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    • 1. 再颁专利
    • Scanning type exposure apparatus and exposure method
    • USRE37361E1
    • 2001-09-11
    • US09300376
    • 1999-04-27
    • Masamitsu YanagiharaSusumu MoriTsuyoshi NarakiMasami SekiSeiji MiyazakiTsuyohsi NarabeHiroshi Chiba
    • Masamitsu YanagiharaSusumu MoriTsuyoshi NarakiMasami SekiSeiji MiyazakiTsuyohsi NarabeHiroshi Chiba
    • H01L21027
    • G03F7/70275G03F7/70241G03F7/70258G03F7/70358G03F7/70858G03F7/70883G03F9/70
    • In a scanning type exposure apparatus for exposing an entire surface of a pattern region on a mask to a substrate by scanning the mask and the substrate with respect to a projection optical system in a predetermined direction with a speed ratio in accordance with a magnification of the projection optical system, there are provided a plurality of illumination optical systems for illuminating respective areas of the pattern region on the mask with respective light fluxes from respective light source; a plurality of projection optical systems arranged so as to correspond to the respective illumination optical systems, the projection optical systems projecting respective images of the areas illuminated by the respective illumination optical systems onto respective projection areas on the substrate; a memory device for obtaining and storing a change of shape of the substrate; a magnification changing device for changing a magnification of at least one of the projection optical systems in accordance with the change of shape of the substrate; and an imaging position changing device for changing the position of said image projected via the at least one projection optical systems in accordance with the change in magnification. An exposure apparatus for exposing a pattern of a mask onto a substrate includes an image transfer system, an imaging characteristic adjusting mechanism and an exposure system. The image transfer system projects the pattern of the mask onto the substrate while moving the mask and the substrate synchronously during the projection of the pattern onto the substrate such that portions of the pattern overlap each other. The imaging characteristic adjusting mechanism is disposed in a space between the mask and the substrate, and adjusts imaging characteristics of a portion of the image transfer system that projects the pattern onto the substrate. The exposure system exposes the pattern during the synchronous movement of the mask and the substrate by the image transfer system.
    • 2. 发明授权
    • Scanning type exposure apparatus and exposure method
    • 扫描式曝光装置和曝光方法
    • US5625436A
    • 1997-04-29
    • US689691
    • 1996-08-13
    • Masamitsu YanagiharaSusumu MoriTsuyoshi NarakiMasami SekiSeiji MiyazakiTsuyoshi NarabeHiroshi Chiba
    • Masamitsu YanagiharaSusumu MoriTsuyoshi NarakiMasami SekiSeiji MiyazakiTsuyoshi NarabeHiroshi Chiba
    • G03F7/20G03F9/00H01L21/027
    • G03F7/70275G03F7/70241G03F7/70258G03F7/70358G03F7/70858G03F7/70883G03F9/70
    • In a scanning type exposure apparatus for exposing an entire surface of a pattern region on a mask to a substrate by scanning the mask and the substrate with respect to a projection optical system in a predetermined direction with a speed ratio in accordance with a magnification of the projection optical system, there are provided a plurality of illumination optical systems for illuminating respective areas of the pattern region on the mask with respective light fluxes from respective light source; a plurality of projection optical systems arranged so as to correspond to the respective illumination optical systems, the projection optical systems projecting respective images of the areas illuminated by the respective illumination optical systems onto respective projection areas on the substrate; a memory device for obtaining and storing a change of shape of the substrate; a magnification changing device for changing a magnification of at least one of the projection optical systems in accordance with the change of shape of the substrate; and an imaging position changing device for changing the position of said image projected via the at least one projection optical systems in accordance with the change in magnification.
    • 在扫描型曝光装置中,通过以与所述掩模和所述基板相对于所述投影光学系统的倍率相对于投影光学系统沿预定方向扫描所述掩模上的图案区域的整个表面, 提供了多个照明光学系统,用于利用来自各个光源的各个光束照射掩模上的图案区域的各个区域; 多个投影光学系统被布置为对应于各个照明光学系统,所述投影光学系统将由各个照明光学系统照射的区域的各个图像投射到所述基板上的相应的投影区域上; 用于获取和存储基板的形状变化的存储装置; 放大率改变装置,用于根据基板的形状变化来改变至少一个投影光学系统的放大率; 以及成像位置改变装置,用于根据放大率的变化改变经由至少一个投影光学系统投影的所述图像的位置。
    • 3. 发明授权
    • Scanning light exposure apparatus
    • 扫描曝光装置
    • US5579147A
    • 1996-11-26
    • US354715
    • 1994-12-06
    • Susumu MoriTsuyoshi Naraki
    • Susumu MoriTsuyoshi Naraki
    • G03B27/50G03F7/20H01L21/027G02B26/08
    • G03F7/7005G03F7/70241G03F7/70275G03F7/70358G03F7/70475G03F7/70791
    • A scanning light exposure apparatus comprises illumination optical systems for radiating light beams to a plurality of sub-areas in a pattern area of a mask, a plurality of projection optical systems arranged along a predetermined direction for projecting erected images of unity magnification of the sub-areas by the light beams transmitted through the mask onto a photo-sensitive substrate, a diaphragm member arranged at a substantially conjugate position to the photo-sensitive substrate in each illumination optical system for limiting a projection area of the sub-area to the photo-sensitive substrate, scanning means for synchronously scanning said mask and said photo-sensitive substrate substantially transversely to the predetermined direction relative to said projection optical systems and diaphragm control means for changing a width of an aperture of each diaphragm member along a direction transverse to the predetermined direction.
    • 扫描曝光装置包括用于将光束照射到掩模的图案区域中的多个子区域的照明光学系统,沿着预定方向布置的多个投影光学系统,用于投影子像素的单位放大率的竖立图像, 通过掩模将光束透射到感光基板上的区域,在每个照明光学系统中布置在与感光基板基本共轭的位置处的光阑部件,用于将子区域的投影面积限制在光敏基片上, 敏感基板,用于相对于所述投影光学系统和隔膜控制装置基本横向于预定方向同步扫描所述掩模和所述感光基板的扫描装置,用于沿横向于预定的方向改变每个隔膜部件的孔的宽度 方向。
    • 6. 发明授权
    • Method for measuring orthogonality having a third interferometer which
is not orthogonal
    • 正交性测量方法,舞台装置和曝光装置
    • US6134007A
    • 2000-10-17
    • US310959
    • 1999-05-13
    • Tsuyoshi NarakiShuji Kawamura
    • Tsuyoshi NarakiShuji Kawamura
    • G01B11/26G03F7/20G03F9/00H01L21/027G01B9/02
    • G03F7/70716G01B11/26G03F7/70775G03F9/70
    • A projection exposure apparatus has a function to measure orthogonality between movement mirrors for interferometers for measuring positions of a substrate table in X and Y directions. The substrate table is moved by a distance L along a direction of a third axis which is included in an XY plane and inclined at an angle .alpha. with respect to a Y axis, while operating a movement mirror and an interferometer for the direction of the third axis. A component in the Y direction corresponding to the distance L in the direction of the third axis is defined as d. A movement distance of the substrate table in the X direction after movement of the substrate table by the distance L in the direction of the third axis is determined by the interferometer for measuring the position in the X direction, which is defined as S. An orthogonality error .theta. can be determined in accordance with .theta.=tan.sup.-1 [(d-S)/d]. The position of the substrate table can be correctly controlled by moving the substrate table while giving an offset to correct the error. This function can be also applied to a mask stage.
    • 投影曝光装置具有测量用于干涉仪的移动反射镜之间在X和Y方向上测量基板台的位置的正交性的功能。 衬底台沿着包括在XY平面中的第三轴的方向移动距离L,并相对于Y轴以α角倾斜,同时操作用于第三个方向的移动镜和干涉仪 轴。 对应于在第三轴方向上的距离L的Y方向的分量被定义为d。 基板台沿着第三轴方向移动距离L后的X方向上的X方向的移动距离由用于测量X方向的位置的干涉仪决定,该方向被定义为S.正交性 可以根据θ= tan-1 [(dS)/ d]来确定误差θ。 通过移动衬底台,同时给出偏移以校正误差,可以正确地控制衬底台的位置。 此功能也可应用于遮罩舞台。
    • 7. 发明授权
    • Method for measuring orthogonality in a stage of an exposure apparatus
    • 用于在曝光装置的阶段中测量正交性的方法
    • US5995225A
    • 1999-11-30
    • US754012
    • 1996-11-20
    • Tsuyoshi NarakiShuji Kawamura
    • Tsuyoshi NarakiShuji Kawamura
    • G01B11/26G03F7/20G03F9/00H01L21/027G01B9/02
    • G03F7/70716G01B11/26G03F7/70775G03F9/70
    • A projection exposure apparatus has a function to measure orthogonality between movement mirrors for interferometers for measuring positions of a substrate table in X and Y directions. The substrate table is moved by a distance L along a direction of a third axis which is included in an XY plane and inclined at an angle .alpha. with respect to a Y axis, while operating a movement mirror and an interferometer for the direction of the third axis. A component in the Y direction corresponding to the distance L in the direction of the third axis is defined as d. A movement distance of the substrate table in the X direction after movement of the substrate table by the distance L in the direction of the third axis is determined by the interferometer for measuring the position in the X direction, which is defined as S. An orthogonality error .theta. can be determined in accordance with .theta.=tan.sup.-1 [(d-S)/d]. The position of the substrate table can be correctly controlled by moving the substrate table while giving an offset to correct the error. This function can be also applied to a mask stage.
    • 投影曝光装置具有测量用于干涉仪的移动反射镜之间在X和Y方向上测量基板台的位置的正交性的功能。 衬底台沿着包括在XY平面中的第三轴的方向移动距离L,并相对于Y轴以α角倾斜,同时操作用于第三个方向的移动镜和干涉仪 轴。 对应于在第三轴方向上的距离L的Y方向的分量被定义为d。 基板台沿着第三轴方向移动距离L后的X方向上的X方向的移动距离由用于测量X方向的位置的干涉仪决定,该方向被定义为S.正交性 可以根据θ= tan-1 [(dS)/ d]来确定误差θ。 通过移动衬底台,同时给出偏移以校正误差,可以正确地控制衬底台的位置。 此功能也可应用于遮罩舞台。
    • 8. 发明授权
    • Substrate positioning apparatus
    • 基板定位装置
    • US4655584A
    • 1987-04-07
    • US729968
    • 1985-05-03
    • Hiroshi TanakaYukio KakizakiHiromitsu IwataTsuyoshi Naraki
    • Hiroshi TanakaYukio KakizakiHiromitsu IwataTsuyoshi Naraki
    • G03F7/20G03B27/42A23G9/00
    • G03F7/7075Y10S414/136
    • An apparatus for positioning a planar substrate on a plane relative to a stage comprises means for supporting the substrate on the plane, the supporting means being provided on the stage for rotation about an axis perpendicular to the plane, first drive means for moving the substrate relative to the supporting means in a predetermined direction along the plane, a reference member disposed on the stage and having a reference surface intersecting the plane, the reference member having a position in which the reference surface is opposed to the substrate moved in the predetermined position so that the reference surface is brought into contact with the circumferential end of the substrate moved by the first drive means to thereby position the substrate, and a biased position in which the reference surface is biased away from the circumferential end of the substrate from the opposed position, and second drive means for displacing the reference member between the opposed position and the biased position.
    • 用于将平面基板定位在相对于平台的平面上的装置包括用于在平面上支撑基板的装置,支撑装置设置在平台上用于围绕垂直于平面的轴线旋转;第一驱动装置,用于移动基板相对 在沿着平面的预定方向上到支撑装置的参考构件,设置在平台上并具有与平面交叉的参考表面的基准构件,基准构件具有基准表面与在预定位置移动的基板相对的位置,从而 参考表面与由第一驱动装置移动的基板的周向端部接触,从而定位基板;以及偏置位置,在该偏置位置,参考表面偏离基板的周向端部,从相对位置 以及第二驱动装置,用于使参考构件在相对位置和双侧之间移位 sed位置。
    • 10. 发明授权
    • Exposure apparatus
    • 曝光装置
    • US06496249B2
    • 2002-12-17
    • US09766337
    • 2001-01-19
    • Yasunori NishimuraTaimi OketaniTsuyoshi Naraki
    • Yasunori NishimuraTaimi OketaniTsuyoshi Naraki
    • G03B2760
    • G03F7/707G03F7/70275G03F7/70358G03F7/70425G03F7/70433G03F7/70916
    • The present invention aims at preventing deterioration of flatness of a substrate and contamination of a substrate-holding surface of a substrate holder, which are caused by a resist leaking into the back surface of the substrate. A substrate-holding surface of a substrate holder is provided with a first pair of grooves 31 and 32 extending from one end to the other along a scanning direction and a second pair of grooves 33 and 34 extending from one end to the other along a direction generally perpendicular to the scanning direction. The first and second grooves are positioned such that they make contact with the periphery of the substrate when the substrate is vertically or horizontally placed on the substrate holder. Even when a resist on a substrate leaks into the periphery of the back surface, the resist escapes into the grooves, thereby preventing deterioration of the flatness of the substrate or contamination of the substrate-holding surface.
    • 本发明的目的在于防止由于抗蚀剂渗透到基板的后表面而导致的基板的平坦度的劣化和基板保持件的基板保持表面的污染。基板保持器的基板保持表面是 设置有沿着扫描方向从一端延伸到另一端的第一对槽31和32以及沿着与扫描方向大致垂直的方向从一端延伸到另一端的第二对槽33和34。 第一和第二槽定位成使得当衬底垂直或水平放置在衬底保持器上时,它们与衬底的周边接触。 即使当基板上的抗蚀剂泄漏到背面的周边时,抗蚀剂也可以逸出到槽中,从而防止基板的平坦度的劣化或基板保持面的污染。