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1. 发明授权

US6094334A Polymer chuck with heater and method of manufacture 失效
标题翻译：带加热器的聚合物卡盘和制造方法
公开(公告)号：US6094334A
公开(公告)日：2000-07-25
申请号：US261083
申请日：1999-03-02
申请人： Surinder S. Bedi , Shamouil Shamouilian , Syed H. Askari , Arnold Kholodenko , Jon T. Clinton , Alexander M. Veytser , Liang-Guo Wang , You Wang
发明人： Surinder S. Bedi , Shamouil Shamouilian , Syed H. Askari , Arnold Kholodenko , Jon T. Clinton , Alexander M. Veytser , Liang-Guo Wang , You Wang
IPC分类号： H01L21/683 , H01G23/00
CPC分类号： H01L21/6833
摘要： An electrostatic chuck 20 for holding a substrate 25 in a process chamber 30 comprises an electrostatic member 115 comprising a polymer 120 covering an electrode 125, the polymer 120 having a receiving surface 135 for receiving the substrate 25. A heater 130 abutting the polymer 120 is provided to heat the substrate 25 during processing of the substrate 25. The heater 130 has a resistance that is sufficiently low to heat the substrate 25 without causing excessive thermal degradation of the polymer 120.
摘要翻译：用于将基板25保持在处理室30中的静电卡盘20包括包括覆盖电极125的聚合物120的静电部件115，聚合物120具有用于接收基板25的接收表面135.邻接聚合物120的加热器130是提供用于在基板25的加工期间加热基板25.加热器130具有足够低的电阻以加热基板25而不引起聚合物120的过度热降解。

2. 发明授权

US06478924B1 Plasma chamber support having dual electrodes 有权
标题翻译：具有双电极的等离子体室支撑
公开(公告)号：US06478924B1
公开(公告)日：2002-11-12
申请号：US09513992
申请日：2000-03-07
申请人： Shamouil Shamouilian , Arnold Kholodenko , Kwok Manus Wong , Liang-Guo Wang , Alexander M. Veytser , Dennis S. Grimard
发明人： Shamouil Shamouilian , Arnold Kholodenko , Kwok Manus Wong , Liang-Guo Wang , Alexander M. Veytser , Dennis S. Grimard
IPC分类号： H05H100
CPC分类号： H01J37/32706 , H01L21/6833 , Y10T279/23
摘要： A process chamber 110 capable of processing a substrate 50 in a plasma comprises a dielectric 210 covering a first electrode 220 and a second electrode 230, a conductor 250 supporting the dielectric 210, and a voltage supply 170 to supply an RF voltage to the first electrode 220 or the second electrode 230 in the dielectric 210. The first electrode 220 capacitively couples with a process electrode 225 to energize process gas in the process chamber 110 and RF voltage applied to the second electrode 230 is capacitively coupled to the conductor 250 and through a collar 260 or the second electrode 230 is directly capacitively coupled through the collar 260.
摘要翻译：能够处理等离子体中的衬底50的处理室110包括覆盖第一电极220和第二电极230的电介质210，支撑电介质210的导体250以及向第一电极提供RF电压的电压源170 220或电介质210中的第二电极230.第一电极220与处理电极225电容耦合以激励处理室110中的处理气体，并且施加到第二电极230的RF电压电容耦合到导体250并且通过套环260或第二电极230通过套环260直接电容耦合。

3. 发明授权

US06494958B1 Plasma chamber support with coupled electrode 有权
标题翻译：具有耦合电极的等离子体室支撑
公开(公告)号：US06494958B1
公开(公告)日：2002-12-17
申请号：US09607100
申请日：2000-06-29
申请人： Shamouil Shamouilian , Jon M. McChesney , Kwok Manus Wong , Liang-Guo Wang , Alexander M. Veytser , Dennis S. Grimard
发明人： Shamouil Shamouilian , Jon M. McChesney , Kwok Manus Wong , Liang-Guo Wang , Alexander M. Veytser , Dennis S. Grimard
IPC分类号： C23C1600
CPC分类号： H01J37/32082 , C23C16/4581 , C23C16/4586 , C23C16/505
摘要： A process chamber 110 capable of processing a substrate 30 in a plasma of process gas. The chamber 110 comprises a support 200 having a dielectric 210 covering an electrode 220 and a conductor 230 below the electrode 220. A voltage supply 180 supplies a gas energizing voltage to the conductor 220, and the conductor is adapted to capacitively couple the voltage to the electrode 220 to energize the process gas. Alternatively, the voltage may be supplied to the electrode 220 through a connector 195 which can capacitively couple with the conductor 230. A DC power supply 190 may also provide an electrostatic chucking voltage to the electrode 220. In one version, the conductor 230 comprises an interposer 280.
摘要翻译：能够处理处理气体的等离子体中的基板30的处理室110。腔室110包括支撑件200，其具有覆盖电极220的电介质210和电极220下方的导体230.电压源180向导体220提供气体激励电压，并且导体适于将电压电容耦合到电极220以使处理气体通电。或者，电压可以通过能够与导体230电容耦合的连接器195提供给电极220.直流电源190还可以向电极220提供静电夹持电压。在一种形式中，导体230包括插入器280。

4. 发明授权

US06726804B2 RF power delivery for plasma processing using modulated power signal 失效
标题翻译：使用调制功率信号的等离子体处理的射频功率传输
公开(公告)号：US06726804B2
公开(公告)日：2004-04-27
申请号：US09767282
申请日：2001-01-22
申请人： Liang-Guo Wang , Kwok M. Wong , Shamouil Shamouilian , Kartik Ramaswamy
发明人： Liang-Guo Wang , Kwok M. Wong , Shamouil Shamouilian , Kartik Ramaswamy
IPC分类号： H05H100
CPC分类号： H01J37/32137 , C23C16/507 , H01J37/321
摘要： A plasma processing apparatus and a method of operating a plasma processing apparatus are disclosed. In one embodiment, a first RF signal at a carrier frequency and a second RF signal at a second frequency are generated. An amplitude modulated signal is formed by modulating the first RF signal with the second RF signal. A plasma is generated within the plasma processing chamber using the amplitude modulated signal. Generating plasma using a frequency modulated signal is also disclosed.
摘要翻译：公开了等离子体处理装置和操作等离子体处理装置的方法。在一个实施例中，产生载波频率的第一RF信号和第二频率的第二RF信号。通过用第二RF信号调制第一RF信号来形成幅度调制信号。使用幅度调制信号在等离子体处理室内产生等离子体。还公开了使用调频信号产生等离子体。

5. 发明授权

US06481886B1 Apparatus for measuring pedestal and substrate temperature in a semiconductor wafer processing system 失效
标题翻译：用于测量半导体晶片处理系统中基座和基板温度的装置
公开(公告)号：US06481886B1
公开(公告)日：2002-11-19
申请号：US09513726
申请日：2000-02-24
申请人： Kadthala R. Narendrnath , Liang-Guo Wang , Shamouil Shamouilian , Paul E. Luscher , Hamid Noorbakhsh
发明人： Kadthala R. Narendrnath , Liang-Guo Wang , Shamouil Shamouilian , Paul E. Luscher , Hamid Noorbakhsh
IPC分类号： G01K114
CPC分类号： H01L21/67248 , G01K11/3213 , H01J37/32431 , H01J2237/2001
摘要： Apparatus for measuring wafer support assembly temperature in a semiconductor wafer processing system. The apparatus is a modular plug that is mounted to the support assembly. The plug contains a photoluminescent material that exhibits a decay in luminescence after an excitement which is indicative of the temperature of the support assembly.
摘要翻译：用于测量半导体晶片处理系统中的晶片支撑组件温度的装置。该装置是安装到支撑组件的模块化插头。塞子包含在激发后表现出发光衰减的光致发光材料，其表示支撑组件的温度。

6. 发明授权

US5128797A Non-mechanical optical path switching and its application to dual beam spectroscopy including gas filter correlation radiometry 失效
标题翻译：非机械光路切换及其应用于双光束光谱，包括气体滤波器相关辐射测量
公开(公告)号：US5128797A
公开(公告)日：1992-07-07
申请号：US653605
申请日：1991-02-11
申请人： Glen W. Sachse , Liang-Guo Wang
发明人： Glen W. Sachse , Liang-Guo Wang
IPC分类号： G01J3/08 , G01N21/35
CPC分类号： G01N21/3518 , G01J3/08 , G01N2021/3509
摘要： A non-mechanical optical switch is provided for alternately switching a monochromatic or quasi-monochromatic light beam along two optical paths. A polarizer polarizes light into a single, e.g., vertical component which is then rapidly modulated into vertical and horizontal components by a polarization modulator. A polarization beam splitter then reflects one of these components along one path and transmits the other along the second path. In the specific application of gas filter correlation radiometry, one path is directed through a vacuum cell and one path is directed through a gas correlation cell containing a desired gas. Reflecting mirrors cause these two paths to intersect at a second polarization beam splitter which reflects one component and transmits the other to recombine them into a polarization modulated beam which can be detected by an appropriate single sensor.
摘要翻译：提供非机械光学开关用于沿着两个光路交替地切换单色或准单色光束。偏振器将光线偏振成单个例如垂直分量，然后通过偏振调制器将光快速调制成垂直和水平分量。偏振分束器然后沿着一个路径反射这些分量中的一个，并沿第二路径传输另一个。在气体过滤器相关辐射测量的具体应用中，一条路径被引导通过真空室，一条路径被引导通过含有所需气体的气相关池。反射镜使得这两条路径在第二偏振分束器处相交，第二偏振分束器反射一个分量并透射另一个分量，将它们重新组合成可由适当的单个传感器检测的偏振调制束。

7. 发明授权

US06642489B2 Method and apparatus for improving exhaust gas consumption in an exhaust conduit 失效
标题翻译：用于改善排气管道中废气消耗的方法和装置
公开(公告)号：US06642489B2
公开(公告)日：2003-11-04
申请号：US09758000
申请日：2001-01-09
申请人： Kartik Ramaswamy , Dennis S. Grimard , Philip M. Salzman , Liang-Guo Wang , Kwok Manus Wong
发明人： Kartik Ramaswamy , Dennis S. Grimard , Philip M. Salzman , Liang-Guo Wang , Kwok Manus Wong
IPC分类号： H05B610
CPC分类号： H01L21/67098
摘要： A conduit has a heating system disposed therein. The heating system generates heat in response to magnetic flux generated by an inductive coil. The heating system has a heat transfer element and a plurality of ferromagnetic elements. The heat transfer element may be displaced within the conduit to control the amount of heat generated.
摘要翻译：导管具有设置在其中的加热系统。加热系统响应于由感应线圈产生的磁通而产生热量。加热系统具有传热元件和多个铁磁元件。传热元件可以在导管内移位以控制产生的热量。

8. 发明授权

US5451769A Circular electrode geometry metal-semiconductor-metal photodetectors 失效
标题翻译：圆形电极几何金属 - 半导体 - 金属光电探测器
公开(公告)号：US5451769A
公开(公告)日：1995-09-19
申请号：US179598
申请日：1994-01-05
申请人： James A. McAdoo , Elias Towe , William L. Bishop , Liang-Guo Wang
发明人： James A. McAdoo , Elias Towe , William L. Bishop , Liang-Guo Wang
IPC分类号： H01L31/108 , H01J40/14
CPC分类号： H01L31/1085
摘要： A high speed, metal-semiconductor-metal photodetector includes a pair of generally circular, electrically conductive electrodes formed on an optically active semiconductor layer. Various embodiments of the invention include a spiral, intercoiled electrode geometry and an electrode geometry having substantially circular, concentric electrodes which are interposed. These electrode geometries result in photodetectors with lower capacitances, dark currents and lower inductance which reduces the ringing seen in the optical pulse response.
摘要翻译：高速金属半导体金属光电探测器包括在光学活性半导体层上形成的一对大致圆形的导电电极。本发明的各种实施例包括螺旋状，互联电极几何形状和具有基本圆形的同心电极的电极几何形状。这些电极几何形状导致具有较低电容，暗电流和较低电感的光电探测器，这减少了在光脉冲响应中看到的振铃。

9. 发明授权

US07196801B1 Patterned substrate surface mapping 有权
标题翻译：图案衬底表面映射
公开(公告)号：US07196801B1
公开(公告)日：2007-03-27
申请号：US10771020
申请日：2004-02-03
申请人： Gary R. Janik , Liang-Guo Wang , Christopher M. Pohlhammer
发明人： Gary R. Janik , Liang-Guo Wang , Christopher M. Pohlhammer
IPC分类号： G01B11/30
CPC分类号： G01B11/306
摘要： A method for measuring a characteristic of a substrate, including directing an incident beam at an inspection grid of points on the substrate, receiving the reflected beam with a position sensitive detector, measuring the displacement of the reflected beam from its expected location, compiling a database of the displacement measurements, examining the database for effects of a pattern induced anomaly in the displacement measurements, producing an adjusted database, and deriving the characteristic of the substrate from the adjusted database. Thus, pattern induced errors from the displacement measurements are corrected. In this manner, problems with interpreting the reflection angles of a beam in substrate stress analysis equipment are overcome where distortions in the reflection angles are caused by deposition patterns on the substrates.
摘要翻译：一种用于测量衬底的特性的方法，包括将入射光束定向在衬底上的点的检查栅格处，用位置敏感检测器接收反射光束，测量反射光束从其预期位置的位移，编译数据库的位移测量，检查数据库中位移测量中模式引起的异常的影响，产生调整后的数据库，以及从调整后的数据库导出底物的特征。因此，校正来自位移测量的图案诱导误差。以这种方式，克服了在基板应力分析设备中解释光束的反射角度的问题，其中反射角的失真是由基板上的沉积图案引起的。

10. 发明授权

US07190441B1 Methods and systems for preparing a sample for thin film analysis 有权
标题翻译：制备薄膜分析样品的方法和系统
公开(公告)号：US07190441B1
公开(公告)日：2007-03-13
申请号：US11021555
申请日：2004-12-22
申请人： James T. McWhirter , Liang-Guo Wang , Hidong Kwak , Haixing Zou , Dan Georgesco , Bernard Lautee , Jennming James Chen , Gary R. Janik , Patrick M. Maxton
发明人： James T. McWhirter , Liang-Guo Wang , Hidong Kwak , Haixing Zou , Dan Georgesco , Bernard Lautee , Jennming James Chen , Gary R. Janik , Patrick M. Maxton
IPC分类号： G01N1/00
CPC分类号： G01N1/32 , G01N1/2813 , H01L21/67028
摘要： Methods and systems for preparing a sample for thin film analysis are provided. One system includes an energy beam source configured to generate an energy beam. The system also includes an energy beam delivery subsystem configured to direct the energy beam to a sample and to modify the energy beam such that the energy beam has a substantially flat-top profile on the sample. The energy beam removes a portion of a contaminant layer on the sample to expose an analysis area of a thin film on the sample. One method includes generating an energy beam and modifying the energy beam such that the energy beam has a substantially flat-top profile. The method also includes directing the energy beam to a sample. The energy beam removes a portion of a contaminant layer on the sample to expose an analysis area of a thin film on the sample.
摘要翻译：提供了制备用于薄膜分析的样品的方法和系统。一个系统包括被配置为产生能量束的能量束源。该系统还包括能量束传送子系统，其配置成将能量束引导到样品并修改能量束，使得能量束在样品上具有基本上平顶的轮廓。能量束去除样品上的污染物层的一部分以暴露样品上薄膜的分析区域。一种方法包括产生能量束并修改能量束，使得能量束具有基本平坦的轮廓。该方法还包括将能量束引导到样品。能量束去除样品上的污染物层的一部分以暴露样品上薄膜的分析区域。

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