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1. 发明授权

US08048354B2 Method of forming supports bearing features, such as lithography masks 有权
标题翻译：形成支撑轴承特征的方法，例如光刻掩模
公开(公告)号：US08048354B2
公开(公告)日：2011-11-01
申请号：US12092911
申请日：2006-11-09
申请人： Stephan Landis , Jean-Philippe Gouy
发明人： Stephan Landis , Jean-Philippe Gouy
IPC分类号： B29C33/40
CPC分类号： B82Y10/00 , B81C99/009 , B82Y40/00 , G03F1/34 , G03F7/0002
摘要： To manufacture a support made of at least one predetermined material and bearing features: a plurality of superposed layers is produced on a substrate that it is known how to remove, each of the layers being formed from zones of at least two different materials, the geometry of the zones and the constituent materials of these superposed layers being defined so as to form said features, on the reverse side of the substrate, these features being of 3D type, and some of these features differing in height among themselves and/or with other features; a layer of the predetermined material is produced on this multilayer stack; and at least the substrate is eliminated whereby, after inversion, said support with said features is obtained.
摘要翻译：为了制造由至少一种预定材料制成的支撑件和轴承特征：在基底上产生多个重叠层，已知如何去除每个由至少两种不同材料的区域形成的层，几何形状的区域和这些重叠层的构成材料被限定以形成所述特征，在基底的相反侧，这些特征是3D型的，并且这些特征中的一些这些特征在它们之间和/或与其它部分之间的高度不同特征; 在该多层叠层上产生一层预定材料; 并且至少消除基板，由此在反转之后获得具有所述特征的所述支撑件。

2. 发明申请

US20080268351A1 Method of Forming Supports Bearing Features, Such as Lithography Masks 有权
标题翻译：形成支撑轴承特征的方法，如平版印刷面膜
公开(公告)号：US20080268351A1
公开(公告)日：2008-10-30
申请号：US12092911
申请日：2006-11-09
申请人： Stephan Landis , Jean-Philippe Gouy
发明人： Stephan Landis , Jean-Philippe Gouy
IPC分类号： G03F1/00
CPC分类号： B82Y10/00 , B81C99/009 , B82Y40/00 , G03F1/34 , G03F7/0002
摘要： To manufacture a support made of at least one predetermined material and bearing features: a plurality of superposed layers is produced on a substrate that it is known how to remove, each of the layers being formed from zones of at least two different materials, the geometry of the zones and the constituent materials of these superposed layers being defined so as to form said features, on the reverse side of the substrate, these features being of 3D type, and some of these features differing in height among themselves and/or with other features; a layer of the predetermined material is produced on this multilayer stack; and at least the substrate is eliminated whereby, after inversion, said support with said features is obtained.
摘要翻译：为了制造由至少一种预定材料制成的支撑件和轴承特征：在基底上产生多个重叠层，已知如何去除每个由至少两种不同材料的区域形成的层，几何形状的区域和这些重叠层的构成材料被限定以形成所述特征，在基底的相反侧，这些特征是3D型的，并且这些特征中的一些这些特征在它们之间和/或与其它部分之间的高度不同特征; 在该多层叠层上产生一层预定的材料; 并且至少消除基板，由此在反转之后获得具有所述特征的所述支撑件。

3. 发明申请

US20060183060A1 Nano-imprint lithography method involving substrate pressing 有权
标题翻译：涉及基片压制的纳米压印光刻方法
公开(公告)号：US20060183060A1
公开(公告)日：2006-08-17
申请号：US10539875
申请日：2003-12-22
申请人： Corinne Perret , Cecile Gourgon , Stephan Landis
发明人： Corinne Perret , Cecile Gourgon , Stephan Landis
IPC分类号： B29C59/02 , B29C71/02 , C23F1/00 , B29C71/00 , B28B11/08 , G03C5/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/11
摘要： The inventive method includes a preparation step during which the substrate is covered with a layer, a pressing step in which a mould including a pattern of recesses and protrusions is pressed into part of the thickness of the aforementioned layer, at least one etching step in which the layer is etched until parts of the surface of the substrate have been stripped, and a substrate etching step whereby the substrate is etched using an etching pattern which is defined from the mould pattern. The preparation step includes a sub-step consisting of the formation of a lower sub-layer of curable material, a step involving the curing of said layer and a sub-step including the formation of an outer sub-layer which is adjacent to the cured sub-layer. Moreover, during the pressing step, the above-mentioned protrusions in the mould penetrate the outer sub-layer until contact is reached with the cured sub-layer.
摘要翻译：本发明的方法包括一个制备步骤，在该步骤中衬底被一层覆盖，一个压制步骤，其中将包括凹凸图案的模具压入上述层的厚度的一部分中，至少一个蚀刻步骤，其中蚀刻该层，直到基板的表面的一部分被剥离，以及基板蚀刻步骤，由此使用从模具图案限定的蚀刻图案来蚀刻该基板。制备步骤包括由可固化材料的下层形成的子步骤，涉及所述层的固化的步骤和包括形成邻近固化的外部亚层的子步骤子层。此外，在挤压步骤中，模具中的上述突起穿透外部子层，直到与固化的子层接触。

4. 发明授权

US07682515B2 Nano-imprint lithography method involving substrate pressing 有权
标题翻译：涉及基片压制的纳米压印光刻方法
公开(公告)号：US07682515B2
公开(公告)日：2010-03-23
申请号：US10539875
申请日：2003-12-22
申请人： Corinne Perret , Cecile Gourgon , Stephan Landis
发明人： Corinne Perret , Cecile Gourgon , Stephan Landis
IPC分类号： C03C15/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/11
摘要： The inventive method includes a preparation step during which the substrate is covered with a layer, a pressing step in which a mould including a pattern of recesses and protrusions is pressed into part of the thickness of the aforementioned layer, at least one etching step in which the layer is etched until parts of the surface of the substrate have been stripped, and a substrate etching step whereby the substrate is etched using an etching pattern which is defined from the mould pattern. The preparation step includes a sub-step consisting of the formation of a lower sub-layer of curable material, a step involving the curing of said layer and a sub-step including the formation of an outer sub-layer which is adjacent to the cured sub-layer. Moreover, during the pressing step, the above-mentioned protrusions in the mould penetrate the outer sub-layer until contact is reached with the cured sub-layer.
摘要翻译：本发明的方法包括一个制备步骤，在该步骤中衬底被一层覆盖，一个压制步骤，其中将包括凹凸图案的模具压入上述层的厚度的一部分中，至少一个蚀刻步骤，其中蚀刻该层，直到基板的表面的一部分被剥离，以及基板蚀刻步骤，由此使用从模具图案限定的蚀刻图案来蚀刻该基板。制备步骤包括由可固化材料的下层形成的子步骤，涉及所述层的固化的步骤和包括形成邻近固化的外部亚层的子步骤子层。此外，在挤压步骤中，模具中的上述突起穿透外部子层，直到与固化的子层接触。

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