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1. 发明授权

US4929623A Benzothiazole derivative 失效
标题翻译：苯并噻唑衍生物
公开(公告)号：US4929623A
公开(公告)日：1990-05-29
申请号：US207329
申请日：1988-06-16
申请人： Shinya Abe , Mitsuaki Miyamoto , Masayuki Tanaka , Kozo Akasaka , Kenji Hayashi , Tetsuya Kawahara , Satoshi Katayama , Yoshinori Sakuma , Takeshi Suzuki , Isao Yamatsu
发明人： Shinya Abe , Mitsuaki Miyamoto , Masayuki Tanaka , Kozo Akasaka , Kenji Hayashi , Tetsuya Kawahara , Satoshi Katayama , Yoshinori Sakuma , Takeshi Suzuki , Isao Yamatsu
IPC分类号： A61K31/428 , A61P11/06 , C07D277/82 , C07D277/84 , C07D417/04 , C07D417/12 , C07D513/04
CPC分类号： C07D417/04 , C07D277/82 , C07D277/84 , C07D417/12 , C07D513/04
摘要： A benzothiazol compound having the formula is disclosed and is effective to inhibit the production of leukotriene. It is useful against allergy, asthma, affections of the skin, allergic rhinitis and affection of a cardiovascular system. ##STR1## in which R20 is ester or amide and --NR5R6 is amino in variety.

2. 发明授权

US06489336B2 Nitrogen-containing tricyclic compounds and drugs containing the same 失效
标题翻译：含氮三环化合物和含有这些化合物的药物
公开(公告)号：US06489336B2
公开(公告)日：2002-12-03
申请号：US09985416
申请日：2001-11-02
申请人： Mitsuaki Miyamoto , Tatsuya Yoshiuchi , Keizo Sato , Makoto Kaino , Masayuki Tanaka , Motohiro Soejima , Katsuhiro Moriya , Yoshinori Sakuma , Koji Yamada , Kokichi Harada , Yukio Nishizawa , Seiichi Kobayashi , Makoto Okita , Koichi Katayama
发明人： Mitsuaki Miyamoto , Tatsuya Yoshiuchi , Keizo Sato , Makoto Kaino , Masayuki Tanaka , Motohiro Soejima , Katsuhiro Moriya , Yoshinori Sakuma , Koji Yamada , Kokichi Harada , Yukio Nishizawa , Seiichi Kobayashi , Makoto Okita , Koichi Katayama
IPC分类号： A61K31473
CPC分类号： C07D417/06 , C07D279/22 , C07D279/24 , C07D417/12 , C09B21/00 , C09B57/08
摘要： A phenothiazine, acridan, acridone oxime, acridone hydrazone and dibenzodiazepine derivative represented by formula (I) effective against diseases in which histamine, leukotrienes, etc. participate and effective in preventing or treating diseases in which chemical mediators such as histamine and leukotrienes participate, for example, asthma, allergic rhinitis, atopic dermatitis, urticaria, hay fever, gastrointestinal allergy and food allergy.
摘要翻译：苯并噻嗪，吖啶酮肟，吖啶酮肟，腙酮腙和二苯并二氮杂衍生物，其对组胺，白细胞三烯等参与并有效预防或治疗化学介质如组胺和白三烯参与的疾病有效，例如哮喘，过敏性鼻炎，特应性皮炎，荨麻疹，花粉症，胃肠道过敏和食物过敏。

3. 发明授权

US06703388B2 Nitrogen-containing tricyclic compounds and drugs containing the same 失效
标题翻译：含氮三环化合物和含有这些化合物的药物
公开(公告)号：US06703388B2
公开(公告)日：2004-03-09
申请号：US10201952
申请日：2002-07-25
申请人： Mitsuaki Miyamoto , Tatsuya Yoshiuchi , Keizo Sato , Makoto Kaino , Masayuki Tanaka , Motohiro Soejima , Katsuhiro Moriya , Yoshinori Sakuma , Koji Yamada , Kokichi Harada , Yukio Nishizawa , Seiichi Kobayashi , Makoto Okita , Koichi Katayama
发明人： Mitsuaki Miyamoto , Tatsuya Yoshiuchi , Keizo Sato , Makoto Kaino , Masayuki Tanaka , Motohiro Soejima , Katsuhiro Moriya , Yoshinori Sakuma , Koji Yamada , Kokichi Harada , Yukio Nishizawa , Seiichi Kobayashi , Makoto Okita , Koichi Katayama
IPC分类号： A61K31551
CPC分类号： C07D417/06 , C07D279/22 , C07D279/24 , C07D417/12 , C09B21/00 , C09B57/08
摘要： A phenothiazine, acridan, acridone oxime, acridone hydrazone and dibenzodiazepine derivative represented by formula (I) effective against diseases in which histamine, leukotrienes, etc. participate and effective in preventing or treating diseases in which chemical mediators such as histamine and leukotrienes participate, for example, asthma, allergic rhinitis, atopic dermatitis, urticaria, hay fever, gastrointestinal allergy and food allergy.
摘要翻译：苯并噻嗪，吖啶酮肟，吖啶酮肟，腙酮腙和二苯并二氮杂衍生物，其对组胺，白细胞三烯等参与并有效预防或治疗化学介质如组胺和白三烯参与的疾病有效，例如哮喘，过敏性鼻炎，特应性皮炎，荨麻疹，花粉症，胃肠道过敏和食物过敏。

4. 发明授权

US06333322B1 Nitrogen-containing tricyclic compounds and drugs containing the same 失效
标题翻译：含氮三环化合物和含有这些化合物的药物
公开(公告)号：US06333322B1
公开(公告)日：2001-12-25
申请号：US09125451
申请日：1998-09-21
申请人： Mitsuaki Miyamoto , Tatsuya Yoshiuchi , Keizo Sato , Makoto Kaino , Masayuki Tanaka , Motohiro Soejima , Katsuhiro Moriya , Yoshinori Sakuma , Koji Yamada , Kokichi Harada , Yukio Nishizawa , Seiichi Kobayashi , Makoto Okita , Koichi Katayama
发明人： Mitsuaki Miyamoto , Tatsuya Yoshiuchi , Keizo Sato , Makoto Kaino , Masayuki Tanaka , Motohiro Soejima , Katsuhiro Moriya , Yoshinori Sakuma , Koji Yamada , Kokichi Harada , Yukio Nishizawa , Seiichi Kobayashi , Makoto Okita , Koichi Katayama
IPC分类号： A61K315415
CPC分类号： C07D417/06 , C07D279/22 , C07D279/24 , C07D417/12 , C09B21/00 , C09B57/08
摘要： A phenothiazine, acridan, acridone oxime, acridone hydrazone and dibenzodiazepine derivative represented by formula (I) effective against diseases in which histamine, leukotrienes, etc. participate and effective in preventing or treating diseases in which chemical mediators such as histamine and leukotrienes participate, for example, asthma, allergic rhinitis, atopic dermatitis, urticaria, hay fever, gastrointestinal allergy and food allergy.
摘要翻译：苯并噻嗪，吖啶酮肟，吖啶酮肟，腙酮腙和二苯并二氮杂衍生物，其对组胺，白细胞三烯等参与并有效预防或治疗化学介质如组胺和白三烯参与的疾病有效，例如哮喘，过敏性鼻炎，特应性皮炎，荨麻疹，花粉症，胃肠道过敏和食物过敏。

5. 发明授权

US5298649A Naphthalene derivative 失效
标题翻译：萘衍生物
公开(公告)号：US5298649A
公开(公告)日：1994-03-29
申请号：US774237
申请日：1991-10-10
申请人： Makoto Okita , Hiroshi Shirota , Masayuki Tanaka , Toshihiko Kaneko , Katsuya Tagami , Shigeki Hibi , Yasushi Okamoto , Seiichiro Nomoto , Takeshi Suzuki , Kenichi Chiba , Masaki Goto , Ryoichi Hashida , Hideki Ono , Hideto Ohhara , Hideki Sakurai , Shigeru Souda , Yoshimasa Machida , Kouichi Katayama , Isao Yamatsu
发明人： Makoto Okita , Hiroshi Shirota , Masayuki Tanaka , Toshihiko Kaneko , Katsuya Tagami , Shigeki Hibi , Yasushi Okamoto , Seiichiro Nomoto , Takeshi Suzuki , Kenichi Chiba , Masaki Goto , Ryoichi Hashida , Hideki Ono , Hideto Ohhara , Hideki Sakurai , Shigeru Souda , Yoshimasa Machida , Kouichi Katayama , Isao Yamatsu
IPC分类号： C07C39/225 , C07C43/215 , C07C43/23 , C07C43/30 , C07C43/313 , C07C43/315 , C07C45/00 , C07C45/29 , C07C45/30 , C07C45/51 , C07C45/54 , C07C45/59 , C07C45/63 , C07C45/71 , C07C47/57 , C07C47/575 , C07C49/83 , C07C49/84 , C07C59/68 , C07C69/157 , C07F7/18 , C07C69/76
CPC分类号： C07F7/1852 , C07C39/225 , C07C43/215 , C07C43/23 , C07C43/30 , C07C43/313 , C07C43/315 , C07C45/00 , C07C45/298 , C07C45/30 , C07C45/305 , C07C45/513 , C07C45/54 , C07C45/59 , C07C45/63 , C07C45/71 , C07C47/57 , C07C47/575 , C07C49/83 , C07C49/84 , C07C59/68
摘要： A naphthalene derivative having the formula is new and useful for medicine. ##STR1## wherein R.sup.1 represents a hydrogen atom, a lower alkyl group or an acyl group;R.sup.2 independently represents a hydrogen atom, a lower alkyl group, a lower alkoxy group, a halogen atom, a cycloalkyl group, a cycloalkylalkyl group, a hydroxyl group, an aryl group which may be substituted, an arylalkyl group whose aryl group may be substituted, a heteroaryl group, or a heteroarylalkyl group;R.sup.3 and R.sup.4 are the same or different and represent a hydrogen atom, a lower alkyl group, a lower alkenyl group, an aryl group which may have a substituent, an arylalkyl group whose aryl group may be substituted, an arylalkenyl group whose aryl group may be substituted, a cycloalkyl group, an alkoxyalkyl group, a heteroaryl group, a heteroarylalkyl group, a carboxyl group, a carboxyalkyl group, an aminoalkyl group, or a cyano group;R.sup.5 represents a group of the formula, --OR.sup.7, (wherein R.sup.7 represents a hydrogen atom or a lower alkyl group), or a group of the formula, ##STR2## (wherein R.sup.8 and R.sup.9 are the same or different and represent a hydrogen atom or a lower alkyl group.
摘要翻译：具有该式的萘衍生物是新的并且可用于药物。其中R 1表示氢原子，低级烷基或酰基; R2独立地表示氢原子，低级烷基，低级烷氧基，卤素原子，环烷基，环烷基烷基，羟基，可被取代的芳基，芳基可以被取代的芳基烷基杂芳基或杂芳基烷基; R3和R4相同或不同，表示氢原子，低级烷基，低级烯基，可以具有取代基的芳基，芳基可以被取代的芳基烷基，芳基可以被取代的芳基烯基烷氧基烷基，杂芳基，杂芳基烷基，羧基，羧基烷基，氨基烷基或氰基; R5表示式-OR7的基团（其中R7表示氢原子或低级烷基）或下式的基团，其中R8和R9相同或不同，表示氢原子或低级烷基。

6. 发明授权

US5134111A Naphthalene derivative 失效
标题翻译：萘衍生物
公开(公告)号：US5134111A
公开(公告)日：1992-07-28
申请号：US451468
申请日：1989-12-15
申请人： Makoto Okita , Hiroshi Shirota , Masayuki Tanaka , Toshihiko Kaneko , Katsuya Tagami , Shigeki Hibi , Yasushi Okamoto , Seiichiro Nomoto , Takeshi Suzuki , Kenichi Chiba , Masaki Goto , Ryoichi Hashida , Hideki Ono , Hideto Ohhara , Hideki Sakurai , Shigeru Souda , Yoshimasa Machida , Kouichi Katayama , Isao Yamatsu
发明人： Makoto Okita , Hiroshi Shirota , Masayuki Tanaka , Toshihiko Kaneko , Katsuya Tagami , Shigeki Hibi , Yasushi Okamoto , Seiichiro Nomoto , Takeshi Suzuki , Kenichi Chiba , Masaki Goto , Ryoichi Hashida , Hideki Ono , Hideto Ohhara , Hideki Sakurai , Shigeru Souda , Yoshimasa Machida , Kouichi Katayama , Isao Yamatsu
IPC分类号： C07C39/225 , C07C43/215 , C07C43/23 , C07C43/30 , C07C43/313 , C07C43/315 , C07C45/00 , C07C45/29 , C07C45/30 , C07C45/51 , C07C45/54 , C07C45/59 , C07C45/63 , C07C45/71 , C07C47/57 , C07C47/575 , C07C49/83 , C07C49/84 , C07C59/68 , C07C69/157 , C07F7/18
CPC分类号： C07F7/1852 , C07C39/225 , C07C43/215 , C07C43/23 , C07C43/30 , C07C43/313 , C07C43/315 , C07C45/00 , C07C45/298 , C07C45/30 , C07C45/305 , C07C45/513 , C07C45/54 , C07C45/59 , C07C45/63 , C07C45/71 , C07C47/57 , C07C47/575 , C07C49/83 , C07C49/84 , C07C59/68
摘要： A naphthalene derivative having the formula is new and useful for medicine. ##STR1## [wherein R.sup.1 represents a hydrogen atom, a lower alkyl group or an acyl group;R.sup.2 independently represents a hydrogen atom, a lower alkyl group, a lower alkoxy group, a halogen atom, a cycloalkyl group, a cycloalkylalkyl group, a hydroxyl group, an aryl group which may be substituted, an arylalkyl group whose aryl group may be substituted, a heteroaryl group, or a heteroarylalkyl group;R.sup.3 and R.sup.4 are the same or different and represent a hydrogen atom, a lower alkyl group, a lower alkenyl group, an aryl group which may have a substituent, an arylalkyl group whose aryl group may be substituted, an arylalkenyl group whose aryl group may be substituted, a cycloalkyl group, an alkoxyalkyl group, a heteroaryl group, a heteroarylalkyl group, a carboxy group, a carboxyalkyl group, an aminoalkyl group, or a cyano group;R.sup.5 represents a group of the formula, --OR.sup.7, (wherein R.sup.7 represents a hydrogen atom or a lower alkyl group), or a group of the formula ##STR2## (wherein R.sup.8 and R.sup.9 are the same or different and represent a hydrogen atom or a lower alkyl group, or R.sup.8 and R.sup.9 can form, along with the nitrogen atom bonded with R.sup.8 and R.sup.9, a ring which may contain an oxygen atom);R.sup.6 independently represents a hydrogen atom, a halogen atom, a lower alkyl group, a lower alkoxy group, a hydroxyl group, an amino group, an arylalkyl group, or an aryl group; andm is 0 or an integer of from 1 to 2, and n is 0 or an integer of from 1 to 4.]

7. 发明授权

US5527948A Naphthalene derivative 失效
标题翻译：萘衍生物
公开(公告)号：US5527948A
公开(公告)日：1996-06-18
申请号：US402569
申请日：1995-03-13
申请人： Makoto Okita , Hiroshi Shirota , Masayuki Tanaka , Toshihiko Kaneko , Katsuya Tagami , Shigeki Hibi , Yasushi Okamoto , Seiichiro Nomoto , Takeshi Suzuki , Kenichi Chiba , Masaki Goto , Ryoichi Hashida , Hideki Ono , Hideto Ohhara , Hideki Sakurai , Shigeru Souda , Yoshimasa Machida , Kouichi Katayama , Isao Yamatsu
发明人： Makoto Okita , Hiroshi Shirota , Masayuki Tanaka , Toshihiko Kaneko , Katsuya Tagami , Shigeki Hibi , Yasushi Okamoto , Seiichiro Nomoto , Takeshi Suzuki , Kenichi Chiba , Masaki Goto , Ryoichi Hashida , Hideki Ono , Hideto Ohhara , Hideki Sakurai , Shigeru Souda , Yoshimasa Machida , Kouichi Katayama , Isao Yamatsu
IPC分类号： C07C39/225 , C07C43/215 , C07C43/23 , C07C43/30 , C07C43/313 , C07C43/315 , C07C45/00 , C07C45/29 , C07C45/30 , C07C45/51 , C07C45/54 , C07C45/59 , C07C45/63 , C07C45/71 , C07C47/57 , C07C47/575 , C07C49/83 , C07C49/84 , C07C59/68 , C07C69/157 , C07F7/18 , C07C69/76 , C07C49/115
CPC分类号： C07F7/1852 , C07C39/225 , C07C43/215 , C07C43/23 , C07C43/30 , C07C43/313 , C07C43/315 , C07C45/00 , C07C45/298 , C07C45/30 , C07C45/305 , C07C45/513 , C07C45/54 , C07C45/59 , C07C45/63 , C07C45/71 , C07C47/57 , C07C47/575 , C07C49/83 , C07C49/84 , C07C59/68
摘要： Naphthalene derivatives of the formula: ##STR1## wherein R.sup.1, represents a hydrogen atom, a lower alkyl group or an acyl group; R.sup.2 independently represents a hydrogen atom, a lower alkyl group, a lower alkoxy group, a halogen atom, a cycloalkyl group, a cycloalkylalkyl group, a hydroxyl group, an aryl group which may be substituted, an arylalkyl group whose aryl group may be substituted, a heteroaryl group, or a heteroaryllakyl group; R.sup.3 represents a hydrogen atom, a lower alkyl group, a lower alkenyl group, an aryl group which may have a substituent, an arylalkyl group whose aryl group may be substituted, an arylalkenyl group whose aryl group may be substituted, a cycloalkyl group, an alkoxyalkyl group, a heteroaryl group, a heteroarylalkyl group, a carboxyl group, a carboxyalkyl group, an aminoalkyl group, or a cyano group; R.sup.6 is C.sub.1-6 alkyl; and m is 0 or an integer of from 1 to 2 useful in treating autoimmune diseases are disclosed.
摘要翻译：下式的萘衍生物：其中R 1，表示氢原子，低级烷基或酰基; R2独立地表示氢原子，低级烷基，低级烷氧基，卤素原子，环烷基，环烷基烷基，羟基，可被取代的芳基，芳基可以被取代的芳基烷基，杂芳基或杂芳基烷基; R 3表示氢原子，低级烷基，低级烯基，可以具有取代基的芳基，可以被取代芳基的芳基烷基，可以被芳基取代的芳基烯基，环烷基，烷氧基烷基，杂芳基，杂芳基烷基，羧基，羧基烷基，氨基烷基或氰基; R6是C1-6烷基; 并且公开了m为0或可用于治疗自身免疫性疾病的1〜2的整数。

8. 发明授权

US08791521B2 Semiconductor device and method of manufacturing the same 有权
标题翻译：半导体装置及其制造方法
公开(公告)号：US08791521B2
公开(公告)日：2014-07-29
申请号：US13423664
申请日：2012-03-19
申请人： Koji Nakahara , Kazuhiro Matsuo , Masayuki Tanaka , Hirofumi Iikawa
发明人： Koji Nakahara , Kazuhiro Matsuo , Masayuki Tanaka , Hirofumi Iikawa
IPC分类号： H01L29/788
CPC分类号： H01L27/11521 , H01L29/42324 , H01L29/7881
摘要： A semiconductor device includes an interelectrode insulating film formed between a charge storage layer and a control electrode layer. The interelectrode insulating film is formed in a first region above an upper surface of an element isolation insulating film, a second region along a sidewall of the charge storage layer, and a third region above an upper surface of the charge storage layer. The interelectrode insulating film includes a first stack including a first silicon nitride film or a high dielectric constant film interposed between a first and a second silicon oxide film or a second stack including a second high dielectric constant film and a third silicon oxide film, and a second silicon nitride film formed between the control electrode layer and the first or the second stack. The second silicon nitride film is relatively thinner in the third region than in the first region.
摘要翻译：半导体器件包括在电荷存储层和控制电极层之间形成的电极间绝缘膜。电极间绝缘膜形成在元件隔离绝缘膜的上表面上方的第一区域，沿着电荷存储层的侧壁的第二区域和电荷存储层的上表面上方的第三区域。电极间绝缘膜包括：第一堆叠，其包括介于第一和第二氧化硅膜之间的第一氮化硅膜或高介电常数膜，或包括第二高介电常数膜和第三氧化硅膜的第二堆叠，形成在控制电极层和第一或第二堆叠之间的第二氮化硅膜。在第三区域中，第二氮化硅膜比第一区域相对薄。

9. 发明授权

US08525252B2 Nonvolatile semiconductor memory device and method of fabricating the same 有权
公开(公告)号：US08525252B2
公开(公告)日：2013-09-03
申请号：US13233788
申请日：2011-09-15
申请人： Kenichiro Toratani , Masayuki Tanaka , Kazuhiro Matsuo
发明人： Kenichiro Toratani , Masayuki Tanaka , Kazuhiro Matsuo
IPC分类号： H01L29/792
CPC分类号： H01L29/792 , G11C16/0466 , H01L21/28282 , H01L27/11568 , H01L27/11582 , H01L29/4234 , H01L29/66833 , H01L29/7926
摘要： According to one embodiment, a nonvolatile semiconductor memory device includes a semiconductor region, a tunnel insulator provided above the semiconductor region, a charge storage insulator provided above the tunnel insulator, a block insulator provided above the charge storage insulator, a control gate electrode provided above the block insulator, and an interface region including a metal element, the interface region being provided at one interface selected from between the semiconductor region and the tunnel insulator, the tunnel insulator and the charge storage insulator, the charge storage insulator and the block insulator, and the block insulator and the control gate electrode.

10. 发明申请

US20130119531A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME 有权
标题翻译：半导体器件及其制造方法
公开(公告)号：US20130119531A1
公开(公告)日：2013-05-16
申请号：US13423818
申请日：2012-03-19
申请人： Masayuki Tanaka , Kenichiro Toratani
发明人： Masayuki Tanaka , Kenichiro Toratani
IPC分类号： H01L23/48 , H01L21/283
CPC分类号： H01L27/11578 , H01L21/02164 , H01L21/02271 , H01L21/02304 , H01L21/28273 , H01L21/28282 , H01L27/11521 , H01L27/11568 , H01L27/11582 , H01L29/94
摘要： According to one embodiment, a method for manufacturing a semiconductor device includes: forming an underlayer film that contains atoms selected from the group consisting of aluminum, boron and alkaline earth metal; and forming a silicon oxide film on the underlayer film by a CVD method or an ALD method by use of a silicon source containing at least one of an ethoxy group, a halogen group, an alkyl group and an amino group, or a silicon source of a siloxane system.
摘要翻译：根据一个实施例，制造半导体器件的方法包括：形成含有选自铝，硼和碱土金属的原子的底层膜; 或通过使用含有乙氧基，卤素基团，烷基和氨基中的至少一个的硅源或硅源的硅源，通过CVD法或ALD法在下层膜上形成氧化硅膜硅氧烷体系。

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