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    • 2. 发明申请
    • DEVICE AND METHOD FOR FOCUSING A BEAM OF LIGHT WITH REDUCED FOCAL PLANE DISTORTION
    • 用减轻焦点平面失真聚焦光束的装置和方法
    • US20120228802A1
    • 2012-09-13
    • US12669466
    • 2008-07-21
    • Shyi-Herng KanTseng-Ming HsiehJackie Y. Ying
    • Shyi-Herng KanTseng-Ming HsiehJackie Y. Ying
    • B29C35/08G02B27/30
    • B29C64/135
    • A system for focusing a light beam may be used for multi-photon stereolithography. It comprises a collimator or expander for adjusting the beam divergence and a scanner for directing the beam onto a focusing device to focus the beam to a focal point or beam waist and to scan the focused beam. A controller controls adjustment of the beam divergence so that the focal point or beam waist is scanned substantially in a plane. A light source may be provided to generate the light beam. The expander may comprise a diverging lens and a converging lens for expanding the beam to produce a collimated beam. The divergence of the collimated beam is dependent on the distance between the diverging lens and the converging lens, which may be adjusted to adjust the beam divergence. The focusing device may comprise a dry objective lens to focus the collimated beam onto the target material to induce multi-photon absorption in the target material at the beam waist of the focused beam.
    • 用于聚焦光束的系统可以用于多光子立体光刻。 它包括用于调整光束发散的准直器或扩展器和用于将光束引导到聚焦装置上以将光束聚焦到焦点或光束腰部并扫描聚焦光束的扫描器。 控制器控制光束发散的调节,使得焦点或光束腰部基本上在平面中扫描。 可以提供光源以产生光束。 扩展器可以包括发散透镜和用于展开光束以产生准直光束的会聚透镜。 准直光束的发散度取决于发散透镜和会聚透镜之间的距离,其可以被调整以调节光束发散。 聚焦装置可以包括干物镜,以将准直光束聚焦到目标材料上,以在聚焦光束的束腰处的目标材料中引起多光子吸收。
    • 4. 发明申请
    • TWO-PHOTON STEREOLITHOGRAPHY USING PHOTOCURABLE COMPOSITIONS
    • 使用光电组合物的双光子立体成像
    • US20120098164A1
    • 2012-04-26
    • US12669461
    • 2008-07-21
    • Shyi-Herng KanTseng-Ming HsiehJackie Y. Ying
    • Shyi-Herng KanTseng-Ming HsiehJackie Y. Ying
    • H01J37/30
    • B29C64/135
    • Two-photon stereolithography can be performed using a photocurable material comprising a poly(meth)acrylate having a (meth)acrylate functionality of at least 3 and a molecular weight (MW) of at least 650, a urethane(meth)acrylate having a (meth)acrylate functionality of 2 to 4 and a MW of 400 to 10,000, a di(meth)acrylate made from bisphenol A or bisphenol F; and a photoinitiator. A beam of light is focused to a focus region of the material to induce two-photon absorption in the focus region, and thus polymerization of the material in the focus region. The beam is scanned across said material according to a pre-selected pattern so that the beam is focused to different pre-selected regions, to induce polymerization of the material at the pre-selected regions.
    • 双光子立体光刻可以使用包含(甲基)丙烯酸酯官能度为至少3,分子量(MW)至少为650的聚(甲基)丙烯酸酯的光固化材料,具有( (甲基)丙烯酸酯官能度为2〜4,MW为400〜10,000,由双酚A或双酚F制成的二(甲基)丙烯酸酯; 和光引发剂。 光束被聚焦到材料的焦点区域,以在聚焦区域中引起双光子吸收,从而聚焦在聚焦区域中的材料。 根据预先选择的图案将光束扫描穿过所述材料,使得光束被聚焦到不同的预选区域,以在预选区域处诱导材料的聚合。