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    • 1. 发明申请
    • Solar Cell Panel
    • 太阳能电池板
    • US20080302406A1
    • 2008-12-11
    • US11631285
    • 2005-06-24
    • Tadahiro OhmiAkihiro MorimotoKiwamu Takehisa
    • Tadahiro OhmiAkihiro MorimotoKiwamu Takehisa
    • H01L31/042
    • H01L31/055H01L31/02168Y02E10/52
    • Generally, solar cell panels are black, being inferior in design. An object of the invention is to provide a transparent plate which develops color without lowering power generation efficiency; and a solar cell panel which uses such transparent plate. A solar cell panel according to the invention has a construction such that the solar cell is covered by a transparent plate which is characterized by absorbing infrared light and emitting visible light. Since the transparent plate develops color by using infrared light which does not contribute to power generation, there is obtained a solar cell panel which is superior in the viewpoint of decoration without lowering the power generation efficiency of solar cells.
    • 一般来说,太阳能电池板是黑色的,设计差。 本发明的目的是提供一种在不降低发电效率的情况下显色的透明板; 以及使用这种透明板的太阳能电池板。 根据本发明的太阳能电池板具有太阳能电池被透明板覆盖的结构,其特征在于吸收红外光并发出可见光。 由于通过使用对发电无贡献的红外线使透明板显色,所以获得了在不降低太阳能电池的发电效率的情况下在装饰的观点上优越的太阳能电池面板。
    • 5. 发明授权
    • Valve for vacuum exhaustion system
    • 真空排气系统阀门
    • US07472887B2
    • 2009-01-06
    • US10545672
    • 2004-02-09
    • Tadahiro OhmiNobukazu IkedaMichio YamajiMasafumi KitanoAkihiro Morimoto
    • Tadahiro OhmiNobukazu IkedaMichio YamajiMasafumi KitanoAkihiro Morimoto
    • F16K7/17
    • F16K7/14F16K27/003F16K51/02
    • The present invention provides a valve which makes it possible to reduce the diameter of the vacuum exhaustion pipings for making the facility for the vacuum exhaustion system small, as a result lowering the costs, and making the vacuum exhaustion time short, and also which can prevent the corrosions, cloggings, and seal leakages inside the piping system caused by the accumulation of substances produced by the decomposition of the gas.Specifically, the aluminum passivation is applied on the piping parts, i.e. the valve and others, used in the vacuum exhaustion system to inhibit the gas decomposition caused by the temperature rise at the time of the baking so that components for the reduction in the diameter size in the vacuum exhaustion system are provided. The corrosions, cloggings and seat leakages caused by the gas decomposition are prevented.
    • 本发明提供一种阀,其能够减小用于真空排气系统的设备的真空排气管的直径,结果是降低成本,并且使真空耗尽时间短,并且还可以防止 由气体分解产生的物质的积聚引起的管道系统内的腐蚀,堵塞和密封泄漏。 具体地说,在真空耗尽系统中使用的管道部件即阀门等上施加铝钝化,以抑制由烘烤时的温度升高引起的气体分解,从而减小直径尺寸的部件 在真空耗尽系统中提供。 防止气体分解引起的腐蚀,堵塞和座椅泄漏。
    • 7. 发明申请
    • Vacuum Tube And Vacuum Tube Manufacturing Apparatus And Method
    • 真空管及真空管制造装置及方法
    • US20070210715A1
    • 2007-09-13
    • US10594896
    • 2005-03-31
    • Tadahiro OhmiAkihiro Morimoto
    • Tadahiro OhmiAkihiro Morimoto
    • H01J7/02H01J9/38H01J9/46
    • H01J9/395H01J7/02H01J9/38H01J9/385H01J17/20H01J21/00H01J37/18H01J61/20H01J61/24
    • With respect to a vacuum tube having a reduced pressure vessel containing an electric discharge gas sealed therein, problems such as the lowering of discharge efficiency owing to an organic material, moisture or oxygen remaining in the reduced pressure vessel have taken place conventionally. It has been now found that the selection of the number of water molecules, the number of molecules of an organic gas and the number of oxygen molecules remaining in the reduced pressure vessel, in a relation with the number of molecules of a gas contributing the electric discharge allows the reduction of the adverse effect by the above-mentioned remaining gas. Specifically, the selection of the number of molecules of the above electric discharge gas being about ten times that of the above-mentioned remaining gas or more can reduce the adverse effect by the above-mentioned remaining gas.
    • 对于具有密封在其中的放电气体的减压容器的真空管,常规地发生诸如由于有机材料引起的排出效率降低,残留在减压容器中的水分或氧气的问题。 现在已经发现,选择水分子的数量,有机气体的分子数和残留在减压容器中的氧分子的数量与导致电气的气体的分子数的关系 放电允许通过上述剩余气体减少不利影响。 具体而言,选择上述放电气体的分子数为上述剩余气体的10倍以上的分子数量,可以减少上述剩余气体的不利影响。
    • 9. 发明授权
    • Rotary silicon wafer cleaning apparatus
    • 旋转硅片清洗装置
    • US07103990B2
    • 2006-09-12
    • US10498800
    • 2003-09-11
    • Tadahiro OhmiYasuyuki ShiraiTakumi FujitaYukio MinamiNobukazu IkedaAkihiro MorimotoKoji Kawada
    • Tadahiro OhmiYasuyuki ShiraiTakumi FujitaYukio MinamiNobukazu IkedaAkihiro MorimotoKoji Kawada
    • F26B5/08
    • H01L21/67034H01L21/02052
    • It is an object of the present invention to provide a rotation type silicon wafer cleaning device to further raise the stability of a silicon wafer by providing a better hydrogen termination on the silicon wafer after completion of chemical and pure water cleaning treatments.According to the present invention, a rotation type silicon wafer cleaning device has a silicon wafer support/rotation driving mechanism inside the case body for cleaning the silicon wafer at the post chemical cleaning with pure water, drying and hydrogen termination treatments on the outer surface of a silicon wafer is performed by means of installing a silicon wafer drying device comprising a gas supply panel attached to a case body to supply a mixed gas of the hydrogen gas and inactive gas containing a hydrogen gas of more than 0.05%, a mixed gas supply pipe coupled to a gas mixer of the afore-mentioned gas supply panel at one end, a mixed gas heating device to heat the mixed gas in the afore-mentioned gas supply pipe, and a hydrogen radical formation apparatus equipped with a platinum coating film to form hydrogen radical at the gas contacting part where to a high temperature gas heated with the afore-mentioned mixed gas heating device touches, thus to gush out the mixed gas containing hydrogen radical formed with the afore-mentioned radical formation apparatus onto the rotating silicon wafer after cleaning is completed.
    • 本发明的目的是提供一种旋转型硅晶片清洁装置,以在化学和纯净水清洗处理完成之后通过在硅晶片上提供更好的氢终止来进一步提高硅晶片的稳定性。 根据本发明,旋转型硅晶片清洗装置在壳体内部具有硅晶片支撑/旋转驱动机构,用于在后期化学清洗时用纯水清洗硅晶片,在外表面上进行干燥和氢终止处理 通过安装硅晶片干燥装置来执行硅晶片,所述硅晶片干燥装置包括附接到壳体的气体供应板,以供应氢气和含有大于0.05%的氢气的惰性气体的混合气体,混合气体供应 一端连接上述气体供给面板的气体混合器的管道,将上述气体供给管内的混合气体加热的混合气体加热装置以及配备有铂镀膜的氢自由基形成装置, 在与上述混合气体加热装置加热的高温气体接触的气体接触部分处形成氢自由基,从而喷出混合气体 在完成清洁之后,将上述自由基形成装置形成的氢基团固定在旋转的硅晶片上。