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    • 1. 发明授权
    • Master strategy adjustment method and disc manufacturing method
    • 主要策略调整方法及盘片制造方法
    • US08582410B2
    • 2013-11-12
    • US13411975
    • 2012-03-05
    • Akiya SaitoToru AidaShinobu Hayashi
    • Akiya SaitoToru AidaShinobu Hayashi
    • G11B7/00
    • G11B7/261G11B7/00456
    • A master strategy adjustment method includes performing first recording on a master with a predetermined strategy, performing first measurement of an evaluation value of the master of the first recording, forming a first optical disc based on the master after the first recording, performing second measurement of an evaluation value of the optical disc formed as the first optical disc, calculating a target value of the evaluation value of the master based on a difference with the first measurement evaluation value and the second measurement evaluation value, and adjusting the strategy so that the evaluation value with regard to the master matches the target value, performing recording on the master with the adjusted writing strategy, performing measurement of the evaluation value of the master, and performing determination of whether the evaluation value is within a predetermined range with the target value as a reference until an affirmative result is obtained.
    • 主策略调整方法包括以预定的策略在主机上执行第一记录,对第一记录的主装置的评估值进行第一测量,在第一记录之后,基于主装置形成第一光盘,执行第二记录 形成为第一光盘的光盘的评估值,基于与第一测量评估值和第二测量评估值的差异来计算主机的评估值的目标值,并且调整策略,使得评估 相对于主机的值与目标值相匹配,利用调整后的写入策略对主机进行记录,对主机的评价值进行测量,并且以目标值为判定值是否处于预定范围内 直到获得肯定结果为止。
    • 4. 发明申请
    • MASTER STRATEGY ADJUSTMENT METHOD AND DISC MANUFACTURING METHOD
    • 主策略调整方法和盘制作方法
    • US20120236697A1
    • 2012-09-20
    • US13411975
    • 2012-03-05
    • Akiya SaitoToru AidaShinobu Hayashi
    • Akiya SaitoToru AidaShinobu Hayashi
    • G11B7/095
    • G11B7/261G11B7/00456
    • A master strategy adjustment method includes performing first recording on a master with a predetermined strategy, performing first measurement of an evaluation value of the master of the first recording, forming a first optical disc based on the master after the first recording, performing second measurement of an evaluation value of the optical disc formed as the first optical disc, calculating a target value of the evaluation value of the master based on a difference with the first measurement evaluation value and the second measurement evaluation value, and adjusting the strategy so that the evaluation value with regard to the master matches the target value, performing recording on the master with the adjusted writing strategy, performing measurement of the evaluation value of the master, and performing determination of whether the evaluation value is within a predetermined range with the target value as a reference until an affirmative result is obtained.
    • 主策略调整方法包括以预定的策略在主机上执行第一记录,对第一记录的主装置的评估值进行第一测量,在第一记录之后,基于主装置形成第一光盘,执行第二记录 形成为第一光盘的光盘的评估值,基于与第一测量评估值和第二测量评估值的差异来计算主机的评估值的目标值,并且调整策略,使得评估 相对于主机的值与目标值相匹配,利用调整后的写入策略对主机进行记录,对主机的评价值进行测量,并且以目标值为判定值是否处于预定范围内 直到获得肯定结果为止。
    • 5. 发明申请
    • Exposure apparatus and exposure method
    • 曝光装置和曝光方法
    • US20110207035A1
    • 2011-08-25
    • US12932033
    • 2011-02-16
    • Akiya SaitoAkitoshi SuzukiToru AidaShinobu Hayashi
    • Akiya SaitoAkitoshi SuzukiToru AidaShinobu Hayashi
    • G03F7/20G03B27/52
    • G03B27/52G11B7/1267G11B7/261G11B7/263
    • An exposure apparatus includes an exposure unit selectively performing exposure on a resist layer with a first laser beam, focused by a lens system, in a pattern including pits and lands arranged in a scanning direction; a detecting unit detecting a reflection of a second laser beam applied through the lens system to the resist layer selectively exposed to the first laser beam, the second laser beam being produced by changing a focal length of the lens system such that the resist layer is prevented from responding thereto; a calculating unit calculating, from a result of the detection, a displacement between center axes of signal waveforms representing beams reflected from first and second portions of the pattern having a smallest width and a larger width, respectively; a setting unit setting the focal length of the lens system to such a value that the displacement is maximal; and a control unit controlling the exposure unit to expose the resist layer to the first laser beam focused with the focal length set by the setting unit.
    • 曝光装置包括曝光单元,其以包括沿扫描方向布置的凹坑和平台的图案以由透镜系统聚焦的第一激光束选择性地对抗蚀剂层进行曝光; 检测单元,其检测通过透镜系统施加的第二激光束对选择性地暴露于第一激光束的抗蚀剂层的反射,第二激光束是通过改变透镜系统的焦距而产生的,以防止抗蚀剂层 从响应; 计算单元,从所述检测结果计算分别表示从具有最小宽度和较大宽度的图案的第一和第二部分反射的光束的信号波形的中心轴之间的位移; 设置单元,将透镜系统的焦距设定为位移最大的值; 以及控制单元,其控制所述曝光单元将所述抗蚀剂层暴露于由所述设定单元设定的所述焦距聚焦的所述第一激光束。