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    • 3. 发明授权
    • Cata-dioptric reduction projection optical system
    • Cata屈光减光投影光学系统
    • US5220454A
    • 1993-06-15
    • US950765
    • 1992-09-24
    • Yutaka IchiharaHideo MizutaniSumio HashimotoYutaka Suenaga
    • Yutaka IchiharaHideo MizutaniSumio HashimotoYutaka Suenaga
    • G02B17/08G02B27/00G02B27/28G03F7/20
    • G02B17/0892G02B17/08G02B27/283G03F7/70225G02B27/0018
    • In a cata-dioptric optical system having a combination of a reflection system and a refraction system for reduction-projecting an object on a first plane onto a second plane, a polarization beam splitter and a quarter wavelength plate are provided to split the incident light and the reflected light. The light beam directed to the polarization beam splitter is converted to a substantially collimated light beam by a first group of lenses. A second group of lenses are arranged between the polarization beam splitter and a concave reflection mirror to diverge the light beam. The light reflected by the concave reflection mirror is directed back to the polarization beam splitter with a substantially collimated state by the second group of lenses. The light beam from the second group of lenses transmitted through the polarization beam splitter is focused by a third group of lenses having a positive refraction power to form a reduced image.
    • 在具有用于将第一平面上的物体还原投影到第二平面上的反射系统和折射系统的组合的数位屈光光学系统中,设置偏振分束器和四分之一波长板以分离入射光, 反射光。 被引导到偏振分束器的光束被第一组透镜转换成基本准直的光束。 第二组透镜被布置在偏振分束器和凹面反射镜之间以使光束发散。 由第二组透镜将由凹面反射镜反射的光引导回基本准直状态的偏振分束器。 通过偏振分束器透射的第二组透镜的光束被具有正折射光焦度的第三组透镜聚焦以形成缩小图像。
    • 4. 再颁专利
    • Cata-dioptric reduction projection optical system
    • Cata屈光减光投影光学系统
    • USRE36740E
    • 2000-06-20
    • US490700
    • 1995-06-14
    • Yutaka IchiharaHideo MizutaniSumio HashimotoYutaka Suenaga
    • Yutaka IchiharaHideo MizutaniSumio HashimotoYutaka Suenaga
    • G02B17/08G02B27/00G02B27/28G03F7/20G02B5/30
    • G02B17/08G02B17/0892G02B27/283G03F7/70225G02B27/0018
    • In a cata-dioptric optical system having a combination of a reflection system and a refraction system for reduction-projecting an object on a first plane onto a second plane, a polarization beam splitter and a quarter wavelength plate are provided to split the incident light and the reflected light. The light beam directed to the polarization beam splitter is converted to a substantially collimated light beam by a first group of lenses. A second group of lenses are arranged between the polarization beam splitter and a concave reflection mirror to diverge the light beam. The light reflected by the concave reflection mirror is directed back to the polarization beam splitter with a substantially collimated state by the second group of lenses. The light beam from the second group of lenses transmitted through the polarization beam splitter is focused by a third group of lenses having a positive refraction power to form a reduced image.
    • 在具有用于将第一平面上的物体还原投影到第二平面上的反射系统和折射系统的组合的数位屈光光学系统中,设置偏振分束器和四分之一波长板以分离入射光, 反射光。 被引导到偏振分束器的光束被第一组透镜转换成基本准直的光束。 第二组透镜被布置在偏振分束器和凹面反射镜之间以使光束发散。 由第二组透镜将由凹面反射镜反射的光引导回基本准直状态的偏振分束器。 通过偏振分束器透射的第二组透镜的光束被具有正折射光焦度的第三组透镜聚焦以形成缩小图像。
    • 8. 发明授权
    • Catoptric reduction projection optical system and exposure apparatus and method using same
    • 缩小投影光学系统和曝光装置及其使用方法
    • US06302548B2
    • 2001-10-16
    • US09760891
    • 2001-01-17
    • Tomowaki TakahashiYutaka Suenaga
    • Tomowaki TakahashiYutaka Suenaga
    • G02B510
    • G03F7/70058G02B17/0657G03F7/70233G03F7/7025G03F7/70275
    • A catoptric reduction projection optical system (5) is provided with a first catoptric optical system (10) that images an object (R) in first (object) plane (OP) into a second plane (12) and forming an intermediate image (II) therein, and a second catoptric optical system (20) that images the intermediate image in the second plane onto a third (image) plane (IP), thereby forming a reduced image of the object in the first (object) plane onto the third (image) plane. The first catoptric optical system comprises a first mirror pair comprising two reflective mirrors (M1, M2). The second catoptric optical system comprises a second mirror pair comprising a convex mirror (M3) and a concave mirror (M4). The system also preferably satisfied a number of design conditions.
    • 折射减少投影光学系统(5)设置有将第一(物体)平面(OP)中的物体(R)成像为第二平面(12)并形成中间图像(II)的第一反射光学系统(10) )和第二反射光学系统(20),其将第二平面中的中间图像成像到第三(图像)平面(IP)上,从而在第一(对象)平面中形成对象的缩小图像到第三 (图像)飞机。 第一反射光学系统包括包括两个反射镜(M1,M2)的第一镜对。 第二反射光学系统包括包括凸面镜(M3)和凹面镜(M4)的第二镜对。 该系统还优选地满足多个设计条件。
    • 9. 发明授权
    • Exposure apparatus
    • 曝光装置
    • US6084723A
    • 2000-07-04
    • US705079
    • 1996-08-29
    • Hitoshi MatsuzawaKoji ShigematsuKazumasa EndoYutaka Suenaga
    • Hitoshi MatsuzawaKoji ShigematsuKazumasa EndoYutaka Suenaga
    • G02B13/24G02B13/14G02B13/22G03F7/20
    • G03F7/70216G02B13/14G02B13/143G02B13/22
    • The present invention relates to an exposure apparatus having a high-performance projection optical system having a relatively large numerical aperture and achieving bitelecentricity and superior correction of aberrations, particularly distortion, in a very wide exposure area. Particularly, the protection optical system according to the present invention is composed of a first lens group G.sub.1 with a positive refracting power, a second lens group G.sub.2 with a negative refracting power, a third lens group G.sub.3 with a positive refracting power, a fourth lens group G.sub.4 with a negative refracting power, and a fifth lens group G.sub.5 with a positive refracting power in order from the side of a first object R. The present invention is directed to finding of suitable ranges of focal lengths for the first to fifth lens groups G.sub.1 -G.sub.5, based on the above arrangement.
    • 本发明涉及具有相当大的数值孔径的高性能投影光学系统的曝光装置,并且在非常宽的曝光区域中实现了偏心度和卓越的像差校正,特别是畸变。 特别地,根据本发明的保护光学系统由具有正折射力的第一透镜组G1,具有负折射力的第二透镜组G2,具有正折射力的第三透镜组G3,第四透镜 具有负折射率的组G4和从第一对象R侧起依次具有正折射率的第五透镜组G5.本发明旨在找到第一至第五透镜组的适合的焦距范围 G1-G5,基于上述安排。
    • 10. 发明授权
    • Microscope objective lens with variable correction of aberrations
imparted by transparent body between the specimen and the objective lens
    • 显微镜物镜,其可变校正​​由样品和物镜之间的透明体赋予的像差
    • US5940220A
    • 1999-08-17
    • US958748
    • 1997-10-31
    • Yutaka SuenagaMasayuki Mizusawa
    • Yutaka SuenagaMasayuki Mizusawa
    • G02B21/02G02B27/00
    • G02B27/0068G02B21/02
    • Microscope objective lenses are disclosed that comprise an axially movable second lens group for correcting aberrations that arise with changes in the thickness of a cover glass or other transparent body situated between the specimen and the objective lens. An objective lens according to one aspect of the invention comprises, in order from the specimen side, first, second, third, and fourth lens groups. The first lens group is positive and comprises a negative lens cemented to a positive lens, the positive lens having a convex surface facing the specimen side. The second lens group is positive and comprises a cemented lens having a cemented surface having negative refractive power. The third lens group is positive and causes a ray bundle from the specimen, propagating divergently from the specimen, to converge toward the optical axis. The fourth lens group is negative and comprises a positive lens cemented to a negative lens, the negative lens having a concave surface facing the image side. Moving the second lens group on the optical axis allows correction of aberrations imparted by a transparent body between the specimen and the objective lens. The objective lens satisfies one or more conditional expressions.
    • 公开了一种显微镜物镜,其包括可轴向移动的第二透镜组,用于校正由位于样本和物镜之间的覆盖玻璃或其它透明体的厚度变化而产生的像差。 根据本发明的一个方面的物镜,从样本侧起依次包括第一,第二,第三和第四透镜组。 第一透镜组是正的并且包括胶合到正透镜的负透镜,正透镜具有面向样本侧的凸面。 第二透镜组是正的,并且包括具有负屈光力的胶合表面的胶合透镜。 第三透镜组是正的并且引起来自试样的光束,从试样分散地传播,朝向光轴会聚。 第四透镜组是负的并且包括胶合到负透镜的正透镜,负透镜具有面向图像侧的凹面。 在光轴上移动第二透镜组允许校正由样本和物镜之间的透明体赋予的像差。 物镜满足一个或多个条件表达式。