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    • 3. 发明申请
    • High Voltage Resistance Coupling Structure
    • 高压电阻耦合结构
    • US20120273917A1
    • 2012-11-01
    • US13538043
    • 2012-06-29
    • Uwe WahlMarkus HammerJens-Peer Stengl
    • Uwe WahlMarkus HammerJens-Peer Stengl
    • H01L23/52H01L21/76
    • H01L23/5227H01L23/3178H01L23/585H01L23/642H01L24/03H01L24/05H01L2224/02166H01L2224/03462H01L2224/03464H01L2224/05155H01L2224/05644H01L2924/01029H01L2924/13091H01L2924/14H01L2924/01015
    • The disclosed invention provides a structure and method for providing a high lateral voltage resistance between the electrical networks, sharing a lateral plane, of conductive elements (e.g., having different high voltage potentials) comprising a coupler. In one embodiment, an integrated coupler providing a high lateral voltage resistance comprises a primary conductive element and a secondary conductive element. An isolating material is laterally configured between the electrical network of the primary conductive element and an electrical network of the secondary conductive element. The isolating material may comprise a low-k dielectric layer and prevents any lateral barrier layers (e.g., etch stop layers, diffusion barrier layers, etc.) from extending between the first conductive element and the electrical network of the second conductive element. The structure therefore provides a galvanically isolated integrated coupler which avoids electrical shorting between circuits (e.g., at barrier layers) resulting in an improved high voltage resistance.
    • 所公开的发明提供了一种用于在包括耦合器的导电元件(例如,具有不同的高电压电位)的共享横向平面的电网之间提供高横向电压电阻的结构和方法。 在一个实施例中,提供高横向电压电阻的集成耦合器包括主导电元件和次导电元件。 隔离材料横向配置在主要导电元件的电网和次级导电元件的电网之间。 隔离材料可以包括低k电介质层,并且防止任何侧向阻挡层(例如,蚀刻停止层,扩散阻挡层等)在第一导电元件和第二导电元件的电网之间延伸。 因此,该结构提供了一种电隔离的集成耦合器,其避免了电路之间的电短路(例如,在阻挡层处),导致改进的高耐电压。
    • 4. 发明授权
    • High voltage resistance coupling structure
    • 高压电阻耦合结构
    • US08790985B2
    • 2014-07-29
    • US13538043
    • 2012-06-29
    • Uwe WahlMarkus HammerJens-Peer Stengl
    • Uwe WahlMarkus HammerJens-Peer Stengl
    • H01L21/76
    • H01L23/5227H01L23/3178H01L23/585H01L23/642H01L24/03H01L24/05H01L2224/02166H01L2224/03462H01L2224/03464H01L2224/05155H01L2224/05644H01L2924/01029H01L2924/13091H01L2924/14H01L2924/01015
    • The disclosed invention provides a structure and method for providing a high lateral voltage resistance between the electrical networks, sharing a lateral plane, of conductive elements (e.g., having different high voltage potentials) comprising a coupler. In one embodiment, an integrated coupler providing a high lateral voltage resistance comprises a primary conductive element and a secondary conductive element. An isolating material is laterally configured between the electrical network of the primary conductive element and an electrical network of the secondary conductive element. The isolating material may comprise a low-k dielectric layer and prevents any lateral barrier layers (e.g., etch stop layers, diffusion barrier layers, etc.) from extending between the first conductive element and the electrical network of the second conductive element. The structure therefore provides a galvanically isolated integrated coupler which avoids electrical shorting between circuits (e.g., at barrier layers) resulting in an improved high voltage resistance.
    • 所公开的发明提供了一种用于在包括耦合器的导电元件(例如,具有不同的高电压电位)的共享横向平面的电网之间提供高横向电压电阻的结构和方法。 在一个实施例中,提供高横向电压电阻的集成耦合器包括主导电元件和次导电元件。 隔离材料横向配置在主要导电元件的电网和次级导电元件的电网之间。 隔离材料可以包括低k电介质层,并且防止任何侧向阻挡层(例如,蚀刻停止层,扩散阻挡层等)在第一导电元件和第二导电元件的电网之间延伸。 因此,该结构提供了一种电隔离的集成耦合器,其避免了电路之间的电短路(例如,在阻挡层处),导致改进的高耐电压。
    • 5. 发明授权
    • High voltage resistance coupling structure
    • 高压电阻耦合结构
    • US08278730B2
    • 2012-10-02
    • US12607230
    • 2009-10-28
    • Uwe WahlMarkus HammerJens-Peer Stengl
    • Uwe WahlMarkus HammerJens-Peer Stengl
    • H01L21/70
    • H01L23/5227H01L23/3178H01L23/585H01L23/642H01L24/03H01L24/05H01L2224/02166H01L2224/03462H01L2224/03464H01L2224/05155H01L2224/05644H01L2924/01029H01L2924/13091H01L2924/14H01L2924/01015
    • The disclosed invention provides a structure and method for providing a high lateral voltage resistance between the electrical networks, sharing a lateral plane, of conductive elements (e.g., having different high voltage potentials) comprising a coupler. In one embodiment, an integrated coupler providing a high lateral voltage resistance comprises a primary conductive element and a secondary conductive element. An isolating material is laterally configured between the electrical network of the primary conductive element and an electrical network of the secondary conductive element. The isolating material may comprise a low-k dielectric layer and prevents any lateral barrier layers (e.g., etch stop layers, diffusion barrier layers, etc.) from extending between the first conductive element and the electrical network of the second conductive element. The structure therefore provides a galvanically isolated integrated coupler which avoids electrical shorting between circuits (e.g., at barrier layers) resulting in an improved high voltage resistance.
    • 所公开的发明提供了一种用于在包括耦合器的导电元件(例如,具有不同的高电压电位)的共享横向平面的电网之间提供高横向电压电阻的结构和方法。 在一个实施例中,提供高横向电压电阻的集成耦合器包括主导电元件和次导电元件。 隔离材料横向配置在主要导电元件的电网和次级导电元件的电网之间。 隔离材料可以包括低k电介质层,并且防止任何侧向阻挡层(例如,蚀刻停止层,扩散阻挡层等)在第一导电元件和第二导电元件的电网之间延伸。 因此,该结构提供了一种电隔离的集成耦合器,其避免了电路之间的电短路(例如,在阻挡层处),导致改进的高耐电压。
    • 6. 发明申请
    • HIGH VOLTAGE RESISTANCE COUPLING STRUCTURE
    • 高电阻耦合结构
    • US20110095392A1
    • 2011-04-28
    • US12607230
    • 2009-10-28
    • Uwe WahlMarkus HammerJens-Peer Stengl
    • Uwe WahlMarkus HammerJens-Peer Stengl
    • H01L29/06H01L21/762
    • H01L23/5227H01L23/3178H01L23/585H01L23/642H01L24/03H01L24/05H01L2224/02166H01L2224/03462H01L2224/03464H01L2224/05155H01L2224/05644H01L2924/01029H01L2924/13091H01L2924/14H01L2924/01015
    • The disclosed invention provides a structure and method for providing a high lateral voltage resistance between the electrical networks, sharing a lateral plane, of conductive elements (e.g., having different high voltage potentials) comprising a coupler. In one embodiment, an integrated coupler providing a high lateral voltage resistance comprises a primary conductive element and a secondary conductive element. An isolating material is laterally configured between the electrical network of the primary conductive element and an electrical network of the secondary conductive element. The isolating material may comprise a low-k dielectric layer and prevents any lateral barrier layers (e.g., etch stop layers, diffusion barrier layers, etc.) from extending between the first conductive element and the electrical network of the second conductive element. The structure therefore provides a galvanically isolated integrated coupler which avoids electrical shorting between circuits (e.g., at barrier layers) resulting in an improved high voltage resistance.
    • 所公开的发明提供了一种用于在包括耦合器的导电元件(例如,具有不同的高电压电位)的共享横向平面的电网之间提供高横向电压电阻的结构和方法。 在一个实施例中,提供高横向电压电阻的集成耦合器包括主导电元件和次导电元件。 隔离材料横向配置在主要导电元件的电网和次级导电元件的电网之间。 隔离材料可以包括低k电介质层,并且防止任何侧向阻挡层(例如,蚀刻停止层,扩散阻挡层等)在第一导电元件和第二导电元件的电网之间延伸。 因此,该结构提供了一种电隔离的集成耦合器,其避免了电路之间的电短路(例如,在阻挡层处),导致改进的高耐电压。
    • 9. 发明申请
    • Lateral SOI component having a reduced on resistance
    • 具有降低导通电阻的横向SOI元件
    • US20070080395A1
    • 2007-04-12
    • US11527760
    • 2006-09-26
    • Uwe WahlRalf RudolfDirk Priefert
    • Uwe WahlRalf RudolfDirk Priefert
    • H01L29/76
    • H01L29/78624H01L29/0623H01L29/0692H01L29/0878H01L29/402H01L29/404H01L29/407H01L29/7803H01L29/7808H01L29/7818H01L29/7824H01L29/78639H01L29/861
    • An SOI semiconductor component comprises a semiconductor substrate having a basic doping, a dielectric layer arranged on the semiconductor substrate, and a semiconductor layer arranged on the dielectric layer. The semiconductor layer includes a drift zone of a first conduction type, a junction between the drift zone and a further component zone which is configured in such a way that a space charge zone is formed in the drift zone when a reverse voltage is applied to the junction, and a terminal zone adjacent to the drift zone. A first terminal electrode is connected to the further component zone, and a second terminal electrode is connected to the terminal zone. In the semiconductor substrate a first semiconductor zone is doped complementarily with respect to a basic doping of the semiconductor substrate, and the first terminal electrode is connected to the first semiconductor zone. A rectifier element is connected between the first terminal electrode and the first semiconductor zone.
    • SOI半导体部件包括具有基本掺杂的半导体衬底,布置在半导体衬底上的电介质层和布置在电介质层上的半导体层。 半导体层包括第一导电类型的漂移区域,漂移区域和另一组件区域之间的结,该区域构造成使得当反向电压施加到漂移区域时在漂移区域中形成空间电荷区域 结和与漂移区相邻的终端区。 第一端子电极连接到另一组件区域,并且第二端子电极连接到端子区域。 在半导体衬底中,第一半导体区相对于半导体衬底的基本掺杂互补地掺杂,并且第一端电极连接到第一半导体区。 整流元件连接在第一端子电极和第一半导体区域之间。