专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08237139B2 Method for detecting substrate position of charged particle beam photolithography apparatus and charged particle beam photolithography apparatus 有权
标题翻译：用于检测带电粒子束光刻装置和带电粒子束光刻装置的基板位置的方法
公开(公告)号：US08237139B2
公开(公告)日：2012-08-07
申请号：US12778472
申请日：2010-05-12
申请人： Kota Fujiwara , Yoshiro Yamanaka , Michihiro Kawaguchi , Kazuhiro Shiba
发明人： Kota Fujiwara , Yoshiro Yamanaka , Michihiro Kawaguchi , Kazuhiro Shiba
IPC分类号： G01N21/86 , G01V8/00
CPC分类号： G03B27/58 , B82Y10/00 , B82Y40/00 , H01J37/3045 , H01J37/3174 , H01J2237/20221 , H01J2237/2482
摘要： One aspect of the invention provides a substrate position detecting method for charged particle beam photolithography apparatus in order to be able to measure accurately and simply a substrate position on a stage. The substrate position detecting method for charged particle beam photolithography apparatus includes placing a substrate on a stage that can be moved in an X-direction and a Y-direction; measuring a position in the X-direction of the stage while moving the stage in the X-direction, and illuminating obliquely an upper surface of the substrate with a laser beam to receive light reflected from the substrate with a position sensing device; computing a barycentric position of the reflected light when the stage is moved in the X-direction; measuring a position in the Y-direction of the stage while moving the stage in the Y-direction, and illuminating obliquely the upper surface of the substrate with the laser beam to receive light reflected from the substrate with the position sensing device; computing a barycentric position of the reflected light when the stage is moved in the Y-direction; and computing the positions of the substrate from the position measurement results of the stage and the computed barycentric position.
摘要翻译：本发明的一个方面提供一种用于带电粒子束光刻设备的基板位置检测方法，以便能够准确且简单地测量台上的基板位置。用于带电粒子束光刻设备的基片位置检测方法包括将基片放置在能沿X方向和Y方向移动的台上; 在X方向移动载物台的同时测量载物台的X方向上的位置，用激光束倾斜地照射基板的上表面，以利用位置检测装置接收从基板反射的光; 当所述台沿X方向移动时计算反射光的重心位置; 同时沿着Y方向移动台，测量台的Y方向的位置，并用激光束倾斜地照射基板的上表面，以利用位置感测装置接收从基板反射的光; 当所述载物台沿Y方向移动时计算反射光的重心位置; 以及从所述台的位置测量结果和所计算的重心位置计算所述基板的位置。

2. 发明授权

US08779397B2 Substrate cover and charged particle beam writing method using same 失效
标题翻译：基板盖和带电粒子束写入方法使用相同
公开(公告)号：US08779397B2
公开(公告)日：2014-07-15
申请号：US12970084
申请日：2010-12-16
申请人： Michihiro Kawaguchi , Keisuke Yamaguchi , Shun Kanezawa , Soichiro Mitsui , Kiminobu Akeno
发明人： Michihiro Kawaguchi , Keisuke Yamaguchi , Shun Kanezawa , Soichiro Mitsui , Kiminobu Akeno
IPC分类号： H01J37/317 , H01J37/20
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/0044
摘要： A substrate cover 40 includes a conductive portion 41 having a shape corresponding to a peripheral edge region of a substrate. Since at least part of the conductive portion includes transmissive portions 47 each formed of a light transmissive member, it is configured so as to allow desired light to penetrate through. The position of each edge portion of the substrate is detected in such a manner that the substrate is disposed with the substrate cover 40 placed thereon between light irradiation means and a light detecting unit, irradiation light directed from the light irradiation means located above the substrate to the edge portion of the substrate is made to penetrate through at least part of the substrate cover 40, the edge portion of the substrate is then irradiated with light from the irradiation means.
摘要翻译：基板盖40包括具有与基板的周缘区域对应的形状的导电部41。由于导电部分的至少一部分包括由透光构件形成的透射部分47，所以它被构造成允许期望的光穿透。以这样的方式检测基板的每个边缘部分的位置，使得基板设置在其上放置有光照射装置和光检测单元之间的基板盖40，从位于基板上方的光照射装置引导的照射光使基板的边缘部分穿过基板盖40的至少一部分，然后用来自照射装置的光照射基板的边缘部分。

3. 发明申请

US20110155930A1 SUBSTRATE COVER AND CHARGED PARTICLE BEAM WRITING METHOD USING SAME 失效
标题翻译：基板封装和使用相同的充电颗粒光束写入方法
公开(公告)号：US20110155930A1
公开(公告)日：2011-06-30
申请号：US12970084
申请日：2010-12-16
申请人： Michihiro KAWAGUCHI , Keisuke Yamaguchi , Shun Kanezawa , Soichiro Mitsui , Kiminobu Akeno
发明人： Michihiro KAWAGUCHI , Keisuke Yamaguchi , Shun Kanezawa , Soichiro Mitsui , Kiminobu Akeno
IPC分类号： G21K5/10
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/0044
摘要： A substrate cover 40 includes a conductive portion 41 having a shape corresponding to a peripheral edge region of a substrate. Since at least part of the conductive portion includes transmissive portions 47 each formed of a light transmissive member, it is configured so as to allow desired light to penetrate through. The position of each edge portion of the substrate is detected in such a manner that the substrate is disposed with the substrate cover 40 placed thereon between light irradiation means and a light detecting unit, irradiation light directed from the light irradiation means located above the substrate to the edge portion of the substrate is made to penetrate through at least part of the substrate cover 40, the edge portion of the substrate is then irradiated with light from the irradiation means.
摘要翻译：基板盖40包括具有与基板的周缘区域对应的形状的导电部41。由于导电部分的至少一部分包括由透光构件形成的透射部分47，所以它被构造成允许期望的光穿透。以这样的方式检测基板的每个边缘部分的位置，使得基板设置在其上放置有光照射装置和光检测单元之间的基板盖40，从位于基板上方的光照射装置引导的照射光使基板的边缘部分穿过基板盖40的至少一部分，然后用来自照射装置的光照射基板的边缘部分。

4. 发明申请

US20100290023A1 METHOD FOR DETECTING SUBSTRATE POSITION OF CHARGED PARTICLE BEAM PHOTOLITHOGRAPHY APPARATUS AND CHARGED PARTICLE BEAM PHOTOLITHOGRAPHY APPARATUS 有权
标题翻译：用于检测充电颗粒光束照相装置和充电颗粒光栅照相装置的基板位置的方法
公开(公告)号：US20100290023A1
公开(公告)日：2010-11-18
申请号：US12778472
申请日：2010-05-12
申请人： Kota FUJIWARA , Yoshiro Yamanaka , Michihiro Kawaguchi , Kazuhiro Shiba
发明人： Kota FUJIWARA , Yoshiro Yamanaka , Michihiro Kawaguchi , Kazuhiro Shiba
IPC分类号： G03B27/58
CPC分类号： G03B27/58 , B82Y10/00 , B82Y40/00 , H01J37/3045 , H01J37/3174 , H01J2237/20221 , H01J2237/2482
摘要： One aspect of the invention provides a substrate position detecting method for charged particle beam photolithography apparatus in order to be able to measure accurately and simply a substrate position on a stage. The substrate position detecting method for charged particle beam photolithography apparatus includes placing a substrate on a stage that can be moved in an X-direction and a Y-direction; measuring a position in the X-direction of the stage while moving the stage in the X-direction, and illuminating obliquely an upper surface of the substrate with a laser beam to receive light reflected from the substrate with a position sensing device; computing a barycentric position of the reflected light when the stage is moved in the X-direction; measuring a position in the Y-direction of the stage while moving the stage in the Y-direction, and illuminating obliquely the upper surface of the substrate with the laser beam to receive light reflected from the substrate with the position sensing device; computing a barycentric position of the reflected light when the stage is moved in the Y-direction; and computing the positions of the substrate from the position measurement results of the stage and the computed barycentric position.
摘要翻译：本发明的一个方面提供一种用于带电粒子束光刻设备的基板位置检测方法，以便能够准确且简单地测量台上的基板位置。用于带电粒子束光刻设备的基片位置检测方法包括将基片放置在能沿X方向和Y方向移动的台上; 在X方向移动载物台的同时测量载物台的X方向上的位置，用激光束倾斜地照射基板的上表面，以利用位置检测装置接收从基板反射的光; 当所述台沿X方向移动时计算反射光的重心位置; 同时沿着Y方向移动台，测量台的Y方向的位置，并用激光束倾斜地照射基板的上表面，以利用位置感测装置接收从基板反射的光; 当所述载物台沿Y方向移动时计算反射光的重心位置; 以及从所述台的位置测量结果和所计算的重心位置计算所述基板的位置。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式