专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20090045051A1 TARGET DESIGNS AND RELATED METHODS FOR COUPLED TARGET ASSEMBLIES, METHODS OF PRODUCTION AND USES THEREOF 有权
标题翻译：联合目标组件的目标设计及相关方法，生产方法及其用途
公开(公告)号：US20090045051A1
公开(公告)日：2009-02-19
申请号：US11838166
申请日：2007-08-13
申请人： Stephane Ferrasse , Werner H. Hort , Jaeyeon Kim , Frank C. Alford
发明人： Stephane Ferrasse , Werner H. Hort , Jaeyeon Kim , Frank C. Alford
IPC分类号： C23C14/50 , B21D39/00
CPC分类号： C23C14/3407 , B21K25/00 , H01J37/3414 , H01J37/3423 , H01J37/3426 , Y10T29/49826
摘要： Sputtering targets are described that comprise: a) a target surface component comprising a target material; b) a core backing component having a coupling surface, a back surface and at least one open area, wherein the coupling surface is coupled to at least part of the target surface component; and wherein at least part of the target surface component fits into at least one open area of the core backing component. In some embodiments, the target surface component, the core backing component or a combination thereof have at least one surface area feature coupled to or located in the back surface of the core backing component, the target surface component or a combination thereof, wherein the surface area feature increases the cooling effectiveness of the target surface component. Methods of forming a sputtering target are also described that comprises: a) providing a target surface component comprising a surface material; b) providing a core backing component having a coupling surface, a back surface and at least one open area; c) coupling the coupling surface to at least part of the target surface component, wherein at least part of the target surface component fits into the at least one open area of the core backing component.
摘要翻译：描述了溅射靶，其包括：a）包含靶材料的靶表面组分; b）具有联接表面，后表面和至少一个开放区域的芯背衬部件，其中所述耦合表面耦合到所述目标表面部件的至少一部分; 并且其中所述目标表面部件的至少一部分装配到所述芯背衬部件的至少一个开放区域中。在一些实施例中，目标表面部件，芯部背衬部件或其组合具有至少一个表面区域特征，其耦合到或位于芯背衬部件，目标表面部件或其组合的后表面中，其中表面面积特征增加了目标表面部件的冷却效果。还描述了形成溅射靶的方法，其包括：a）提供包含表面材料的靶表面组分; b）提供具有联接表面，后表面和至少一个开放区域的芯背衬部件; c）将所述耦合表面耦合到所述目标表面部件的至少一部分，其中所述目标表面部件的至少一部分装配到所述芯部背衬部件的所述至少一个开放区域中。

2. 发明授权

US08702919B2 Target designs and related methods for coupled target assemblies, methods of production and uses thereof 有权
标题翻译：耦合目标组件的目标设计和相关方法，生产方法及其用途
公开(公告)号：US08702919B2
公开(公告)日：2014-04-22
申请号：US11838166
申请日：2007-08-13
申请人： Stephane Ferrasse , Werner H. Hort , Jaeyeon Kim , Frank C. Alford
发明人： Stephane Ferrasse , Werner H. Hort , Jaeyeon Kim , Frank C. Alford
IPC分类号： C23C14/34
CPC分类号： C23C14/3407 , B21K25/00 , H01J37/3414 , H01J37/3423 , H01J37/3426 , Y10T29/49826
摘要： Sputtering targets are described that comprise: a) a target surface component comprising a target material; b) a core backing component having a coupling surface, a back surface and at least one open area, wherein the coupling surface is coupled to at least part of the target surface component; and wherein at least part of the target surface component fits into at least one open area of the core backing component. In some embodiments, the target surface component, the core backing component or a combination thereof have at least one surface area feature coupled to or located in the back surface of the core backing component, the target surface component or a combination thereof, wherein the surface area feature increases the cooling effectiveness of the target surface component. Methods of forming a sputtering target are also described that comprises: a) providing a target surface component comprising a surface material; b) providing a core backing component having a coupling surface, a back surface and at least one open area; c) coupling the coupling surface to at least part of the target surface component, wherein at least part of the target surface component fits into the at least one open area of the core backing component.
摘要翻译：描述了溅射靶，其包括：a）包含靶材料的靶表面组分; b）具有联接表面，后表面和至少一个开放区域的芯背衬部件，其中所述耦合表面耦合到所述目标表面部件的至少一部分; 并且其中所述目标表面部件的至少一部分装配到所述芯背衬部件的至少一个开放区域中。在一些实施例中，目标表面部件，芯部背衬部件或其组合具有至少一个表面区域特征，其耦合到或位于芯背衬部件，目标表面部件或其组合的后表面中，其中表面面积特征增加了目标表面部件的冷却效果。还描述了形成溅射靶的方法，其包括：a）提供包含表面材料的靶表面组分; b）提供具有联接表面，后表面和至少一个开放区域的芯背衬部件; c）将所述耦合表面耦合到所述目标表面部件的至少一部分，其中所述目标表面部件的至少一部分装配到所述芯部背衬部件的所述至少一个开放区域中。

3. 发明授权

US07618520B2 Physical vapor deposition target constructions 有权
标题翻译：物理气相沉积目标结构
公开(公告)号：US07618520B2
公开(公告)日：2009-11-17
申请号：US11234615
申请日：2005-09-23
申请人： Chi tse Wu , Stephane Ferrasse , Frank C. Alford , Susanne Grabmeier , Werner H. Hort , Jaeyeon Kim , Susan D. Strothers , Andrew Wragg , Robert Prater
发明人： Chi tse Wu , Stephane Ferrasse , Frank C. Alford , Susanne Grabmeier , Werner H. Hort , Jaeyeon Kim , Susan D. Strothers , Andrew Wragg , Robert Prater
IPC分类号： C23C14/35
CPC分类号： C23C14/3407 , H01J37/3423 , H01J37/3426
摘要： The invention includes a target construction having a sputtering region and a flange region laterally outward relative to the sputtering region. The flange region has a front surface disposed on a front face of the construction and a back surface opposing the front surface. An o-ring groove is disposed within the flange region. The o-ring groove has a planar base surface which has a first width and has an orifice disposed along the front surface of the flange. The orifice has a second width as measured parallel relative to the base surface. The second width is greater than the first width. The flange surfaces can additionally be protected from rubbing by a layer of protective material.
摘要翻译：本发明包括具有溅射区域和相对于溅射区域横向向外的凸缘区域的目标结构。凸缘区域具有设置在结构的正面上的前表面和与前表面相对的后表面。 O形环槽设置在凸缘区域内。 O形环槽具有平坦的基面，其具有第一宽度并且具有沿凸缘的前表面设置的孔。孔口具有相对于基底表面平行测量的第二宽度。第二宽度大于第一宽度。凸缘表面可另外被保护，免受一层保护材料的摩擦。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式