： Hiroyuki Katayama , Junichiro Nakayama , Michinobu Mieda , Junji Hirokane , Akira Takahashi , Kenji Ohta
IPC分类号： G11B11/10 , G11B11/105 , G11B11/00
CPC分类号： G11B11/10554 , G11B11/10521 , G11B11/10523 , G11B11/10552
摘要： A magneto-optical recording apparatus of the present invention is provided with an objective lens for focusing a light beam onto a magneto-optical recording medium. A pair of magnets is disposed on opposite sides of the magneto-optical recording medium and apply a writing magnetic field onto a portion of the magneto-optical recording medium that has been irradiated by the light beam while applying an initializing magnetic field greater than the writing magnetic field onto a portion apart from that irradiated by the light beam.
摘要翻译：本发明的磁光记录装置设置有用于将光束聚焦到磁光记录介质上的物镜。一对磁体设置在磁光记录介质的相对侧上，并将写入磁场施加到已经被光束照射的磁光记录介质的一部分上，同时施加大于写入的初始化磁场磁场到除了被光束照射的部分之外的部分。

10. 发明授权

US5644566A Magneto-optical recording medium 失效
标题翻译：磁光记录介质
公开(公告)号：US5644566A
公开(公告)日：1997-07-01
申请号：US432683
申请日：1995-05-02
申请人： Junichiro Nakayama , Michinobu Mieda , Hiroyuki Katayama , Junji Hirokane , Akira Takahashi , Kenji Ohta
发明人： Junichiro Nakayama , Michinobu Mieda , Hiroyuki Katayama , Junji Hirokane , Akira Takahashi , Kenji Ohta
IPC分类号： G11B11/105 , G11B7/00
CPC分类号： G11B11/10586 , G11B11/10517
摘要： An intermediate layer is formed between a memory layer and a writing layer. The intermediate layer shows in-plane magnetization at room temperature, and perpendicular magnetization within a temperature range within which the coercive force of the memory layer is lower than that of the writing layer. The Curie point of the intermediate layer is lower than that of the memory layer. Like a conventional method, light-intensity modulation overwriting is performed by irradiating laser light whose intensity has been modulated between high level and low level while applying a recording magnetic field after performing an initialization. Even when there are variations in the raised temperature by the irradiation of laser light of high level, it is possible to perform stable overwriting with light-intensity modulation by satisfactorily restraining the exchange forces between the intermediate layer and the writing layer from causing coupling.
摘要翻译：在存储层和写入层之间形成中间层。中间层在室温下显示出平面内的磁化强度，在存储层的矫顽力低于书写层的温度范围内的垂直磁化强度。中间层的居里点低于存储层的居里点。像传统方法一样，通过在执行初始化之后照射记录磁场的同时照射强度已经被调制在高电平和低电平之间的激光来执行光强调制重写。即使通过高水平的激光照射而升高的温度存在变化，也可以通过令人满意地抑制中间层与书写层之间的交换作用而进行光强调制来进行稳定的重写。

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