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    • 2. 发明授权
    • Processing head for electrophotographic apparatus
    • 电子照相设备的加工头
    • US4727393A
    • 1988-02-23
    • US920336
    • 1986-10-17
    • Shuichi OhtsukaAkira YodaAkinori Kimura
    • Shuichi OhtsukaAkira YodaAkinori Kimura
    • G03G15/10G03G15/11G03G15/22G03G15/00
    • G03G15/223G03G15/11
    • A processing head for an electrophotographic apparatus has a developing section for developing an electrophotographic film with a liquid developer, and a drying section disposed adjacent to and on the downstream side of the developing section in the direction in which the film is advanced, to dry the film wetted with the developer by passing a gas in a direction that intersects the film advancing direction. The drying section is provided with a pair of frame members extending in a direction that intersects the film advancing direction so as to define both ends of the drying section in the film advancing direction. In addition, a pair of recesses are formed along opposing walls of the frame members, respectively. Accordingly, the flow rate of the gas passed through the recesses is higher than that of the gas passed along the other portion between the frame members.
    • 电子照相设备的处理头具有显影部分,用于显影具有液体显影剂的电子照相胶片,以及干燥部分,其设置在显影部分的前进方向上与显影部分的下游侧和下游侧,以将干燥 膜通过使气体沿与膜前进方向相交的方向通过显影剂润湿。 干燥部设置有沿与膜前进方向相交的方向延伸的一对框架构件,以便限定干燥部的膜前进方向的两端。 此外,分别在框架构件的相对的壁上形成一对凹部。 因此,通过凹部的气体的流量高于沿着框架部件之间的其他部分通过的气体的流量。
    • 4. 发明授权
    • Developing head for electrophotographic apparatus
    • 电子照相设备的显影头
    • US4613226A
    • 1986-09-23
    • US564493
    • 1983-12-22
    • Akinori KimuraShuichi Ohtsuka
    • Akinori KimuraShuichi Ohtsuka
    • G03G15/10G03D5/00G03D7/00
    • G03G15/101
    • A developing head in which liquid developer and gas are applied by a feeding system to the photosensitive surface of an electrophotographic material for electrophotographic apparatus via a developing chamber, a space being formed between the framed opening of the developing mask at its outer peripheral surface and an opposing photosensitive surface to prevent leakage of the liquid developer by capillarity between the photosensitive surface and the framed opening of the developing mask at its mouth abutting the photosensitive surface, a valve interposed between the passageways for feeding liquid developer and gas respectively in order to prevent the liquid developer from flowing into the passageway for supplying gas, and a pressure reduction apparatus to apply negative pressure between the photosensitive surface and the mouth of the framed opening when the electrophotographic material is advanced from one frame to another.
    • 一种显影头,其中液体显影剂和气体通过进料系统经由显影室施加到用于电子照相设备的电子照相材料的感光表面,在其外周表面处在显影掩模的框形开口之间形成的空间和 相反的感光表面,以防止液体显影剂在其感光表面附近的感光表面和显影掩模的框架开口之间的毛细作用泄漏,分别插入在用于供给液体显影剂和气体的通道之间的阀,以防止 液体显影剂流入用于供应气体的通道中;以及减压装置,当电子照相材料从一个框架前进到另一个框架时,在感光表面和框架开口的口部之间施加负压。
    • 5. 发明授权
    • Developing head of electrophotographic system
    • 显影电子照相系统的头
    • US4622915A
    • 1986-11-18
    • US678819
    • 1984-12-06
    • Shuichi OhtsukaAkinori Kimura
    • Shuichi OhtsukaAkinori Kimura
    • G03G15/10G03G15/11G03G15/22
    • G03G15/101G03G15/10
    • In a developing head of an electrophotographic system which develops an image by bringing a liquid developer into contact with a photosensitive face of electrophotographic material, through an opening provided in the developing head, a right angle is formed between the photosensitive face and the in-flow and out-flow route for the liquid developer and a gas for removing excess developer at the opening. A pressure-reducing chamber is formed between a frame around the opening and a frame surrounding the pressure-reducing chamber, both frames tightly contacting the electrophotosensitive material. Thus, the gap between the photosensitive face and a developing electrode is reduced and high speed for the gas for removing the developer is obtained. Liquid developer exuding from the frame around the opening is captured in the pressure-reducing chamber.
    • 在通过使液体显影剂与电子照相材料的感光面接触来显影图像的电子照相系统的显影头中,通过设置在显影头中的开口,在感光面和流入物之间形成直角 和用于液体显影剂的流出路径和用于在开口处去除多余显影剂的气体。 在围绕开口的框架和围绕减压室的框架之间形成减压室,两个框架紧密接触光电敏感材料。 因此,感光面和显影电极之间的间隙减小,并且获得用于除去显影剂的气体的高速度。 从开口周围的框架渗出的液体显影剂被捕获在减压室中。