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1. 发明申请

US20060285091A1 Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application 审中-公开
标题翻译：平版印刷设备，气体净化方法，装置制造方法和吹扫气体供应系统相关应用
公开(公告)号：US20060285091A1
公开(公告)日：2006-12-21
申请号：US11396823
申请日：2006-04-03
申请人： Bipin Parekh , Robert Zeller , Russell Holmes , Jeffrey Spiegelman
发明人： Bipin Parekh , Robert Zeller , Russell Holmes , Jeffrey Spiegelman
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G02B27/0006
摘要： A lithographic projection apparatus includes a support configured to support a patterning device, the patterning device configured to pattern a projection beam according to a desired pattern. The apparatus has a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate. The apparatus also has a purge pas supply system configured to provide a purge gas near a surface of a component of the lithographic projection apparatus. The purge gas supply system includes a purge gas mixture generator configured to generate a purge gas mixture which includes at least one purging gas and moisture. The purge gas mixture generator has a moisturizer configured to add the moisture to the purge gas and a purge gas mixture outlet connected to the purge gas mixture generator configured to supply the purge gas mixture near the surface.
摘要翻译：平版印刷投影装置包括被配置为支撑图案形成装置的支撑件，所述图案形成装置被配置为根据期望的图案来图案化投影光束。该装置具有被配置为保持基板的基板台，配置成将图案化的光束投影到基板的目标部分上的投影系统。该设备还具有净化气体供应系统，其构造成在光刻投影设备的部件的表面附近提供净化气体。净化气体供应系统包括净化气体混合物发生器，其被配置为产生包括至少一个净化气体和水分的净化气体混合物。净化气体混合物发生器具有保湿剂，其被配置为将湿气添加到净化气体中，以及净化气体混合物出口，其连接到净化气体混合物发生器，其构造成在表面附近提供净化气体混合物。

2. 发明申请

US20070030463A1 Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system 失效
标题翻译：平版印刷设备，气体净化方法，装置制造方法和吹扫气体供应系统
公开(公告)号：US20070030463A1
公开(公告)日：2007-02-08
申请号：US10565486
申请日：2004-07-21
申请人： Bipin Parekh , Jeffrey Spiegelman , Robert Zeller , Russell Holmes
发明人： Bipin Parekh , Jeffrey Spiegelman , Robert Zeller , Russell Holmes
IPC分类号： G03B27/52
CPC分类号： G02B27/0006 , G03F7/70933
摘要： A lithographic projection apparatus (1) includes a support configured to support a patterning device (MA), the patterning device configured to pattern the projection beam according to a desired pattern. The apparatus has a substrate (W) table configure to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate. The apparatus also has a purge gas supply system (100) configured to provide a purge gas near a surface of a component of the lithographic projection apparatus. The purge gas supply system (100) includes a purge gas mixture generator (120) configured to generate a purge gas mixture which includes at least one purging gas and moisture. The purge gas mixture generator has a moisturizer (150) configured to add the moisture to the purge gas and a purge gas mixture outlet (130) connected to the purge gas mixture generator (120) configured to supply the purge gas mixture near the surface.
摘要翻译：光刻投影设备（1）包括被配置为支撑图案形成装置（MA）的支撑件，所述图案形成装置被配置成根据期望的图案对投影光束进行图案化。该装置具有构造成保持基板的基板（W）台，配置成将图案化的光束投影到基板的目标部分上的投影系统。该设备还具有净化气体供应系统（100），其构造成在光刻投影设备的部件的表面附近提供净化气体。净化气体供应系统（100）包括净化气体混合物发生器（120），其被配置为产生包括至少一个净化气体和湿气的净化气体混合物。净化气体混合物发生器具有配置成将湿气添加到净化气体中的保湿剂（150）和连接到净化气体混合物发生器（120）的净化气体混合物出口（130），其构造成在表面附近提供净化气体混合物。

3. 发明申请

US20070031321A1 Apparatus and method for purification of corrosive gas streams 审中-公开
标题翻译：用于净化腐蚀性气流的装置和方法
公开(公告)号：US20070031321A1
公开(公告)日：2007-02-08
申请号：US10559070
申请日：2004-06-23
申请人： Daniel Alvarez , Daniel Lev , Jeffrey Spiegelman , Tram Nguyen , Russell Holmes
发明人： Daniel Alvarez , Daniel Lev , Jeffrey Spiegelman , Tram Nguyen , Russell Holmes
IPC分类号： C01F11/22 , C01F5/28
CPC分类号： B01J20/3204 , B01D53/261 , B01D53/28 , B01J20/0211 , B01J20/041 , B01J20/06 , B01J20/28057 , B01J20/28097 , B01J20/3236 , B01J20/3433 , B01J20/3458 , B01J20/3483 , C01B7/0718 , C01B7/0743 , C01B7/093 , C01B7/096 , C01B7/197 , C01B7/20 , C01B7/24
摘要： A process, composition and apparatus for the removal of impurities from corrosive gases, particularly halogen-containing gases, down to about 100 ppb concentration are described. The critical component is zirconia (ZrO2), which in a variety of physical forms is capable of dehydrating such gases. The zirconia can be in the form of a coating on a substrate, as a granular bulk material, or deposited within the pores of a porous body. The zirconia is retained in a simple container which is easily installed in a gas supply line, such as to a gas- or vapor-deposition manufacturing unit. The purification process can be operated for long periods of time in the presence of these gases. The invention provides final purification to gas streams intended for gas- or vapor-deposition formation of high purity electronic, prosthetic or similar products, and can be used in combination with a preliminary dehydration process or a solid particulate removal unit upstream.
摘要翻译：描述了用于从低至约100ppb浓度的腐蚀性气体，特别是含卤素气体中除去杂质的方法，组合物和装置。关键组分是氧化锆（ZrO 2/2），其以各种物理形式能够使这些气体脱水。氧化锆可以是基材上的涂层形式，作为颗粒体材料，或者沉积在多孔体的孔内。氧化锆保持在易于安装在气体供应管线中的简单容器中，例如气体或气相沉积制造单元。净化过程可在这些气体存在的情况下长时间运行。本发明提供了用于气体或气相沉积形成高纯度电子，假体或类似产品的气流的最终纯化，并且可以与预脱水方法或固体颗粒去除单元上游结合使用。

4. 发明申请

US20050265912A1 Method for purifying carbon dioxide 有权
标题翻译：净化二氧化碳的方法
公开(公告)号：US20050265912A1
公开(公告)日：2005-12-01
申请号：US10531512
申请日：2003-10-16
申请人： Daniel Alvarez Jr , Jeffrey Spiegelman , Russell Holmes
发明人： Daniel Alvarez Jr , Jeffrey Spiegelman , Russell Holmes
IPC分类号： C01B32/50 , B01D53/02 , B01D53/04 , B01J20/06 , B01J20/34 , C01B17/16
CPC分类号： B01D53/02 , B01D53/04 , B01D2253/10 , B01D2253/112 , B01D2256/22 , B01D2257/104 , B01D2257/308 , B01D2257/404 , B01D2257/406 , B01D2257/702 , B01D2257/80 , B01D2259/40083 , B01D2259/402 , B01J20/06 , B01J20/3433 , B01J20/3458 , B01J20/3483 , B01J2220/42 , C01B32/50 , Y02C10/08
摘要： The invention is a method for the decontamination of CO2 to a sufficient level of purity to allow it to be used in the semiconductor industry. The invention comprises the exposure of fluid CO2 to a combination metallic states of at least one metal under the appropriate conditions for removal of contaminants. The adsorbents are then decontaminated/activated to return the adsorbent to a mixed oxidation state and allow further rounds of decontamination. The adsorbents are selected to be complimentary to each other, preferentially adsorbing different contaminants. Additionally, the adsorbents are selected to undergo reduction differently such that upon regeneration only a portion of the metals are reduced and the adsorbent is returned essentially to its original state.
摘要翻译：本发明是一种将CO 2去污的方法，使其具有足够的纯度以使其可用于半导体工业。本发明包括在适合除去污染物的条件下将流体CO 2 2暴露于至少一种金属的组合金属状态。然后将吸附剂去污/活化，使吸附剂回到混合氧化态，并允许进一步的去污染。吸附剂被选择为彼此互补，优先吸附不同的污染物。此外，选择吸附剂进行不同的还原，使得在再生时，只有一部分金属被还原，并且吸附剂基本恢复到其初始状态。

5. 发明申请

US20070137676A1 Method for the removal of airborne molecular contaminants using extra clean dry air 审中-公开
标题翻译：使用额外干净的干燥空气去除空气中的分子污染物的方法
公开(公告)号：US20070137676A1
公开(公告)日：2007-06-21
申请号：US11706044
申请日：2007-02-13
申请人： Jeffrey Spiegelman , Daniel Alvarez , Allan Tram , Russell Holmes
发明人： Jeffrey Spiegelman , Daniel Alvarez , Allan Tram , Russell Holmes
IPC分类号： B08B7/04 , B08B3/00
CPC分类号： B01D53/00 , B01D53/72 , B08B5/02 , B08B9/00 , C23G5/00 , H01L21/02046
摘要： The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surfaces. A contaminated purge gas is produced by transferring a portion of the contamination from the interior surfaces into the purge gas. The contaminated purge gas is removed from the device and the process is, continued until the contaminant concentration in the contaminated purge gas is below a predetermined level.
摘要翻译：本发明公开了一种从装置内的表面除去多种分子污染物的方法。含有氧气和/或水的净化气体被引入到装置的内部，与内表面的至少一部分接触。污染的吹扫气体通过将一部分污染物从内表面转移到吹扫气体中而产生。污染的吹扫气体从设备中移出，并且该过程一直持续到污染的净化气体中的污染物浓度低于预定水平。

6. 发明申请

US20060118138A1 Method for the removal of airborne molecular contaminants using oxygen and/or water gas mixtures 失效
标题翻译：使用氧气和/或水气混合物去除空气传播的分子污染物的方法
公开(公告)号：US20060118138A1
公开(公告)日：2006-06-08
申请号：US10523371
申请日：2004-06-01
申请人： Jeffrey Spiegelman , Daniel Alvarez Jr. , Russell Holmes
发明人： Jeffrey Spiegelman , Daniel Alvarez Jr. , Russell Holmes
IPC分类号： B08B3/00
CPC分类号： B01D53/00 , B01D53/72 , B08B5/02 , B08B9/00 , C23G5/00 , H01L21/02046
摘要： The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surfaces. A contaminated purge gas is produced by transferring a portion of the contamination from the interior surfaces into the purge gas. The contaminated purge gas is removed from the device and the process is continued until the contaminant concentration in the contaminated purge gas is below a predetermined level.
摘要翻译：本发明公开了一种从装置内的表面除去多种分子污染物的方法。含有氧气和/或水的净化气体被引入到装置的内部，与内表面的至少一部分接触。污染的吹扫气体通过将一部分污染物从内表面转移到吹扫气体中而产生。污染的净化气体从设备中移出，并且继续该过程直到污染的吹扫气体中的污染物浓度低于预定水平。

7. 发明申请

US20060243585A1 Method for the point of use production of ammonia from water and nitrogen 审中-公开
标题翻译：从水和氮生产氨的方法
公开(公告)号：US20060243585A1
公开(公告)日：2006-11-02
申请号：US10565396
申请日：2004-07-22
申请人： Jeffrey Spiegelman , Daniel Alvarez
发明人： Jeffrey Spiegelman , Daniel Alvarez
IPC分类号： C01B13/00
CPC分类号： C01B21/045 , C01B3/025 , C01B3/56 , C01B2203/043 , C01B2203/0465 , C01B2203/047 , C01B2203/0475 , C01B2203/048 , C01B2203/0495 , C01C1/024 , C01C1/0405 , Y02E60/364 , Y02E60/366 , Y02P20/52
摘要： The present invention discloses a method for the manufacture of high purity ammonia, hydrogen, and nitrogen from de-ionized water and standard nitrogen. De-ionized water is degassed and fed to an electrolytic hydrogen generator to produce raw hydrogen. The hydrogen is purified and mixed with purified nitrogen, compressed, and fed to a catalytic ammonia reactor. Following purification, the ammonia is delivered to the semiconductor process tool along with purified hydrogen and purified nitrogen.
摘要翻译：本发明公开了一种从去离子水和标准氮气制造高纯氨，氢和氮的方法。去离子水被脱气并进料到电解氢发生器以产生原始氢。将氢纯化并与纯化氮混合，压缩，并进料到催化氨反应器中。纯化后，将氨与纯化的氢气和纯化氮气一起输送到半导体工艺工具。

8. 发明申请

US20060211131A1 Method for analysis of contaminants in a process fluid stream 有权
标题翻译：分析工艺流体流中污染物的方法
公开(公告)号：US20060211131A1
公开(公告)日：2006-09-21
申请号：US10544309
申请日：2004-02-20
申请人： Jeffrey Spiegelman , Daniel Alvarez , Allan Tram
发明人： Jeffrey Spiegelman , Daniel Alvarez , Allan Tram
IPC分类号： G01N1/18
CPC分类号： G01N30/12 , G01N1/2214 , G01N1/44 , G01N2030/085 , Y10T436/25 , Y10T436/25375 , Y10T436/255
摘要： The present invention relates to the monitoring of contaminant concentrations in manufacturing processes that employ fluid purification devices. The invention provides a sensitive method for analyzing contaminant concentrations in a process fluid stream using purification material to adsorb contaminants contained therein over an entire process.
摘要翻译：本发明涉及使用流体净化装置的制造过程中的污染物浓度的监测。本发明提供了一种用于分析工艺流体流中的污染物浓度的敏感方法，其使用净化材料在整个过程中吸附其中所含的污染物。

9. 发明申请

US20050229783A1 Method for purification of lens gases used in photolithography 审中-公开
标题翻译：纯化用于光刻中的透镜气体的方法
公开(公告)号：US20050229783A1
公开(公告)日：2005-10-20
申请号：US11147563
申请日：2005-06-08
申请人： Daniel Alvarez , Jeffrey Spiegelman
发明人： Daniel Alvarez , Jeffrey Spiegelman
IPC分类号： B01D53/02 , B01D53/04 , B01D53/26 , B01D53/50 , B01D53/56 , B01D53/72 , B01J20/02 , B01J20/06 , B01J20/18 , G03F7/20
CPC分类号： G03F7/70883 , B01D53/02 , B01D53/04 , B01D53/261 , B01D53/508 , B01D53/565 , B01D53/72 , B01D2253/108 , B01D2256/10 , B01D2256/18 , B01D2257/206 , B01D2257/306 , B01D2257/70 , B01D2257/702 , B01D2257/80 , B01J20/02 , B01J20/0207 , B01J20/0211 , B01J20/0214 , B01J20/0225 , B01J20/0229 , B01J20/0237 , B01J20/0244 , B01J20/06 , B01J20/08 , B01J20/103 , B01J20/18 , B01J2220/42 , G03F7/70925 , G03F7/70933
摘要： A method and composition for the removal of contaminants in a gas stream used in the contamination sensitive processes of photolithography and metrology are described. The synergistic effect of a combination of an electropositive metal component, a high silica zeolite, and a late transition metal compound effects removal or reduction of the contaminates in the gas which interfere with light transmittance to the ppb or ppt levels necessary for the gas to be suitable for these uses. The removal of neutral polar molecules, neutral polar aprotic molecules, protic and aprotic alkaline molecules, acidic polar species, and neutral non-polar aprotic molecules is accomplished with the claimed composition. Depending on the type of contaminant, the composition components are each varied from 10 to 80 parts by volume, with the total composition limited to 100 parts by volume.
摘要翻译：描述了用于去除光刻和计量的污染敏感过程中气流中污染物的方法和组合物。正电性金属组分，高二氧化硅沸石和后期过渡金属化合物的组合的协同效应影响气体中污染物的去除或还原，其干扰对于气体所需的ppb或ppt水平的透光率适合这些用途。中性极性分子，中性极性非质子分子，质子和非质子碱性分子，酸性极性物质和中性非极性非质子分子的去除是用要求保护的组合物完成的。取决于污染物的类型，组合物组分各自为10至80体积份，总组合物限制为100体积份。

10. 发明申请

US20050051739A1 Lithographic projection apparatus, gas purging method, device manufacturing method, and purge gas supply system 有权
标题翻译：平版印刷装置，气体吹扫法，装置制造方法以及吹扫气体供给系统
公开(公告)号：US20050051739A1
公开(公告)日：2005-03-10
申请号：US10894365
申请日：2004-07-20
申请人： Antonius Van Der Net , Jeffrey Spiegelman , Erik Johannus Van Bragt
发明人： Antonius Van Der Net , Jeffrey Spiegelman , Erik Johannus Van Bragt
IPC分类号： G02B27/00 , G03F7/20 , G21G5/00 , H01L21/425
CPC分类号： G02B27/0006 , G03F7/70933
摘要： A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support for supporting a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a purge gas supply system. The purge gas supply system includes a purge gas mixture generator that includes a moisturizer that is arranged for adding moisture to a purge gas to generate a purge gas mixture, and a purge gas mixture outlet connected to the purge gas mixture generator for supplying the purge gas mixture to at least part of the lithographic projection apparatus.
摘要翻译：公开了一种光刻投影装置。该装置包括用于提供辐射束的辐射系统和用于支撑图案形成装置的支撑结构。图案形成装置用于根据期望的图案对辐射束进行图案化。该装置还包括用于支撑基板的基板支撑件，用于将图案化的辐射束投影到基板的目标部分上的投影系统和净化气体供应系统。吹扫气体供应系统包括净化气体混合物发生器，其包括保湿剂，该保湿剂被布置成用于向吹扫气体中添加水分以产生吹扫气体混合物，以及净化气体混合物出口，其连接到吹扫气体混合物发生器，混合物至光刻投影装置的至少一部分。

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