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1. 发明授权

US12027407B2 Substrate support apparatus and method 有权
公开(公告)号：US12027407B2
公开(公告)日：2024-07-02
申请号：US15723505
申请日：2017-10-03
申请人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
发明人： Yueh Lin Yang , Chi-Hung Liao , Fei-Gwo Tsai
IPC分类号： H01J37/32 , C23C14/50 , C23C16/458 , H01L21/673 , H01L21/683 , H01L21/687 , H05K7/14
CPC分类号： H01L21/6838 , C23C14/505 , C23C16/4586 , H01L21/673 , H01L21/6734 , H01L21/6835 , H01L21/687 , H01L21/6875 , H05K7/14
摘要： A substrate support apparatus includes a housing and a plurality of spherical supports. The housing has a top surface, the top surface including a plurality of openings. The housing is configured to position the plurality of spherical supports within the plurality of openings so that topmost surfaces of the plurality of spherical supports are arranged in a plane above the top surface. A spherical support of the plurality of spherical supports is rotatable within the housing.

2. 发明授权

US09618855B2 Lithography system and method for mask inspection 有权
公开(公告)号：US09618855B2
公开(公告)日：2017-04-11
申请号：US13763791
申请日：2013-02-11
申请人： Taiwan Semiconductor Manufacturing Company, Ltd.
发明人： Fei-Gwo Tsai , Bo-Tsun Liu , Chieh-Huan Ku
IPC分类号： G03F7/20 , G03F7/00 , G03F1/84 , G03F1/82
CPC分类号： G03F7/70666 , G03F1/82 , G03F1/84 , G03F7/00 , G03F7/70483 , G03F7/70525 , G03F7/70925
摘要： The present disclosure provides a method that includes capturing a first image of a mask in a first exposure apparatus using a first exposure source and a first imaging sensor; capturing a second image of the mask in a second exposure apparatus using a second exposure source and a second imaging sensor; comparing the first image of the mask and the second image of the mask for a difference therebetween; and determining an action according to the difference.

3. 发明授权

US09081306B2 Method of optimizing lithography tools utilization 有权
标题翻译：优化光刻工具利用的方法
公开(公告)号：US09081306B2
公开(公告)日：2015-07-14
申请号：US13622675
申请日：2012-09-19
申请人： Taiwan Semiconductor Manufacturing Company, Ltd.
发明人： Yao-Hwan Kao , Fei-Gwo Tsai , Li-Kong Tum , Ching-Hai Yang , Steven Liu
IPC分类号： G03B27/42 , G03B27/32 , G03F7/20 , H01L21/67
CPC分类号： G03F7/70733 , G03F7/20 , H01L21/67155
摘要： A lithography cluster includes at least two lithography cells having a first lithography cell and a second lithography cell, an interface unit configured to integrate with the first lithography cell and the second lithography cell. The first lithography cell includes a first track and a first exposing tool and a second lithography cell includes a second track and a second exposing tool. The interface station includes a first interface buffer configured to couple the first track, a second interface buffer configured to couple the second track, a conveyor configured to couple the first interface buffer and the second interface buffer, and a robot configure to move along the conveyor, where in the robot transfers a substrate between functions of multiple functions within the first lithography cell, the second lithography cell, or between the first lithography cell and the second lithography cell.
摘要翻译：光刻簇包括具有第一光刻单元和第二光刻单元的至少两个光刻单元，被配置为与第一光刻单元和第二光刻单元集成的接口单元。第一光刻单元包括第一轨道和第一曝光工具，第二光刻单元包括第二轨道和第二曝光工具。接口站包括被配置为耦合第一轨道的第一接口缓冲器，被配置为耦合第二轨道的第二接口缓冲器，被配置为耦合第一接口缓冲器和第二接口缓冲器的传送器，以及被配置为沿着传送器移动的机器人其中机器人在第一光刻单元，第二光刻单元或第一光刻单元与第二光刻单元之间的多功能功能之间传送基板。

4. 发明申请

US20140226143A1 Lithography System and Method For Mask Inspection 有权
标题翻译：平版印刷系统和面膜检查方法
公开(公告)号：US20140226143A1
公开(公告)日：2014-08-14
申请号：US13763791
申请日：2013-02-11
申请人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
发明人： Fei-Gwo Tsai , Bo-Tsun Liu , Chieh-Huan Ku
IPC分类号： G03F7/20 , G03F7/00
CPC分类号： G03F7/70666 , G03F1/82 , G03F1/84 , G03F7/00 , G03F7/70483 , G03F7/70525 , G03F7/70925
摘要： The present disclosure provides a method that includes capturing a first image of a mask in a first exposure apparatus using a first exposure source and a first imaging sensor; capturing a second image of the mask in a second exposure apparatus using a second exposure source and a second imaging sensor; comparing the first image of the mask and the second image of the mask for a difference therebetween; and determining an action according to the difference.
摘要翻译：本公开提供一种方法，其包括使用第一曝光源和第一成像传感器在第一曝光装置中捕获掩模的第一图像; 使用第二曝光源和第二成像传感器在第二曝光装置中拍摄掩模的第二图像; 将掩模的第一图像和掩模的第二图像之间的差异进行比较; 以及根据所述差异确定动作。

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