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1. 发明授权

US07359546B2 Defect inspection apparatus and defect inspection method 失效
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US07359546B2
公开(公告)日：2008-04-15
申请号：US11072317
申请日：2005-03-07
申请人： Shinji Sugihara , Ikunao Isomura , Junji Oaki , Toru Tojo
发明人： Shinji Sugihara , Ikunao Isomura , Junji Oaki , Toru Tojo
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01R31/311 , G03F1/84 , G06T2207/30148
摘要： A defect inspection method comprises irradiating a sample including a pattern under inspection with light, acquiring measurement pattern data of the pattern based on intensity of light reflected by the sample, generating conversion data including pixel data corresponding to the measurement pattern data from design data of the sample, applying FIR filter process to the conversion data, reconstructing the conversion data by replacing pixel data having value not larger than first reference value with first pixel data, replacing pixel data having value larger than second reference value larger than first reference value with second pixel data having value larger than first pixel data, replacing pixel data having value larger than first reference value and less than second reference value with third pixel data having value between the value of first and second pixel data, the pixel data having larger value being replaced with third pixel data having higher value.
摘要翻译：缺陷检查方法包括用光照射包括检查中的图案的样品，基于由样品反射的光的强度获取图案的测量图案数据，生成包括与来自样品的设计数据相对应的测量图案数据的像素数据的转换数据将FIR滤波处理应用于转换数据，通过用第一像素数据替换具有不大于第一参考值的像素数据来重构转换数据，用第二像素替换具有大于第一参考值的值的大于第二参考值的像素数据具有大于第一像素数据的数据的数据，替换具有大于第一参考值且小于第二参考值的像素数据，其中第三像素数据具有在第一和第二像素数据的值之间的值，具有较大值的像素数据被替换为第三像素数据具有较高的值。

2. 发明申请

US20060018530A1 Pattern inspecting method 失效
公开(公告)号：US20060018530A1
公开(公告)日：2006-01-26
申请号：US11175360
申请日：2005-07-07
申请人： Junji Oaki , Shinji Sugihara , Ikunao Isomura , Toru Tojo
发明人： Junji Oaki , Shinji Sugihara , Ikunao Isomura , Toru Tojo
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06T2207/30148
摘要： The present invention is to allow rapid detection of such a defect as buried in a pixel positional deviation, expansion/contraction noise or sensing noise on an image. A relationship between an inspection reference pattern image and a pattern image to be inspected is identified during inspection to construct a mathematical model obtained by absorbing (applying fitting on) a pixel positional deviation, expansion/contraction noise or sensing noise on an image, and a defect is detected by comparing a new inspection reference pattern image (model image) obtained by simulating the mathematical model and a pattern image to be inspected.

3. 发明授权

US07590277B2 Pattern inspecting method 失效
标题翻译：模式检查方法
公开(公告)号：US07590277B2
公开(公告)日：2009-09-15
申请号：US11175360
申请日：2005-07-07
申请人： Junji Oaki , Shinji Sugihara , Ikunao Isomura , Toru Tojo
发明人： Junji Oaki , Shinji Sugihara , Ikunao Isomura , Toru Tojo
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06T2207/30148
摘要： The present invention is to allow rapid detection of such a defect as buried in a pixel positional deviation, expansion/contraction noise or sensing noise on an image. A relationship between an inspection reference pattern image and a pattern image to be inspected is identified during inspection to construct a mathematical model obtained by absorbing (applying fitting on) a pixel positional deviation, expansion/contraction noise or sensing noise on an image, and a defect is detected by comparing a new inspection reference pattern image (model image) obtained by simulating the mathematical model and a pattern image to be inspected.
摘要翻译：本发明可以快速检测像图像中的像素位置偏差，扩张/收缩噪声或感测噪声那样的缺陷。在检查中识别出检查基准图案图像与待检查图案图像之间的关系，构成通过吸收（贴合）图像上的像素位置偏差，扩张/收缩噪声或感测噪声而获得的数学模型，以及通过比较通过模拟数学模型获得的新的检查参考图案图像（模型图像）和待检查的图案图像来检测缺陷。

4. 发明申请

US20050232477A1 Defect inspection apparatus and defect inspection method 失效
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US20050232477A1
公开(公告)日：2005-10-20
申请号：US11072317
申请日：2005-03-07
申请人： Shinji Sugihara , Ikunao Isomura , Junji Oaki , Toru Tojo
发明人： Shinji Sugihara , Ikunao Isomura , Junji Oaki , Toru Tojo
IPC分类号： G01B11/24 , G01N21/956 , G01R31/311 , G03F1/84 , G06K9/00 , G06T1/00 , G06T5/20 , G06T7/00 , H01L21/027 , H01L21/66
CPC分类号： G06T7/001 , G01R31/311 , G03F1/84 , G06T2207/30148
摘要： A defect inspection method comprises irradiating a sample including a pattern under inspection with light, acquiring measurement pattern data of the pattern based on intensity of light reflected by the sample, generating conversion data including pixel data corresponding to the measurement pattern data from design data of the sample, applying FIR filter process to the conversion data, reconstructing the conversion data by replacing pixel data having value not larger than first reference value with first pixel data, replacing pixel data having value larger than second reference value larger than first reference value with second pixel data having value larger than first pixel data, replacing pixel data having value larger than first reference value and less than second reference value with third pixel data having value between the value of first and second pixel data, the pixel data having larger value being replaced with third pixel data having higher value.
摘要翻译：缺陷检查方法包括用光照射包括检查中的图案的样品，基于由样品反射的光的强度获取图案的测量图案数据，生成包括与来自样品的设计数据相对应的测量图案数据的像素数据的转换数据将FIR滤波处理应用于转换数据，通过用第一像素数据替换具有不大于第一参考值的像素数据来重构转换数据，用第二像素替换具有大于第一参考值的值的大于第二参考值的像素数据具有大于第一像素数据的数据的数据，替换具有大于第一参考值且小于第二参考值的像素数据，其中第三像素数据具有在第一和第二像素数据的值之间的值，具有较大值的像素数据被替换为第三像素数据具有较高的值。

5. 发明申请

US20050213084A1 Mask-defect inspecting apparatus 有权
标题翻译：掩模缺陷检查装置
公开(公告)号：US20050213084A1
公开(公告)日：2005-09-29
申请号：US11083323
申请日：2005-03-18
申请人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
发明人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
IPC分类号： G01N21/88 , G01N21/956 , G03F1/84 , H01L21/027
CPC分类号： G01N21/956
摘要： A mask-defect inspection apparatus including a plurality of illumination optical systems (2) for illuminating different areas (14a, 14b) on a mask (4) on which a pattern (6) is formed, an objective lens (OL) disposed to face the mask, and at least a pair of detection optical systems (15, 16) each having a detection sensor (17, 19) to form an image of the pattern and for receiving illumination light from each of the different areas through the objective lens, each of the detection optical systems having a mechanism (13a, 13b) for adjusting an angle of an aperture.
摘要翻译：一种掩模缺陷检查装置，包括：多个照明光学系统（2），用于照射在其上形成有图案（6）的掩模（4）上的不同区域（14a，14b），物镜（OL）以及至少一对具有检测传感器（17,19）的检测光学系统（15,16），以形成图案的图像，并且用于通过该目标接收来自每个不同区域的照明光每个检测光学系统具有用于调整光圈角度的机构（13a，13b）。

6. 发明授权

US07551273B2 Mask defect inspection apparatus 有权
标题翻译：掩模缺陷检测仪器
公开(公告)号：US07551273B2
公开(公告)日：2009-06-23
申请号：US12081852
申请日：2008-04-22
申请人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
发明人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
IPC分类号： G01N21/00
CPC分类号： G03F1/84 , G01N21/8806 , G01N21/9501 , G01N21/95607 , G01N2021/95676
摘要： The mask defect inspection apparatus including an illumination optical system for illuminating a mask on which a pattern is formed; an objective lens facing the mask; at least a pair of detection optical systems having a detection sensor for obtaining an image of the pattern, respectively, and which receive illumination light from illumination areas different from each other through the objective lens, respectively; and focusing changing means for changing a position of focusing between sites of the pattern in a film-thickness direction of the mask and the pattern images obtained by the detection sensors, such that the pattern images obtained by the detection sensors are changed corresponding to the film-thickness direction of the mask.
摘要翻译：掩模缺陷检查装置包括用于照亮其上形成有图案的掩模的照明光学系统; 面对面罩的物镜; 至少一对检测光学系统，具有分别用于获得图案的图像的检测传感器，并分别通过物镜从彼此不同的照明区域接收照明光; 以及聚焦改变装置，用于改变在掩模的膜厚度方向上的图案的位置之间的聚焦位置和由检测传感器获得的图案图像，使得由检测传感器获得的图案图像相应地变化面膜方向。

7. 发明授权

US07760349B2 Mask-defect inspecting apparatus with movable focusing lens 有权
标题翻译：具有可移动聚焦透镜的掩模缺陷检测设备
公开(公告)号：US07760349B2
公开(公告)日：2010-07-20
申请号：US11083323
申请日：2005-03-18
申请人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
发明人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
IPC分类号： G01N21/00
CPC分类号： G01N21/956
摘要： A mask-defect inspection apparatus including a plurality of illumination optical systems (2) for illuminating different areas (14a, 14b) on a mask (4) on which a pattern (6) is formed, an objective lens (OL) disposed to face the mask, and at least a pair of detection optical systems (15, 16) each having a detection sensor (17, 19) to form an image of the pattern and for receiving illumination light from each of the different areas through the objective lens, each of the detection optical systems having a mechanism (18a, 20a) for adjusting an angle of an aperture.
摘要翻译：一种掩模缺陷检查装置，包括：多个照明光学系统（2），用于照射形成有图案（6）的掩模（4）上的不同区域（14a，14b）;物镜（OL）所述掩模和至少一对检测光学系统（15,16），每个具有检测传感器（17,19）以形成所述图案的图像并且用于通过所述物镜接收来自每个所述不同区域的照明光，每个检测光学系统具有用于调整孔的角度的机构（18a，20a）。

8. 发明申请

US20080204723A1 Mask defect inspection apparatus 有权
标题翻译：掩模缺陷检测仪器
公开(公告)号：US20080204723A1
公开(公告)日：2008-08-28
申请号：US12081852
申请日：2008-04-22
申请人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
发明人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
IPC分类号： G01N21/00
CPC分类号： G03F1/84 , G01N21/8806 , G01N21/9501 , G01N21/95607 , G01N2021/95676
摘要： The mask defect inspection apparatus including an illumination optical system for illuminating a mask on which a pattern is formed; an objective lens facing the mask; at least a pair of detection optical systems having a detection sensor for obtaining an image of the pattern, respectively, and which receive illumination light from illumination areas different from each other through the objective lens, respectively; and focusing changing means for changing a position of focusing between sites of the pattern in a film-thickness direction of the mask and the pattern images obtained by the detection sensors, such that the pattern images obtained by the detection sensors are changed corresponding to the film-thickness direction of the mask.
摘要翻译：掩模缺陷检查装置包括用于照亮其上形成有图案的掩模的照明光学系统; 面对面罩的物镜; 至少一对检测光学系统，具有分别用于获得图案的图像的检测传感器，并分别通过物镜从彼此不同的照明区域接收照明光; 以及聚焦改变装置，用于改变在掩模的膜厚度方向上的图案的位置之间的聚焦位置和由检测传感器获得的图案图像，使得由检测传感器获得的图案图像相应地变化面膜方向。

9. 发明授权

US07379176B2 Mask defect inspection apparatus 有权
公开(公告)号：US07379176B2
公开(公告)日：2008-05-27
申请号：US11083202
申请日：2005-03-18
申请人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
发明人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
IPC分类号： G01N21/00
CPC分类号： G03F1/84 , G01N21/8806 , G01N21/9501 , G01N21/95607 , G01N2021/95676
摘要： The mask defect inspection apparatus including an illumination optical system for illuminating a mask on which a pattern is formed; an objective lens facing the mask; at least a pair of detection optical systems having a detection sensor for obtaining an image of the pattern, respectively, and which receive illumination light from illumination areas different from each other through the objective lens, respectively; and focusing changing means for changing a position of focusing between sites of the pattern in a film-thickness direction of the mask and the pattern images obtained by the detection sensors, such that the pattern images obtained by the detection sensors are changed corresponding to the film-thickness direction of the mask.

10. 发明申请

US20050213083A1 Mask defect inspection apparatus 有权
标题翻译：掩模缺陷检测仪器
公开(公告)号：US20050213083A1
公开(公告)日：2005-09-29
申请号：US11083202
申请日：2005-03-18
申请人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
发明人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
IPC分类号： G01N21/88 , G01N21/95 , G01N21/956 , G03F1/68 , G03F1/84
CPC分类号： G03F1/84 , G01N21/8806 , G01N21/9501 , G01N21/95607 , G01N2021/95676
摘要： The mask defect inspection apparatus including an illumination optical system for illuminating a mask on which a pattern is formed; an objective lens facing the mask; at least a pair of detection optical systems having a detection sensor for obtaining an image of the pattern, respectively, and which receive illumination light from illumination areas different from each other through the objective lens, respectively; and focusing changing means for changing a position of focusing between sites of the pattern in a film thickness direction of the mask and the pattern images obtained by the detection sensors, such that the pattern images obtained by the detection sensors are changed corresponding to the film-thickness direction of the mask.
摘要翻译：掩模缺陷检查装置包括用于照亮其上形成有图案的掩模的照明光学系统; 面对面罩的物镜; 至少一对检测光学系统，具有分别用于获得图案的图像的检测传感器，并分别通过物镜从彼此不同的照明区域接收照明光; 以及聚焦改变装置，用于改变在掩模的膜厚度方向上的图案的位置之间的聚焦位置和由检测传感器获得的图案图像，使得由检测传感器获得的图案图像相应地变化，掩模的厚度方向。

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