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    • 3. 发明授权
    • Method and plant for etching a fluoropolymer substrate
    • 用于蚀刻氟聚合物基材的方法和设备
    • US09481773B2
    • 2016-11-01
    • US15022150
    • 2013-10-10
    • Guarniflon S.p.A.
    • Massimo VillanoPasquale Stella
    • B44C1/22C03C15/00C03C25/68C23F1/00C08J7/14B01D61/02
    • C08J7/14B01D61/022B01D61/025B01D61/58B01D69/12B01D2311/06B01D2311/25B01D2311/263B01D2311/2634B01D2311/2669B01D2311/2688C08J7/02C08J2327/18
    • (Semi-)continuous etching method for a fluoropolymer substrate (10) comprising steps of feeding (22) said substrate (10) in the form of a continuous ribbon wherein said substrate defines a primary surface (12), subjecting to at least one etching operations (2) a part of the primary surface (12) by means of an adhesion-promoting solution comprising a complex of an alkali metal in naphthalene, washing (4) the primary surface (12) wetted by the adhesion-promoting solution by means of a washing solution (42) comprising aqueous acetic acid/formic acid, and selectively separating a concentrated solution (24) of acetic acid/formic acid from the washing solution (42) by means of inverse osmosis operations (6, 8) at ▪ increasing pressures, and re-introducing at least a portion of the concentrated solution (24) of acetic acid/formic acid in the washing solution (42) to create a recirculation. The invention further relates to an etching plant.
    • (10)的(半)连续蚀刻方法,包括以连续色带形式馈送(22)所述基底(10)的步骤,其中所述基底限定主表面(12),进行至少一个蚀刻 (2)通过包含萘中的碱金属的配合物的粘合促进溶液洗涤主表面(12)的一部分,洗涤(4)由粘合促进溶液润湿的主表面(12) 的包含乙酸/甲酸水溶液的洗涤溶液(42),并且通过反渗透操作(6,8)从所述洗涤溶液(42)中选择性分离乙酸/甲酸的浓缩溶液(24) 增加压力,并将至少一部分乙酸/甲酸的浓缩溶液(24)重新引入洗涤溶液(42)中以产生再循环。 本发明还涉及一种蚀刻装置。
    • 4. 发明申请
    • Method and Plant for Etching a Fluoropolymer Substrate
    • 用于蚀刻含氟聚合物基材的方法和设备
    • US20160237231A1
    • 2016-08-18
    • US15022150
    • 2013-10-10
    • Guarniflon S.p.A.
    • Massimo VillanoPasquale Stella
    • C08J7/14B01D61/02
    • C08J7/14B01D61/022B01D61/025B01D61/58B01D69/12B01D2311/06B01D2311/25B01D2311/263B01D2311/2634B01D2311/2669B01D2311/2688C08J7/02C08J2327/18
    • (Semi-) continuous etching method for a fluoropolymer substrate (10) comprising steps of feeding (22) said substrate (10) in the form of a continuous ribbon wherein said substrate defines a primary surface (12), subjecting to at least one etching operations (2) a part of the primary surface (12) by means of an adhesion-promoting solution comprising a complex of an alkali metal in naphthalene, washing (4) the primary surface (12) wetted by the adhesion-promoting solution by means of a washing solution (42) comprising aqueous acetic acid/formic acid, and selectively separating a concentrated solution (24) of acetic acid/formic acid from the washing solution (42) by means of inverse osmosis operations (6, 8) at ▪ increasing pressures, and re-introducing at least a portion of the concentrated solution (24) of acetic acid/formic acid in the washing solution (42) to create a recirculation. The invention further relates to an etching plant.
    • (10)的(半)连续蚀刻方法,包括以连续色带形式馈送(22)所述基底(10)的步骤,其中所述基底限定主表面(12),进行至少一个蚀刻 (2)通过包含萘中的碱金属的配合物的粘合促进溶液洗涤主表面(12)的一部分,洗涤(4)由粘合促进溶液润湿的主表面(12) 的包含乙酸/甲酸水溶液的洗涤溶液(42),并且通过反渗透操作(6,8)从所述洗涤溶液(42)中选择性分离乙酸/甲酸的浓缩溶液(24) 增加压力,并将至少一部分乙酸/甲酸的浓缩溶液(24)重新引入洗涤溶液(42)中以产生再循环。 本发明还涉及一种蚀刻装置。