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    • 1. 发明授权
    • Method for manufacturing display device
    • 显示装置制造方法
    • US08043901B2
    • 2011-10-25
    • US12222686
    • 2008-08-14
    • Shunpei YamazakiYasuyuki AraiYukie SuzukiYoshiyuki Kurokawa
    • Shunpei YamazakiYasuyuki AraiYukie SuzukiYoshiyuki Kurokawa
    • H01L21/00
    • H01L29/78696H01L21/0237H01L21/02532H01L21/02595H01L21/0262H01L27/124H01L29/04H01L29/41733H01L29/66765
    • The present invention relates to a method for manufacturing a display device including a p-channel thin film transistor and an n-channel thin film transistor having a microcrystalline semiconductor film each of which are an inverted-staggered type, and relates to a method for formation of an insulating film and a semiconductor film which are included in the thin film transistor. Two or more kinds of high-frequency powers having different frequencies are supplied to an electrode for generating glow discharge plasma in a reaction chamber. High-frequency powers having different frequencies are supplied to generate glow discharge plasma, so that a thin film of a semiconductor or an insulator is formed. High-frequency powers having different frequencies (different wavelength) are superimposed and applied to the electrode of a plasma CVD apparatus, so that densification and uniformity of plasma for preventing the effect of surface standing wave of plasma can be realized.
    • 本发明涉及一种制造显示装置的方法,该显示装置包括一个p沟道薄膜晶体管和一个具有微晶半导体薄膜的n沟道薄膜晶体管,它们都是反向交错型,并且涉及一种形成方法 包括在薄膜晶体管中的绝缘膜和半导体膜。 向反应室内产生辉光放电等离子体的电极供给具有不同频率的两种以上的高频电力。 提供具有不同频率的高频功率以产生辉光放电等离子体,从而形成半导体或绝缘体的薄膜。 具有不同频率(不同波长)的高频功率被叠加并施加到等离子体CVD装置的电极,从而可以实现等离子体的致密化和均匀性,以防止等离子体的表面驻波的影响。
    • 3. 发明申请
    • Method for manufacturing display device
    • 显示装置制造方法
    • US20090047775A1
    • 2009-02-19
    • US12222686
    • 2008-08-14
    • Shunpei YamazakiYasuyuki AraiYukie SuzukiYoshiyuki Kurokawa
    • Shunpei YamazakiYasuyuki AraiYukie SuzukiYoshiyuki Kurokawa
    • H01L21/205
    • H01L29/78696H01L21/0237H01L21/02532H01L21/02595H01L21/0262H01L27/124H01L29/04H01L29/41733H01L29/66765
    • The present invention relates to a method for manufacturing a display device including a p-channel thin film transistor and an n-channel thin film transistor having a microcrystalline semiconductor film each of which are an inverted-staggered type, and relates to a method for formation of an insulating film and a semiconductor film which are included in the thin film transistor. Two or more kinds of high-frequency powers having different frequencies are supplied to an electrode for generating glow discharge plasma in a reaction chamber. High-frequency powers having different frequencies are supplied to generate glow discharge plasma, so that a thin film of a semiconductor or an insulator is formed. High-frequency powers having different frequencies (different wavelength) are superimposed and applied to the electrode of a plasma CVD apparatus, so that densification and uniformity of plasma for preventing the effect of surface standing wave of plasma can be realized.
    • 本发明涉及一种制造显示装置的方法,该显示装置包括一个p沟道薄膜晶体管和一个具有微晶半导体薄膜的n沟道薄膜晶体管,它们都是反向交错型,并且涉及一种形成方法 包括在薄膜晶体管中的绝缘膜和半导体膜。 向反应室内产生辉光放电等离子体的电极供给具有不同频率的两种以上的高频电力。 提供具有不同频率的高频功率以产生辉光放电等离子体,从而形成半导体或绝缘体的薄膜。 具有不同频率(不同波长)的高频功率被叠加并施加到等离子体CVD装置的电极,从而可以实现等离子体的致密化和均匀性,以防止等离子体的表面驻波的影响。