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    • 2. 发明申请
    • PURGING APPARATUS AND PURGING METHOD FOR SUBSTRATE STORAGE CONTAINER
    • 基材储存容器的取料装置和清洗方法
    • US20150040950A1
    • 2015-02-12
    • US14370306
    • 2013-01-30
    • TOKYO ELECTRON LIMITED
    • Seiichi KaiseShigeki AmemiyaGenichi Nanasaki
    • B08B9/093
    • B08B9/093H01L21/67034H01L21/67389
    • Provided is a purging apparatus including an upper nozzle provided above an opening of the substrate storage container and configured to supply a dry gas obliquely downwardly to a side opposite to the substrate storage container and over the entire surface of the width of the opening; and a plurality of side nozzles provided at both sides of the opening of the substrate, respectively, and each configured to supply a dry gas towards the inside of the substrate storage container from an outside of the opening. The side nozzles are each longer than a height of the opening and formed with a plurality of supply holes supplying the dry gas at predetermined intervals in a vertical direction. The respective supply hole formed on one side nozzle and the respective supply holes formed on the other side nozzle are disposed alternately so as not to be located at the same height.
    • 本发明提供一种净化装置,其具有设置在所述基板收容容器的开口部的上方的上部喷嘴,所述清洗装置构成为向所述基板收容容器的相反侧向所述开口部的宽度方向倾斜地供给干燥气体, 以及分别设置在所述基板的开口的两侧的多个侧面喷嘴,并且分别构造成从所述开口的外部朝向所述基板收容容器的内部供给干燥气体。 所述侧喷嘴的长度大于所述开口的高度,并形成有在垂直方向上以预定间隔供给所述干燥气体的多个供给孔。 形成在一侧喷嘴上的相应供应孔和形成在另一侧喷嘴上的各个供应孔交替设置成不位于相同的高度。
    • 5. 发明授权
    • Method for purging a substrate container
    • 吹扫基材容器的方法
    • US09305817B2
    • 2016-04-05
    • US13757954
    • 2013-02-04
    • TOKYO ELECTRON LIMITED
    • Seiichi KaiseShigeki AmemiyaShinobu OnoderaHiroki FujitaMasaru NishinoAtsushi Rikukawa
    • H01L21/677H01L21/673
    • H01L21/67772H01L21/67393
    • A method for purging a substrate container which accommodates in multiple stages a plurality of substrates to be processed by a substrate processing apparatus, the method includes: mounting the substrate container on a mounting unit; connecting a gas supply port provided in the substrate container and a gas supply line provided in a mounting unit; starting supply of a dry gas into the substrate container from a gas supply line before opening a cover of the substrate container; opening the cover of the substrate container while keeping the supply of the dry gas; closing the cover of the substrate container upon completion of processing of the substrates in the substrate container; and stopping the supply of the dry gas after closing the cover of the substrate container.
    • 一种用于清洗基板容器的方法,所述方法包括:将所述基板容器安装在安装单元上,所述方法包括:将所述基板容器安装在基板处理装置上, 连接设置在基板容器中的气体供给口和设置在安装单元中的气体供给管线; 在打开基板容器的盖之前,从气体供应管线开始供应干燥气体到基板容器中; 在保持供应干燥气体的同时打开基材容器的盖子; 在基板容器中的基板处理完成时封闭基板容器的盖子; 并且在关闭基板容器的盖子之后停止供应干燥气体。