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    • 1. 发明授权
    • Polysilane monomolecular film and polysilane built-up film
    • 聚硅烷单分子膜和聚硅烷成膜
    • US5362559A
    • 1994-11-08
    • US89634
    • 1993-07-12
    • Shuji HayaseYoshihiko NakanoYukihiro MikogamiAkira YoshizumiShinji MuraiRikako Kani
    • Shuji HayaseYoshihiko NakanoYukihiro MikogamiAkira YoshizumiShinji MuraiRikako Kani
    • B05D1/20C09D183/16B32B5/00
    • B82Y30/00B05D1/202B82Y40/00C09D183/16Y10T428/261
    • Disclosed are a polysilane monomolecular film and a polysilane built-up film formed by building up a plurality of said monomolecular films, said monomolecular film consisting of a polysilane having a repeating unit represented by general formula (1) given below: ##STR1## where, R.sup.1 represents a substituted or unsubstituted alkyl group having 1 to 24 carbon atoms or a substituted or unsubstituted aryl group having 6 to 24 carbon atoms, R.sup.2 represents a divalent hydrocarbon group having 1 to 4 carbon atoms which can be substituted, and X represents hydroxyl group, amino group, carboxyl group, or a hydrophilic group having at least one selected from the group consisting of hydroxyl group, amino group, carboxyl group, amide linkage, ester linkage, carbamate linkage and carbonate linkage. The polysilane monomolecular film and built-up film can be formed on a substrate by an LB technique. In the films, the molecules of the polysilane having the repeating unit (1), that is, the Si-Si backbones are oriented in a fixed direction.
    • 公开了一种聚硅烷单分子膜和聚硅烷叠层膜,其通过构建多个所述单分子膜而形成,所述单分子膜由具有由以下给出的通式(1)表示的重复单元的聚硅烷组成:< IMAGE>(1 )其中,R1表示取代或未取代的碳原子数1〜24的烷基或碳原子数6〜24的取代或未取代的芳基,R2表示可被取代的碳原子数1〜4的二价烃基,X 表示羟基,氨基,羧基或具有选自羟基,氨基,羧基,酰胺键,酯键,氨基甲酸酯键和碳酸酯键中的至少一种的亲水基团。 可以通过LB技术在基板上形成聚硅烷单分子膜和积层膜。 在膜中,具有重复单元(1)的聚硅烷的分子,即Si-Si主链在固定方向上取向。
    • 2. 发明授权
    • Polysilane and polysilane composition
    • 聚硅烷和聚硅烷组成
    • US5336736A
    • 1994-08-09
    • US53810
    • 1993-04-29
    • Yoshihiko NakanoShuzi HayaseShinji MuraiYukihiro MikogamiAkira Yoshizumi
    • Yoshihiko NakanoShuzi HayaseShinji MuraiYukihiro MikogamiAkira Yoshizumi
    • C08G18/64C08G59/00C08G59/20C08G59/30C08G59/40C08G59/42C08G77/60C08L63/00C08L83/04C08L83/16G03F7/075C08F283/00
    • G03F7/0754C08G77/60C08L83/16
    • Disclosed is a polysilane having a repeating unit represented by general formula (1) given below. Also disclosed is a polysilane composition, comprising a polysilane having a repeating unit represented by general formula (2) given below and a cross linking agent: ##STR1## where, each of R.sup.1 and R.sup.3 is hydrogen, a substituted or unsubstituted alkyl group having 1 to 24 carbon atoms or a substituted or unsubstituted aryl group having 6 to 24 carbon atoms; R.sup.2 is a divalent hydrocarbon group having to 24 carbon atoms which can be substituted; R.sup.4 is a covalent bond, or a substituted or unsubstituted alkylene group having 1 to carbon atoms, or a substituted or unsubstituted arylene group having 6 to 24 carbon atoms; each of R.sup.5 to R.sup.9 is hydrogen, a substituted or unsubstituted alkyl group having 1 to 24 carbon atoms, a substituted or unsubstituted aryl group having 6 to 24 carbon atoms, or hydroxyl group, at least one of R.sup.5 to R.sup.9 being hydroxyl group; and X is a monovalent organic group having a reactive group capable of crosslinking upon exposure to light or by heating. If any of the polysilane and the polysilane composition of the present invention is exposed to light or heated, the polysilane molecules are crosslinked so as to provide a two or three dimensional polymer.
    • 公开了具有下述通式(1)表示的重复单元的聚硅烷。 还公开了一种聚硅烷组合物,其包含具有由下述通式(2)表示的重复单元的聚硅烷和交联剂:其中,R1和R3各自为氢 取代或未取代的碳原子数为1〜24的烷基或取代或未取代的碳原子数为6〜24的芳基。 R2是可被取代的具有24个碳原子的二价烃基; R4为共价键,或取代或未取代的碳原子数1〜2的亚烷基,取代或未取代的碳原子数为6〜24的亚芳基。 R5至R9各自为氢,取代或未取代的碳原子数为1〜24的烷基,取代或未取代的碳原子数为6〜24的芳基或羟基,R5〜R9中的至少一个为羟基; X是具有能够在曝光或加热时能够交联的反应性基团的一价有机基团。 如果本发明的聚硅烷和聚硅烷组合物中的任何一种都被曝光或加热,则聚硅烷分子被交联以提供二维或三维聚合物。