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1. 发明申请

US20060234145A1 Method for determining and correcting reticle variations 有权
标题翻译：确定和校正标线差异的方法
公开(公告)号：US20060234145A1
公开(公告)日：2006-10-19
申请号：US11394177
申请日：2006-03-29
申请人： Sterling Watson , Ady Levy , Chris Mack , Stanley Stokowski , Zain Saidin
发明人： Sterling Watson , Ady Levy , Chris Mack , Stanley Stokowski , Zain Saidin
IPC分类号： G03F1/00 , G03C5/00 , G06K9/00
CPC分类号： G03F1/84 , Y10S430/146
摘要： Disclosed are techniques for determining and correcting reticle variations using a reticle global variation map generated by comparing a set of measured reticle parameters to a set of reference reticle parameters. The measured reticle parameters are obtained by reticle inspection, and the variation map identifies reticle regions and associated levels of correction. In one embodiment, the variation data is communicated to a system which modifies the reticle by embedding scattering centers within the reticle at identified reticle regions, thereby improving the variations. In another embodiment the variation data is transferred to a wafer stepper or scanner which in turn modifies the conditions under which the reticle is used to manufacture wafers, thereby compensating for the variations and producing wafers that are according to design.
摘要翻译：公开了用于使用通过将测量的标线参数的集合与一组参考掩模版参数进行比较而生成的光罩全局变化图来确定和校正光罩变化的技术。通过掩模版检查获得测量的掩模版参数，并且变化图识别标线区域和相关联的校正水平。在一个实施例中，将变化数据传送到通过在标定的标线区域内的散射中心嵌入来修改掩模版的系统，从而改善变化。在另一个实施例中，变化数据被传送到晶片步进器或扫描器，该晶片步进器或扫描器又改变了使用掩模版制造晶片的条件，从而补偿了根据设计的变化和生产晶片。

2. 发明申请

US20060240336A1 Systems and methods for mitigating variances on a patterned wafer using a prediction model 有权
标题翻译：使用预测模型减轻图案化晶片上的方差的系统和方法
公开(公告)号：US20060240336A1
公开(公告)日：2006-10-26
申请号：US11394900
申请日：2006-03-31
申请人： Sterling Watson , Ady Levy , Chris Mack , Stanley Stokowski , Zain Saidin
发明人： Sterling Watson , Ady Levy , Chris Mack , Stanley Stokowski , Zain Saidin
IPC分类号： G06F17/50 , G03F1/00
CPC分类号： G03F1/84 , G03F1/36 , Y10S430/146
摘要： Disclosed are systems and methods for mitigating variances (e.g., critical dimension variances) on a patterned wafer are provided. In general, variances of a patterned wafer are predicted using one or more reticle fabrication and/or wafer processing models. The predicted variances are used to modify selected transparent portions of the reticle that is to be used to produce the patterned wafer. In a specific implementation, an optical beam, such as a femto-second laser, is applied to the reticle at a plurality of embedded positions, and the optical beam is configured to form specific volumes of altered optical properties within the transparent material of the reticle at the specified positions. These reticle volumes that are created at specific positions of the reticle result in varying amounts of light transmission or dose through the reticle at such specific positions so as to mitigate the identified variances on a wafer that is patterned using the modified reticle.
摘要翻译：公开了用于减轻图案化晶片上的方差（例如，临界尺寸方差）的系统和方法。通常，使用一个或多个掩模版制造和/或晶片处理模型预测图案化晶片的变化。预测的方差用于修改用于产生图案化晶片的掩模版的所选透明部分。在具体实现中，诸如毫微微秒激光器的光束在多个嵌入位置被施加到掩模版，并且光束被配置为在掩模版的透明材料内形成改变的光学特性的特定体积在指定位置。在掩模版的特定位置处产生的这些掩模版体积在这样的特定位置处导致通过掩模版的光透射或剂量的变化量，以便减轻使用修改的掩模版图案化的晶片上识别的方差。

3. 发明申请

US20060234144A1 Method for monitoring a reticle 有权
标题翻译：监测掩模版的方法
公开(公告)号：US20060234144A1
公开(公告)日：2006-10-19
申请号：US11394145
申请日：2006-03-29
申请人： Sterling Watson , Ady Levy , Chris Mack , Stanley Stokowski , Zain Saidin
发明人： Sterling Watson , Ady Levy , Chris Mack , Stanley Stokowski , Zain Saidin
IPC分类号： G03F1/00 , G03C5/00 , G06K9/00
CPC分类号： G03F1/84 , G03F1/38 , G03F1/50 , G03F7/70433 , G03F7/70625 , Y10S430/146
摘要： Reticles may comprise shading elements (SEs) for locally altering the reticle optical properties. However, such reticles may degrade over time as a result of repeated exposure to radiation in a lithography process, as the radiation may “heal” the SEs. Disclosed are techniques for monitoring a reticle in order to maintain confidence about the reticle's optical properties and the uniformity of patterns on wafers that are to be printed using the reticle. Reticles undergo periodic inspection comprising reticle transmission measurement and/or aerial imaging of the reticle. When such inspection indicates sufficient reticle degradation, the reticle is tagged for correction prior to its subsequent use in a lithography process.
摘要翻译：网状物可以包括用于局部改变光罩光学性质的遮蔽元件（SE）。然而，由于辐射可能“治愈”SE，因此在光刻过程中由于反复暴露于辐射而导致这样的掩模版可能随时间而降解。公开了用于监测掩模版的技术，以便保持关于掩模版的光学性质和将使用掩模版印刷的晶片上的图案的均匀性的置信度。网格线进行定期检查，包括掩模版传输测量和/或掩模版的空中成像。当这种检查表明足够的掩模版降解时，标线片被标记以在其后续在光刻工艺中使用之前进行校正。

4. 发明申请

US20060234139A1 Systems and methods for modifying a reticle's optical properties 有权
标题翻译：用于修改掩模版光学性质的系统和方法
公开(公告)号：US20060234139A1
公开(公告)日：2006-10-19
申请号：US11394901
申请日：2006-03-31
申请人： Sterling Watson , Ady Levy , Chris Mack , Stanley Stokowski , Zain Saidin , Larry Zurbrick
发明人： Sterling Watson , Ady Levy , Chris Mack , Stanley Stokowski , Zain Saidin , Larry Zurbrick
IPC分类号： G03F1/00 , G03C5/00 , G06K9/00
CPC分类号： G06K9/2063 , G03F1/72 , G03F1/84 , Y10S430/146
摘要： Disclosed are systems and methods for modifying a reticle. In general, inspection results from a plurality of wafers or prediction results from a lithographic model are used to individually decrease the dose or any other optical property at specific locations of the reticle. In one embodiment, any suitable optical property of the reticle is modified by an optical beam, such as a femto-second laser, at specific locations on the reticle so as to widen the process window for such optical property. Examples of optical properties include dose, phase, illumination angle, and birefringence. Techniques for adjusting optical properties at specific locations on a reticle using an optical beam may be practiced for other purposes besides widening the process window.
摘要翻译：公开了用于修改掩模版的系统和方法。通常，来自多个晶片的检查结果或来自光刻模型的预测结果被用于单独地减小光罩的特定位置处的剂量或任何其它光学特性。在一个实施例中，掩模版的任何合适的光学性质通过光束（例如毫微微秒级激光器）在掩模版上的特定位置处被修改，以便加宽用于这种光学性质的工艺窗口。光学性质的实例包括剂量，相位，照射角度和双折射率。使用光束在光罩上的特定位置处调整光学特性的技术可以用于除加宽工艺窗口之外的其它目的。

5. 发明授权

US07869023B2 System for detecting anomalies and/or features of a surface 有权
标题翻译：用于检测表面的异常和/或特征的系统
公开(公告)号：US07869023B2
公开(公告)日：2011-01-11
申请号：US12123393
申请日：2008-05-19
申请人： Guoheng Zhao , Stanley Stokowski , Mehdi Vaez-Iravani
发明人： Guoheng Zhao , Stanley Stokowski , Mehdi Vaez-Iravani
IPC分类号： G01N21/00
CPC分类号： G01N21/9501
摘要： A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam.
摘要翻译：使用圆柱形镜或透镜将输入的准直光束聚焦到要检查的表面上的线上，其中线基本上在聚焦束的入射平面中。光束的图像被投影到平行于线的电荷耦合器件的阵列上，用于检测表面的异常和/或特征，其中阵列位于聚焦光束的入射平面之外。

6. 发明授权

US07119897B2 Sample inspection system 有权
公开(公告)号：US07119897B2
公开(公告)日：2006-10-10
申请号：US11007729
申请日：2004-12-07
申请人： Mehdi Vaez-Iravani , Stanley Stokowski , Guoheng Zhao
发明人： Mehdi Vaez-Iravani , Stanley Stokowski , Guoheng Zhao
IPC分类号： G01N21/00
CPC分类号： G01N21/956 , G01N21/47 , G01N21/9501
摘要： A curved mirrored surface is used to collect radiation scattered by a sample surface and originating from a normal illumination beam and an oblique illumination beam. The collected radiation is focused to a detector. Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors to restrict detection to certain azimuthal angles.

7. 发明申请

US20050254065A1 Method and apparatus for detecting surface characteristics on a mask blank 审中-公开
标题翻译：用于检测掩模板上的表面特性的方法和装置
公开(公告)号：US20050254065A1
公开(公告)日：2005-11-17
申请号：US11127436
申请日：2005-05-11
申请人： Stanley Stokowski
发明人： Stanley Stokowski
IPC分类号： G01B11/24 , G01N21/956 , G03F1/00
CPC分类号： G01N21/95684 , G01N2021/8825 , G01N2021/95676 , G03F1/50 , G03F1/84
摘要： An optical system and method configured to detect surface height variations on a mask blank. The optical system comprises a Wollaston prism, optics and first and second detectors. The Wollaston prism splits an incident beam of radiation into a first beam and a second beam. The first beam has a first polarization. The second beam has a second polarization. The optics directs the first and second beams along first and second paths onto first and second illuminated areas on a surface of the mask blank. The first and second illuminated areas reflect or transmit portions of the first and second beams to produce first and second reflected or transmitted beams. The first and second detectors detect the first and second reflected or transmitted beams and produce first and second signals in response to the first and second reflected or transmitted beams. A multiple way coupler may also be used for detecting height variation or other features on a mask blank. Two substantially parallel optical incident radiation beams are transmitted to the mask blank. The multiple way coupler mixes portions of the two beams after they have been reflected or transmitted by two different areas of said mask blank to provide three or more outputs which can be analyzed to provide information on height variation or other features on the mask blank.
摘要翻译：一种被配置为检测掩模板上的表面高度变化的光学系统和方法。光学系统包括Wollaston棱镜，光学器件和第一和第二检测器。 Wollaston棱镜将入射的辐射束分裂成第一光束和第二光束。第一光束具有第一偏振。第二光束具有第二偏振。光学器件将第一和第二光束沿着第一和第二路径引导到掩模毛坯的表面上的第一和第二被照射区域上。第一和第二照明区域反射或透射第一和第二光束的部分以产生第一和第二反射或透射光束。第一和第二检测器检测第一和第二反射或发射波束，并响应于第一和第二反射或透射波束产生第一和第二信号。多路耦合器也可用于检测掩模板上的高度变化或其它特征。两个基本上平行的光入射辐射束被传送到掩模板。多路耦合器在两个光束的两个不同区域被反射或透射之后混合两个光束的部分，以提供三个或更多个输出，其可被分析以提供关于掩模板上的高度变化或其它特征的信息。

8. 发明申请

US20050134841A1 Sample inspection system 审中-公开
标题翻译：样品检验系统
公开(公告)号：US20050134841A1
公开(公告)日：2005-06-23
申请号：US11031813
申请日：2005-01-07
申请人： Mehdi Vacz-Iravani , Stanley Stokowski , Guoheng Zhao
发明人： Mehdi Vacz-Iravani , Stanley Stokowski , Guoheng Zhao
IPC分类号： G01N21/21 , G01N21/47 , G01N21/95 , G01N21/88
CPC分类号： G01N21/956 , G01N21/21 , G01N21/47 , G01N21/9501 , G01N2021/8825 , G01N2021/8845 , G01N2021/8848
摘要： A curved mirrored surface is used to collect radiation scattered by a sample surface and originating from a normal illumination beam and an oblique illumination beam. The collected radiation is focused to a detector. Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors to restrict detection to certain azimuthal angles.
摘要翻译：弯曲的镜面用于收集样品表面散射的辐射，并起源于正常照明光束和倾斜照明光束。收集的辐射被聚焦到检测器。可以通过使用两个不同波长的辐射，通过有意地在由两个光束照射的光斑之间引入偏移，或者通过交替地切换正常和倾斜照明光束来区分源自正常和倾斜照明光束的散射辐射。可以通过检测倾斜照明光束的镜面反射并响应于其而改变照明方向来校正由样本高度的变化引起的光束位置误差。蝶形空间滤波器可以与曲面镜辐射收集器一起使用，以将检测限制在某些方位角。

9. 发明申请

US20050099621A1 Sample inspection system 有权
公开(公告)号：US20050099621A1
公开(公告)日：2005-05-12
申请号：US11007729
申请日：2004-12-07
申请人： Mehdi Vaez-Iravani , Stanley Stokowski , Guoheng Zhao
发明人： Mehdi Vaez-Iravani , Stanley Stokowski , Guoheng Zhao
IPC分类号： G01N21/47 , G01N21/95 , G01N21/88
CPC分类号： G01N21/956 , G01N21/47 , G01N21/9501
摘要： A curved mirrored surface is used to collect radiation scattered by a sample surface and originating from a normal illumination beam and an oblique illumination beam. The collected radiation is focused to a detector. Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors to restrict detection to certain azimuthal angles.

10. 发明授权

US07280199B2 System for detecting anomalies and/or features of a surface 有权
标题翻译：用于检测表面的异常和/或特征的系统
公开(公告)号：US07280199B2
公开(公告)日：2007-10-09
申请号：US10949078
申请日：2004-09-24
申请人： Guoheng Zhao , Stanley Stokowski , Mehdi Vaez-Iravani
发明人： Guoheng Zhao , Stanley Stokowski , Mehdi Vaez-Iravani
IPC分类号： G01N21/88
CPC分类号： G01N21/9501
摘要： A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam.
摘要翻译：使用圆柱形镜或透镜将输入的准直光束聚焦到要检查的表面上的线上，其中线基本上在聚焦束的入射平面中。光束的图像被投影到平行于线的电荷耦合器件的阵列上，用于检测表面的异常和/或特征，其中阵列位于聚焦光束的入射平面之外。

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