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    • 6. 发明申请
    • Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application
    • 平版印刷设备,气体净化方法,装置制造方法和吹扫气体供应系统相关应用
    • US20060285091A1
    • 2006-12-21
    • US11396823
    • 2006-04-03
    • Bipin ParekhRobert ZellerRussell HolmesJeffrey Spiegelman
    • Bipin ParekhRobert ZellerRussell HolmesJeffrey Spiegelman
    • G03B27/52
    • G03F7/70933G02B27/0006
    • A lithographic projection apparatus includes a support configured to support a patterning device, the patterning device configured to pattern a projection beam according to a desired pattern. The apparatus has a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate. The apparatus also has a purge pas supply system configured to provide a purge gas near a surface of a component of the lithographic projection apparatus. The purge gas supply system includes a purge gas mixture generator configured to generate a purge gas mixture which includes at least one purging gas and moisture. The purge gas mixture generator has a moisturizer configured to add the moisture to the purge gas and a purge gas mixture outlet connected to the purge gas mixture generator configured to supply the purge gas mixture near the surface.
    • 平版印刷投影装置包括被配置为支撑图案形成装置的支撑件,所述图案形成装置被配置为根据期望的图案来图案化投影光束。 该装置具有被配置为保持基板的基板台,配置成将图案化的光束投影到基板的目标部分上的投影系统。 该设备还具有净化气体供应系统,其构造成在光刻投影设备的部件的表面附近提供净化气体。 净化气体供应系统包括净化气体混合物发生器,其被配置为产生包括至少一个净化气体和水分的净化气体混合物。 净化气体混合物发生器具有保湿剂,其被配置为将湿气添加到净化气体中,以及净化气体混合物出口,其连接到净化气体混合物发生器,其构造成在表面附近提供净化气体混合物。